Abstract: A resist composition comprising a base polymer comprising repeat units containing a tertiary ester group having a double or triple bond and a halogenated aromatic group exhibits a high sensitivity and resolution and forms a pattern of satisfactory profile having reduced edge roughness or size variation.

Abstract: A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.

Abstract: A resist composition comprising a sulfonium salt having an acid labile group of aromatic group-containing cyclic secondary or tertiary ester type in its cation exhibits a high sensitivity and reduced LWR or improved CDU.

Abstract: A resist composition comprising a quencher comprising a sulfonium salt of a weak acid having an acid labile group of triple bond-bearing tertiary ester type in its cation exhibits a high sensitivity and reduced LWR or improved CDU.

Abstract: An antireflective film including: a support base, and a pattern composed of a photoresist material formed on the support base, the pattern having a larger size at a point closer to the support base. The photoresist material contains a polymer compound having an aromatic group, and the polymer compound includes at least one of: (i) a repeating unit having a cyclopentadienyl complex structure, (ii) a repeating unit having a naphthalene structure, and (iii) a repeating unit having a naphthalene structure and/or a fluorene structure. The repeating units having a naphthalene structure may include one of the following units: The disclosed antireflective film shows an antireflection effect to decrease the reflection of light. A method of producing the antireflective film, and an eyeglass type display including the antireflective film are disclosed.

Abstract: A resist composition comprising a sulfonium salt having an acid labile group of triple bond-containing tertiary ester type in the cation as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.

Abstract: A resist composition comprising a sulfonium salt of an aromatic carboxylic acid having a nitrogen-containing cyclic group and a nitro-substituted benzene ring as the quencher is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: Provided is an air cleaner including: a first case and a second case each having a case wall; and a flat plate filter element sandwiched between the first case and the second case, wherein the flat plate filter element has an annular sealing portion on a peripheral edge of the flat plate filter element, at least a partial section of a peripheral edge of at least one of the first case or the second case has a flange portion and a guide wall inside the case wall, the flange portion contacts the sealing portion and extends inside at least one of the first case or the second case substantially perpendicular to the case wall from an end of the case wall, and the guide wall extends substantially parallel to the case wall and facing the case wall from an inner end of the flange portion.

Abstract: A resist composition comprising a quencher and an acid generator is provided. The quencher is a compound having a nitro-substituted aromatic moiety-containing acid labile group and a heterocyclic amine structure in its molecule. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a sulfonim salt having an acid labile group of aromatic group-containing cyclic secondary or tertiary ester type in the cation as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.

Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having an acid labile group of aromatic group-containing tertiary ester type as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.

Abstract: A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having an acid labile group of aromatic group-containing cyclic secondary or tertiary ester type as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.

Abstract: A resist composition comprising a quencher containing a sulfonium salt having the formula (A).

Abstract: A chemically amplified resist composition comprising a quencher containing an ammonium salt of an iodized or brominated phenol and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU.

Abstract: A resist composition comprising a base polymer and a salt is provided. The salt consisting of an anion derived from a carboxylic acid having an iodized or brominated hydrocarbyl group and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.

Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) containing an imide group having an iodized aromatic group bonded thereto and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation.

Abstract: A resist composition comprising a sulfonium salt having an acid labile group of aromatic ring-containing tertiary ester type in the cation as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.

Abstract: A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.

Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having the formula (1) or an iodonium salt having the formula (2).