Patents by Inventor Kaname Okada

Kaname Okada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110151194
    Abstract: The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.
    Type: Application
    Filed: March 4, 2011
    Publication date: June 23, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Chikaya Tamitsuji, Kunio Watanabe, Kaname Okada, Daisuke Kobayashi
  • Patent number: 7934391
    Abstract: The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: May 3, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Chikaya Tamitsuji, Kunio Watanabe, Kaname Okada, Daisuke Kobayashi
  • Publication number: 20100159227
    Abstract: The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.
    Type: Application
    Filed: December 22, 2009
    Publication date: June 24, 2010
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Chikaya TAMITSUJI, Kunio Watanabe, Kaname Okada, Daisuke Kobayashi
  • Publication number: 20090208760
    Abstract: The present invention is to provide an optical fiber preform suitable for the production of an energy-transmitting or ultraviolet light-transmitting optical fiber, which has an excellent transmittance of a high-energy light of 50 KW/cm2 or more in terms of laser peak power or an ultraviolet light, to be transmitted through the optical fiber and which exhibits excellent durability that causes almost no deterioration by the irradiation with those two lights; and a production process thereof.
    Type: Application
    Filed: April 24, 2009
    Publication date: August 20, 2009
    Applicant: Asahi Glass Company, Limited
    Inventors: Madoka KUWAHARA, Akio KOIKE, Kaname OKADA, Tomonori OGAWA
  • Patent number: 6829084
    Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: December 7, 2004
    Assignee: Asahi Glass Company, Limited
    Inventors: Satoru Takaki, Kaname Okada, Shinya Kikugawa
  • Patent number: 6795170
    Abstract: A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: September 21, 2004
    Assignee: Asahi Glass Company, Limited
    Inventors: Hitoshi Mishiro, Shinya Kikugawa, Kaname Okada, Takayuki Kawahara, Morio Terakado
  • Patent number: 6744562
    Abstract: A pellicle comprising a box-shaped pellicle frame having top and bottom openings, and a pellicle sheet bonded to the pellicle frame to cover one of the openings of the pellicle frame, wherein the pellicle frame is made of quartz glass, a plurality of vent holes are formed as distributed on opposing side walls of the pellicle frame, and the size of the vent holes in the direction of the height of the pellicle frame is at most ⅗ of the height of the pellicle frame.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: June 1, 2004
    Assignee: Asahi Glass Company, Limited
    Inventors: Kaname Okada, Shinya Kikugawa
  • Publication number: 20030214704
    Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate
    Type: Application
    Filed: June 9, 2003
    Publication date: November 20, 2003
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Satoru Takaki, Kaname Okada, Shinya Kikugawa
  • Patent number: 6628456
    Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: September 30, 2003
    Assignee: Asahi Glass Company, Limited
    Inventors: Satoru Takaki, Kaname Okada, Shinya Kikugawa
  • Publication number: 20030095245
    Abstract: A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.
    Type: Application
    Filed: November 20, 2002
    Publication date: May 22, 2003
    Applicant: Asahi Glass Company, Limited
    Inventors: Hitoshi Mishiro, Shinya Kikugawa, Kaname Okada, Takayuki Kawahara, Morio Terakado
  • Publication number: 20030035222
    Abstract: A pellicle comprising a box-shaped pellicle frame having top and bottom openings, and a pellicle sheet bonded to the pellicle frame to cover one of the openings of the pellicle frame, wherein the pellicle frame is made of quartz glass, a plurality of vent holes are formed as distributed on opposing side walls of the pellicle frame, and the size of the vent holes in the direction of the height of the pellicle frame is at most ⅗ of the height of the pellicle frame.
    Type: Application
    Filed: July 29, 2002
    Publication date: February 20, 2003
    Applicant: Asahi Glass Company, Limited
    Inventors: Kaname Okada, Shinya Kikugawa
  • Publication number: 20030025991
    Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate
    Type: Application
    Filed: May 6, 2002
    Publication date: February 6, 2003
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Satoru Takaki, Kaname Okada, Shinya Kikugawa
  • Patent number: 6475575
    Abstract: It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.
    Type: Grant
    Filed: August 6, 2001
    Date of Patent: November 5, 2002
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Hitoshi Mishiro, Hiroshi Arishima, Kaname Okada, Katsuhiro Matsumoto