Patents by Inventor Katsumi Murofushi
Katsumi Murofushi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190382676Abstract: A fluorine-containing ether compound represented by Formula (1) is provided. R1—R2—CH2—R3—CH2—R4—R5 ??(1) (In Formula (1), R1 and R5 each represents a group having a heterocyclic ring and may be the same as or different from each other, R2 and R4 each represents a divalent linking group having a polar group and play be the same as or different from each other, and R3 represents a perfluoropolyether chain.Type: ApplicationFiled: January 5, 2018Publication date: December 19, 2019Applicant: SHOWA DENKO K.K.Inventors: Yuta YAMAGUCHI, Daisuke YAGYU, Naoya FUKUMOTO, Shoko UETAKE, Tsuyoshi KATO, Hiroyuki TOMITA, Ryuuta MIYASAKA, Katsumi MUROFUSHI
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Publication number: 20190382675Abstract: A fluorine-containing ether compound represented by Formula (1) is provided; R1—R2—CH2—R3—CH2—R4—R5??(1) (In Formula (1), R1 and R5 may be the same as or different from each other and each represents an alkenyl group having 2 to 8 carbon atoms or an alkynyl group having 3 to 8 carbon atoms, R2 and R4 may be the same as or different from each other and each represents a divalent linking group having a polar group, and R3 represents a perfluoropolyether chain, with a proviso that R1 and R2 are, and R4 and R5 are divided due to the presence of an atom other than the carbon atom such as an oxygen atom).Type: ApplicationFiled: December 4, 2017Publication date: December 19, 2019Applicant: SHOWA DENKO K.K.Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Shoko UETAKE, Tsuyoshi KATO, Hiroyuki TOMITA, Ryuuta MIYASAKA, Katsumi MUROFUSHI
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Publication number: 20190180782Abstract: A magnetic recording medium includes a substrate, an underlayer provided on the substrate, and a magnetic layer provided on the underlayer and having a L10 structure and a (001) orientation. The magnetic layer has a granular structure in which an organic compound having a methylene skeleton or a methine skeleton is arranged at grain boundaries of magnetic grains.Type: ApplicationFiled: October 24, 2018Publication date: June 13, 2019Inventors: Katsumi MUROFUSHI, Yoshitaka ISHIBASHI, Takayuki FUKUSHIMA, Kazuya NIWA, Lei ZHANG, Yuji MURAKAMI, Hisato SHIBATA, Takehiro YAMAGUCHI, Chen XU, Tetsuya KANBE, Tomoo SHIGE
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Publication number: 20190084911Abstract: The present invention relates to a fluorine-containing ether compound represented by Formula (1), R1—R2—CH2—R3—CH2—R4??(1). (In Formula (1), R1 is an end group including an organic group having at least one double bond or triple bond, R2 is a divalent linking group bonded to R1 by etheric oxygen, R3 is a perfluoropolyether chain, R4 is an end group having two or three polar groups with each polar group being bonded to different carbon atoms, and the carbon atoms, to which the polar groups are bonded, being bonded to each other via a linking group including carbon atoms to which the polar groups are not bonded.Type: ApplicationFiled: January 30, 2017Publication date: March 21, 2019Applicant: SHOWA DENKO K.K.Inventors: Daisuke YAGYU, Yuta YAMAGUCHI, Naoya FUKUMOTO, Tsuyoshi KATO, Shoko UETAKE, Hiroyuki TOMITA, Ryuuta MIYASAKA, Naoko ITO, Ichiro OTA, Katsumi MUROFUSHI
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Publication number: 20180047419Abstract: A fluorine-containing ether compound of the present invention is represented by Formula (1). R1—CH2—R2—CH2—R3??(1) (In Formula (1), R1 is an organic end group having 3 or more carbon atoms which includes two or more polar groups with each polar group being bonded to different carbon atoms and the carbon atoms to which the polar groups are bonded being bonded to each other via a linking group including the carbon atoms which are not bonded to the polar groups, R2 includes a perfluoropolyether chain represented by Formula (3), and R3 is a hydroxyl group or R1) —(CF2)y-1—O—((CF2)yO)z—(CF2)y-1—??(3) (In Formula (3), y represents an integer of 2 to 4, and z represents an integer of 1 to 30).Type: ApplicationFiled: July 31, 2017Publication date: February 15, 2018Applicant: SHOWA DENKO K.K.Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Shoko UETAKE, Tsuyoshi KATO, Hiroyuki TOMITA, Ryuta MIYASAKA, Katsumi MUROFUSHI
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Publication number: 20180009773Abstract: This fluorine-containing ether compound is represented by Formula (1). R1—R2—CH2—R3—CH2—R4—R5??(1) (in Formula (1), R1 is an aryl group or an aralkyl group, R2 is a divalent linking group having 0 or 1 polar group, R3 is a perfluoropolyether chain, R4 is a divalent linking group having 2 or 3 polar groups, and R5 is an aryl group or an aralkyl group.Type: ApplicationFiled: July 3, 2017Publication date: January 11, 2018Applicant: SHOWA DENKO K.K.Inventors: Shoko UETAKE, Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Naoko ITO, Hiroyuki TOMITA, Ryuta MIYASAKA, Katsumi MUROFUSHI
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Patent number: 8865801Abstract: The present invention relates to epoxy resin coating composition which comprises, at least, epoxy resin, a thiol-type curing agent and a curing assistant, being composed of two liquids of liquid (A) containing epoxy resin and a thiol-type curing agent and liquid (B) containing a curing assistant, which liquids are mixed just before using, wherein the thiol-type curing agent contains a branched compound containing a thiol group (P), which compound is an ester of polyhydric alcohol with thiol group-containing carboxylic acid represented by formula (1) HOCO(CH2)nCR1R2SH??(1) (in the formula, R1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms, R2 represents a linear or branched alkyl group having 1 to 10 carbon atoms, and n represents an integer of 1 to 4), which exhibits a suitable pot life, excellent curability particularly at low and ordinary temperature and low toxicity.Type: GrantFiled: May 27, 2010Date of Patent: October 21, 2014Assignee: Showa Denko K.K.Inventors: Isao Yamagami, Hiroki Takenaka, Katsumi Murofushi
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Patent number: 8840830Abstract: There is provided a method of molding which is capable of more highly precisely molding a molded article to be molded such as a lens than conventional technologies. A molded article such as a lens array and a mold for nanoimprinting is molded by repeating multiple times a transfer step including: a transformation step of bringing a light curable composition containing a compound having a polymerizable functional group and a polymerization initiator into contact with a transfer member 62 on which a transfer shape portion shaped equally to or reversely to an aspherical lens portion 312 is formed to transform the light curable composition to the transfer shape of the transfer member 62; a curing step of irradiating at least a transformed portion of the transformed light curable composition with light by a light irradiation unit 60 to cure the light curable composition; and a separation step of separating the cured light curable composition and the transfer member.Type: GrantFiled: November 13, 2009Date of Patent: September 23, 2014Assignee: AJI Co., Ltd.Inventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, Katsumi Murofushi, Kunio Yoshida
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Patent number: 8399569Abstract: An object of the present invention is to provide a reactive urethane compound having superior curability, adhesion to substrates, transparency, molecular flexibility, and mechanical properties, a curable composition containing the compound, and a cured material formed from the composition. An ethylenically-unsaturated-group containing reactive urethane compound of the present invention is represented by formula (I): wherein R1 and R2 are each independently a hydrogen atom or an alkylene group; R3 is a hydrogen atom, a alkyl group, or an aryl group; R4 is a single bond or an alkylene group; R5 is a hydrogen atom or a methyl group; R6 is an oxygen atom, a sulfur atom, or an imino group; n is 2 to 12; m is 1 to 300; and X is an aliphatic, aromatic or heterocyclic compound residue.Type: GrantFiled: May 21, 2008Date of Patent: March 19, 2013Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Nobuaki Ishii, Miyuki Tomita, Yotaro Hattori, Yoshifumi Urakawa
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Patent number: 8349934Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; RType: GrantFiled: December 10, 2009Date of Patent: January 8, 2013Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
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Patent number: 8283095Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).Type: GrantFiled: August 14, 2007Date of Patent: October 9, 2012Assignee: Showa Denko K.K.Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
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Patent number: 8242217Abstract: It is an object of the present invention to provide an epoxy resin curing agent which has a favorable pot life and good storage stability as a curing agent for epoxy resins and from which an epoxy resin cured product having good water resistance and hardness is obtained through curing. The present invention is an epoxy resin curing agent containing a secondary or tertiary branched thiol compound having a substituent on a carbon atom at the ?-position to a thiol group, and is also an epoxy resin composition comprising a polyvalent epoxy compound and the epoxy resin curing agent.Type: GrantFiled: December 8, 2008Date of Patent: August 14, 2012Assignee: Showa Denko K.K.Inventors: Yoshifumi Urakawa, Hideo Miyata, Isao Yamagami, Katsumi Murofushi
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Publication number: 20120077903Abstract: The present invention relates to epoxy resin coating composition which comprises, at least, epoxy resin, a thiol-type curing agent and a curing assistant, being composed of two liquids of liquid (A) containing epoxy resin and a thiol-type curing agent and liquid (B) containing a curing assistant, which liquids are mixed just before using, wherein the thiol-type curing agent contains a branched compound containing a thiol group (P), which compound is an ester of polyhydric alcohol with thiol group-containing carboxylic acid represented by formula (1) HOCO(CH2)nCR1R2SH??(1) (in the formula, R1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms, R2 represents a linear or branched alkyl group having 1 to 10 carbon atoms, and n represents an integer of 1 to 4), which exhibits a suitable pot life, excellent curability particularly at low and ordinary temperature and low toxicity.Type: ApplicationFiled: May 27, 2010Publication date: March 29, 2012Applicant: SHOWA DENKO K.K.Inventors: Isao Yamagami, Hiroki Takenaka, Katsumi Murofushi
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Patent number: 8053167Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.Type: GrantFiled: November 15, 2007Date of Patent: November 8, 2011Assignee: Showa Denko K.K.Inventors: Katsumi Murofushi, Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori
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Publication number: 20110263779Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; RType: ApplicationFiled: December 10, 2009Publication date: October 27, 2011Applicant: SHOWA DENKO K.K.Inventors: Katsumi Murofushi, Nobuaki Ishii, Shigeru Yamaki, Hideo Miyata, Yotaro Hattori
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Publication number: 20110227239Abstract: There is provided a method of molding which is capable of more highly precisely molding a molded article to be molded such as a lens than conventional technologies. A molded article such as a lens array and a mold for nanoimprinting is molded by repeating multiple times a transfer step including: a transformation step of bringing a light curable composition containing a compound having a polymerizable functional group and a polymerization initiator into contact with a transfer member 62 on which a transfer shape portion shaped equally to or reversely to an aspherical lens portion 312 is formed to transform the light curable composition to the transfer shape of the transfer member 62; a curing step of irradiating at least a transformed portion of the transformed light curable composition with light by a light irradiation unit 60 to cure the light curable composition; and a separation step of separating the cured light curable composition and the transfer member.Type: ApplicationFiled: November 19, 2009Publication date: September 22, 2011Applicants: SHOWA DENKO K.K., AJI CO., LTDInventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, Katsumi Murofushi, Kunio Yoshida
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Publication number: 20110172421Abstract: An object of the present invention is to provide a novel photobase generator which can sensitively generate a base even by h-ray in place of a conventional 2-nitro-4,5-dimethoxybenzyloxycarbonylamine compound. Disclosed is an N-(?-aromatic group-substituted-2-nitro-4,5-dialkoxybenzyloxycarbonyl)amine compound represented by the following general formula (I). (In the above formula (I), R1 to R9 denote specific groups.Type: ApplicationFiled: October 1, 2009Publication date: July 14, 2011Applicant: SHOWA DENKO K.K.Inventors: Isao Yamagami, Yoshihiko Maeda, Hiroshi Yasuda, Katsumi Murofushi
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Publication number: 20110112243Abstract: The invention has an object of providing paint compositions showing excellent performances in both scratch resistance and impact resistance, and processes for forming multilayer paint films using the paint composition. The invention has another object of providing paint compositions suitably used as clear paints for finish painting automobiles and the like, and highly solidifiable paint compositions. A paint composition according to the invention includes a polyisocyanate prepolymer (A) including a monomer unit of Formula (1) below and a polyol (B), and has an average functional group equivalent weight of 160 to 400 g/eq. A process for forming multilayer paint films involves the paint composition. wherein R1 is a hydrogen atom or a methyl group; n is an integer of 0 or 1; when n=0, l=0, p=1 and m is an integer of 1 to 8; and when n=1, m=2, l=2 and p is an integer of 1 to 4.Type: ApplicationFiled: June 24, 2009Publication date: May 12, 2011Applicant: SHOWA DENKO K.K.Inventors: Nobuaki Ishii, Katsuro Urakawa, Nobuyuki Mitarai, Katsumi Murofushi
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Publication number: 20110077334Abstract: It is an object of the present invention to provide a curable composition capable of forming a heat-resistant cured film which is excellent in surface hardness, is good in flexibility and bending properties, and has strength and flexibility that are compatible with each other, and a cured product (film) of the composition. The curable composition includes a reactive (meth)acrylate polymer (A) having a monomer unit represented by the following formula (1), a polymerization initiator (B) and a reactive monomer(C): wherein R1 is a hydrogen atom, a methyl group or an ethyl group, R2 is a hydrogen atom or a methyl group, X1 is a straight-chain or branched hydrocarbon group of 2 to 6 carbon atoms or an alcohol residue of polyethylene glycol, polypropylene glycol or caprolactone-modified both-terminal diol, n is an integer of 2 to 4, and m is an integer of 1 to 5.Type: ApplicationFiled: May 20, 2009Publication date: March 31, 2011Applicant: SHOWA DENKO K.K.Inventors: Hiroko OI, Yotaro Hattori, Nobuaki Ishii, Katsumi Murofushi
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Publication number: 20100273940Abstract: It is an object of the present invention to provide an epoxy resin curing agent which has a favorable pot life and good storage stability as a curing agent for epoxy resins and from which an epoxy resin cured product having good water resistance and hardness is obtained through curing. The present invention is an epoxy resin curing agent containing a secondary or tertiary branched thiol compound having a substituent on a carbon atom at the ?-position to a thiol group, and is also an epoxy resin composition comprising a polyvalent epoxy compound and the epoxy resin curing agent.Type: ApplicationFiled: December 8, 2008Publication date: October 28, 2010Applicant: SHOWA DENKO K.K.Inventors: Yoshifumi Urakawa, Hideo Miyata, Isao Yamagami, Katsumi Murofushi