Patents by Inventor Joon-Sung Kim

Joon-Sung Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190130152
    Abstract: A fan-out semiconductor package includes: a core member including a support layer, a first wiring layer, a second wiring layer, and through-vias and having a through-hole; a semiconductor chip disposed in the through-hole; an encapsulant covering the core member and the semiconductor chip and filling at least portions of the through-hole; a connection member including an insulating layer disposed on the first wiring layer and the semiconductor chip, a redistribution layer disposed on the insulating layer, first vias electrically connecting the redistribution layer and the connection pads to each other, and second vias electrically connecting the redistribution layer and the first wiring layer to each other; and a passivation layer disposed on the insulating layer and covering the redistribution layer, wherein a thickness of the passivation layer is within half a distance from an inactive surface of the semiconductor chip to a lower surface of the encapsulant.
    Type: Application
    Filed: May 16, 2018
    Publication date: May 2, 2019
    Inventors: Byung Ho KIM, Da Hee KIM, Joon Sung KIM, Joo Young CHOI, Hee Sook PARK, Tae Wook KIM
  • Publication number: 20190035942
    Abstract: A vertical memory device may include a conductive pattern structure, a pad structure, a plurality of channel structures, a plurality of first dummy structures and a plurality of second dummy structures. The conductive pattern structure may be in a first region of a substrate, and may extend in a first direction. The pad structure may be in a second region of the substrate adjacent to each of opposite sides of the first region of the substrate, and may contact a side of the conductive pattern structure. The channel structures may extend through the conductive pattern structure, and may be regularly arranged on the substrate. The first dummy structures may extend through the conductive pattern structure, and may be disposed in a portion of the first region of the substrate adjacent to the second region thereof. The second dummy structures may extend through the pad structure on the substrate.
    Type: Application
    Filed: April 27, 2018
    Publication date: January 31, 2019
    Inventors: Joon-Young KWON, Shin-Young KIM, Yoon-Hwan SON, Jae-Jung LEE, Joon-Sung KIM, Seung-Min LEE
  • Patent number: 10134695
    Abstract: A fan-out semiconductor package includes: a first interconnection member having a through-hole; a semiconductor chip disposed in the through-hole and having an active surface having connection pads disposed thereon and an inactive surface; an encapsulant encapsulating at least portions of the first interconnection member and the inactive surface of the semiconductor chip; and a second interconnection member disposed on the first interconnection member and the active surface of the semiconductor chip.
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: November 20, 2018
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Doo Hwan Lee, Ju Hyeon Kim, Hyoung Joon Kim, Joon Sung Kim
  • Publication number: 20180270824
    Abstract: Some example embodiments include methods of operating a wireless communication device supporting carrier aggregation, the methods include allocating a memory of a plurality of memories to each of a plurality of component carriers based on a memory allocation priority; determining a demodulation priority for each of the plurality of component carriers based on one of a size of each memory allocated to each of the plurality of component carriers, and the memory allocation priority; and demodulating signals received via the plurality of component carriers based on the demodulation priority.
    Type: Application
    Filed: January 12, 2018
    Publication date: September 20, 2018
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Young-seok JUNG, Min-goo KIM, In-hyoung KIM, Joon-sung KIM, Se-bin IM
  • Publication number: 20180127545
    Abstract: A copolymerized polyamide resin includes a polymer of a monomer mixture comprising a dicarboxylic acid component comprising adipic acid and a dicarboxylic acid represented by Formula 1, wherein each R1 is independently a C1 to C5 alkyl group and a is an integer from 0 to 4, and a diamine component comprising m-xylene diamine and a diamine represented by Formula 2, wherein A is a single bond or a C1 to C10 hydrocarbon group, R2 and R3 are each independently a C1 to C5 alkyl group, and b and c are each independently an integer from 0 to 4, wherein the copolymerized polyamide resin has a difference between a melting temperature (Tm) and a crystallization temperature (Tc) of about 50° C. or more. The copolymerized polyamide resin may have excellent heat resistance and reduced or no gel generation and yellowing phenomenon in a molding process.
    Type: Application
    Filed: January 5, 2018
    Publication date: May 10, 2018
    Inventors: So Young KWON, Jin Kyu KIM, Young Sub JIN, Joon Sung KIM, Ki Yon LEE, Suk Min JUN
  • Publication number: 20180082962
    Abstract: A fan-out semiconductor package includes: a first interconnection member having a through-hole; a semiconductor chip disposed in the through-hole and having an active surface having connection pads disposed thereon and an inactive surface; an encapsulant encapsulating at least portions of the first interconnection member and the inactive surface of the semiconductor chip; and a second interconnection member disposed on the first interconnection member and the active surface of the semiconductor chip.
    Type: Application
    Filed: March 15, 2017
    Publication date: March 22, 2018
    Inventors: Doo Hwan LEE, Ju Hyeon KIM, Hyoung Joon KIM, Joon Sung KIM
  • Publication number: 20180070365
    Abstract: A chipset is provided. The chipset is configured to detect an interference characteristic of a neighbor cell corresponding to groups and perform an interference whitening operation based on the interference characteristic. The groups are generated by dividing a time interval occupied by a first reference signal region by dividing a frequency band occupied by the first reference signal region, or by dividing a time interval occupied by a second reference signal region. A frequency band occupied by the second reference signal region is wider than the frequency band occupied by the first reference signal region.
    Type: Application
    Filed: July 7, 2017
    Publication date: March 8, 2018
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Hui-Won JE, Dong-Sik KIM, Joon-Sung KIM, Young-Seok JUNG
  • Patent number: 9902808
    Abstract: A copolymerized polyamide resin includes a polymer of a monomer mixture comprising a dicarboxylic acid component comprising adipic acid and a dicarboxylic acid represented by Formula 1, wherein each R1 is independently a C1 to C5 alkyl group and a is an integer from 0 to 4, and a diamine component comprising m-xylene diamine and a diamine represented by Formula 2, wherein A is a single bond or a C1 to C10 hydrocarbon group, R2 and R3 are each independently a C1 to C5 alkyl group, and b and c are each independently an integer from 0 to 4, wherein the copolymerized polyamide resin has a difference between a melting temperature (Tm) and a crystallization temperature (Tc) of about 50° C. or more. The copolymerized polyamide resin may have excellent heat resistance and reduced or no gel generation and yellowing phenomenon in a molding process.
    Type: Grant
    Filed: December 26, 2014
    Date of Patent: February 27, 2018
    Assignee: Lotte Advanced Materials Co., Ltd.
    Inventors: So Young Kwon, Jin Kyu Kim, Young Sub Jin, Joon Sung Kim, Ki Yon Lee, Suk Min Jun
  • Publication number: 20180016394
    Abstract: The polyamide resin of the present invention is a polymer of a monomer mixture including a dicarboxylic acid and an amine-based compound, wherein the amine-based compound comprises diamine and triamine and a branching rate measured using 1H—NMR is approximately 1% to approximately 8%.
    Type: Application
    Filed: April 8, 2016
    Publication date: January 18, 2018
    Inventors: So Young KWON, Joon Sung KIM, Jin Kyu KIM, Sang Kyun IM, Il Kyoung KWON, Ki Chul SON, Young Sub JIN, Sung Chul CHOI
  • Patent number: 9837343
    Abstract: A chip embedded substrate includes: an insulating layer having outer layer circuit patterns provided on any one of an upper surface and a lower surface thereof; a chip embedded in the insulating layer; and internal circuit patterns included in the insulating layer and disposed between a height of a top surface of the chip and a height of a bottom surface thereof.
    Type: Grant
    Filed: June 29, 2015
    Date of Patent: December 5, 2017
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Joon Sung Kim, Yong Ho Baek, Jung Hyun Cho, Eung Suek Lee, Jae Hoon Choi, Young Gwan Ko
  • Patent number: 9580552
    Abstract: A polyamide ester resin includes: a repeat unit derived from a dicarboxylic acid; a repeat unit derived from a diamine; and a repeat unit represented by the following Formula 1, wherein the polyamide ester resin has a melting temperature (Tm) of about 280° C. or more. The polyamide ester resin can exhibit excellent properties in terms of moisture absorption resistance, heat resistance, discoloration resistance, fluidity and the like by using a cyclic ester. wherein R1 is a C3 to C12 linear, branched or cyclic alkylene group.
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: February 28, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sang Kyun Im, Shin Hyo Bae, Su Yeong Son, Ki Yon Lee, So Young Kwon, Joon Sung Kim, Jin Kyu Kim, Tae Joon Park, Young Sub Jin
  • Publication number: 20170044318
    Abstract: A copolymerized polyamide resin according to the present invention is characterized by comprising: a repeat unit derived from a dicarboxylic acid; a repeat unit derived from a diamine; and a repeat unit represented by Formula 1, wherein the copolymerized polyamide resin has a melting point (Tm) of about 280° C. to about 330° C. The copolymerized polyamide resin has excellent heat resistance and melt-process ability.
    Type: Application
    Filed: December 3, 2014
    Publication date: February 16, 2017
    Inventors: Sang Kyun IM, Shin Hyo BAE, So Young KWON, Tae Joon PARK, Joon Sung KIM, Jin Kyu KIM, Young Sub JIN
  • Patent number: 9315627
    Abstract: A polyamide ester resin is a polymer of: a dicarboxylic acid; a diamine; and a linear aliphatic diol, wherein, based on a total amount of the diamine and the linear aliphatic diol, the diamine is present in an amount of about 75 mol % to about 99 mol % and the linear aliphatic diol is present in an amount of about 1 mol % to about 25 mol %, and wherein the polyamide ester resin has a melting point (Tm) from about 280° C. to about 320° C. and a crystallization temperature (Tc) from about 260° C. to about 290° C. The polyamide ester resin can exhibit excellent heat resistance, discoloration resistance, and moldability.
    Type: Grant
    Filed: December 12, 2013
    Date of Patent: April 19, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Eun Ju Lee, So Young Kwon, Joon Sung Kim, Sang Kyun Im, Sung Chul Choi, Ki Yon Lee, Suk Min Jun
  • Publication number: 20160096924
    Abstract: A polyamide resin is a polymer of an adipic acid-containing dicarboxylic acid component and an m-xylenediamine-containing diamine component, wherein the polymer includes about 100 ppm or less of phosphorus and about 100 ppm or less of sodium (Na), and has a gel content of about 0.5% or less as measured on a specimen prepared by melting about 10 g of the polymer at about 260° C., maintaining the molten polymer for about 30 minutes, and then cooling the molten polymer to room temperature. The polyamide resin can exhibit excellent heat resistance and can reduce or prevent gel generation upon polymerization or molding.
    Type: Application
    Filed: January 16, 2015
    Publication date: April 7, 2016
    Inventors: Jin Kyu KIM, So Young KWON, Young Sub JIN, Joon Sung KIM, Su Yeong SON, Ki Yon LEE, Sang Kyun IM, Suk Min JUN
  • Publication number: 20160090448
    Abstract: A copolymerized polyamide resin includes a polymer of a monomer mixture comprising a dicarboxylic acid component comprising adipic acid and a dicarboxylic acid represented by Formula 1, wherein each R1 is independently a C1 to C5 alkyl group and a is an integer from 0 to 4, and a diamine component comprising m-xylene diamine and a diamine represented by Formula 2, wherein A is a single bond or a C1 to C10 hydrocarbon group, R2 and R3 are each independently a C1 to C5 alkyl group, and b and c are each independently an integer from 0 to 4, wherein the copolymerized polyamide resin has a difference between a melting temperature (Tm) and a crystallization temperature (Tc) of about 50° C. or more. The copolymerized polyamide resin may have excellent heat resistance and reduced or no gel generation and yellowing phenomenon in a molding process.
    Type: Application
    Filed: December 26, 2014
    Publication date: March 31, 2016
    Inventors: So Young KWON, Jin Kyu KIM, Young Sub JIN, Joon Sung KIM, Ki Yon LEE, Suk Min JUN
  • Publication number: 20160083509
    Abstract: A polyamide ester resin includes: a repeat unit derived from a dicarboxylic acid; a repeat unit derived from a diamine; and a repeat unit represented by the following Formula 1, wherein the polyamide ester resin has a melting temperature (Tm) of about 280° C. or more. The polyamide ester resin can exhibit excellent properties in terms of moisture absorption resistance, heat resistance, discoloration resistance, fluidity and the like by using a cyclic ester. wherein R1 is a C3 to C12 linear, branched or cyclic alkylene group.
    Type: Application
    Filed: April 14, 2015
    Publication date: March 24, 2016
    Inventors: Sang Kyun IM, Shin Hyo BAE, Su Yeong SON, Ki Yon LEE, So Young KWON, Joon Sung KIM, Jin Kyu KIM, Tae Joon PARK, Young Sub JIN
  • Publication number: 20160032051
    Abstract: A copolymerized polyamide resin includes a polymer of a monomer mixture comprising a dicarboxylic acid component and a diamine component including about 4 mol % to about 20 mol % of an alicyclic diamine represented by the Formula 1, wherein the polyamide resin has a melting temperature (Tm) from about 280 to about 330° C. and a crystallization temperature (Tc) from about 250 to about 300° C.: wherein, R1 and R2 are the same or different and are each independently a C1 to C5 alkyl group or a C6 to C10 aryl group, X is a C1 to C10 hydrocarbon group, and m and n are the same or different and are each independently an integer from 0 to 4. The copolymerized polyamide resin can exhibit excellent properties, such as crystallinity, heat resistance, processability and discoloration resistance, and an excellent balance therebetween.
    Type: Application
    Filed: December 11, 2014
    Publication date: February 4, 2016
    Inventors: So Young KWON, Joon Sung KIM, Eun Ju LEE, Ki Yon LEE, Sung Chul CHOI
  • Publication number: 20160007449
    Abstract: Disclosed herein is a chip embedded substrate including: an insulating layer having outer layer circuit patterns provided on any one of an upper surface and a lower surface thereof; a chip embedded in the insulating layer; and internal circuit patterns included in the insulating layer and disposed between a height of a top surface of the chip and a height of a bottom surface thereof.
    Type: Application
    Filed: June 29, 2015
    Publication date: January 7, 2016
    Inventors: Joon Sung KIM, Yong Ho BAEK, Jung Hyun CHO, Eung Suek LEE, Jae Hoon CHOI, Young Gwan KO
  • Patent number: 9042113
    Abstract: Disclosed herein are a printed circuit board and a method of manufacturing the same. The printed circuit board includes: a base substrate; an outer circuit layer formed on an upper portion of the base substrate and including a connection pad; a first solder resist formed on the upper portion of the base substrate so that the connection pad of the outer circuit layer is exposed; and a second solder resist formed on an upper portion of an outer circuit layer and formed so that the connection pad is exposed.
    Type: Grant
    Filed: November 20, 2012
    Date of Patent: May 26, 2015
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventor: Joon Sung Kim
  • Publication number: 20150114699
    Abstract: There are provided an insulation material, a printed circuit board using the same, and a method of manufacturing the same. The insulation material includes a via region in which a via is to be formed; and a reinforcement material, wherein the via region and the reinforcement material are formed to be spaced apart from each other.
    Type: Application
    Filed: July 28, 2014
    Publication date: April 30, 2015
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Young Gwan Ko, Yong Jin Park, Kang Wook Bong, Hye Won Jung, Young Kuk Ko, Joon Sung Kim