Patents by Inventor Johannes Jacobus Matheus Baselmans

Johannes Jacobus Matheus Baselmans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210132507
    Abstract: Method of determining a photodetector contribution to a measurement of apodization of a projection system of an immersion lithography apparatus, the method comprising providing a beam of radiation, illuminating an object with the beam of radiation, using the projection system to project an image of the object through a liquid layer and onto a photodetector, performing a first set of measurements of radiation intensity across a pupil plane of the projection system at a first liquid layer thickness, performing a second set of measurements of radiation intensity across the pupil plane of the projection system at a different liquid layer thickness, determining a set of intensity differences from the first set of measurements and the second set of measurements, comparing the determined set of intensity differences to an expected set of intensity difference, and using the results of the comparison to determine the photodetector contribution to a measurement of apodization.
    Type: Application
    Filed: June 12, 2018
    Publication date: May 6, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Paulus Hubertus Petrus KOLLER, Johannes Jacobus Matheus BASELMANS, Bartolomeus Petrus RIJPERS
  • Patent number: 10996567
    Abstract: A method for quantifying the effect of pupil function variations on a lithographic effect within a lithographic apparatus is disclosed. The method comprises: determining a discrete, two-dimensional sensitivity map in a pupil plane of the lithographic apparatus, wherein the lithographic effect is given by the inner product of said sensitivity map with a discrete, two-dimensional pupil function variation map of a radiation beam in the pupil plane. The pupil plane of a lithographic apparatus generally refers to the exit pupil of a projection system of the lithographic apparatus. Pupil function variations may comprise: relative phase variations within the pupil plane and/or relative intensity variations within the pupil plane.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: May 4, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Bart Smeets, Cristina Ioana Toma
  • Patent number: 10845712
    Abstract: An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: November 24, 2020
    Assignee: ASML Netherlands B.V.
    Inventor: Johannes Jacobus Matheus Baselmans
  • Publication number: 20200363573
    Abstract: A two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises a substrate provided with a square array of through-apertures, wherein the diffraction grating is self-supporting. It will be appreciated that for a substrate provided with a square array of through-apertures to be self-supporting at least some substrate material is provided between each through-aperture and the adjacent through apertures. A method of designing a two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises: selecting a general geometry for the two-dimensional diffraction grating, the general geometry having at least one parameter; and selecting values for the least one parameter that result in a grating efficiency map for the two-dimensional diffraction grating so as to control the contributions to a first harmonic of a phase stepping signal.
    Type: Application
    Filed: January 4, 2019
    Publication date: November 19, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan DE GROOT, Johannes Jacobus Matheus BASELMANS, Derick Yun Chek CHONG, Yassin CHOWDHURY
  • Patent number: 10747120
    Abstract: A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.
    Type: Grant
    Filed: September 2, 2019
    Date of Patent: August 18, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Carolus Johannes Catharina Schoormans, Petrus Franciscus Van Gils, Johannes Jacobus Matheus Baselmans
  • Patent number: 10739684
    Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: August 11, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens
  • Patent number: 10732498
    Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: August 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan De Groot, Gerard Frans Jozef Schasfoort, Maksym Yuriiovych Sladkov, Manfred Petrus Johannes Maria Dikkers, Jozef Maria Finders, Pieter-Jan Van Zwol, Johannes Jacobus Matheus Baselmans, Stefan Michael Bruno Baumer, Laurentius Cornelius De Winter, Wouter Joep Engelen, Marcus Adrianus Van De Kerkhof, Robbert Jan Voogd
  • Patent number: 10705432
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Publication number: 20200117093
    Abstract: A method for quantifying the effect of pupil function variations on a lithographic effect within a lithographic apparatus is disclosed. The method comprises: determining a discrete, two-dimensional sensitivity map in a pupil plane of the lithographic apparatus, wherein the lithographic effect is given by the inner product of said sensitivity map with a discrete, two-dimensional pupil function variation map of a radiation beam in the pupil plane. The pupil plane of a lithographic apparatus generally refers to the exit pupil of a projection system of the lithographic apparatus. Pupil function variations may comprise: relative phase variations within the pupil plane and/or relative intensity variations within the pupil plane.
    Type: Application
    Filed: May 31, 2018
    Publication date: April 16, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus BASELMANS, Bart SMEETS, Cristina Ioana TOMA
  • Patent number: 10620548
    Abstract: A method comprising illuminating a patterning device (MA?) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by t
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Pieter Bart Aloïs De Buck, Nico Vanroose, Giovanni Imponente, Roland Johannes Wilhelmus Stas, Chanpreet Kaur, James Robert Downes
  • Publication number: 20200012199
    Abstract: An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane.
    Type: Application
    Filed: September 19, 2019
    Publication date: January 9, 2020
    Inventor: Johannes Jacobus Matheus BASELMANS
  • Publication number: 20200004163
    Abstract: A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.
    Type: Application
    Filed: September 2, 2019
    Publication date: January 2, 2020
    Inventors: Carolus Johannes Catharina SCHOORMANS, Petrus Franciscus VAN GILS, Johannes Jacobus Matheus BASELMANS
  • Patent number: 10509326
    Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: December 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
  • Patent number: 10466595
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: November 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Publication number: 20190324374
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: July 2, 2019
    Publication date: October 24, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
  • Publication number: 20190324365
    Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
    Type: Application
    Filed: July 3, 2019
    Publication date: October 24, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan DE GROOT, Gerard Frans Jozef SCHASFOORT, Maksym Yuriiovych SLADKOV, Manfred Petrus Johannes M DIKKERS, Jozef Maria FINDERS, Pieter-Jan VAN ZWOL, Johannes Jacobus Matheus BASELMANS, Stefan Michael Bruno BAUMER, Laurentius Cornelius DE WINTER, Wouter Joep ENGELEN, Marcus Adrianus VAN DE KERKHOF, Robbert Jan VOOGD
  • Patent number: 10451977
    Abstract: A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.
    Type: Grant
    Filed: November 30, 2015
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Nick Kant, Nico Vanroose, Johannes Jacobus Matheus Baselmans
  • Publication number: 20190317411
    Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
    Type: Application
    Filed: June 27, 2019
    Publication date: October 17, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS
  • Patent number: 10444635
    Abstract: A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: October 15, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Carolus Johannes Catharina Schoormans, Johannes Jacobus Matheus Baselmans, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Aldegonda Theodorus Marie Van Den Homberg, Maksym Yuriiovych Sladkov, Andreas Johannes Antonius Brouns, Alexander Viktorovych Padiy
  • Patent number: 10444637
    Abstract: An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane.
    Type: Grant
    Filed: December 1, 2016
    Date of Patent: October 15, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Johannes Jacobus Matheus Baselmans