Patents by Inventor Katsumasa Kawabata
Katsumasa Kawabata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240120541Abstract: Please substitute the new Abstract submitted herewith for the original Abstract: According to a nonaqueous electrolytic solution containing: a compound represented by the General Formula (1); a solute; and a nonaqueous organic solvent, a nonaqueous electrolytic solution battery, and a compound represented by General Formula (1), a nonaqueous electrolytic solution and a nonaqueous electrolytic solution battery having a low initial resistance value, and a compound that can be suitably used for the above nonaqueous electrolytic solution are provided,Type: ApplicationFiled: January 14, 2022Publication date: April 11, 2024Inventors: Ryosuke TERADA, Wataru KAWABATA, Katsumasa MORI, Takayoshi MORINAKA, Mikihiro TAKAHASHI
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Patent number: 11667061Abstract: The invention provides a method of forming porous polyurethane polishing pad that includes feeding liquid polyurethane onto a web sheet with a doctor blade while back tensioning the web. Coagulating liquid polyurethane onto the web sheet forms a two-layer substrate. The two-layer substrate has a porous matrix wherein the porous matrix has large pores extending upward from a base surface and open to an upper surface. Spring-arm sections connect lower and upper sections of the large pores.Type: GrantFiled: April 18, 2020Date of Patent: June 6, 2023Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Wei-Wen Tsai, Katsumasa Kawabata, Hui Bin Huang, Akane Uehara, Yosuke Takei
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Publication number: 20210323116Abstract: The invention provides a porous polyurethane polishing pad that includes a porous matrix having large pores that extend upward from a base surface and open to an upper surface. The large pores extend to the top polishing surface and have lower and upper sections with a vertical orientation. The lower and upper sections are offset in a horizontal direction. Middle-sized pores with a columnar shape and a vertical orientation originate adjacent the middle sections and small pores with a columnar shape and a vertical orientation originate between the middle-sized pores. The pores combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.Type: ApplicationFiled: April 18, 2020Publication date: October 21, 2021Inventors: Wei-Wen TSAI, Katsumasa KAWABATA, Hui Bin HUANG, Akane UEHARA, Yosuke TAKEI
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Publication number: 20210323115Abstract: The invention provides a porous polyurethane polishing pad that includes a porous matrix. The matrix has large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with tertiary pores, a portion of the large pores is open to a top polishing surface and at least a portion of the large pores extend to the top polishing surface. Spring-arm sections connect lower and upper sections of the large pores. The spring-arm sections all are in a same horizontal direction as measured from the vertical orientation and they combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.Type: ApplicationFiled: April 18, 2020Publication date: October 21, 2021Inventors: Wei-Wen TSAI, Katsumasa KAWABATA, Hui Bin HUANG, Akane UEHARA, Yosuke TAKEI
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Publication number: 20210323202Abstract: The invention provides a method of forming porous polyurethane polishing pad that includes feeding liquid polyurethane onto a web sheet with a doctor blade while back tensioning the web. Coagulating liquid polyurethane onto the web sheet forms a two-layer substrate. The two-layer substrate has a porous matrix wherein the porous matrix has large pores extending upward from a base surface and open to an upper surface. Spring-arm sections connect lower and upper sections of the large pores.Type: ApplicationFiled: April 18, 2020Publication date: October 21, 2021Inventors: Wei-Wen TSAI, Katsumasa KAWABATA, Hui Bin HUANG, Akane UEHARA, Yosuke TAKEI
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Patent number: 10259099Abstract: The method forms a porous polyurethane polishing pad by coagulating thermoplastic polyurethane to create a porous matrix having large pores extending upward from a base surface and open to an upper surface. The large pores are interconnected with small pores. Heating a press to temperature below or above the softening onset temperature of the thermoplastic polyurethane forms a series of pillows. Plastic deforming side walls of the pillow structures forms downwardly sloped side walls. The downwardly sloped side walls extend from all sides of the pillow structures. The large pores open to the downwardly sloped sidewalls are less vertical than the large pores open to the top polishing surface and are offset 10 to 60 degrees from the vertical direction.Type: GrantFiled: August 4, 2016Date of Patent: April 16, 2019Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang, George C. Jacob, Shuiyuan Luo
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Patent number: 10215345Abstract: A battery holder includes storage chamber for storing a battery. The storage chamber includes: opening end surface through which battery can be taken in or out; and upper surface section, lower surface section, and first and second side-surface sections (opposing each other) for holding the battery. Projection is formed on the inner wall of first side-surface section at a portion including the end on the opening end surface side. Outward deformable flexible section is formed on second side-surface section at a portion including the end on the opening end surface side. Slit that extends from third side-surface section opposite to the opening end surface toward the opening end surface and stops at the position corresponding to a part of the battery is formed in upper surface section and/or lower surface section. The end of the flexible section is located closer to the third side-surface section than the projection.Type: GrantFiled: February 4, 2015Date of Patent: February 26, 2019Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Miho Shirakawa, Katsumasa Kawabata
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Patent number: 10106662Abstract: The porous polyurethane polishing pad includes a porous matrix having large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with small pores. The porous matrix is a blend of two thermoplastic polymers. The first thermoplastic polyurethane has by molecular percent, 45 to 60 adipic acid, 10 to 30 MDI-ethylene glycol and 15 to 35 MDI and an Mn of 40,000 to 60,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 2.5 to 4 The second thermoplastic polyurethane has by molecular percent, 40 to 50 adipic acid, 20 to 40 adipic acid butane diol, 5 to 20 MDI-ethylene glycol and 5 to 25 MDI and an Mn of 60,000 to 80,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 1.5 to 3.Type: GrantFiled: August 4, 2016Date of Patent: October 23, 2018Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Shuiyuan Luo, George C. Jacob, Henry Sanford-Crane, Koichi Yoshida, Katsumasa Kawabata, Shusuke Kitawaki, Shogo Takahashi, Yosuke Takei
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Patent number: 9925637Abstract: The porous polyurethane polishing pad includes a porous polyurethane matrix having large pores extending upward from a base surface and open to a polishing surface. A series of pillow structures is formed from the porous matrix that include the large pores and the small pores. The pillow structures have a downward surface extending from the top polishing surface for forming downwardly sloped side walls at an angle from 30 to 60 degrees from the polishing surface. The large pores open to the downwardly sloped sidewalls and are less vertical than the large pores. The large pores are offset 10 to 60 degrees from the vertical direction in a direction more orthogonal to the sloped sidewalls.Type: GrantFiled: August 4, 2016Date of Patent: March 27, 2018Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang, George C. Jacob, Shuiyuan Luo
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Publication number: 20180036860Abstract: The method forms a porous polyurethane polishing pad by coagulating thermoplastic polyurethane to create a porous matrix having large pores extending upward from a base surface and open to an upper surface. The large pores are interconnected with small pores. Heating a press to temperature below or above the softening onset temperature of the thermoplastic polyurethane forms a series of pillows. Plastic deforming side walls of the pillow structures forms downwardly sloped side walls. The downwardly sloped side walls extend from all sides of the pillow structures. The large pores open to the downwardly sloped sidewalls are less vertical than the large pores open to the top polishing surface and are offset 10 to 60 degrees from the vertical direction.Type: ApplicationFiled: August 4, 2016Publication date: February 8, 2018Inventors: Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang, George C. Jacob, Shuiyuan Luo
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Publication number: 20180037706Abstract: The porous polyurethane polishing pad includes a porous matrix having large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with small pores. The porous matrix is a blend of two thermoplastic polymers. The first thermoplastic polyurethane has by molecular percent, 45 to 60 adipic acid, 10 to 30 MDI-ethylene glycol and 15 to 35 MDI and an Mn of 40,000 to 60,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 2.5 to 4 The second thermoplastic polyurethane has by molecular percent, 40 to 50 adipic acid, 20 to 40 adipic acid butane diol, 5 to 20 MDI-ethylene glycol and 5 to 25 MDI and an Mn of 60,000 to 80,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 1.5 to 3.Type: ApplicationFiled: August 4, 2016Publication date: February 8, 2018Inventors: Shuiyuan Luo, George C. Jacob, Henry Sanford-Crane, Koichi Yoshida, Katsumasa Kawabata, Shusuke Kitawaki, Shogo Takahashi, Yosuke Takei
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Publication number: 20180036862Abstract: The porous polyurethane polishing pad includes a porous polyurethane matrix having large pores extending upward from a base surface and open to a polishing surface. A series of pillow structures is formed from the porous matrix that include the large pores and the small pores. The pillow structures have a downward surface extending from the top polishing surface for forming downwardly sloped side walls at an angle from 30 to 60 degrees from the polishing surface. The large pores open to the downwardly sloped sidewalls and are less vertical than the large pores. The large pores are offset 10 to 60 degrees from the vertical direction in a direction more orthogonal to the sloped sidewalls.Type: ApplicationFiled: August 4, 2016Publication date: February 8, 2018Inventors: Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang, George C. Jacob, Shuiyuan Luo
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Publication number: 20160377241Abstract: A battery holder includes storage chamber for storing a battery. The storage chamber includes: opening end surface through which battery can be taken in or out; and upper surface section, lower surface section, and first and second side-surface sections (opposing each other) for holding the battery. Projection is formed on the inner wall of first side-surface section at a portion including the end on the opening end surface side. Outward deformable flexible section is formed on second side-surface section at a portion including the end on the opening end surface side. Slit that extends from third side-surface section opposite to the opening end surface toward the opening end surface and stops at the position corresponding to a part of the battery is formed in upper surface section and/or lower surface section. The end of the flexible section is located closer to the third side-surface section than the projection.Type: ApplicationFiled: February 4, 2015Publication date: December 29, 2016Inventors: MIHO SHIRAKAWA, KATSUMASA KAWABATA
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Patent number: 9520582Abstract: A compartment accommodates a button cell. The compartment includes an opening side through which the button cell is loaded or ejected from a side surface of the buttons cell. The compartment includes an upper side, a lower side, and lateral sides for holding flat surfaces and the side surface of the button cell. The compartment includes elastic pieces for biasing at least one of the flat surfaces or the side surface of the button cell. A slit is disposed on at least one of the upper side, the lower side, or the lateral sides. The slit extends from a side opposite to the opening side toward the opening side. The slit extends to a part of the button cell.Type: GrantFiled: November 30, 2012Date of Patent: December 13, 2016Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Katsumasa Kawabata, Miho Shirakawa
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Patent number: 8980749Abstract: A method for polishing a silicon wafer is provided, comprising: providing a silicon wafer; providing a polishing pad having a polishing layer which is the reaction product of raw material ingredients, including: a polyfunctional isocyanate; and, a curative package; wherein the curative package contains an amine initiated polyol curative and a high molecular weight polyol curative; wherein the polishing layer exhibits a density of greater than 0.4 g/cm3; a Shore D hardness of 5 to 40; an elongation to break of 100 to 450%; and, a cut rate of 25 to 150 ?m/hr; and, wherein the polishing layer has a polishing surface adapted for polishing the silicon wafer; and, creating dynamic contact between the polishing surface and the silicon wafer.Type: GrantFiled: October 24, 2013Date of Patent: March 17, 2015Assignees: Rohm and Haas Electronic Materials CMP Holdings, Inc., Nitta Haas IncorporatedInventors: Yasuyuki Itai, Bainian Qian, Hiroyuki Nakano, David B. James, Naoko Kawai, Katsumasa Kawabata, Koichi Yoshida, Kazutaka Miyamoto, James Murnane, Fengji Yeh, Marty W. DeGroot
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Publication number: 20140286001Abstract: A compartment accommodates a button cell. The compartment includes an opening side through which the button cell is loaded or ejected from a side surface of the buttons cell. The compartment includes an upper side, a lower side, and lateral sides for holding flat surfaces and the side surface of the button cell. The compartment includes elastic pieces for biasing at least one of the flat surfaces or the side surface of the button cell. A slit is disposed on at least one of the upper side, the lower side, or the lateral sides. The slit extends from a side opposite to the opening side toward the opening side. The slit extends to a part of the button cell.Type: ApplicationFiled: November 30, 2012Publication date: September 25, 2014Applicant: PANASONIC CORPORATIONInventors: Katsumasa Kawabata, Miho Shirakawa
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Patent number: D554733Type: GrantFiled: April 21, 2006Date of Patent: November 6, 2007Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Katsumasa Kawabata, Akihiko Kotani
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Patent number: D827891Type: GrantFiled: July 22, 2015Date of Patent: September 4, 2018Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Katsumasa Kawabata, Yuji Wada, Hiroshi Fujita