Patents by Inventor Kateryna Stanislavovna LYAKHOVA

Kateryna Stanislavovna LYAKHOVA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optimization of a lithography apparatus or patterning process based on selected aberration
    Patent number: 11029594
    Abstract: A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Steven George Hansen, Kateryna Stanislavovna Lyakhova, Paulus Jacobus Maria Van Adrichem
  • OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED ON SELECTED ABERRATION
    Publication number: 20190369480
    Abstract: A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.
    Type: Application
    Filed: August 30, 2017
    Publication date: December 5, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Steven George HANSEN, Kateryna Stanislavovna LYAKHOVA, Paulus Jacobus Maria VAN ADRICHEM