Patents by Inventor Jong-Hwa Lee

Jong-Hwa Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV
    Publication number: 20210208495
    Abstract: Disclosed is a blankmask for EUV includes a substrate, a reflection film that is stacked on the substrate; and an absorbing film that is stacked on the reflection film. The absorbing film is constituted by an uppermost layer and a plurality of layers under the uppermost layer. The uppermost layer contains Ta and O. The plurality of layers contain Ta and are configured so that a content of N increases upward. As a result, a CD deviation of a pattern of the absorbing film is minimized.
    Type: Application
    Filed: January 8, 2021
    Publication date: July 8, 2021
    Inventors: Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Gil-Woo KONG
  • Porous outflow pipe for forward osmosis or pressure-retarded osmosis, and forward osmosis or pressure-retarded osmosis module comprising same
    Patent number: 11020705
    Abstract: Provided are a porous outflow pipe and an osmosis module comprising same. A porous outflow pipe for forward osmosis or pressure-retarded osmosis, according to one embodiment of the present invention, comprises: a hollow pipe provided with a plurality of first through-holes and second through-holes in the lengthwise direction through which a fluid flows in and out; a bypass pipe arranged concentrically inside the hollow pipe in the lengthwise direction; and a partitioning plate formed along the circumference of the bypass pipe, for preventing mixing of a fluid introduced through the front end side of the hollow pipe and a fluid introduced through the second through-holes.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: June 1, 2021
    Assignee: TORAY ADVANCED MATERIALS KOREA INC.
    Inventors: Sung Yun Lee, Yeon Ju Sim, Jong Hwa Lee
  • BLANKMASK AND PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
    Publication number: 20210132487
    Abstract: A blankmask for extreme ultraviolet lithography includes a reflection film, a capping film, and an absorbing film that are sequentially formed on a transparent substrate, in which the reflection film has a surface roughness of 0.5 nm Ra or less. It is possible to prevent footing of an EUV photomask pattern from occurring, improving flatness of an EUV blankmask, and prevent oxidation and defects of a capping film.
    Type: Application
    Filed: November 5, 2020
    Publication date: May 6, 2021
    Applicant: S&S TECH Co., Ltd.
    Inventors: Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Gil-Woo KONG, Gyeong-Won SEO
  • HALF-TONE ATTENUATED PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
    Publication number: 20210124254
    Abstract: The disclosure relates to a half-toned attenuated shift blankmask for extreme ultraviolet lithography including: a reflective film, a capping film, a first etch stop film, a phase shift film, a second etch stop film, and an absorbing film that are sequentially provided on a transparent substrate. The phase shift film has a high reflectance of 20% or more, so characteristics of NILS and MEEF are improved during wafer printing.
    Type: Application
    Filed: October 23, 2020
    Publication date: April 29, 2021
    Applicant: S&S TECH Co., Ltd.
    Inventors: Cheol SHIN, Jong-Hwa LEE, See-Jun JEONG, Chul-Kyu YANG
  • AUDIO SYSTEM FOR BROADCASTING RUNNING AND METHOD FOR BROADCASTING RUNNING USING THE SAME
    Publication number: 20210106873
    Abstract: Provided is an audio system for broadcasting running. The audio system includes: a record management unit configured to manage running records of a specific runner; a runner matching unit configured to recommend candidate matching runners belonging to the other space different from a space of the specific runner and having running records commensurate with the running record of the specific runner; a matching runner information receiving unit for receiving information about a runner selected by the specific runner as a running competitor of the specific runner from among the candidate matching runners recommended by the runner matching unit; and a running broadcasting unit for broadcasting a running situation of the specific runner in real time in comparison with one selected from a past time point and a current time point of the matching runner.
    Type: Application
    Filed: November 26, 2019
    Publication date: April 15, 2021
    Inventor: Jong Hwa LEE
  • Blankmask and photomask, and methods of fabricating the same
    Patent number: 10942445
    Abstract: A blankmask according to the present disclosure includes a light-shielding film provided on a transparent substrate; and a hard mask film provided on the light-shielding film and comprising molybdenum chromium (MoCr). Thus, the hard mask film has not only an enhanced etching speed but also sufficient etching resistance to fluorine (F)-based dry etching, so that an etching load against a resist film can be decreased and a hard mask film pattern and a light-shielding film pattern can be improved in a line edge roughness (LER), thereby forming a photomask for high-precision pattern printing.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: March 9, 2021
    Assignee: S&S TECH Co., Ltd.
    Inventors: Cheol Shin, Jong-Hwa Lee, Chul-Kyu Yang, Min-Ki Choi
  • RUNNER MATCHING APPLICATION, RUNNER MATCHING DEVICE INCLUDING THE SAME, AND RUNNER MATCHING METHOD USING THE SAME
    Publication number: 20210001173
    Abstract: Provided is a runner matching device may include a running environment collecting unit configured to acquire reference running environment information related to a running environment including at least one of an air quality, an altitude, a temperature, and a humidity of a running route of a specific runner, a matching runner selection receiving unit configured to receive, from the specific runner, a request for selection of a matching runner who is to have a running match with the specific runner, and a runner matching unit configured to, when a request for runner matching is made to the matching runner selection receiving unit, provide the matching runner, wherein the matching runner has a running environment that is in accordance with the reference running environment information.
    Type: Application
    Filed: October 16, 2019
    Publication date: January 7, 2021
    Inventor: Jong Hwa LEE
  • PROTECTIVE CASE FOR FOLDABLE MOBILE DEVICE
    Publication number: 20200412401
    Abstract: The present invention relates to a protective case for foldable mobile device which has a first portion, a second portion, and a joining portion wherein the joining portion connects the first portion and the second portion, comprising: a first case for protecting the first portion of the foldable mobile device installed therein; a connecting portion for covering the joining portion and fixedly attached to the first case; and a second case for protecting the second portion of the foldable mobile device installed therein wherein the second case includes a second outer frame. The second outer frame comprises a recess to receive the connecting portion wherein the connecting portion slidably moves in the recess, and the second case further comprises a recess cover for covering the recess.
    Type: Application
    Filed: October 30, 2019
    Publication date: December 31, 2020
    Inventors: Dae-Young KIM, Jae Hong CHO, Sun Woo YUN, Jong Hwa LEE, Kyung Joon LEE, Gang Il PARK
  • BLANKMASK AND PHOTOMASK
    Publication number: 20200379337
    Abstract: A blankmask includes a transparent substrate, a phase-shift film, and a light-shielding film. The phase-shift film for example has a transmissivity of 30˜100%, and in this case the light-shielding film has a thickness of 40˜70 nm and a composition ratio of 30˜80 at % chromium, 10˜50 at % nitrogen, 0˜35% oxygen, and 0˜25% carbon. A structure where the light-shielding film and the phase-shift film are stacked has an optical density of 2.5˜3.5. Thus, CD deviation is minimized when the light-shielding film is etched in a manufacturing process for a photomask.
    Type: Application
    Filed: May 13, 2020
    Publication date: December 3, 2020
    Applicant: S&S TECH Co., Ltd.
    Inventors: Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Min-Ki CHOI, Seung-Hyup SHIN
  • ATMOSPHERIC PRESSURE ADJUSTMENT APPARATUS AND ATMOSPHERIC PRESSURE ADJUSTMENT METHOD OF ATMOSPHERIC PRESSURE ADJUSTMENT APPARATUS
    Publication number: 20200336843
    Abstract: An atmospheric pressure adjustment apparatus is disclosed.
    Type: Application
    Filed: November 5, 2018
    Publication date: October 22, 2020
    Inventors: Jong Hwa LEE, Yang Wook KIM, Chang Han KIM, Gui Won SEO, Sung Won CHO, Jin Ho PARK, Hyeong Cheol JEONG
  • Case for electronic communications device
    Patent number: D902913
    Type: Grant
    Filed: August 29, 2019
    Date of Patent: November 24, 2020
    Assignee: Spigen Korea CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D905675
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: December 22, 2020
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D906313
    Type: Grant
    Filed: April 19, 2019
    Date of Patent: December 29, 2020
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D906316
    Type: Grant
    Filed: May 7, 2019
    Date of Patent: December 29, 2020
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D906320
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: December 29, 2020
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D907023
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: January 5, 2021
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D908686
    Type: Grant
    Filed: March 18, 2020
    Date of Patent: January 26, 2021
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D910004
    Type: Grant
    Filed: March 20, 2020
    Date of Patent: February 9, 2021
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D914004
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: March 23, 2021
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee
  • Case for electronic communications device
    Patent number: D915385
    Type: Grant
    Filed: March 20, 2020
    Date of Patent: April 6, 2021
    Assignee: SPIGEN KOREA CO., LTD.
    Inventor: Jong Hwa Lee