Patents by Inventor Joaquim L. Heck, Jr.

Joaquim L. Heck, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fixture for supporting and aligning a sample to be analyzed in an X-ray diffraction apparatus
    Patent number: 4641329
    Abstract: A fixture is provided for supporting and aligning small samples of material on a goniometer for X-ray diffraction analysis. A sample-containing capillary is accurately positioned for rotation in the X-ray beam by selectively adjusting the fixture to position the capillary relative to the x and y axes thereof to prevent wobble and position the sample along the z axis or the axis of rotation. By employing the subject fixture relatively small samples of materials can be analyzed in an X-ray diffraction apparatus previously limited to the analysis of much larger samples.
    Type: Grant
    Filed: April 23, 1985
    Date of Patent: February 3, 1987
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Lanny A. Green, Joaquim L. Heck, Jr.