Patents by Inventor Jong-shin Kim

Jong-shin Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11940725
    Abstract: A blankmask for EUV lithography includes a substrate, a reflective layer, a capping layer, and a phase shift layer. The phase shift layer is made of a material containing ruthenium (Ru) and chromium (Cr), and a total content of ruthenium (Ru) and chromium (Cr) is 50 to 100 at %. The phase shift layer may further contain boron (B) or nitrogen (N). The phase shift layer of the present invention has a high relative reflectance (relative reflectance with respect to a reflectance of the reflective layer under the phase shift layer) with respect to a tantalum (Ta)-based phase shift layer and has a phase shift amount of 170 to 230°. It is possible to obtain excellent resolution when finally manufacturing a pattern of 7 nm or less by using a photomask manufactured using such a blankmask.
    Type: Grant
    Filed: December 6, 2021
    Date of Patent: March 26, 2024
    Assignee: S&S Tech Co., Ltd.
    Inventors: Cheol Shin, Yong-Dae Kim, Jong-Hwa Lee, Chul-Kyu Yang, Min-Kwang Park, Mi-Kyung Woo
  • Publication number: 20240084176
    Abstract: An electrically conductive bonding tape includes a conductive first film between, and bonded to, conductive first and second adhesive layers. The first film and the first and second adhesive layers are conductive at least along a thickness direction of the bonding tape. Each of the first and second adhesive layers includes conductive particles dispersed substantially as a single layer in a substantially insulative adhesive material. The plurality of conductive particles in each of the first and second adhesive layers has an average particle size Pav and a standard of deviation Psd, such that Psd/Pav is less than about 0.2. Each of the first and second adhesive layers has an average thickness of no more than about 15% greater than the average particle size of the particles in the adhesive layer. An average surface roughness of opposing major first and second surfaces of the first film is less than 10 microns.
    Type: Application
    Filed: August 30, 2023
    Publication date: March 14, 2024
    Inventors: Junbeom Shin, Jeongwan Choi, Jong-Pil Kim
  • Patent number: 8850602
    Abstract: An application protection method and an application execution method using the same are provided. The application protection method generates a key needed to execute the application which is provided to a user terminal using information on the user terminal, information on the application, and a part of text; and transmits the generated key to the user terminal. Therefore, the application is executed on the device which has a legal right for the application, thereby preventing the illegal use of the application.
    Type: Grant
    Filed: November 25, 2010
    Date of Patent: September 30, 2014
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Min-cheol Lee, Jae-won Choi, Dong-sung Kim, Jong-shin Kim, Nam-geol Lee
  • Publication number: 20120311720
    Abstract: An application protection method and an application execution method using the same are provided. The application protection method generates a key needed to execute the application which is provided to a user terminal using information on the user terminal, information on the application, and a part of text; and transmits the generated key to the user terminal. Therefore, the application is executed on the device which has a legal right for the application, thereby preventing the illegal use of the application.
    Type: Application
    Filed: November 25, 2010
    Publication date: December 6, 2012
    Inventors: Min-cheol Lee, Jae-won Choi, Dong-sung Kim, Jong-shin Kim, Nam-geol Lee