Abstract: The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.

Abstract: An arrangement for the generation of radiation by a gas discharge has the object of achieving a considerable reduction in the inductance of the discharge circuit for the gas discharge while simultaneously increasing the lifetime of the electrode system. Also, the use of different emitters is ensured. A rotary electrode arrangement accommodated in the discharge chamber contains electrodes which are rigidly connected to one another at a distance from one another and are mounted so as to be rotatable around a common axis. Capacitor elements of a high-voltage power supply for generating high-voltage pulses for the two electrodes are arranged in a free space formed by the mutual distance. The electrodes are electrically connected to the capacitor elements and to a voltage source for charging the capacitor elements.

Abstract: The present invention relates to an AAV DNA having helper virus sequences which are necessary for developing AAV viral particles, a system containing such a DNA and the use of both.

Abstract: The invention is directed to an arrangement for the generation of intensive short-wavelength radiation based on a gas discharge plasma. It is the object of the invention to find a novel possibility for generating intensive short-wavelength radiation, particularly EUV radiation, based on a gas discharge plasma which achieves a long life of the electrode system along with a high total efficiency of the radiation source without substantially increasing the dimensions of the discharge unit. This object is met, according to the invention, in that exclusively suitably shaped vacuum insulation areas which have the shape of an annular gap and which are formed depending on the product of gas pressure (p) and interelectrode distance (d) between the cathode and anode are provided for insulating the cathode and anode from one another in a cylindrically symmetric electrode arrangement for reliable suppression of electron arcing.

Abstract: The invention is directed to a method and arrangements for the suppression of debris in short-wavelength radiation sources based on a plasma, particularly for EUV sources for semiconductor lithography. The object of the invention is to find a novel possibility for suppressing the particle flow (debris) from a plasma which keeps the debris away from primarily optical components located downstream without excessive attenuation of the desired radiation emitted from the plasma. According to the invention, this object is met in that a buffer gas is injected inside the filter structure of the debris filter lateral to openings that are provided for passing the radiation.

Abstract: It is the object of a device and method for generating extreme ultraviolet (EUV) radiation to overcome the obstacles formerly posed by the use of efficient metal emitters so that the conversion efficiency can be optimized and, as a result, the radiation output can be increased without shortening the useful life of the collector optics and electrode system. An injection nozzle of an injection device is directed to a discharge area located in a discharge chamber. The injection nozzle supplies a series of individual volumes of a starting material serving to generate radiation at a repetition rate that corresponds to the frequency of the gas discharge. Further, provision is made for successively vaporizing the individual volumes in the discharge area.

Abstract: The invention is directed to an arrangement for debris reduction in a radiation source based on a plasma, particularly for generating bundled radiation in the extreme ultraviolet (EUV) spectral region. The object of the invention, to find a novel possibility for beam shaping and debris reduction in a radiation source based on a plasma which substantially increases the life of collector optics without having to tolerate a substantial reduction in transparency or a sudden destruction of the protective mechanism, is met according to the invention in that exchangeable additional optics are arranged in the radiation path between a conventional debris filter and the collector optics, wherein a distance-increasing intermediate imaging of the source location relative to the collector optics is provided by the additional optics for further debris reduction.

Abstract: A line-narrowing module for a laser includes a prism beam expander and a grating preferably attached to a heat sink. A pressure-controlled enclosure filled with an inert gas seals the grating and/or other elements of the line-narrowing module. The pressure in the enclosure is adjusted for tuning the wavelength. Preferably, the pressure is controlled by controlling the flow of an inert gas through the enclosure. A pump may be used, or an overpressure flow may be used. Alternatively, a prism of the beam expander or an etalon may be rotatable for tuning the wavelength.

Abstract: The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation.

Abstract: Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.

Abstract: A tunable laser system includes a gain medium and an optical resonator for generating a laser beam, and a spectral narrowing and tuning unit within the resonator. A detection and control unit controls a relative wavelength of the laser system. A wavelength calibration module calibrates the detection and control unit. The module contains more than one species each having an optical transition line within the tuning spectrum of the laser. A beam portion of the narrowed emission from the laser is directed through the wavelength calibration module and a beam portion is directed through the detection and control unit when the laser beam is scanned through the optical transition line of each of the species within the module. The detection and control unit is monitored and calibrated during the scanning.

Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an initial partial pressure and is subject to depletion within the laser discharge chamber. Injections of gas including molecular fluorine are performed each to increase the partial pressure of molecular fluorine by a selected amount in the laser chamber preferably less than 0.2 mbar per injection, or 7% of an amount of F2 already within the laser chamber. A number of successive injections may be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters.

Abstract: The arrangement for generating EUV radiation based on electrically triggered gas discharges with high repetition rates and high average outputs.

Abstract: The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation.

Abstract: The present invention relates to a method of detecting a causative agent of the so-called spontaneous early abortion by investigating patients' samples for the presence of adeno-associated virias DNA (AAV DNA), or AAV antigen or antibodies, preferably of the IgM type, directed to AAV. Furthermore, the present invention relates to antibodies suitable for said method.

Abstract: The invention is directed to a method for the energy stabilization of a gas discharge-pumped radiation source that is operated in defined pulse sequences, particularly for suppression of overshooting and undershooting of excimer lasers and EUV radiation sources in burst operation. It is the object of the invention to find a novel possibility for the stabilization of the energy emission of a gas discharge-pumped radiation source that is operated in defined pulse sequences (bursts) which makes it possible to take into account a temporary behavior of the radiation source at the beginning of every burst without repeated recalibration of the energy-voltage curve.

Abstract: An exhaust pipe includes first and second length portions, each having an outer pipe and an inner pipe positioned relative to one another to define an annular gap therebetween. The length portions are placed in confronting disposition with their adjacent first ends interconnected for relative movement in a longitudinal direction. An end piece of the outer pipe of the first length portion is disposed in surrounding relationship to an end piece of the outer pipe of the second length portion at interposition of an end portion of the inner pipe of the first length portion, wherein the end pieces of the outer pipes of the first and second length portions and the end portion of the inner pipe of the first length portion are positioned for relative movement in the longitudinal direction, so as to define a triple sliding fit.

Abstract: Speckle of a laser beam is reduced by inserting an anti-speckle apparatus in the beam path to disrupt its spatial coherence while maintaining its temporal coherence. In one embodiment, the anti-speckle apparatus is a phase retarder plate bearing periodic optically-coated regions. Transmission or reflection of the beam through coated and uncoated regions causes an internal phase shift of first beam portions relative to second beam portions, thereby disrupting spatial coherence. Size and thickness of the coated regions can be carefully tailored to meet requirements of stepper and scanner equipment manufacturers for maximum allowable spatial coherence expressed as a minimum permissible number of coherent cells across the beam cross-section. An alternative embodiment of an anti-speckle apparatus is a scattering plate bearing a roughened surface. Transmission or reflection of the beam by the roughened surface disrupts the beam's spatial coherence.

Abstract: The invention is directed to an arrangement for monitoring the energy radiated by an EUV radiation source with respect to energy variations acting in an illumination beam path, wherein the radiation source has a plasma column emitting extreme ultraviolet radiation. The arrangement includes an energy monitoring unit, and a detection beam path. The detection beam path is separate from the illumination beam path and is arranged with the energy monitoring unit for detecting pulse energy, so that the illumination beam path is not impaired by the energy measurement. The detection beam path is matched to the illumination beam path with respect to bundle extension and optical losses.

Abstract: The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles.