Abstract: A semiconductor wafer including patterns transferred to a plurality of shot regions of the semiconductor wafer respectively, a plurality of chip regions being formed in the plurality of shot regions respectively, a plurality of first dummy patterns being formed respectively in a first chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of first dummy patterns being arranged repeatedly in a first manner, a plurality of second dummy patterns being formed respectively in a second chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of second dummy patterns being arranged repeatedly in a second manner different from the first manner.

Abstract: A semiconductor wafer including patterns transferred to a plurality of shot regions of the semiconductor wafer respectively, a plurality of chip regions being formed in the plurality of shot regions respectively, a plurality of first dummy patterns being formed respectively in a first chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of first dummy patterns being arranged repeatedly in a first manner, a plurality of second dummy patterns being formed respectively in a second chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of second dummy patterns being arranged repeatedly in a second manner different from the first manner.

Abstract: A laser diode capable of reducing a radiating angle ?? in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle ?? in the vertical direction to be reduced.

Abstract: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.

Abstract: A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical proximity effect correction to the generated data of the main pattern; correcting shapes of the main pattern and the assist pattern on the basis of a shape change caused at an edge of the main pattern facing the assist pattern by the optical proximity effect correction; and forming a photomask by using the data of the main pattern and of the assist pattern which have been corrected.

Abstract: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.

Abstract: A photomask includes a transparent substrate and an opaque film formed on the transparent substrate. The opaque film is configured to form a device pattern with which a wafer is to be exposed; and at least one pair of assist patterns is formed by the opaque film, one assist pattern on each side of the device pattern on the transparent substrate. The size of each assist pattern of the pair of assist patterns is such that the assist pattern is not resolved on the wafer. A part of each assist pattern of the pair of assist patterns includes step portions.

Abstract: In a motor-generator control system for controlling a motor-generator, first and second sets of multiphase windings of a motor-generator are arranged to be spatially shifted in phase from each other. An allocating unit is configured to, upon input of workload request for the motor-generator, determine a first torque to be allocated to the first set of multiphase windings and a second torque to be allocated to the second set of multiphase windings. A resultant torque of the first torque and second torque meets the input workload request for the motor-generator. An energizing unit is configured to energize the first set of multiphase windings to create the first torque and energize the second set of multiphase windings to create the second torque.

Abstract: A laser diode capable of reducing a radiating angle ?? in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle ?? in the vertical direction to be reduced.

Abstract: A laser diode capable of reducing a radiating angle ?? in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle ?? in the vertical direction to be reduced.

Abstract: A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical proximity effect correction to the generated data of the main pattern; correcting shapes of the main pattern and the assist pattern on the basis of a shape change caused at an edge of the main pattern facing the assist pattern by the optical proximity effect correction; and forming a photomask by using the data of the main pattern and of the assist pattern which have been corrected.

Abstract: A photomask includes a transparent substrate and an opaque film formed on the transparent substrate. The opaque film is configured to form a device pattern with which a wafer is to be exposed; and at least one pair of assist patterns is formed by the opaque film, one assist pattern on each side of the device pattern on the transparent substrate. The size of each assist pattern of the pair of assist patterns is such that the assist pattern is not resolved on the wafer. A part of each assist pattern of the pair of assist patterns includes step portions.

Abstract: In a motor-generator control system for controlling a motor-generator, first and second sets of multiphase windings of a motor-generator are arranged to be spatially shifted in phase from each other. An allocating unit is configured to, upon input of workload request for the motor-generator, determine a first torque to be allocated to the first set of multiphase windings and a second torque to be allocated to the second set of multiphase windings. A resultant torque of the first torque and second torque meets the input workload request for the motor-generator. An energizing unit is configured to energize the first set of multiphase windings to create the first torque and energize the second set of multiphase windings to create the second torque.

Abstract: A laser diode capable of reducing a radiating angle ?? in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle ?? in the vertical direction to be reduced.

Abstract: A laser diode capable of reducing a radiating angle ?? in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle ?? in the vertical direction to be reduced.

Abstract: A laser diode capable of reducing a radiating angle &thgr;⊥ in the vertical direction, an optical pickup device, an optical disk apparatus, and optical communications equipment, all equipped with the laser diode which increases optical coupling efficiency. It has a first cladding layer of the first conductive type formed on a substrate, with an active layer on top of the first cladding layer and a second cladding layer of the second conductive type on top of the active layer. In at least the first or second cladding layer, it is formed of at least one optical guide layer having a higher refractive index than the first or second cladding layer and operating to expand a beam waist in the waveguide. This operation contributes to widening a region in which to shut up light, enabling a radiating angle &thgr;⊥ in the vertical direction to be reduced.

Abstract: An electric power steering apparatus for recovering a steering wheel to its neutral position based on the speeds of the steered wheels of a vehicle. In response to a steering torque signal from a torque sensor, assisting torque by a motor is controlled in a torque servo system from a phase compensating filter to a current detecting unit. A microcomputer calculates a speed ratio of left and right wheels based on wheel speeds detected by wheel speed sensors. Recovery compensating torque is obtained from the speed ratio of the left and right wheels, and a corresponding signal is output to an addition calculating unit. The addition calculating unit adds the steering torque signal and the signal representing the recovery compensating torque to obtain a recovery compensated signal. Based on the recovery compensated signal, the assisting torque is controlled to recover the steering to its neutral position.

Abstract: An electric power steering device includes an output shaft connected to a steering mechanism of a steering system for power assisting the steering operation. The EPS includes a motor and a control circuit accommodated in a common motor housing. The motor housing comprises an end frame and a cup-shaped motor case hermetically covering the motor and the control circuit. The end frame is secured to a rack housing accommodating the steering mechanism, so that heat generated by the motor and the control circuit is transmitted to the rack housing.

Abstract: In a control device for a small-scale series-type hybrid automobile using an electric motor and an internal combustion engine as power sources, energy generated by the drive motor is applied to a motor/generator through a generator inverter so that the motor/generator drives the internal combustion engine to apply a braking force thereto. In this way, energy generated during regenerative braking which cannot be absorbed by a saturated battery (for example, when the vehicle is travelling downhill) can be used to help brake the vehicle.

Abstract: An inverter control apparatus for driving a polyphase AC motor for preventing abrupt changes in motor drive currents when switching of one phase is stopped. The apparatus includes a signal generator for generating duty signals of drive signals of respective phases on the basis of a generated reference waveform and a signal modifier for selecting one of the duty signals of one phase, holding it at a predetermined level, and modifying the duty signals of other phases according to the value required to hold the selected duty signal. On the basis of three-phase signal voltage levels, a decision is made on voltage fixing phase intervals by a phase decision circuit, and shift values are determined by an adder at every voltage fixing phase interval. Shift values are selected by a multiplexer according to the outputs of the phase decision circuit and added to triangular wave voltage. Resultant sum values are compared with the three-phase signal voltages to form a three-phase PWM signal.