Patents by Inventor Katsushi Nakano

Katsushi Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10317803
    Abstract: An information calculation method includes: calculating liquid information regarding a liquid on an object, which faces an optical member that emits exposure light, when moving the object; and calculating region information indicating a region, in which the liquid information satisfies predetermined conditions, on the object.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: June 11, 2019
    Assignee: NIKON CORPORATION
    Inventors: Mineyuki Nishino, Katsushi Nakano, Satoshi Takahashi
  • Publication number: 20180364597
    Abstract: An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.
    Type: Application
    Filed: August 27, 2018
    Publication date: December 20, 2018
    Applicant: NIKON CORPORATION
    Inventors: Natsuko YAMAKAWA, Katsushi NAKANO, Kenichi SHIRAISHI
  • Publication number: 20180292759
    Abstract: A substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material to hold the substrate, and a second holding portion formed on the base material to hold a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged to absorb the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.
    Type: Application
    Filed: June 13, 2018
    Publication date: October 11, 2018
    Applicant: NIKON CORPORATION
    Inventors: Hiroyuki Nagasaka, Makoto Shibuta, Katsushi Nakano, Yuichi Yoshida, Hiroaki Takaiwa
  • Patent number: 10061214
    Abstract: An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: August 28, 2018
    Assignee: NIKON CORPORATION
    Inventors: Natsuko Sagawa, Katsushi Nakano, Kenichi Shiraishi
  • Publication number: 20170329239
    Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes: a projection system; a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet; a second nozzle member having a gas supply inlet via which a gas is supplied, the gas being supplied via the gas supply inlet to a space surrounding the liquid immersion area during the exposure; and a stage system having a holder by which the substrate is held. The substrate held by the holder is moved below and relative to the projection system, the first nozzle member and the second nozzle member.
    Type: Application
    Filed: August 2, 2017
    Publication date: November 16, 2017
    Applicants: NIKON CORPORATION, NIKON ENGINEERING CO., LTD.
    Inventors: Hirotaka KOHNO, Takeshi OKUYAMA, Hiroyuki NAGASAKA, Katsushi NAKANO
  • Publication number: 20170307984
    Abstract: An information calculation method includes: calculating liquid information regarding a liquid on an object, which faces an optical member that emits exposure light, when moving the object; and calculating region information indicating a region, in which the liquid information satisfies predetermined conditions, on the object.
    Type: Application
    Filed: July 3, 2017
    Publication date: October 26, 2017
    Applicant: NIKON CORPORATION
    Inventors: Mineyuki NISHINO, Katsushi NAKANO, Satoshi TAKAHASHI
  • Patent number: 9746781
    Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: August 29, 2017
    Assignees: NIKON CORPORATION, NIKON ENGINEERING CO., LTD.
    Inventors: Hirotaka Kohno, Takeshi Okuyama, Hiroyuki Nagasaka, Katsushi Nakano
  • Patent number: 9720332
    Abstract: An information calculation method includes: calculating liquid information regarding a liquid on an object, which faces an optical member that emits exposure light, when moving the object; and calculating region information indicating a region, in which the liquid information satisfies predetermined conditions, on the object.
    Type: Grant
    Filed: June 6, 2014
    Date of Patent: August 1, 2017
    Assignee: NIKON CORPORATION
    Inventors: Mineyuki Nishino, Katsushi Nakano, Satoshi Takahashi
  • Publication number: 20160231653
    Abstract: To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.
    Type: Application
    Filed: April 19, 2016
    Publication date: August 11, 2016
    Applicant: NIKON CORPORATION
    Inventors: Hiroyuki NAGASAKA, Makoto SHIBUTA, Katsushi NAKANO, Yuichi YOSHIDA, Hiroaki TAKAIWA
  • Patent number: 8941808
    Abstract: An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.
    Type: Grant
    Filed: June 9, 2008
    Date of Patent: January 27, 2015
    Assignee: Nikon Corporation
    Inventors: Katsushi Nakano, Masahiko Okumura, Tarou Sugihara, Takeyuki Mizutani, Tomoharu Fujiwara
  • Publication number: 20140362354
    Abstract: An information calculation method includes: calculating liquid information regarding a liquid on an object, which faces an optical member that emits exposure light, when moving the object; and calculating region information indicating a region, in which the liquid information satisfies predetermined conditions, on the object.
    Type: Application
    Filed: June 6, 2014
    Publication date: December 11, 2014
    Inventors: Mineyuki NISHINO, Katsushi NAKANO, Satoshi TAKAHASHI
  • Publication number: 20140307238
    Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.
    Type: Application
    Filed: June 25, 2014
    Publication date: October 16, 2014
    Applicants: NIKON CORPORATION, NIKON ENGINEERING CO., LTD.
    Inventors: Hirotaka KOHNO, Takeshi OKUYAMA, Hiroyuki NAGASAKA, Katsushi NAKANO
  • Patent number: 8780327
    Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.
    Type: Grant
    Filed: April 21, 2011
    Date of Patent: July 15, 2014
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Patent number: 8760617
    Abstract: A cleaning of a liquid immersion exposure apparatus is performed at a different time than an exposure operation. A stage is placed under a liquid supply inlet during a cleaning operation. The cleaning operation is performed at the different time than the exposure operation in which an immersion liquid is supplied onto a substrate held on a holder of the stage. The immersion liquid is supplied from a liquid supply inlet during the cleaning operation. The immersion liquid is supplied to a portion of the stage different from a portion at which the substrate is held by the holder of the stage.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: June 24, 2014
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Publication number: 20130301019
    Abstract: An exposure apparatus exposes a substrate with an exposure light via a projection optical system and a liquid, and includes a flow channel forming member and a substrate stage. The flow channel forming member forms an immersion area of the liquid at an image surface side of the projection optical system. The substrate stage has a wall portion provided so as to surround a support portion which supports the substrate, and a recovery port capable of recovering the liquid in a recess formed at an outside of the wall portion with respect to an optical axis of the projection optical system. When a cleaning is performed, a cleaning liquid is recovered via the recovery port.
    Type: Application
    Filed: July 16, 2013
    Publication date: November 14, 2013
    Applicant: Nikon Corporation
    Inventor: Katsushi NAKANO
  • Publication number: 20130278908
    Abstract: An exposure apparatus includes; a supply outlet that supplies a liquid to an optical path space of exposure light, and a liquid supply system that supplies an ionized ionic liquid to the supply outlet.
    Type: Application
    Filed: June 14, 2013
    Publication date: October 24, 2013
    Inventors: Yoshitomo NAGAHASHI, Katsushi NAKANO
  • Patent number: 8514366
    Abstract: An exposure method includes holding a substrate held by a substrate holder on a substrate stage moving on an image plane side of a projection optical system; forming an immersion area the image plane side of the projection optical system by using a liquid supplied from a liquid supplying mechanism; and exposing a substrate by exposure light via the projection optical system and the immersion area. During a period when exposure of the substrate is not performed, an upper portion of the substrate holder is cleaned by moving the substrate stage relative to the immersion area, and an upper portion of a measuring stage is cleaned by moving the measuring stage relative to the immersion area. A cleaning liquid can be used as a liquid for forming the immersion area during cleaning. High-resolution immersion exposure is performed at a high throughput by suppressing entering of foreign materials into the liquid.
    Type: Grant
    Filed: October 21, 2008
    Date of Patent: August 20, 2013
    Assignee: Nikon Corporation
    Inventor: Katsushi Nakano
  • Patent number: 8384877
    Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
    Type: Grant
    Filed: June 7, 2007
    Date of Patent: February 26, 2013
    Assignee: Nikon Corporation
    Inventors: Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa
  • Publication number: 20120314193
    Abstract: An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.
    Type: Application
    Filed: November 9, 2010
    Publication date: December 13, 2012
    Applicant: NIKON CORPORATION
    Inventors: Natsuko Sagawa, Katsushi Nakano, Kenichi Shiraishi
  • Patent number: 8305553
    Abstract: Provided is an exposure apparatus that is able to prevent liquid from remaining on a measuring part. An exposure apparatus comprises a measuring system (60), which has a first pattern (61) formed on the upper surface of a substrate stage, and a second area (S2) specified on the upper surface in the vicinity of a first area (S1), which includes the first pattern (61), and a second pattern (80) is formed in the second area (S2) so that the liquid (LQ) that has remained so as to span the first area (S1) and the second area (S2) retreats from the first area (S1) and collects in the second area (S2).
    Type: Grant
    Filed: August 17, 2005
    Date of Patent: November 6, 2012
    Assignee: Nikon Corporation
    Inventors: Katsushi Nakano, Tsuneyuki Hagiwara