Patents by Inventor Jung Bae CHOI

Jung Bae CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12133545
    Abstract: The present application relates to a plant-soaked solution comprising sugars containing tagatose and to a method for producing same.
    Type: Grant
    Filed: June 23, 2017
    Date of Patent: November 5, 2024
    Assignee: CJ CHEILJEDANG CORPORATION
    Inventors: Su Jeong Kim, Jung Gyu Park, Youn Kyung Bak, Sung Bae Byun, Seung Won Park, Dong Chul Jung, Jong Min Choi
  • Publication number: 20240327883
    Abstract: The present invention relates to a novel enzyme capable of producing multi-hydroxy derivatives from polyunsaturated fatty acids and a method for producing multi-hydroxy derivatives of polyunsaturated fatty acids using the same.
    Type: Application
    Filed: March 8, 2024
    Publication date: October 3, 2024
    Inventors: Jeong Woo SEO, Jong Jae YI, Sun Yeon HEO, Young Bae KIM, Chul Ho KIM, Baek Rock OH, Jung Hyun JU, Hack Sun CHOI
  • Patent number: 12105915
    Abstract: A display device includes a display unit including pixels. A sensor unit overlaps with the display unit and includes sensors. A sensor driver transmits a driving signal to the sensors, and receives sensing signals corresponding to the driving signal from the sensors. One sensing period includes a first sensing period and a second sensing period. The sensor driver transmits a first driving signal having a first frequency to the sensors in the first sensing period, and transmits a second driving signal having a second frequency different from the first frequency to the sensors in the second sensing period.
    Type: Grant
    Filed: July 27, 2022
    Date of Patent: October 1, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hyun Wook Cho, Min Hong Kim, Tae Joon Kim, Hyung Bae Kim, Jung Mok Park, Il Ho Lee, Jae Woo Choi
  • Patent number: 12094796
    Abstract: Embodiments of the present disclosure generally relate to nitrogen-rich silicon nitride and methods for depositing the same, and transistors and other devices containing the same. In one or more embodiments, a passivation film stack is provided and includes a silicon oxide layer disposed on a workpiece, a nitrogen-rich silicon nitride layer disposed on the silicon oxide layer, and a hydrogen-rich silicon nitride layer disposed on the nitrogen-rich silicon nitride layer. The hydrogen-rich silicon nitride layer has a greater hydrogen concentration than the nitrogen-rich silicon nitride layer.
    Type: Grant
    Filed: May 9, 2023
    Date of Patent: September 17, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Rodney S. Lim, Jung Bae Kim, Jiarui Wang, Yi Cui, Dong Kil Yim, Soo Young Choi
  • Publication number: 20240282919
    Abstract: The present invention relates to a positive electrode active material and a lithium secondary battery including the same, and more particularly, to a bimodal-type positive electrode active material including a first lithium composite oxide particle, which is a small particle, and a second lithium composite oxide particle, which is a large particle, these particles having different particle diameters, wherein the positive electrode active material makes it possible to prevent deterioration in electrochemical properties and stability thereof, which are generated due to non-uniform formation of a coating layer at least partially coating surfaces of the small and large particles, a positive electrode including the positive electrode active material, and a lithium secondary battery using the same.
    Type: Application
    Filed: March 26, 2024
    Publication date: August 22, 2024
    Applicant: ECOPRO BM CO., LTD.
    Inventors: Jung Bae PARK, Hyun Jong YU, Moon Ho CHOI
  • Publication number: 20240279802
    Abstract: Provided are a process chamber cleaning apparatus and method in which the inside of a process chamber may be cleaned without damaging to an inner wall or a component of the process chamber. The process chamber cleaning apparatus comprising: a chamber housing; a substrate support installed inside the chamber housing, supporting a plurality of semiconductor substrates; a gas supply providing process gases; a first gas injector installed inside the chamber housing, connected to the gas supply, injecting etch gas, which is one of the process gases, into the chamber housing; and a controller controlling operations of the gas supply and the first gas injector, wherein the first gas injector injects the etch gas in a direction twisted at a predetermined angle from a central direction of the chamber housing.
    Type: Application
    Filed: November 14, 2023
    Publication date: August 22, 2024
    Inventors: Jung-Min LEE, Gi Duck KWEON, Dae Ki KIM, Hang Kyu SONG, Hyun Tae YANG, Byoung Kwon YEO, Byeong Ho WOO, Jae Sung YU, Jung Bae CHOI
  • Patent number: 12068096
    Abstract: An inductor according to an embodiment of the present invention may include: a plurality of first E-type cores, each of which has a base unit and a center leg extending in a first direction from the base unit; a first I-type core arranged in the first direction from the plurality of first E-type cores; and a coil wound around the center leg of each of the plurality of first E-type cores. Here, the plurality of E-type cores may be arranged in a line along the first direction.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: August 20, 2024
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Seok Bae, Jai Hoon Yeom, Jung Hwan Choi