Patents by Inventor Kazuki Takizawa

Kazuki Takizawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11479011
    Abstract: Provided is a decorative molded article that uniformizes the brightness of an uneven surface and inhibits whitening. The decorative molded article is provided with a protective layer having an uneven surface on an adherend, and satisfying the following requirement 1-1: <Requirement 1-1> A black plate is stuck to the surface of the article on the adherend side thereof via a transparent pressure-sensitive adhesive layer to prepare a sample A. A visible light inclined by 10 degrees from the normal direction of the sample A is made to run into the uneven surface, and based on the specular direction of the incident light as a reference angle, a luminous reflectance is measured every 0.2 degrees within a range of the reference angleĀ±5.0 degrees.
    Type: Grant
    Filed: June 6, 2018
    Date of Patent: October 25, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Masahiro Hatano, Takayuki Shimada, Kentaro Akiyama, Kazuki Takizawa
  • Patent number: 11298970
    Abstract: Provided are a decorative molded article that prevents sparkle and has a high contrast, a method for producing the decorative molded article, and a transfer sheet for use for the decorative molded article. The decorative molded article 10 is provided with a protective layer 2 having unevenness on a resin molded article 1, wherein in the surface of the protective layer 2, the arithmetic average roughness (Rax1) according to JIS B0601:1994 at a cutoff value of 0.8 mm, the arithmetic average roughness (Ray1) according to JIS B0601:1994 at a cutoff value of 0.08 mm, and the ten-point average roughness (Rzx1) according to JIS B0601:1994 at a cutoff value of 0.8 mm satisfy the following requirements (1) to (3): 0.30?(Rax1?Ray1)/Ray1?0.85 (1), Rzx1/Rax1?15.0 (2), Rax1?0.14 ?m (3).
    Type: Grant
    Filed: June 6, 2018
    Date of Patent: April 12, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Masahiro Hatano, Takayuki Shimada, Kentaro Akiyama, Kazuki Takizawa
  • Publication number: 20210402825
    Abstract: Provided are a decorative molded article that prevents sparkle and has a high contrast, a method for producing the decorative molded article, and a transfer sheet for use for the decorative molded article. The decorative molded article 10 is provided with a protective layer 2 having unevenness on a resin molded article 1, wherein in the surface of the protective layer 2, the arithmetic average roughness (Rax1) according to JIS B0601:1994 at a cutoff value of 0.8 mm, the arithmetic average roughness (Ray1) according to JIS B0601:1994 at a cutoff value of 0.08 mm, and the ten-point average roughness (Rzx1) according to JIS B0601:1994 at a cutoff value of 0.8 mm satisfy the following requirements (1) to (3): 0.30?(Rax1?Ray1)/Ray1?0.85 (1), Rzx1/Rax1?15.0 (2), Rax1?0.14 ?m (3).
    Type: Application
    Filed: June 6, 2018
    Publication date: December 30, 2021
    Inventors: Masahiro Hatano, Takayuki Shimada, Kentaro Akiyama, Kazuki Takizawa
  • Publication number: 20210323264
    Abstract: Provided is a decorative molded article that uniformizes the brightness of an uneven surface and inhibits whitening. The decorative molded article is provided with a protective layer having an uneven surface on an adherend, and satisfying the following requirement 1-1: <Requirement 1-1> A black plate is stuck to the surface of the article on the adherend side thereof via a transparent pressure-sensitive adhesive layer to prepare a sample A. A visible light inclined by 10 degrees from the normal direction of the sample A is made to run into the uneven surface, and based on the specular direction of the incident light as a reference angle, a luminous reflectance is measured every 0.2 degrees within a range of the reference angleĀ±5.0 degrees. When the luminous reflectance at ?5.0 degrees relative to the reference angle is represented by Y?5.0 and the luminous reflectance at ?4.8 degrees is represented by Y?4.8, a value represented by an expression of [(Y?4.8?Y?5.0)/((Y?4.8+Y?5.
    Type: Application
    Filed: June 6, 2018
    Publication date: October 21, 2021
    Inventors: Masahiro HATANO, Takayuki SHIMADA, Kentaro AKIYAMA, Kazuki TAKIZAWA
  • Patent number: 11041572
    Abstract: An annular valve in which the shape of a sealing surface of a valve body is optimized thus suppressing the occurrence of pressure loss in gas on the periphery of the sealing surface and extending the service life of the annular valve.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: June 22, 2021
    Inventors: Masaru Fujinami, Hirofumi Himei, Tsukasa Suzuki, Kazuhiro Shimizu, Shuji Ishihara, Kazuki Takizawa, Kouichi Takemoto
  • Publication number: 20200370668
    Abstract: An annular valve in which the shape of a sealing surface of a valve body is optimized thus suppressing the occurrence of pressure loss in gas on the periphery of the sealing surface and extending the service life of the annular valve.
    Type: Application
    Filed: March 16, 2018
    Publication date: November 26, 2020
    Inventors: Masaru FUJINAMI, Hirofumi HIMEI, Tsukasa SUZUKI, Kazuhiro SHIMIZU, Shuji ISHIHARA, Kazuki TAKIZAWA, Kouichi TAKEMOTO
  • Publication number: 20150099058
    Abstract: A method includes introducing an organic metal gas containing hydrogen into a deposition vessel to cause a component of the organic metal containing hydrogen to be adsorbed on a substrate; introducing an oxidizing gas or a nitriding gas into the vessel, generating plasma with the oxidizing gas or the nitriding gas by a plasma source, and oxidizing or nitriding the component; detecting emission intensity of a wavelength of light through an observation window in the vessel, the light being emitted, by generating the plasma, from an excited hydrogen radical resulting from the hydrogen separated from the organic metal above the substrate when the organic metal reacts with the oxidizing gas or the nitriding gas to form an oxidized metal or a nitride metal on the substrate; and stopping the generation of the plasma when a value of the detected emission intensity becomes a first predetermined value or less.
    Type: Application
    Filed: October 4, 2013
    Publication date: April 9, 2015
    Applicant: Mitsui Engineering & Shipbulding Co., Ltd.
    Inventor: Kazuki TAKIZAWA
  • Patent number: 8629225
    Abstract: A poly(N-alkylcarbazole) columnar structure having electroconductivity is provided. The poly(N-alkylcarbazole) columnar structure having electroconductivity may be produced by electrolytically polymerizing an N-alkylcarbazole in a particular solvent.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: January 14, 2014
    Assignees: National University Corporation Chiba University, JNC Corporation
    Inventors: Katsuyoshi Hoshino, Kazuki Takizawa, Katsuyuki Murashiro, Toshiki Komatsu
  • Publication number: 20130104803
    Abstract: The thin-film forming apparatus includes: a deposition vessel that includes a deposition space in which the thin film is formed on the substrate in a reduced-pressure state; a raw material gas introducing section configured to introduce a raw material gas for the thin-film into the deposition space of the deposition vessel; and a plasma electrode section configured to generate plasma using the raw material gas for the thin-film in the deposition space. The plasma electrode section is a plate member in which a current flows from one end surface to the other end surface, the plate member provided with, as a plasma generating electrode, an electrode plate including an outward portion and a return portion which allow the current to flow in parallel to each other by bending a direction of the current flowing through the plate member in mid-flow.
    Type: Application
    Filed: February 21, 2011
    Publication date: May 2, 2013
    Applicant: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
    Inventors: Kazuki Takizawa, Naomasa Miyatake, Kazutoshi Murata
  • Patent number: 8214173
    Abstract: A laser beam with a wavelength capable of exciting atoms of helium in the metastable state is directed to a generated plasma, and atoms in the metastable state are excited. Absorption amount information representing the amount of laser beam absorbed is acquired, and the density of atoms of helium in the metastable state in the plasma is computed from the absorption amount. The emissions of light from helium gas in the plasma caused by transition from two different excited states to the lower level are measured, and the ratio between the intensities of the emissions is determined. The electron temperature of the produced plasma is computed from the computed density of the atoms of helium gas in the metastable state and the computed emission intensity ratio. With this, the plasma electron temperature can be computed with a relatively high accuracy irrespective of the condition of the plasma atmosphere.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: July 3, 2012
    Assignee: Mitsui Engineering & Shipbuilding Co., Ltd.
    Inventor: Kazuki Takizawa
  • Publication number: 20110293854
    Abstract: An atomic layer growing apparatus introduces an organic metal gas containing hydrogen to a deposition vessel to cause an organic metal component to be adsorbed on a substrate. Then, the apparatus introduces an oxidizing gas or a nitriding gas to the deposition vessel to generate plasma, thereby oxidizing or nitriding the organic metal component deposited on the substrate. When the plasma is generated, the apparatus detects emission intensity of a predetermined wavelength of light emitted on the substrate through an observation window provided in the deposition vessel. When the detected emission intensity becomes a predetermined value or less, the apparatus stops the generation of the plasma.
    Type: Application
    Filed: January 28, 2010
    Publication date: December 1, 2011
    Applicant: MITSUI ENGINEERING & SHIPBUILDING CO., LTD
    Inventor: Kazuki Takizawa
  • Publication number: 20110293853
    Abstract: A thin film forming apparatus controls pressures of a first internal space in a deposition vessel and a second internal space provided in the first internal space according to determined pressure conditions, respectively. The apparatus causes a source gas to flow onto a substrate in the second internal space and supplies a high-frequency power to a plasma source provided in the first internal space according to the pressure conditions, thereby generating plasma in the second internal space to form a thin film on the substrate.
    Type: Application
    Filed: January 28, 2010
    Publication date: December 1, 2011
    Applicant: MITSUI ENGINEERING & SHIPBUILDING CO., LTD
    Inventors: Kazuki Takizawa, Yasunari Mori, Kazutoshi Murata
  • Publication number: 20110274925
    Abstract: A poly(N-alkylcarbazole) columnar structure having electroconductivity is provided. The poly(N-alkylcarbazole) columnar structure having electroconductivity may be produced by electrolytically polymerizing an N-alkylcarbazole in a particular solvent.
    Type: Application
    Filed: March 4, 2011
    Publication date: November 10, 2011
    Applicants: NATIONAL UNIVERSITY CORPORATION CHIBA UNIVERSITY, CHISSO CORPORATION
    Inventors: Katsuyoshi HOSHINO, Kazuki TAKIZAWA, Katsuyuki MURASHIRO, Toshiki KOMATSU
  • Publication number: 20100131226
    Abstract: A laser beam with a wavelength capable of exciting atoms of helium in the metastable state is directed to a generated plasma, and atoms in the metastable state are excited. Absorption amount information representing the amount of laser beam absorbed is acquired, and the density of atoms of helium in the metastable state in the plasma is computed from the absorption amount. The emissions of light from helium gas in the plasma caused by transition from two different excited states to the lower level are measured, and the ratio between the intensities of the emissions is determined. The electron temperature of the produced plasma is computed from the computed density of the atoms of helium gas in the metastable state and the computed emission intensity ratio. With this, the plasma electron temperature can be computed with a relatively high accuracy irrespective of the condition of the plasma atmosphere.
    Type: Application
    Filed: March 24, 2008
    Publication date: May 27, 2010
    Applicant: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
    Inventor: Kazuki Takizawa
  • Publication number: 20100095888
    Abstract: A plasma generating apparatus is provided with an impedance matching member, which is connected to a feeding line that supplies an antenna element with a high frequency signal, and has variable characteristic parameters for impedance matching; a distribution wire, which is arranged corresponding to the impedance matching member and connects the impedance matching member with at least two antenna elements; and a control section which changes at the same time impedance matching statuses of at least the two antenna elements connected to the impedance matching member through the distribution wire by changing the characteristic parameters of the impedance member. Thus, the number of impedance matching devices is smaller than that of the antenna elements, and a mechanism relating to impedance matching is made relatively small.
    Type: Application
    Filed: March 28, 2008
    Publication date: April 22, 2010
    Applicant: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
    Inventors: Yasunari Mori, Kazuki Takizawa