Patents by Inventor Jung Sung-hoon

Jung Sung-hoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
    Patent number: 10804098
    Abstract: The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD).
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: October 13, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Petri Raisanen, Jung Sung-hoon, Verghese Mohith
  • SYSTEMS AND METHODS FOR THIN-FILM DEPOSITION OF METAL OXIDES USING EXCITED NITROGEN-OXYGEN SPECIES
    Publication number: 20140346650
    Abstract: The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD).
    Type: Application
    Filed: August 11, 2014
    Publication date: November 27, 2014
    Inventors: Petri Raisanen, Jung Sung-hoon, Verghese Mohith
  • Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
    Patent number: 8802201
    Abstract: The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD).
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: August 12, 2014
    Assignee: ASM America, Inc.
    Inventors: Petri Raisanen, Jung Sung-hoon, Verghese Mohith
  • SYSTEMS AND METHODS FOR THIN-FILM DEPOSITION OF METAL OXIDES USING EXCITED NITROGEN-OXYGEN SPECIES
    Publication number: 20120098107
    Abstract: The present invention relates to a process and system for depositing a thin film onto a substrate. One aspect of the invention is depositing a thin film metal oxide layer using atomic layer deposition (ALD).
    Type: Application
    Filed: December 29, 2011
    Publication date: April 26, 2012
    Inventors: Petri Raisanen, Jung Sung-hoon, Verghese Mohith