Patents by Inventor Katsuhiro Fukui

Katsuhiro Fukui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE
    Publication number: 20220347641
    Abstract: A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.
    Type: Application
    Filed: July 19, 2022
    Publication date: November 3, 2022
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Hajime NISHIDE, Takashi IZUTA, Takatoshi HAYASHI, Katsuhiro FUKUI, Koichi OKAMOTO, Kazuhiro FUJITA, Atsuyasu MIURA, Kenji KOBAYASHI, Sei NEGORO, Hiroki TSUJIKAWA
  • Chemical liquid preparation method, chemical liquid preparation device, and substrate processing device
    Patent number: 11439967
    Abstract: A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: September 13, 2022
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Hajime Nishide, Takashi Izuta, Takatoshi Hayashi, Katsuhiro Fukui, Koichi Okamoto, Kazuhiro Fujita, Atsuyasu Miura, Kenji Kobayashi, Sei Negoro, Hiroki Tsujikawa
  • CHEMICAL LIQUID PREPARATION METHOD, CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE
    Publication number: 20190091640
    Abstract: A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.
    Type: Application
    Filed: August 28, 2018
    Publication date: March 28, 2019
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Hajime NISHIDE, Takashi IZUTA, Takatoshi HAYASHI, Katsuhiro FUKUI, Koichi OKAMOTO, Kazuhiro FUJITA, Atsuyasu MIURA, Kenji KOBAYASHI, Sei NEGORO, Hiroki TSUJIKAWA
  • Substrate processing apparatus and substrate processing method
    Patent number: 7615118
    Abstract: In a substrate processing apparatus of the present invention, when substrates are loaded into a chamber, a frame part formed integral with a substrate holding part is interposed between the chamber and a cover, thereby sealing the interior of the chamber. When the substrates are unloaded to above the chamber, the chamber and the cover are brought into a direct contact, thereby sealing the interior of the chamber. Hence, the interior of the chamber can be sealed satisfactorily when the substrates are loaded into the chamber, and when the substrates are unloaded to above the chamber.
    Type: Grant
    Filed: August 15, 2006
    Date of Patent: November 10, 2009
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Katsuhiro Fukui, Toshio Hiroe
  • SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    Publication number: 20070072436
    Abstract: In a substrate processing apparatus of the present invention, when substrates are loaded into a chamber, a frame part formed integral with a substrate holding part is interposed between the chamber and a cover, thereby sealing the interior of the chamber. When the substrates are unloaded to above the chamber, the chamber and the cover are brought into a direct contact, thereby sealing the interior of the chamber. Hence, the interior of the chamber can be sealed satisfactorily when the substrates are loaded into the chamber, and when the substrates are unloaded to above the chamber.
    Type: Application
    Filed: August 15, 2006
    Publication date: March 29, 2007
    Inventors: Katsuhiro FUKUI, Toshio HIROE