Patents by Inventor Juree HONG

Juree HONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for healing defect of conductive layer, method for forming metal-carbon compound layer, 2D nano materials, transparent electrode and method for manufacturing the same
    Patent number: 10811162
    Abstract: Provided are method for healing defect of conductive layer, method for forming metal-carbon compound layer, 2D nano materials, and transparent electrode and method for manufacturing the same. According to an embodiment of present invention, the method for healing defect of conductive layer comprises: forming a conductive layer on a first metal substrate; contacting the first metal substrate with a salt solution containing a second metal in an ionic form, and forming a second metal particle at least in a portion of a conductive area, the second metal having greater reduction potential than a first metal.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 20, 2020
    Assignees: Industry-Academic Cooperation Foundation, Yonsei University, Incheon University Industry Academic Cooperation Foundation
    Inventors: Taeyoon Lee, Jong Hyun Ahn, Juree Hong, Jae-Bok Lee, Han-Bo-Ram Lee
  • METHOD FOR HEALING DEFECT OF CONDUCTIVE LAYER, METHOD FOR FORMING METAL-CARBON COMPOUND LAYER, 2D NANO MATERIALS, TRANSPARENT ELECTRODE AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20170004899
    Abstract: Provided are method for healing defect of conductive layer, method for forming metal-carbon compound layer, 2D nano materials, and transparent electrode and method for manufacturing the same. According to an embodiment of present invention, the method for healing defect of conductive layer comprises: forming a conductive layer on a first metal substrate; contacting the first metal substrate with a salt solution containing a second metal in an ionic form, and forming a second metal particle at least in a portion of a conductive area, the second metal having greater reduction potential than a first metal.
    Type: Application
    Filed: June 29, 2016
    Publication date: January 5, 2017
    Inventors: TAEYOON LEE, JONG HYUN AHN, Juree HONG, Jae-Bok LEE, Han-Bo-Ram LEE