Patents by Inventor Katsuhiro Morikawa

Katsuhiro Morikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10128138
    Abstract: A substrate transfer method is provided. The substrate transfer method comprises: loading the transfer container to a load port, and separating the cover body from the container main body; detecting an accommodation status of the substrate in the container main body by a detection unit; correcting, by a correction device, the accommodation status of the substrate in the container main body in which the accommodation status of the substrate detected by the detection unit is abnormal; and allowing a substrate transfer device to enter the container main body in which the accommodation status of the substrate is corrected, and unloading the substrate from the container main body.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: November 13, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Katsuhiro Morikawa, Ikuo Sunaka, Seiji Nakano, Kazunori Kuratomi, Toshio Shimazu
  • Patent number: 10042356
    Abstract: A substrate processing apparatus includes: first and second places in which a substrate can be placed; a substrate transfer device having a substrate holder that holds the substrate to transfer the substrate between the first and second places; and a substrate position measuring unit that detects a position of the substrate held by the substrate holder. The substrate position measuring unit, disposed independently of the substrate transfer device, is arranged at a position where the substrate held by the substrate holder of the substrate transfer device can be placed.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: August 7, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Naruaki Iida, Katsuhiro Morikawa
  • Publication number: 20170358479
    Abstract: Generation of dust from a peripheral portion of a substrate can be suppressed, and a processed substrate can be suppressed from being adversely affected by a pre-processed substrate. Further, an actual elevation state of the member configured to be moved up and down to support the substrate can be investigated. A substrate transfer device includes a first supporting portion, a second supporting portion and an elevating mechanism. The first supporting portion and the second supporting portion are configured to support a substrate from below the substrate. The elevating mechanism is configured to elevate the second supporting portion up and down between a first position higher than a height of the first supporting portion and a second position lower than the height of the first supporting portion. The substrate transfer device further includes a detecting mechanism configured to detect an elevation state of the second supporting portion.
    Type: Application
    Filed: June 6, 2017
    Publication date: December 14, 2017
    Inventors: Katsuhiro Morikawa, Yuta Matsushima
  • Patent number: 9773690
    Abstract: A substrate processing apparatus includes: a load port into and out of which the transport container is carried; and an apparatus controller that controls operations in the load port. The apparatus controller includes a storage unit that stores transition data of parameter values sent from outside based on a transport container identification code. The transition data of the parameter values each comprises a usage count of the transport container and a corresponding parameter value that quantifies a result of at least one of an operation performed to remove the lid after the transport container is carried into the load port and an operation performed to carry the container out of the load port.
    Type: Grant
    Filed: December 10, 2013
    Date of Patent: September 26, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Katsuhiro Morikawa, Ikuo Sunaka, Suguru Enokida
  • Patent number: 9696262
    Abstract: A substrate processing apparatus includes: a load port into which the transport container is carried; a detecting unit that detects storage condition of the substrates which are contained in the transport container, which has been carried into the load port and the lid of which has been removed; a processing unit that processes the substrates removed from the transport container having been carried into the load port; and a control unit.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: July 4, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Katsuhiro Morikawa, Ikuo Sunaka
  • Publication number: 20170178935
    Abstract: A substrate transfer method is provided. The substrate transfer method comprises: loading the transfer container to a load port, and separating the cover body from the container main body; detecting an accommodation status of the substrate in the container main body by a detection unit; correcting, by a correction device, the accommodation status of the substrate in the container main body in which the accommodation status of the substrate detected by the detection unit is abnormal; and allowing a substrate transfer device to enter the container main body in which the accommodation status of the substrate is corrected, and unloading the substrate from the container main body.
    Type: Application
    Filed: March 3, 2017
    Publication date: June 22, 2017
    Inventors: Katsuhiro Morikawa, Ikuo Sunaka, Seiji Nakano, Kazunori Kuratomi, Toshio Shimazu
  • Patent number: 9666463
    Abstract: A throughput can be improved. A substrate processing apparatus includes processing units arranged in a vertical direction and configured to process substrates; and a substrate transfer device configured to be moved in the vertical direction and perform loading/unloading of the substrates into/from the processing units. Further, the substrate transfer device comprises a first transfer arm and a second transfer arm which are arranged in the vertical direction and configured to be moved in the vertical direction independently, and movement ranges of the first transfer arm and the second transfer arm in the vertical direction are overlapped with each other.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: May 30, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Katsuhiro Morikawa, Issei Ueda, Akira Murata, Junya Minamida
  • Patent number: 9627238
    Abstract: A substrate transfer apparatus unloads a substrate from a transfer container in which a cover body airtightly closes a substrate unloading opening formed at a front surface of a container main body and multiple substrates are accommodated in the form of shelves. The substrate transfer apparatus includes a load port to which the transfer container is loaded; a detection unit configured to detect an accommodation status of the substrate in the container main body that is loaded to the load port and separated from the cover body; a substrate transfer device configured to enter the container main body and unload the substrate; and a correction device configured to correct the accommodation status of the substrate in the container main body before the substrate is unloaded from the container main body by the substrate transfer device when the detection unit detects abnormality in the accommodation status.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: April 18, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Katsuhiro Morikawa, Ikuo Sunaka, Seiji Nakano, Kazunori Kuratomi, Toshio Shimazu
  • Patent number: 9373531
    Abstract: A substrate can be appropriately accommodated in a cassette. A substrate transfer device includes a substrate transfer unit that delivers the substrate with respect to the cassette configured to accommodate the substrate; a detection unit that detects the substrate accommodated in the cassette; and a control device than controls the substrate transfer unit.
    Type: Grant
    Filed: February 19, 2014
    Date of Patent: June 21, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akira Murata, Katsuhiro Morikawa, Issei Ueda
  • Publication number: 20160172225
    Abstract: A substrate processing apparatus includes: a load port into and out of which the transport container is carried; and an apparatus controller that controls operations in the load port. The apparatus controller includes a storage unit that stores transition data of parameter values sent from outside based on a transport container identification code. The transition data of the parameter values each comprises a usage count of the transport container and a corresponding parameter value that quantifies a result of at least one of an operation performed to remove the lid after the transport container is carried into the load port and an operation performed to carry the container out of the load port.
    Type: Application
    Filed: December 10, 2013
    Publication date: June 16, 2016
    Inventors: Katsuhiro MORIKAWA, Ikuo SUNAKA, Suguru ENOKIDA
  • Publication number: 20150300960
    Abstract: A substrate processing apparatus includes: a load port into which the transport container is carried; a detecting unit that detects storage condition of the substrates which are contained in the transport container, which has been carried into the load port and the lid of which has been removed; a processing unit that processes the substrates removed from the transport container having been carried into the load port; and a control unit.
    Type: Application
    Filed: December 5, 2013
    Publication date: October 22, 2015
    Inventors: Katsuhiro MORIKAWA, Ikuo SUNAKA
  • Publication number: 20150235888
    Abstract: A substrate processing apparatus includes: first and second places in which a substrate can be placed; a substrate transfer device having a substrate holder that holds the substrate to transfer the substrate between the first and second places; and a substrate position measuring unit that detects a position of the substrate held by the substrate holder. The substrate position measuring unit, disposed independently of the substrate transfer device, is arranged at a position where the substrate held by the substrate holder of the substrate transfer device can be placed.
    Type: Application
    Filed: February 18, 2015
    Publication date: August 20, 2015
    Inventors: Naruaki IIDA, Katsuhiro MORIKAWA
  • Publication number: 20150187621
    Abstract: A throughput can be improved. A substrate processing apparatus includes processing units arranged in a vertical direction and configured to process substrates; and a substrate transfer device configured to be moved in the vertical direction and perform loading/unloading of the substrates into/from the processing units. Further, the substrate transfer device comprises a first transfer arm and a second transfer arm which are arranged in the vertical direction and configured to be moved in the vertical direction independently, and movement ranges of the first transfer arm and the second transfer arm in the vertical direction are overlapped with each other.
    Type: Application
    Filed: December 23, 2014
    Publication date: July 2, 2015
    Inventors: Katsuhiro Morikawa, Issei Ueda, Akira Murata, Junya Minamida
  • Publication number: 20140234058
    Abstract: A substrate can be appropriately accommodated in a cassette. A substrate transfer device includes a substrate transfer unit that delivers the substrate with respect to the cassette configured to accommodate the substrate; a detection unit that detects the substrate accommodated in the cassette; and a control device than controls the substrate transfer unit.
    Type: Application
    Filed: February 19, 2014
    Publication date: August 21, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Akira Murata, Katsuhiro Morikawa, Issei Ueda
  • Publication number: 20140178162
    Abstract: A substrate transfer apparatus unloads a substrate from a transfer container in which a cover body airtightly closes a substrate unloading opening formed at a front surface of a container main body and multiple substrates are accommodated in the form of shelves. The substrate transfer apparatus includes a load port to which the transfer container is loaded; a detection unit configured to detect an accommodation status of the substrate in the container main body that is loaded to the load port and separated from the cover body; a substrate transfer device configured to enter the container main body and unload the substrate; and a correction device configured to correct the accommodation status of the substrate in the container main body before the substrate is unloaded from the container main body by the substrate transfer device when the detection unit detects abnormality in the accommodation status.
    Type: Application
    Filed: December 20, 2013
    Publication date: June 26, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Katsuhiro Morikawa, Ikuo Sunaka, Seiji Nakano, Kazunori Kuratomi, Toshio Shimazu
  • Patent number: 8554360
    Abstract: A substrate transfer method of delivering a substrate transferred by a transfer arm to a mounting unit and associated apparatus. The method includes moving the transfer arm to a position above the mounting unit, and, when delivering the substrate onto the mounting unit, detecting a mounting portion of the mounting unit by a mounting portion detector having a light emitting element and a light receiving element provided at opposite positions across a center point of the transfer arm on a bottom surface of the transfer arm, and then lowering the transfer arm in an oblique direction to mount the substrate on the mounting unit.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: October 8, 2013
    Assignee: Tokyo Electron Limited
    Inventor: Katsuhiro Morikawa
  • Patent number: 8528889
    Abstract: A substrate support device including a support member having a lower-surface support section to support a lower surface of a substrate; and a position restriction section provided on the lower-surface support section, the position restriction section being formed to surround a periphery of the substrate supported on the lower-surface support section and restrict a position of the substrate. At least one of the lower-surface support section and the position restriction section includes a base material and a protective film formed to cover the base material and prevent at least one of wear and chemical erosion to which the base material will be subject. The substrate support device further includes, for example, a base that supports the support member, and a driving structure that moves the support member in a relative fashion with respect to the base, and is constructed as a substrate transport device.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: September 10, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Seiji Nakano, Michiaki Matsushita, Naruaki Iida, Suguru Enokida, Katsuhiro Morikawa
  • Patent number: 8441618
    Abstract: A substrate transfer apparatus, for transferring a substrate from a first module to a second module, includes a moving base having a Y-motion axis for moving the moving base in Y-direction, and a substrate holding member mounted to the moving base via X-motion axis so as to move relative to the moving base to be in an advanced position and a retracted position relative to the moving base. The X-motion axis operates when the Y-motion axis is operating, if the X-motion axis must be parallel to the Y-motion axis when transferring the substrate from the substrate holding member to the second module.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: May 14, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Masahiro Nakaharada, Naruaki Iida, Katsuhiro Morikawa, Suguru Enokida
  • Publication number: 20120154914
    Abstract: An interference filter assembly includes a condenser lens, a collimating lens, an interference filter, and an imaging device, which are arranged in a direction of light travel. The collimating lens is spaced from the condenser lens by a predetermined distance that corresponds to one of a focal length of the condenser lens and a focal length of the collimating lens. The collimating lens is provided by a single lens and applies a collimated light toward the imaging device through the interference filter in the direction of light travel. The collimating lens has a first surface adjacent to the condenser lens and a second surface adjacent to the interference filter. The first surface is a curved surface that is convex toward the condenser lens and a circular hyperboloid. The second surface is a plane surface and outputs the collimated light to the interference filter.
    Type: Application
    Filed: December 14, 2011
    Publication date: June 21, 2012
    Applicant: DENSO CORPORATION
    Inventors: Chihiro Moriguchi, Hiroshi Ando, Katsuhiro Morikawa
  • Publication number: 20110257783
    Abstract: A substrate transfer method of delivering a substrate transferred by a transfer arm to a mounting unit and associated apparatus. The method includes moving the transfer arm to a position above the mounting unit, and, when delivering the substrate onto the mounting unit, detecting a mounting portion of the mounting unit by a mounting portion detector having a light emitting element and a light receiving element provided at opposite positions across a center point of the transfer arm on a bottom surface of the transfer arm, and then lowering the transfer arm in an oblique direction to mount the substrate on the mounting unit.
    Type: Application
    Filed: June 29, 2011
    Publication date: October 20, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Katsuhiro MORIKAWA