Patents by Inventor Jonathan H. Orloff

Jonathan H. Orloff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8907305
    Abstract: A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.
    Type: Grant
    Filed: August 10, 2011
    Date of Patent: December 9, 2014
    Assignee: FEI Company
    Inventors: Eric Kneedler, Jonathan H. Orloff
  • Patent number: 8742361
    Abstract: A charged particle column having improved performance at multiple beam energies. The column employs a four-element objective lens to enable improved beam focusing performance at both high and low beam energies at a target, with differing focus voltage configurations for different beam energies. By changing the voltages applied to the four electrodes of the objective lens, different focusing conditions may be rapidly configured, enabling rapid toggling between optimized imaging and optimized processing of a target.
    Type: Grant
    Filed: June 7, 2012
    Date of Patent: June 3, 2014
    Assignee: FEI Company
    Inventors: Mostafa Maazouz, Jonathan H. Orloff
  • Publication number: 20130327952
    Abstract: A charged particle column having improved performance at multiple beam energies. The column employs a four-element objective lens to enable improved beam focusing performance at both high and low beam energies at a target, with differing focus voltage configurations for different beam energies. By changing the voltages applied to the four electrodes of the objective lens, different focusing conditions may be rapidly configured, enabling rapid toggling between optimized imaging and optimized processing of a target.
    Type: Application
    Filed: June 7, 2012
    Publication date: December 12, 2013
    Applicant: FEI Company
    Inventors: Mostafa Maazouz, Jonathan H. Orloff
  • Publication number: 20130214156
    Abstract: A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.
    Type: Application
    Filed: August 10, 2011
    Publication date: August 22, 2013
    Applicant: FEI Company
    Inventors: Eric Kneedler, Jonathan H. Orloff
  • Patent number: 8314404
    Abstract: An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed ion source, thereby improving resolution. A magneto-optical trap can be used as the ion source.
    Type: Grant
    Filed: September 20, 2010
    Date of Patent: November 20, 2012
    Assignees: FEI Company, The United States of America as represented by the Secretary of Commerce, The National Institute of Standards and Technology
    Inventors: Jabez McClelland, Brenton J. Knuffman, Adam V. Steele, Jonathan H. Orloff
  • Patent number: 8053725
    Abstract: Applicants have found that the asymmetrical energy distribution of ions from an ion source allow chromatic aberration to be reduced by filtering ions in the low energy beam tail without significantly reducing processing time. A preferred embodiment includes within an ion beam column a filter that removes the low energy ions from the beam.
    Type: Grant
    Filed: June 29, 2009
    Date of Patent: November 8, 2011
    Assignee: FEI Company
    Inventors: Gregory A. Schwind, Jonathan H. Orloff
  • Publication number: 20110210264
    Abstract: An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed ion source, thereby improving resolution. A magneto-optical trap can be used as the ion source.
    Type: Application
    Filed: September 20, 2010
    Publication date: September 1, 2011
    Applicants: FEI COMPANY, Standard
    Inventors: Jabez J. McClelland, Brenton J. Knuffman, Adam V. Steele, Jonathan H. Orloff
  • Publication number: 20100327180
    Abstract: Applicants have found that the asymmetrical energy distribution of ions from an ion source allow chromatic aberration to be reduced by filtering ions in the low energy beam tail without significantly reducing processing time. A preferred embodiment includes within an ion beam column a filter that removes the low energy ions from the beam.
    Type: Application
    Filed: June 29, 2009
    Publication date: December 30, 2010
    Applicant: FEI COMPANY
    Inventors: Gregory A. Schwind, Jonathan H. Orloff
  • Patent number: 5015862
    Abstract: A method for modulating a liquid metal ion source includes generating an ion beam, directing a light beam at the liquid metal ion source and inducing a modulation in the ion beam by modulating the light beam.An apparatus for carrying out the invention includes a light beam source for generating a light beam, a modulator for modulating the light beam and a mechanism for directing the modulated light beam at the light metal ion source.
    Type: Grant
    Filed: January 22, 1990
    Date of Patent: May 14, 1991
    Assignee: Oregon Graduate Institute of Science & Technology
    Inventors: J. Fred Holmes, Jonathan H. Orloff, Karl J. Jousten
  • Patent number: 4698129
    Abstract: A method of forming one or more optical surfaces of the designer's choice in a body of material. The method includes the steps of exposing in a work zone a selected face in a body of selected material, directing a focused ion beam in a predetermined manner into the work zone to impinge the selected face, and by such directing and impinging, removing material from the body to create the desired optical surface(s). Preferably, beam direction is accomplished under the control of a suitably programmed computer.
    Type: Grant
    Filed: May 1, 1986
    Date of Patent: October 6, 1987
    Assignee: Oregon Graduate Center
    Inventors: Joseph Puretz, Jonathan H. Orloff, Richard K. DeFreez, Richard A. Elliott
  • Patent number: 4629898
    Abstract: A three element asymmetric lens system having a very low chromatic aberration coefficient is used in conjunction with a TFE electron source having an angular intensity of approximately 10.sup.-3 amperes per steradian to achieve precise focusing of the resulting electron beam despite the large energy spread thereof for beam, accelerating ratios in the range from 0.2 to 6.0. In one embodiment, an FI ion source is used in conjunction with the same type of lens system to initially visualize the surface of the integrated circuit. The ion beam then is rapidly focused on and scanned across a small area of passivation over an underlying metal conductor to sputter a hole through the passivation layer to the metal. A secondary electron collecting apparatus detects a large increase in the secondary electron emission when the ion beam reaches the metal. The electron beam then is scanned across the surface of the integrated circuit.
    Type: Grant
    Filed: October 13, 1983
    Date of Patent: December 16, 1986
    Assignee: Oregon Graduate Center
    Inventors: Jonathan H. Orloff, Lynwood W. Swanson
  • Patent number: 4426582
    Abstract: A liquid metal field ionization source is used in conjunction with a three element asymmetric lens system to provide an ion gun having greater magnitude beam currents focused on a smaller spot size than has been previously possible for intermediate energy beams. An ultra-clean emitter surface is achieved by means of an argon sputtering and/or plasma etching process applied to the emitter surface before liquid metal is applied to the emitter surface to ensure uniform and sufficient flow of liquid metal to the apex of the emitter. The three element asymmetric lens system has a very low chromatic aberration coefficient, enabling precise focusing of beams with large energy spreads. For beam accelerating ratios in the range from 0.2 to 6, the ion gun produces very high current densities in beams focused on very small spot areas, despite the relatively large energy spread of beams produced by liquid metal ionization sources.
    Type: Grant
    Filed: October 2, 1981
    Date of Patent: January 17, 1984
    Assignee: Oregon Graduate Center
    Inventors: Jonathan H. Orloff, Lynwood W. Swanson