Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: A blender system is provided that maintains a chemical solution bath at desired concentrations. The blender system includes a blender unit configured to receive and blend at least two chemical compounds and deliver a solution including a mixture of compounds at selected concentrations to a tank that retains a selected volume of a chemical solution bath. The blender system further includes a controller configured to maintain at least one compound within a selected concentration range in the chemical solution bath. The controller controls at least one of operation of the blender unit to maintain the concentration of the compound within a selected concentration range within the solution delivered to the tank, and a change in flow rate of solution into and out of the tank when a concentration of the compound within the chemical solution bath falls outside of a target range.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: In one embodiment, a method of controlling fluids in a semiconductor processing system includes mixing two or more chemical compounds in a blender to produce a solution and supplying the solution to a reclaim tank, where the solution is dispense to a process station. The solution can be monitored at a location between the tank and the process station to determine whether at least one of the chemical compounds is at a predetermined concentration. Upon determining that the at least one chemical compound in the solution is at the predetermined concentration the solution is flowed to the process station. The method further includes removing at least a portion of the solution from the process station and returning the removed portion of the solution to the reclaim tank. The removed portion of the solution is monitored at a location between the process station and the reclaim tank to determine whether at least one of the chemical compounds in the removed portion of the solution is at a predetermined concentration.

Abstract: The invention is a method and apparatus for asynchronous blending and supply of chemical solutions. The method of the present invention includes a continuous blending system. This continuous blending system monitors the output and continuously adjusts the blending system to achieve a predetermined formulation of at least a first solution. A centralized monitoring system continuously evaluates the solutions and adjusts the output of the blender as needed to maintain the predetermined formulation of the solution. The system includes at least a first tank system. Any solutions that are delivered from this tank system are also continuously monitored, evaluated, and adjusted as needed by the centralized monitoring system.

Abstract: Provided are a method and apparatus for continuously blending a chemical solution for use in semiconductor processing. The method involves the step of: mixing a first chemical stream with a second chemical stream in a controlled manner, to form a stream of a solution having a predetermined formulation. The apparatus allows one to practice the above method. The method and apparatus can accurately provide chemical solutions of desired concentration in a continuous manner. The invention has particular applicability in semiconductor device fabrication.

Abstract: On-site blending and distribution of oxide abrasives with other constituents as used in semiconductor applications. Constituent blending is accomplished through weighing components individually into a blending tank. Some components may be added by injection or weight. Alternatively blends can be made to varying concentrations by passing the blended oxide solution in a closed circulation loop through a calibrated encapsulated torroid coil to measure electrical conductivity. The resulting conductivity output may be used to add one or more component.

Abstract: Provided are cartridges, apparatuses and methods for purifying a liquid chemical. The cartridges include a conduit connected to receive a flow of a chemical to be purified. A packed section in the conduit comprises a purification material. The ratio of the length of the packed section to the inside diameter of the conduit is from about 8:1 to about 200:1. The flow of the chemical to be purified contacts the purification material, thereby producing a flow of a purified chemical. This invention has particular applicability to the semiconductor manufacturing industry.

Abstract: On-site blending and distribution of oxide abrasives with other constituents as used in semiconductor applications. Constituent blending is accomplished through weighing components individually into a blending tank. Some components may be added by injection or weight. Alternatively blends can be made to varying concentrations by passing the blended oxide solution in a closed circulation loop through a calibrated encapsulated torroid coil to measure electrical conductivity. The resulting conductivity output may be used to add one or more component.