Abstract: An apparatus for reactively coating a substrate 1 with an electrically insulative material comprising an ac power supply connected to the cathodes 5, 5a which are disposed in an evacuable coating chamber 15, 15a. These cathodes interact electrically with the targets 3, 3a, and 3b, 3c to be to be sputtered. The apparatus has three electrodes 6, 5, 5a which are electrically separate from one another and from the sputtering chamber 26. Two electrodes are configured as magnetron cathodes 5, 5a wherein one of the cathode bases 11, 11a and the material of the targets 3, 3a, and 3b, 3c are electrically separate, and the third electrode functions as an anode 6 during the plasma discharge. For this purpose, a power supply source 10 for alternating current is connected to each of the two cathodes 5, 5a which, during a period of alternating current, function as a negative electrode and as a positive electrode. The power supply source 10 has a floating output with three terminals 12, 13, 14.

Abstract: Cathode sputtering apparatus with a high sputtering rate, including a cathode having a cathode base 1 and a target 6 disposed parallel thereto and being provided with a channel 5 in the cathode base which is passed through by a cooling agent 12. With respect to the target 6, 10 to be cooled, this channel 5 is bounded by a thin wall 2 configured as a membrane. The wall 2 has large contact surfaces exhibiting a good heat transfer to the target surface. The contact surface between the target 6 and the wall 2 is coated with a material, e.g. a graphite layer, which has a low sputtering rate in order to delay a sputtering through as long as possible.

Abstract: Process for the production of contact strips on substrates, especially on plates of mineral glass. These substrates are provided with an electrically conductive surface coating which is coated on the side facing away from the substrate with at least one surface layer of a dielectric material. For the production of the contact strips, a noble metal suspension in a liquid is deposited according to the invention on the surface layer in the pattern of the contact strips. Then the substrate with the pack of layers is exposed to a heat treatment at at least 100.degree. C. until a lowered total resistance occurs through the conductive surface coating between the contact strips.

Abstract: Process for coating transparent substrates, for example float glass, with a transparent dielectric layer having a low refractive index (n<1.7) at a high layer growth rate (>6.0A cm.sup.2 /W sec) by means of reactive direct current cathode sputtering. A vacuum chamber includes a cathode 5 which is provided on one of its surfaces with the material (target) to be sputtered and deposited on the substrate 3. The material to be sputtered (target) is a silicide, preferably nickel disilicide (NiSi.sub.2), and the layer deposited on the substrate is the corresponding oxide, for example NiSi-oxide. The reactive gas introduced into the vacuum chamber is oxygen and the process gas is a noble gas.

Abstract: A system of layers is built up on substrates of mineral glass in the following order: first layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or their mixed oxides; second layer: a metal from the group, tantalum, tungsten, nickel, iron; third layer: silver or a silver alloy containing at least 50 weight-percent of silver; fourth layer: a metal from the group, tantalum, tungsten, nickel, iron or their alloys; fifth layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide or their mixed oxides. After that, the substrate with all the coating layers is heated to the softening temperature of the glass in an oxidizing atmosphere and bent to the final shape.

Abstract: Process for the production of contact strips on substrates, especially on plates of mineral glass. These substrates are provided with an electrically conductive surface coating which is coated on the side facing away from the substrate with at least one surface layer of a dielectric material. For the production of the contact strips, a noble metal suspension in a liquid is deposited according to the invention on the surface layer in the pattern of the contact strips. Then the substrate with the pack of layers is exposed to a heat treatment at at least 100.degree. C. until a lowered total resistance occurs through the conductive surface coating between the contact strips.