Patents by Inventor Jingjing Liu

Jingjing Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220064686
    Abstract: Disclosed herein are genetically modified microorganisms and related methods for the enhanced export of oligosaccharides. The microorganisms described herein express major facility superfamily proteins such as CDT-1 which allows for the export of oligosaccharides. Variants of CDT-1 exhibit higher activity regarding oligosaccharide export. Means to export oligosaccharides into the growth medium are provided herein.
    Type: Application
    Filed: October 2, 2019
    Publication date: March 3, 2022
    Inventors: James Cate, Kulika Chomvong, Oliver Kilian, Jingjing Liu, Jason Liu, Yong-Su Jin
  • Patent number: 11257958
    Abstract: The present invention provides a thin film transistor and a manufacturing method thereof. The thin film transistor includes a substrate, a gate electrode, a gate insulating layer, a semiconductor layer, a source electrode and a drain electrode, and a passivation layer. Both structures of the source electrode and the drain electrode are a three-layered metal structure, and the three-layered metal structure is a titanium tantalum/copper/titanium tantalum structure. Therefore, after the passivation layer is applied to the source electrode and the drain electrode, a bulging problem of the passivation layer can be effectively improved, and thus the thin film transistor has better plasticity and can be used for flexible displays.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: February 22, 2022
    Inventor: Jingjing Liu
  • Patent number: 11256691
    Abstract: In general, in one aspect, the invention relates to a method for servicing requests. The method includes receiving, from a client system, a request comprising a query, where the query includes a first plurality of terms. The method further includes generating, using a thesaurus library, a related query including a second plurality of terms, where at least one term in the second plurality of terms is present in the first plurality of terms. The method further includes issuing the query to a content repository to obtain a first result, issuing the related query to the content repository to obtain a second result, processing the first result and the second result to generate a final result, and providing the final result to the client system.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: February 22, 2022
    Assignee: EMC Corporation
    Inventors: Kunwu Huang, Lei Zhang, Chao Chen, Jingjing Liu, Hongtao Dai, Ying Teng
  • Publication number: 20220050381
    Abstract: A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.
    Type: Application
    Filed: October 29, 2019
    Publication date: February 17, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Roshni BISWAS, Rafael C. HOWELL, Cuiping ZHANG, Ningning JIA, Jingjing LIU, Quan ZHANG
  • Publication number: 20220004094
    Abstract: A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.
    Type: Application
    Filed: September 17, 2021
    Publication date: January 6, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Jingjing LIU
  • Patent number: 11193829
    Abstract: A circular dichroism spectrometer which comprises a metasurface. The metasurface has a plurality of anisotropic antennas configured to simultaneously spatially separate LCP and RCP spectral components from an incoming light beam. An optical detector array is included which detects the LCP and RCP spectral components. A transparent medium is situated between the metasurface and the optical detector array.
    Type: Grant
    Filed: July 20, 2020
    Date of Patent: December 7, 2021
    Assignee: Purdue Research Foundation
    Inventors: Amr Mohammad E Shaltout, Alexander V. Kildishev, Vladimir M Shalaev, Jingjing Liu
  • Patent number: 11179309
    Abstract: This invention relates to a hair care composition which provides the desired anti-dandruff efficacy with uniform deposition of the active materials on hair/scalp. This is achieved through a judicious combination of a specific cationic deposition polymer and selective anti-dandruff agent of the right particle size.
    Type: Grant
    Filed: November 28, 2016
    Date of Patent: November 23, 2021
    Assignee: Conopco, Inc.
    Inventors: Shaokun Chang, Jingjing Liu, Yingying Pi, Raghupathi Subramanian
  • Publication number: 20210328061
    Abstract: The present invention provides a thin film transistor and a manufacturing method thereof. The thin film transistor includes a substrate, a gate electrode, a gate insulating layer, a semiconductor layer, a source electrode and a drain electrode, and a passivation layer. Both structures of the source electrode and the drain electrode are a three-layered metal structure, and the three-layered metal structure is a titanium tantalum/copper/titanium tantalum structure. Therefore, after the passivation layer is applied to the source electrode and the drain electrode, a bulging problem of the passivation layer can be effectively improved, and thus the thin film transistor has better plasticity and can be used for flexible displays.
    Type: Application
    Filed: December 10, 2019
    Publication date: October 21, 2021
    Applicant: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
    Inventor: Jingjing LIU
  • Patent number: 11126077
    Abstract: A patterning device, includes: an absorber layer on a patterning device substrate; and a reflective or transmissive layer on the patterning device substrate, wherein the absorber layer and the reflective or transmissive layer together define a pattern layout having a main feature and an attenuated sub-resolution assist feature paired with the main feature, wherein: the main feature is configured to generate, upon transferring the device pattern to a layer of patterning material on a substrate, the main feature in the layer of patterning material, and upon the transferring the pattern to the layer of patterning material, the attenuated sub-resolution assist feature is configured to avoid generating a feature in the layer of patterning material and to produce a different radiation intensity than the main feature.
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: September 21, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Jingjing Liu
  • Patent number: 11086230
    Abstract: A method for optimization to increase lithographic apparatus throughput for a patterning process is described. The method includes providing a baseline dose for an EUV illumination and an initial pupil configuration, associated with a lithographic apparatus. The baseline dose and the initial pupil configuration are configured for use with a dose anchor mask pattern and a corresponding dose anchor target pattern for setting an illumination dose for corresponding device patterns of interest. The method includes biasing the dose anchor mask pattern relative to the dose anchor target pattern; determining an acceptable lower dose for the biased dose anchor mask pattern and the initial pupil configuration; unbiasing the dose anchor mask pattern relative to the dose anchor target pattern; and determining a changed pupil configuration and a mask bias for the device patterns of interest based on the acceptable lower dose and the unbiased dose anchor mask pattern.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Jingjing Liu
  • Publication number: 20210230287
    Abstract: Provided are novel fully human monoclonal antibodies that bind to human 4-1BB. It also provides the methods of hybridoma generation using humanized rats, the nucleic acid molecules encoding the anti-4-1BB antibodies, vectors and host cells used for the expression of anti-4-1BB antibodies. The invention further provides methods for validating the function of antibodies in vitro and the efficacy of antibodies in vivo. The antibodies of invention provide a very potent agent for the treatment of multiple cancers via modulating human immune function.
    Type: Application
    Filed: April 10, 2019
    Publication date: July 29, 2021
    Inventors: Yong ZHENG, Jingjing LIU, Jing LI
  • Patent number: 11068536
    Abstract: Embodiments of the present disclosure relate to a method and apparatus for managing a document index. The method comprises determining an independently updatable field in a plurality of documents, the independently updatable field comprising at least one item. The method further comprises creating an index for an item in the independently updatable field, the index containing an identifier of a document comprising the item, the document being included in the plurality of documents. Furthermore, the method further comprises storing the identifier of the document in blocks such that the index is updatable without modifying the identifier of the document.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: July 20, 2021
    Assignee: EMC IP Holding Company LLC
    Inventors: Kun Wu Huang, Winston Lei Zhang, Chao Chen, Jingjing Liu, Duke Hongtao Dai
  • Publication number: 20210214705
    Abstract: Compositions and methods are provided for producing 2?fucosyliaciose and L-fucose from recombinant microorganisms.
    Type: Application
    Filed: May 15, 2019
    Publication date: July 15, 2021
    Applicants: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS, KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Yong-Su JIN, Jingjing LIU, Sora YU, Eun Ju YUN, Suryang KWAK, Kyoung Heon KIM, Jaewon LEE
  • Patent number: 11048763
    Abstract: Techniques for searching a character string involve: determining a first set of documents including a first token in the character string, and a second set of documents including a second token in the character string; and generating a third set of documents based on the first and second sets of documents, in the third set of documents: i) a document being included in the first and second sets of documents, and ii) a distance between the first and second tokens in the document being equal to a distance between the first and second tokens in the character string.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: June 29, 2021
    Assignee: EMC IP Holding Company LLC
    Inventors: Duke Hongtao Dai, Winston Lei Zhang, Chao Chen, Kun Wu Huang, Jingjing Liu
  • Patent number: 11049701
    Abstract: Apparatus and methods for reducing and eliminating accumulation of excessive charged particles from substrate processing systems are provided herein. In some embodiments a process kit for a substrate process chamber includes: a cover ring having a body and a lip extending radially inward from the body, wherein the body has a bottom, a first wall, and a second wall, and wherein a first channel is formed between the second wall and the lip; a grounded shield having a lower inwardly extending ledge that terminates in an upwardly extending portion configured to interface with the first channel of the cover ring; and a bias power receiver coupled to the body and extending through an opening in the grounded shield.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: June 29, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Adolph Miller Allen, William Johanson, Viachslav Babayan, Zhong Qiang Hua, Carl R. Johnson, Vanessa Faune, Jingjing Liu, Vaibhav Soni, Kirankumar Savandaiah, Sundarapandian Ramalinga Vijayalaks Reddy
  • Publication number: 20210182506
    Abstract: Embodiments of the present disclosure provide a method and apparatus for processing a multi-language text. According to embodiments of the present disclosure, the multi-language text including contents in a plurality of languages may be encoded with a Unicode. The method further comprises splitting the multi-language text into a plurality of parts based on the Unicode of the multi-language text, contents of the plurality of parts having different languages. In addition, the multi-language text may also be processed based on the plurality of parts.
    Type: Application
    Filed: February 26, 2021
    Publication date: June 17, 2021
    Inventors: Kun Wu Huang, Winston Lei Zhang, Chao Chen, Jingjing Liu, Duke Hongtao Dai
  • Patent number: 10990003
    Abstract: A method to determine a mask pattern for a patterning device. The method includes obtaining a target pattern to be printed on a substrate, an initial continuous tone image corresponding to the target pattern, a binarization function (e.g., a sigmoid, an arctan, a step function, etc.) configured to transform the initial continuous tone image, and a process model configured to predict a pattern on the substrate from an output of the binarization function; and generating a binarized image having a mask pattern corresponding to the initial continuous tone image by iteratively updating the initial continuous tone image based on a cost function such that the cost function is reduced. The cost function (e.g., EPE) determines a difference between a predicted pattern determined by the process model and the target pattern.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: April 27, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Jingjing Liu, Rafael C. Howell, Xingyue Peng
  • Publication number: 20210116816
    Abstract: A method for determining electromagnetic fields associated with a mask model of a patterning process. The method includes obtaining a mask stack region of interest and an interaction order corresponding to the mask stack region of interest. The mask stack region of interest is divided into sub regions. The mask stack region of interest has one or more characteristics associated with propagation of electromagnetic waves through the mask stack region of interest. The method includes generating one or more electromagnetic field determination expressions based on the Maxwell Equations and the Quantum Schrodinger Equation. The method includes determining an electromagnetic field associated with the mask stack region of interest based on the sub regions of the mask stack region of interest and the characteristics associated with the propagation of electromagnetic waves through the mask stack region of interest, using the one or more electromagnetic field determination expressions.
    Type: Application
    Filed: April 16, 2019
    Publication date: April 22, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Xingyue PENG, Jingjing LIU
  • Publication number: 20210108964
    Abstract: A circular dichroism spectrometer which comprises a metasurface. The metasurface has a plurality of anisotropic antennas configured to simultaneously spatially separate LCP and RCP spectral components from an incoming light beam. An optical detector array is included which detects the LCP and RCP spectral components. A transparent medium is situated between the metasurface and the optical detector array.
    Type: Application
    Filed: July 20, 2020
    Publication date: April 15, 2021
    Applicant: Purdue Research Foundation
    Inventors: Amr Mohammad E Shaltout, Alexander V. Kildishev, Vladimir M Shalaev, Jingjing Liu
  • Publication number: 20210097049
    Abstract: Embodiments of the present disclosure provide a method, device, and computer program product for managing index tables. There is provided a method of managing index tables, comprising: determining the number of indexing requests for documents, the indexing requests being received within a predetermined period of time; obtaining information related to a processing index table in an index processing system, the processing index table being used for storing indices generated based on the indexing requests, the index processing system further comprising a receiving index table, the receiving index table being used for storing at least a part of the indices in the processing index table; and adjusting, based on the number of indexing requests and the obtained information, the number of processing index tables in the index processing system.
    Type: Application
    Filed: March 26, 2020
    Publication date: April 1, 2021
    Inventors: Frank Yifan Huang, Jingjing Liu