Abstract: A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. A first upper electrode is disposed to have a ring shape and to face a target substrate placed within the process container. A second upper electrode is disposed radially inside the first upper electrode and electrically insulated therefrom. A first electric feeder is configured to supply a first RF output from a first RF power supply to the first upper electrode at a first power value. A second electric feeder branches from the first electric feeder and is configured to supply the first RF output from the first RF power supply to the second upper electrode at a second power value smaller than the first power value.

Abstract: A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. An upper electrode is disposed to face a target substrate placed within the process container. An electric feeder includes a first cylindrical conductive member continuously connected to the upper electrode in an annular direction. The electric feeder is configured to supply a first RF output from a first RF power supply to the upper electrode.

Abstract: In a water treatment apparatus, the time for treatment after water to be treated is introduced into an electrolytic bath is reduced. The water to be treated in a reservoir is subjected to electrolysis at a first electrolytic bath. Electrolysis is carried out at respective first and second electrolytic baths. By the electrolysis at the second electrolytic bath, hypochlorous acid is generated from chloride ions at the anode side. The solution subjected to electrolysis at the second electrolytic bath is mixed at a predetermined site of the pipe connected between the reservoir and the first electrolytic bath with the water output from the reservoir via a pipe prior to introduction into the first electrolytic bath. Accordingly, the water subjected to electrolysis at the first electrolytic bath can be sterilized in advance by the hypochlorous acid generated by electrolysis at the second electrolytic bath.

Abstract: A waste treatment system permitting treatment of organic wastes at low cost is provided. In the waste treatment system, organic wastes such as sewage, garbage and sludge are introduced into a methane fermentation bath for anaerobic fermentation. The methane gas produced in the bath is refined in a gas holder and then supplied to an electric generator, where the methane gas is used as a raw material for power generation. Digested liquid within the methane fermentation bath is supplied to an electrolytic bath via a flow adjustment bath and a fine screen. In the electrolytic bath, the digested liquid is subjected to electrolysis, by applying potentials to an electrode pair in the electrolytic bath based on the electric power obtained by the electric generator. By the electrolysis, nitrogen components including organic nitrogen and ammonia nitrogen, and BOD, SS and phosphorus components are removed from the digested liquid.

Abstract: A bearing unit comprises a bearing 60 formed of a sintered metal in which a magnetized magnetic powder is dispersed in its matrix and at least pores exposed on a bearing surface thereof are sealed by impregnation with a resin; a non-magnetic housing 90 accommodating the bearing 60; and a lubricating fluid M made of a magnetic fluid.

Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time ?t from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

Abstract: A production method for a sintered bearing, comprises compacting a raw metallic material powder into a bearing green compact; sintering the green compact into a sintered compact; and forming a resin coating over the entire surface of the sintered compact by electrodeposition.

Abstract: A road paving material includes an aggregate, asphalt, and fine ceramic particles selected from the group consisting of RBC particles, CRBC particles, and mixtures thereof.

Abstract: A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.

Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time At from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.

Abstract: A road paving material includes an aggregate, asphalt, and fine ceramic particles selected from the group consisting of RBC particles, CRBC particles, and mixtures thereof.

Abstract: The present invention provides glass compositions that can be used instead of known glass compositions containing a large amount of PbO in applications such as coating ceramic substrates, e.g., alumina, or sealing fluorescent tubes or the like. The invention also provides glass forming materials containing the glass compositions as a primary component for glass formation. Glass compositions provided by the present invention are comprises essentially of primary oxide components. The primary oxide components include ZnO, B2O3 and P2O5 as essential components and Al2O3, MgO, CaO and BaO as optional components. The amount of the primary oxide components is 85 wt % or more (preferably 90 wt % or more) of the total weight of the glass composition. Typically, the primary oxide components include 45 to 80% of ZnO, 5 to 45% of B2O3, 1 to 35% of P2O5, 0 to 10% of Al2O3, 0 to 15% of MgO, 0 to 10% of CaO, and 0 to 5% of BaO.

Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one regulator for adjustment of pressure, the flow lines being arranged in parallel, wherein a measure is taken that the operation, that is, opening or closing of one flow passage will have no transient effect on the steady flow of the other flow passages. For this purpose, each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point.

Abstract: A water treatment apparatus includes a storage unit storing water to be treated including a pharmaceutical drug, an apply unit applying the water to be treated to the storage unit, an addition unit adding into the water to be treated metal salt generating halide ions when dissolved in the water to be treated, and an energizing unit applying a current to a pair of electrodes immersed in the water to be treated in the storage unit. The pharmacological activity of the pharmaceutical drug is eliminated or reduced by decomposing or altering at least a portion of the chemical structure of the pharmaceutical drug included in the water to be treated through electrolysis.

Abstract: This invention is a vacuum processing apparatus comprising of a vacuum processing area (14) having a stage (16) on which a substrate to be processed (17) is mounted, and a carrier port (18) provided on a periapheral wall of a processing chamber (11) forming the vacuum processing area (14) and carrying the substrate (17) onto and off the stage (16), for generating plasma in the vacuum processing area (14) and subjecting the substrate (17) on the stage (16) to a plasma processing, wherein a shutter (20) closing the carrier port (18) to prevent the plasma from being disordered when the plasma is generated in the vacuum processing chamber is provided.

Abstract: A spindle motor comprises a housing 10 including a through hole with a pair of apertures, one of the apertures being closed by a thrust plate 70 and the other aperture being open; a bearing 60 accommodated in the housing 90; a rotating shaft 30 inserted into the bearing 60; a displacement restraining structure for restraining movement of the rotating shaft 30 toward the open aperture by engaging the rotation shaft 30 with the bearing 60; a rotating member secured to the rotating shaft; and a motor generating electromagnetic function for rotating the rotating member. The through hole of the housing 90 includes a large diameter portion 92A at the thrust plate 70 side and a small diameter portion 92B at the open aperture side, and a stepped portion 93 is formed at a transition portion between the large diameter portion 92A and the small diameter portion 92B.

Abstract: A vacuum treatment device, comprising a vacuum treatment chamber (1) etching a semiconductor wafer (W) as a body to be treated and a preliminary vacuum chamber (2) communicating with the vacuum treatment chamber (1), wherein a transfer arm (5) and first and second buffers (6, 7) for temporarily supporting the wafer (W) are installed in the preliminary vacuum chamber (2), the transfer arm (5) is provided with a flexible arm part (5a) and a support part (16) supporting the wafer (W), the arm part (5a) is extended and retracted by the rotations of a drive side swing arm (14) and a driven side swing arm (15) forming the arm (5a) so as to move the support part (16) straight forward and backward while maintaining it in its attitude, and the first and second buffers (6, 7) are disposed on the motion route of the support part (16) of the transfer arm (5).

Abstract: A vacuum process system comprises: a load port on which an object to be processed is set; a common transfer chamber disposed adjacent to the load port, having an internal space set at an atmospheric pressure level, and including a first transfer device that is movable and transfers the object into/from the load port, the first transfer device being disposed within the internal space; and a process unit having one process chamber for subjecting the object to a predetermined process, and a vacuum transfer chamber connected to the process chamber, having an internal space set at a vacuum pressure level, and including a second transfer device for transferring the object into/from the process chamber, the second transfer device being disposed within the internal space. The process units are individually connected to the common transfer chamber such that the process units are substantially parallel to each other. The vacuum chamber of each process unit is connected to the common transfer chamber.

Abstract: In a magnetic field generator for magnetron plasma generation which comprises a dipole-ring magnet with a plurality of columnar anisotropic segment magnets arranged in a ring-like manner, or in an etching apparatus and a method both of which utilize the magnetic field generator, the uniformity of plasma treatment over the entire surface of a wafer (workpiece) is improved by controlling the direction of the magnetic field relative to the working surface of the wafer (workpiece) which is subject to plasma treatment such as etching.

Abstract: A waste treatment system permitting treatment of organic wastes at low cost is provided. In the waste treatment system, organic wastes such as sewage, garbage and sludge are introduced into a methane fermentation bath for anaerobic fermentation. The methane gas produced in the bath is refined in a gas holder and then supplied to an electric generator, where the methane gas is used as a raw material for power generation. Digested liquid within the methane fermentation bath is supplied to an electrolytic bath via a flow adjustment bath and a fine screen. In the electrolytic bath, the digested liquid is subjected to electrolysis, by applying potentials to an electrode pair in the electrolytic bath based on the electric power obtained by the electric generator. By the electrolysis, nitrogen components including organic nitrogen and ammonia nitrogen, and BOD, SS and phosphorus components are removed from the digested liquid.