Patents by Inventor Jung-Chen Chien

Jung-Chen Chien has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10591216
    Abstract: A solidifying device is for solidifying a substrate which includes a middle and two side portions. The thermostability of the middle portion is greater than that of the side portions. The solidifying device includes a housing, a heating member, a temperature control air-floating member and a conveyor. The housing defines a working space. The heating member is in the working space. The substrate has a heat receiving surface facing the heating member. The temperature control air-floating member is in the working space and below the heating member. The conveyor is for transporting the substrate into the working space and between the temperature control air-floating member and the heating member. The heating member is for providing heat to the substrate. The temperature control air-floating member is for supplying air towards the substrate to allow the substrate to float in the working space and form a high-temperature and two low-temperature areas.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: March 17, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Fu-Ching Tung, Muh-Wang Liang, Jung-Chen Chien, Yi-Jiun Lin
  • Patent number: 10458019
    Abstract: A gas shower device having gas curtain comprises a first gas shower unit for injecting a reaction gas, thereby forming a reaction gas region, and a second gas shower unit. The second gas shower unit arranged around a periphery of the first gas shower unit comprises a buffer gas chamber for providing a buffer gas, and a curtain distribution plate. The curtain distribution plate further comprises a plurality through holes for injecting the buffer gas, thereby forming a gas curtain around a periphery of the reaction gas region. In another embodiment, an apparatus for depositing film is provided by utilizing the gas shower device having gas curtain, wherein the gas curtain prevents the reaction gas in the reaction gas region from being affected directly by a vacuum pressure so that a residence time of reaction gas can be extended thereby increasing the utilization of reaction gas and film-forming efficiency.
    Type: Grant
    Filed: July 5, 2013
    Date of Patent: October 29, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ching-Chiun Wang, Chih-Yung Huang, Kung-Liang Lin, Jung-Chen Chien, Chen-Der Tsai, Chien-Chih Chen
  • Publication number: 20190101333
    Abstract: A solidifying device is for solidifying a substrate which includes a middle and two side portions. The thermostability of the middle portion is greater than that of the side portions. The solidifying device includes a housing, a heating member, a temperature control air-floating member and a conveyor. The housing defines a working space. The heating member is in the working space. The substrate has a heat receiving surface facing the heating member. The temperature control air-floating member is in the working space and below the heating member. The conveyor is for transporting the substrate into the working space and between the temperature control air-floating member and the heating member. The heating member is for providing heat to the substrate. The temperature control air-floating member is for supplying air towards the substrate to allow the substrate to float in the working space and form a high-temperature and two low-temperature areas.
    Type: Application
    Filed: December 4, 2017
    Publication date: April 4, 2019
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Fu-Ching Tung, Muh-Wang Liang, Jung-Chen Chien, Yi-Jiun Lin
  • Publication number: 20140123900
    Abstract: A gas shower device having gas curtain comprises a first gas shower unit for injecting a reaction gas, thereby forming a reaction gas region, and a second gas shower unit. The second gas shower unit arranged around a periphery of the first gas shower unit comprises a buffer gas chamber for providing a buffer gas, and a curtain distribution plate. The curtain distribution plate further comprises a plurality through holes for injecting the buffer gas, thereby forming a gas curtain around a periphery of the reaction gas region. In another embodiment, an apparatus for depositing film is provided by utilizing the gas shower device having gas curtain, wherein the gas curtain prevents the reaction gas in the reaction gas region from being affected directly by a vacuum pressure so that a residence time of reaction gas can be extended thereby increasing the utilization of reaction gas and film-forming efficiency.
    Type: Application
    Filed: July 5, 2013
    Publication date: May 8, 2014
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ching-Chiun WANG, Chih-Yung Huang, Kung-Liang Lin, Jung-Chen Chien, Chen-Der Tsai, Chien-Chih Chen
  • Patent number: 8198793
    Abstract: A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: June 12, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Fu-Ching Tung, Tean-Mu Shen, Jung-Chen Ho, Pei-Shan Wu, Chia-Ming Chen, Kuan-Chou Chen, Jung-Chen Chien, Muh-Wang Liang
  • Publication number: 20110305846
    Abstract: The present disclosure provides a surface processing apparatus, comprising a reaction chamber provided to form a deposition layer on a substrate, a carrying chamber connected to the reaction chamber and comprising a slot, and a plasma generator installed in the slot and providing plasma to process the substrate surface. Whereby the disclosure further provides a surface processing method, which flatten surface of a deposition layer on the substrate when the substrate is carried form the reaction chamber to the carrying chamber after the deposition process in the reaction chamber.
    Type: Application
    Filed: September 17, 2010
    Publication date: December 15, 2011
    Applicant: Industrial Technology Research Institute
    Inventors: JUNG-CHEN CHIEN, HUNG-JEN YANG, CHIH-CHEN CHANG, SHIH-CHIN LIN, MUH-WANG LIANG
  • Publication number: 20110247559
    Abstract: A gas distribution shower module and a film deposition apparatus are provided. The gas distribution shower module includes a first distributor, a second distributor, a third distributor and a fourth distributor. The second distributor is under the first distributor, the third distributor is under the second distributor, the fourth distributor is under the third distributor, and a distance is between the fourth distributor and the third distributor. The third distributor is divided into an inner region and an outer region, and an area ratio of the inner region to the outer region is from 1:1 to 1:5. Furthermore, the third distributor has a plurality of gas holes in the inner region and the outer region, and an area ratio of the gas holes in the inner region to the gas holes in the outer region is from 1:1 to 1:5.
    Type: Application
    Filed: August 10, 2010
    Publication date: October 13, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jun-Chin Liu, Yen-Yu Pan, Chih-Yung Huang, Jung-Chen Chien, Shun-Yuan Lo
  • Publication number: 20110073038
    Abstract: The present invention provides a gas distribution plate for providing at least two gas flowing channel. In one embodiment, the gas distribution plate has a first flowing channel, at least a second flowing channel disposed around the first flowing channel, and a tapered opening communicating with the first and the second flowing channel. In another embodiment, the gas distribution plate has a first flowing channel passing through a first and a second surface of the gas distribution plate, a second flowing channel paralleling to the first surface and a third flowing channel disposed at the second surface and communicating with the second flowing channel. The ends of the first and the third flowing channel have a tapered opening respectively. Besides, the present further provides a gas distribution apparatus for allowing at least two separate gases to be delivered independently into a process chamber while enabling the gases to be mixed completely after entering the processing chamber.
    Type: Application
    Filed: November 11, 2009
    Publication date: March 31, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jung-Chen CHIEN, Jun-Chin Liu, Hung-Jen Yang, Tean-Mu Shen, Muh-Wang Liang
  • Publication number: 20100126418
    Abstract: A gas shower module for gas deposition chamber with gas channel is disclosed, which comprises: a distributor with at least one diffusion cell positioned therein along first axial direction and a plurality of inlets respectively connecting to the gas channel and the diffusion cell; and a shower with at least one shower channel positioned therein along second axial direction, gas-inlet passages connected to the diffusion cell and the shower channel, and gas-outlet passages connected to the shower channel and gas deposition chamber; wherein the distributor is connected to the shower so that the diffusion cell will be connected to the shower channel through gas-inlet passages and the first axial direction is not be parallel to the second axial direction.
    Type: Application
    Filed: February 12, 2009
    Publication date: May 27, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tung CHIANG, Jung-Chen Chien, Jung-Chen Ho, Chih-Yung Huang
  • Publication number: 20100123381
    Abstract: A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
    Type: Application
    Filed: March 26, 2009
    Publication date: May 20, 2010
    Applicant: Industrial Technology Research Institute
    Inventors: FU-CHING TUNG, Tean-Mu Shen, Jung-Chen Ho, Pei-Shan Wu, Chia-Ming Chen, Kuan-Chou Chen, Jung-Chen Chien, Muh-Wang Liang
  • Publication number: 20090151637
    Abstract: A microwave-excited plasma source using a ridged wave-guide line-type microwave plasma reactor is disclosed. The microwave-excited plasma source comprises a reaction chamber, a ridged wave-guide and a separation plate. The ridged wave-guide is disposed on the reaction chamber, and comprises a frame portion, a ridge portion and a line-shaped slot. The line-shaped slot is disposed on a first side of the frame portion, and the ridge portion facing the line-shaped slot is disposed on a second side of the frame portion. The separation plate is disposed on the line-shaped slot. Moreover, the ridged wave-guide is suitable for concentrating microwave power, which is transmitted to the reaction chamber through the line-shaped slot in order to excite plasma.
    Type: Application
    Filed: May 29, 2008
    Publication date: June 18, 2009
    Applicant: Industrial Technology Research Institute
    Inventors: CHIH-CHEN CHANG, TUNG-CHUAN WU, FU-CHING TUNG, MUH-WANG LIANG, CHING-HUEI WU, CHAN-HSING LO, TEAN-MU SHEN, JUNG-CHEN CHIEN, JUNG-CHEN HO
  • Patent number: 7278839
    Abstract: A multi-stage vacuum pump includes a plurality of casings connected in series and each casing defining a respective compression chamber, a plurality of partition plates each set in between each two casings. When compressed by rotors at shafts in one compression chamber, compressed air passes through the air path formed in the corresponding partition plate to the next compression chamber for further compression, and finally compressed air passes to the last compression chamber through the air path formed in the last partition plate. Because the invention is designed to let compressed air directly pass through the air path in each partition plate, the outer diameter and volume of the multi-stage vacuum pump can be minimized to reduce the weight and the manufacturing cost.
    Type: Grant
    Filed: January 29, 2004
    Date of Patent: October 9, 2007
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Hsin Liu, Hong-Sheng Fang, Tean-Mu Shen, Jung-Chen Chien, Jiun-Hung Chen
  • Publication number: 20050089424
    Abstract: A multi-stage vacuum pump includes a plurality of casings connected in series and each casing defining a respective compression chamber, a plurality of partition plates each set in between each two casings. When compressed by rotors at shafts in one compression chamber, compressed air passes through the air path formed in the corresponding partition plate to the next compression chamber for further compression, and finally compressed air passes to the last compression chamber through the air path formed in the last partition plate. Because the invention is designed to let compressed air directly pass through the air path in each partition plate, the outer diameter and volume of the multi-stage vacuum pump can be minimized to reduce the weight and the manufacturing cost.
    Type: Application
    Filed: January 29, 2004
    Publication date: April 28, 2005
    Inventors: Ming-Hsin Liu, Hong-Sheng Fang, Tean-Mu Shen, Jung-Chen Chien, Jiun-Hung Chen
  • Publication number: 20050070632
    Abstract: An antiglare film applicable to polarizers or displays includes a light-transparent resin, first light-transparent particles dispersed on surface of the light-transparent resin and second light-transparent particles dispersed inside the resin. The first light-transparent particles have a same refractive index as that of the resin and particle diameters of 9 to 500 nanometers that provide a less roughness surface of the resin in order to prevent from large angle diffusion to the interior light and improve clarity of image. The second particles have a different refractive index from the resin so as to diffuse the exterior light that comes to the antiglare film so as to decrease glare. The antiglare film can be made by one time of coating. The two layer light-transparent particles provide light interference and achieve a low reflectivity.
    Type: Application
    Filed: November 29, 2004
    Publication date: March 31, 2005
    Inventors: Jung-Chen Chien, Ta-Wang Lai, Bor-Ping Wang, Hung-Chi Chen
  • Patent number: 6852376
    Abstract: An antiglare film applicable to polarizers or displays includes a light-transparent resin, first light-transparent particles dispersed on surface of the light-transparent resin and second light-transparent particles dispersed inside the resin. The first light-transparent particles have a same refractive index as that of the resin and particle diameters of 9 to 500 nanometers that provide a less roughness surface of the resin in order to prevent from large angle diffusion to the interior light and improve clarity of image. The second particles have a different refractive index from the resin so as to diffuse the exterior light that comes to the antiglare film so as to decrease glare. The antiglare film can be made by one time of coating. The two layer light-transparent particles provide light interference and achieve a low reflectivity.
    Type: Grant
    Filed: April 1, 2003
    Date of Patent: February 8, 2005
    Assignee: Optimax Technology Corporation
    Inventors: Jung-Chen Chien, Ta-Wang Lai, Bor-Ping Wang, Hung-Chi Chen
  • Publication number: 20040071937
    Abstract: An antiglare film applicable to polarizers or displays includes a light-transparent resin, first light-transparent particles dispersed on surface of the light-transparent resin and second light-transparent particles dispersed inside the resin. The first light-transparent particles have a same refractive index as that of the resin and particle diameters of 9 to 500 nanometers that provide a less roughness surface of the resin in order to prevent from large angle diffusion to the interior light and improve clarity of image. The second particles have a different refractive index from the resin so as to diffuse the exterior light that comes to the antiglare film so as to decrease glare. The antiglare film can be made by one time of coating. The two layer light-transparent particles provide light interference and achieve a low reflectivity.
    Type: Application
    Filed: April 1, 2003
    Publication date: April 15, 2004
    Inventors: Jung-Chen Chien, Ta-Wang Lai, Bor-Ping Wang, Hung-Chi Chen
  • Patent number: 6508639
    Abstract: A combination double screw rotor assembly includes a first and a second screw rotor arranged in parallel in a casing, two sets of bearings respectively mounted in the casing near the outlet to support the shafts, and a plurality of locking means respectively fastened to the shafts near the inlet. The first and the second screw rotor each has a low pressure screw rotor element, a high pressure screw rotor element, and a spiral thread formed of a first spiral thread segment at the high pressure screw rotor element and a second spiral thread segment at the low pressure screw rotor element, the first spiral thread segment having an uniform short pitch, the second spiral thread segment having an uniform long pitch, the first spiral thread segment and second spiral thread segment of the first and the second screw rotor being respectively meshed together.
    Type: Grant
    Filed: September 6, 2001
    Date of Patent: January 21, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Chun-chien Chen, Tean-mu Shen, Jung-chen Chien, Ming-Hsin Liu
  • Publication number: 20020031439
    Abstract: A combination double screw rotor assembly includes a first and a second screw rotor arranged in parallel in a casing, two sets of bearings respectively mounted in the casing near the outlet to support the shafts, and a plurality of locking means respectively fastened to the shafts near the inlet. The first and the second screw rotor each has a low pressure screw rotor element, a high pressure screw rotor element, and a spiral thread formed of a first spiral thread segment at the high pressure screw rotor element and a second spiral thread segment at the low pressure screw rotor element, the first spiral thread segment having an uniform short pitch, the second spiral thread segment having an uniform long pitch, the first spiral thread segment and second spiral thread segment of the first and the second screw rotor being respectively meshed together.
    Type: Application
    Filed: September 6, 2001
    Publication date: March 14, 2002
    Inventors: Chun-Chien Chen, Tean-Mu Shen, Jung-Chen Chien, Ming-Hsin Liu
  • Patent number: 6155502
    Abstract: A nozzle device for purging a vacuum pump includes a nozzle, the top portion of the nozzle is a tapered portion, two sides of the tapered portion are installed with nozzle holes for guiding the exhausted air sub-flow to be exhausted from the two sides of vent end.
    Type: Grant
    Filed: August 23, 1999
    Date of Patent: December 5, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Ming-Shinn Liou, Tean-Mu Shen, Cheng-Chan Tsai, Jung-Chen Chien, Tsung-Hsin Lin
  • Patent number: 6123526
    Abstract: A multistage pump includes a shaft assembly and a housing and spacing plates. The shaft assembly completed by forming shafts and rotors integrally. The spacing plates defining a plurality of successive compression chambers, each chamber is delimited by two symmetrical spacing plates, there has a ring groove associated with the spacing plates, and having an elastic component placed. When the elastic component pressed by the housing, it became leakage and the clearance between the rotors and the spacing plates be easily controlled, by this way, the pump using parts are easy to manufacture, can be machined accurately and which enable highly accurate assembly to be achieved. As to the assembling method, which is characterized by mounting the high pressure end axial bearing seat and the high pressured end plate, then to control the clearance between the high pressure end plate of the bearing seat and the rotors. Furthermore, to install the spacing plates and the housing make the compression chamber formed.
    Type: Grant
    Filed: September 18, 1998
    Date of Patent: September 26, 2000
    Assignee: Industrial Technology Research Institute
    Inventors: Chun-Chien Chen, Ming-Shinn Liou, Tean-Mu Shen, Jung-Chen Chien, Tsung-Hsin Lin