Patents by Inventor Kan-Heng LEE

Kan-Heng LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TRANSITION METAL CHALCOGENIDE VAN DER WAALS FILMS, METHODS OF MAKING SAME, AND APPARATUSES AND DEVICES COMPRISING SAME
    Publication number: 20210399146
    Abstract: Provided are van der Waals (VDW) films comprising one or more transition metal chalcogenide (TMD) films. Also provided are methods of making VDW films. The methods are based on transfer of monolayer TMD films under vacuum, for example, using a handle layer. Also provided are apparatuses and devices comprising one or more VDW film.
    Type: Application
    Filed: July 8, 2021
    Publication date: December 23, 2021
    Inventors: Jiwoong Park, Kibum Kang, Hui Gao, Saien Xie, Kan-Heng Lee
  • Transition metal chalcogenide van der waals films, methods of making same, and apparatuses and devices comprising same
    Patent number: 11069822
    Abstract: Provided are van der Waals (VDW) films comprising one or more transition metal chalcogenide (TMD) films. Also provided are methods of making VDW films. The methods are based on transfer of monolayer TMD films under vacuum, for example, using a handle layer. Also provided are apparatuses and devices comprising one or more VDW film.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: July 20, 2021
    Assignee: CORNELL UNIVERSITY
    Inventors: Jiwoong Park, Kibum Kang, Hui Gao, Saien Xie, Kan-Heng Lee
  • TRANSITION METAL CHALCOGENIDE VAN DER WAALS FILMS, METHODS OF MAKING SAME, AND APPARATUSES AND DEVICES COMPRISING SAME
    Publication number: 20200083037
    Abstract: Provided are van der Waals (VDW) films comprising one or more transition metal chalcogenide (TMD) films. Also provided are methods of making VDW films. The methods are based on transfer of monolayer TMD films under vacuum, for example, using a handle layer. Also provided are apparatuses and devices comprising one or more VDW film.
    Type: Application
    Filed: July 10, 2017
    Publication date: March 12, 2020
    Applicant: Cornell University
    Inventors: Jiwoong PARK, Kibum KANG, Hui GAO, Saien XIE, Kan-Heng LEE