Patents by Inventor Kaoru Okamoto

Kaoru Okamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5658918
    Abstract: The present invention provides purine derivatives and pharmaceutically acceptable salts thereof which exhibit an inhibitory action towards nasal mucus secretion and are useful as pharmaceuticals for treatment of nasal secretion and rhinitis. The purine derivatives are represented by the following general formula: ##STR1## wherein R is alkyl or cycloalkyl, or optionally-substituted phenyl or phenylalkyl; R' is hydrogen or --COOX; and X is alkyl, alkenyl, alkoxyalkyl, phenyl or phenylalkyl. The compounds are useful as therapeutic and preventive agents for various types of rhinitis accompanied by acceleration of nasal mucus secretion and by the sneezing reflex such as allergic rhinitis. The compounds may be administered orally and exhibit low toxicity, little side effect and high safety. Accordingly, continuous long term administration of the pharmaceutical compositions may be performed for highly effective treatment of rhinitis.
    Type: Grant
    Filed: March 23, 1995
    Date of Patent: August 19, 1997
    Assignee: Nippon Zoki Pharmaceutical Co., Ltd.
    Inventors: Kaoru Okamoto, Taisuke Hasegawa, Akio Namimatsu
  • Patent number: 5601905
    Abstract: A laminate comprising at least two layers of a photosensitive resin layer and a polyimide precursor resin layer; a process for formation of an insulating protective layer using a laminate which comprises laminating a laminate comprising at least photosensitive resin layer and a polyimide precursor resin layer on an insulating board having an exposed circuit; selectively exposing the photosensitive resin layer to active light; developing the resultant photosensitive resin layer; removing the exposed polyimide precursor resin layer by etching it with an alkaline solution using the photosensitive resin layer as a mask; removing the photosensitive resin layer; and then curing the residual polyimide precusor resin layer; and a process for preparation of a printed circuit which comprises forming a polymide precursor resin layer on an insulating board having an exposed circuit, patterning the resin layer with an alkaline solution, and then curing it.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: February 11, 1997
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Hisashi Watanabe, Takashi Tanaka, Kaoru Okamoto, Keiji Yoshizawa, Hiroyuki Chinju, Isamu Takarabe
  • Patent number: 5438125
    Abstract: Sialic acid compounds of formula ##STR1## wherein X is hydrogen, a lower alkyl group or benzyl, Y is hydrogen or acetyl, Ac is acetyl, and the wavy line represents that the compound of the formula (I) includes both a .alpha.-anomer and .beta.-anomer, have excellent chemical and enzymatical stability and are useful in the treatment of central or peripheral nervous diseases.
    Type: Grant
    Filed: March 4, 1992
    Date of Patent: August 1, 1995
    Assignee: Nippon Zoki Pharmaceutical Co., Ltd.
    Inventors: Kaoru Okamoto, Shinji Morita
  • Patent number: 5128069
    Abstract: The present invention relates to novel luciferin derivatives and salts thereof represented by the following formula (I), which are useful as chemiluminescence reagents. ##STR1## wherein X is hydrogen, an amino-protecting group, R--, R--CO--, R--SO.sub.2 --, R--NHCO-- or R--NHCS--, R is a fluorescence probe, and n represents an integer of 1 to 4.
    Type: Grant
    Filed: March 21, 1990
    Date of Patent: July 7, 1992
    Assignee: Nippon Zoki Pharmaceutical Co., Ltd.
    Inventors: Kaoru Okamoto, Toshio Goto
  • Patent number: 4545993
    Abstract: Heterocyclic compounds comprising the formula (I): ##STR1## wherein: R.sub.1, R.sub.2, R.sub.4 and R.sub.5 each are hydrogen or a lower alkyl group;R.sub.3 is hydrogen, a halogen, an alkyl group, a haloalkyl group, an alkoxy group, an alkenyl group, an alkenyloxy group, an aryl group, an aryloxy group, an acyl group or a nitro group;and the broken line connotes a single or double bond at the C.sub.3 -C.sub.4 position, provided that when the broken line connotes a single bond, R.sub.3 is other than hydrogen; and pharmaceutically acceptable salts thereof,exhibiting antiinflammatory, antipyretic and analgesic action.
    Type: Grant
    Filed: July 20, 1982
    Date of Patent: October 8, 1985
    Assignee: Nippon Zoki Pharmaceutical Co. Ltd.
    Inventors: Kaoru Okamoto, Masaki Hamada, Teikichi Kurosaki