Patents by Inventor Katsumi Maeda

Katsumi Maeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7432035
    Abstract: There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the
    Type: Grant
    Filed: March 5, 2007
    Date of Patent: October 7, 2008
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
  • Patent number: 7378683
    Abstract: An organic thin film transistor having an insulator layer formed of a polymer compound having a repeat unit represented by the following formula [1] is disclosed: wherein R1, R2 and R3 are each independently a hydrogen atom or a methyl group, R4 is a hydrogen atom or a linear, branched or bridged cyclic hydrocarbon group having 1 to 12 carbon atoms, and x and y are molar ratio and are any number satisfying x +y=1, 0<x?1 and 0?y<1.
    Type: Grant
    Filed: April 11, 2005
    Date of Patent: May 27, 2008
    Assignee: NEC Corporation
    Inventors: Hiroyuki Endoh, Etsuo Hasegawa, Satoru Toguchi, Katsumi Maeda
  • Publication number: 20080056984
    Abstract: Provided is a single crystal with a hexagonal wurtzite structure which is useful as a substrate for various devices and has high purity and is uniform. The single crystal with a hexagonal wurtzite structures which is obtained by a crystal growth on at least an m-plane of a columnar seed crystal and represented by AX (A representing an electropositive element and X representing an electronegative element) is characterized in that a variation in the concentration of a metal other than the electropositive element A and having a concentration of 0.1 to 50 ppm is within 100%.
    Type: Application
    Filed: September 21, 2005
    Publication date: March 6, 2008
    Applicants: Tokyo Denpa Co., Ltd., MITSUBISHI CHEMICAL CORPORATION
    Inventors: Kenji Yoshioka, Hiroshi Yoneyama, Katsumi Maeda, Ikuo Niikura, Mitsuru Sato, Masumi Ito, Fumio Orito
  • Publication number: 20070218403
    Abstract: There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the
    Type: Application
    Filed: March 5, 2007
    Publication date: September 20, 2007
    Inventors: Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
  • Publication number: 20070152233
    Abstract: A manufacture method that can manufacture ZnO based compound semiconductor crystal of good quality. A ZnO substrate is prepared to have a principal surface made of a plurality of terraces of (0001) planes arranged stepwise along an m-axis direction, the envelop of the principal surface being inclined relative to the (0001) plane by about 2 degrees or less. ZnO based compound semiconductor crystal is grown on the principal surface.
    Type: Application
    Filed: August 24, 2006
    Publication date: July 5, 2007
    Inventors: Hiroyuki Kato, Michihiro Sano, Katsumi Maeda, Hiroshi Yoneyama, Takafumi Yao, Meoung Cho
  • Patent number: 7232639
    Abstract: As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1): wherein R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1 and R2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: June 19, 2007
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Publication number: 20070134586
    Abstract: There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous alkaline solution. The photosensitive resin composition is prepared using a polymer at least having a constitutional repeating unit represented by general formula II: wherein R1 represents hydrogen atom or methyl group; R2 to R9 independently represent hydrogen atom, halogen atom or alkyl group having 1 to 4 carbon atoms; X represents —CH?N—, —CONH—, —(CH2)n—CH?N— or —(CH2)n—CONH— and the N atom in X is bonded to a carbon atom in the benzene ring having AO— at an o-position; A represents hydrogen atom or a group being decomposed by an acid; and n represents a positive integer of 1 to 3.
    Type: Application
    Filed: February 25, 2005
    Publication date: June 14, 2007
    Applicant: NEC CORPORATION
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 7192682
    Abstract: There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (V).
    Type: Grant
    Filed: June 27, 2003
    Date of Patent: March 20, 2007
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 7186495
    Abstract: There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: March 6, 2007
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
  • Publication number: 20070041698
    Abstract: A photosensitive resin composition for forming an optical waveguide comprises, at least, a polymer comprising at least one repeating structural unit represented by the following general formula (1): wherein R1 represents a hydrogen atom or methyl group; and R2 to R5 each independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms, and a photoacid generator. This composition can form an optical waveguide pattern with excellent shape precision and at a low cost, and an optical waveguide of a low propagation loss.
    Type: Application
    Filed: July 19, 2006
    Publication date: February 22, 2007
    Applicant: NEC CORPORATION
    Inventors: Katsumi Maeda, Kaichiro Nakano, Masahiro Kubo
  • Publication number: 20060124051
    Abstract: An objective of the present invention is to provide a zinc oxide (ZnO) single crystal whose electroconductivity is excellent and which has a high quality. The invention relates to a zinc oxide single crystal whose concentration of metals other than zinc in the crystal fulfills the following equation: [?cM]/[+cM]?3 wherein M is a metal other than zinc, [?cM] is a concentration of M in a ?c region in the zinc oxide crystal, and [+cM] is a concentration of M in a +c region in the zinc oxide crystal.
    Type: Application
    Filed: September 30, 2005
    Publication date: June 15, 2006
    Applicants: MITSUBISHI CHEMICAL CORPORATION, Tokyo Denpa Co., Ltd.
    Inventors: Kenji Yoshioka, Hiroshi Yoneyama, Katsumi Maeda, Ikuo Niikura, Mitsuru Sato, Masumi Ito
  • Publication number: 20060073408
    Abstract: A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.
    Type: Application
    Filed: March 4, 2004
    Publication date: April 6, 2006
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Publication number: 20050230680
    Abstract: An organic thin film transistor having an insulator layer formed of a polymer compound having a repeat unit represented by the following formula [1] is disclosed: wherein R1, R2 and R3 are each independently a hydrogen atom or a methyl group, R4 is a hydrogen atom or a linear, branched or bridged cyclic hydrocarbon group having 1 to 12 carbon atoms, and x and y are molar ratio and are any number satisfying x+y=1, 0?x?1 and 0?y<1.
    Type: Application
    Filed: April 11, 2005
    Publication date: October 20, 2005
    Applicant: NEC Corporation
    Inventors: Hiroyuki Endoh, Etsuo Hasegawa, Satoru Toguchi, Katsumi Maeda
  • Patent number: 6924079
    Abstract: The present invention relates to a resist resin having an acid-decomposable group, which gives rise to decomposition of the acid-decomposable group to show an increased solubility to an aqueous alkali solution by the action of an acid, wherein the resist resin has, in the main chain, an alicyclic lactone structure represented by the following general formula (1). According to the present invention, a positive-type chemically amplified resist can be obtained which has high transparency to a far-ultraviolet light having a wavelength of about 220 nm or less, excellent etching resistance, and excellent adhesion to substrate; and a fine pattern required in production of semiconductor device can be formed. (wherein Z is an alicyclic hydrocarbon group having a lactone structure).
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: August 2, 2005
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
  • Publication number: 20050164119
    Abstract: As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1): wherein R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1 and R2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.
    Type: Application
    Filed: February 25, 2003
    Publication date: July 28, 2005
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 6849384
    Abstract: Photoacid generators comprising sulfonium salt compounds represented by the following general formula (2) wherein R1 and R2 represent each an alkyl group optionally having oxo, or R1 and R2 may be cyclized together to form an alkylene group optionally having oxo; R3, R4 and R5 represent each hydrogen or a linear, branched, monocyclic, polycyclic or crosslinked cyclic alkyl group; and Y? represents a counter ion.
    Type: Grant
    Filed: July 23, 2001
    Date of Patent: February 1, 2005
    Assignee: NEC Corporation
    Inventors: Shigeyuki Iwasa, Katsumi Maeda, Kaichiro Nakano, Etsuo Hasegawa
  • Publication number: 20040265732
    Abstract: There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic &ggr;-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic &ggr;-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic &ggr;-lactone structure defined in the general formula (V).
    Type: Application
    Filed: June 1, 2004
    Publication date: December 30, 2004
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 6746722
    Abstract: A fluorine-containing phenylmaleimide derivative having a specific structure. A polymer obtained by polymerizing monomers containing the derivative. A polymer containing a specific structural unit and having a weight-average molecular weight of 2,000 to 200,000. A chemically amplified resist composition containing the polymer and a photo acid generator, wherein the proportion of the polymer relative to the total of the polymer and the photo acid generator is 70 to 99.8% by mass. A method for pattern formation, which comprises coating the above composition on a to-be-processed substrate, exposing with a light of 180 nm or less wavelength, and conducting baking and development.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: June 8, 2004
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 6710188
    Abstract: Chemically amplified resist is produced on the basis of vinyl polymer having 3-oxo-4-oxabicyclo[3.2.1]octane-2-yl group expressed by general formula (1) where each of L1, L2, L3, L4, L5 and L6 is selected from the group consisting of hydrogen atom and alkyl groups having the carbon number from 1 to 8, and the hydrogen atom and/or the alkyl group at L5 and L6 are replaced with alkylene groups having the carbon number from 1 to 10 and bonded to each other for forming a ring so that the resist exhibits high transparency to light equal to or less than 220 nm wavelength, large resistance against dry etching and good adhesion to substrates.
    Type: Grant
    Filed: June 18, 2003
    Date of Patent: March 23, 2004
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 6685416
    Abstract: A bookbinding device is disclosed to adhesively bind a back surface of a stack of pages to a center portion of a cover page, which includes a page supply unit (1), a thickness sensor (2), an adhesive applicator (3), a page conveyor unit (4), a cover supply unit (5), a press unit (8) and a cover folding unit (9). The cover supply unit includes a trimmer (6) for trimming a side edge portion of the cover sheet depending upon thickness of the page stack detected by the thickness sensor, and a positioning unit (7) for positioning the cover sheet such that a center line of the cover sheet which has been trimmed by the trimmer is aligned with a center of thickness of the page stack, at which position the page stack is adhesively bound to the cover sheet.
    Type: Grant
    Filed: April 8, 2002
    Date of Patent: February 3, 2004
    Assignees: Dynic Corporation, Kyokko Seiko Co., Ltd.
    Inventors: Katsuyasa Itoh, Masahiko Sakai, Motohiro Susa, Katsumi Maeda, Toshiaki Tsukahara, Maki Takimura, Hajime Nishimura, Junji Chatani