Patents by Inventor Kazuhiro TADOKORO

Kazuhiro TADOKORO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate treating method
    Patent number: 10423070
    Abstract: A substrate treating method includes a determining step for determining a treating condition for hydrophobizing a surface of a substrate, based on a target regarding a dissolved area size in a resist pattern, and a treating step for hydrophobizing the surface of the substrate with the treating condition determined in the determining step before forming resist film on the surface of the substrate.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: September 24, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masashi Kanaoka, Masanori Imamura, Taiji Matsu, Hidetoshi Sagawa, Atsushi Tanaka, Kazuhiro Tadokoro, Kazuya Ono, Shinichi Takada, Tsuyoshi Mitsuhashi
  • SUBSTRATE TREATING METHOD
    Publication number: 20170277038
    Abstract: A substrate treating method includes a determining step for determining a treating condition for hydrophobizing a surface of a substrate, based on a target regarding a dissolved area size in a resist pattern, and a treating step for hydrophobizing the surface of the substrate with the treating condition determined in the determining step before forming resist film on the surface of the substrate.
    Type: Application
    Filed: February 28, 2017
    Publication date: September 28, 2017
    Inventors: Masashi KANAOKA, Masanori IMAMURA, Taiji MATSU, Hidetoshi SAGAWA, Atsushi TANAKA, Kazuhiro TADOKORO, Kazuya ONO, Shinichi TAKADA, Tsuyoshi MITSUHASHI
  • Exposure apparatus and method of manufacturing device
    Patent number: 9383660
    Abstract: An exposure apparatus which includes a projection optical system and exposes a substrate to radiant energy via the projection optical system, includes a temperature measuring device configured to perform measurement of a temperature of a temperature measurement portion of the projection optical system, and a controller configured to perform prediction of a change in an optical characteristic of the projection optical system based on a change in temperature measured by the temperature measuring device, and to perform processing of reduction, based on the prediction, of a change in a state of an image formed on the substrate by the projection optical system, wherein the controller is configured to perform the prediction in accordance with a second-order lag response function to the change in temperature of the temperature measurement portion.
    Type: Grant
    Filed: May 4, 2012
    Date of Patent: July 5, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Toshiyuki Yoshihara, Kazuhiro Tadokoro
  • EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
    Publication number: 20120293781
    Abstract: An exposure apparatus which includes a projection optical system and exposes a substrate to radiant energy via the projection optical system, includes a temperature measuring device configured to perform measurement of a temperature of a temperature measurement portion of the projection optical system, and a controller configured to perform prediction of a change in an optical characteristic of the projection optical system based on a change in temperature measured by the temperature measuring device, and to perform processing of reduction, based on the prediction, of a change in a state of an image formed on the substrate by the projection optical system, wherein the controller is configured to perform the prediction in accordance with a second-order lag response function to the change in temperature of the temperature measurement portion.
    Type: Application
    Filed: May 4, 2012
    Publication date: November 22, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Toshiyuki YOSHIHARA, Kazuhiro TADOKORO