Patents by Inventor Kazunori Sakamoto

Kazunori Sakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11952549
    Abstract: Examples of the ester oil include diester oils such as dibutyl sebacate, dioctyl sebacate, di-2-ethylhexyl sebacate, dioctyl adipate, diisodecyl adipate, ditridecyl adipate, ditridecyl phthalate, and methyl acetyl ricinolate; aromatic ester oils such as trioctyl trimellitate, tridecyl trimellitate, and tetraoctyl pyromellitate; polyol ester oils such as trimethylolpropane caprylate, trimethylolpropane pelargonate, pentaerythritol-2-ethylhexanoate, and pentaerythritol pelargonate; carbonate oil; complex ester oil which is an oligoester of polyhydric alcohol and mixed fatty acid including dibasic acid and monobasic acid; etc.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: April 9, 2024
    Assignees: JTEKT CORPORATION, ENEOS CORPORATION
    Inventors: Kazunori Miyake, Kiyomi Sakamoto, Yusuke Ayame, Go Tatsumi
  • Publication number: 20240071337
    Abstract: An unevenness correction data generation device suppressing the appearance of color unevenness when turning on R, G and B together includes a pattern generation unit causing red, green and blue images, in which display panel subpixels are turned on at the same gray level, to be displayed, a monochrome camera, a control unit generating first red, green and blue luminance correction data based on shooting data of the monochrome camera, a pattern generation unit causing the display panel to display a white image by causing red, green and blue images corrected with the respective luminance correction data to be displayed simultaneously, a color camera shooting the white image in color, and a control unit generating color correction data for correcting color unevenness based on shooting data of the color camera and generates unevenness correction data based on the red, green and blue luminance correction data and the color correction data.
    Type: Application
    Filed: February 4, 2021
    Publication date: February 29, 2024
    Applicant: IIX INC.
    Inventors: Makoto HATAKENAKA, Takashi SAKAMOTO, Hiroshi MURASE, Mitsuo HAGIWARA, Hideaki SUZUKI, Kazunori YOSHIZAWA
  • Patent number: 11144565
    Abstract: An information extraction apparatus includes, a controller extracting, as variable elements, parts different between a plurality of structured documents and extract, as peripheral information pieces, elements within a predetermined range from the respective variable elements, and a storage unit storing the variable elements and the peripheral information pieces with respect to at least an extraction object which is at least one of the variable elements.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: October 12, 2021
    Assignee: INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION RESEARCH ORGANIZATION OF INFORMATION AND SYSTEMS
    Inventors: Kazunori Sakamoto, Shinichi Honiden
  • Patent number: 10689762
    Abstract: A substrate processing apparatus can suppress particle generation on a substrate, and can reduce a consumption amount of a processing liquid. A substrate processing apparatus 1 includes a processing chamber 30 having a processing space 31 in which a substrate W is processed; a vaporizing tank 60, configured to store the processing liquid therein, having a vaporization space 61 in which the stored processing liquid is allowed to be vaporized; a decompression driving unit 70 configured to decompress the vaporization space 61; and a control unit 18. The control unit 18 vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 without through the processing space 31, and then, vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 through the processing space 31, and supplies an inert gas into the vaporization space 61.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: June 23, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akira Murata, Satoshi Kaneko, Kazuki Motomatsu, Kazunori Sakamoto
  • Patent number: 10584420
    Abstract: A substrate liquid processing apparatus 1 includes a substrate holding unit 52 configured to hold a substrate W; a processing liquid supply unit 53 configured to supply a processing liquid L1 onto a top surface of the substrate W held by the substrate holding unit 52; and a cover body 6 configured to cover the substrate W. Here, the cover body 6 includes a ceiling unit 61 disposed above the substrate W, a sidewall unit 62 downwardly extended from the ceiling unit 61, and a heating unit 63 provided at the ceiling unit 61 and configured to heat the processing liquid L1 on the substrate W. The sidewall unit 62 of the cover body 6 is placed at an outer periphery side of the substrate W when the processing liquid L1 on the substrate W is heated.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: March 10, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuki Motomatsu, Satoshi Kaneko, Kazunori Sakamoto
  • Publication number: 20180018378
    Abstract: An information extraction apparatus includes, a controller extracting, as variable elements, parts different between a plurality of structured documents and extract, as peripheral information pieces, elements within a predetermined range from the respective variable elements, and a storage unit storing the variable elements and the peripheral information pieces with respect to at least an extraction object which is at least one of the variable elements.
    Type: Application
    Filed: December 14, 2015
    Publication date: January 18, 2018
    Applicant: INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION ORGANIZATION OF INFORMATION AND SYSTEMS
    Inventors: Kazunori SAKAMOTO, Shinichi HONIDEN
  • Publication number: 20180010252
    Abstract: A substrate processing apparatus can suppress particle generation on a substrate, and can reduce a consumption amount of a processing liquid. A substrate processing apparatus 1 includes a processing chamber 30 having a processing space 31 in which a substrate W is processed; a vaporizing tank 60, configured to store the processing liquid therein, having a vaporization space 61 in which the stored processing liquid is allowed to be vaporized; a decompression driving unit 70 configured to decompress the vaporization space 61; and a control unit 18. The control unit 18 vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 without through the processing space 31, and then, vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 through the processing space 31, and supplies an inert gas into the vaporization space 61.
    Type: Application
    Filed: June 28, 2017
    Publication date: January 11, 2018
    Inventors: Akira Murata, Satoshi Kaneko, Kazuki Motomatsu, Kazunori Sakamoto
  • Publication number: 20180002811
    Abstract: A substrate liquid processing apparatus 1 includes a substrate holding unit 52 configured to hold a substrate W; a processing liquid supply unit 53 configured to supply a processing liquid L1 onto a top surface of the substrate W held by the substrate holding unit 52; and a cover body 6 configured to cover the substrate W. Here, the cover body 6 includes a ceiling unit 61 disposed above the substrate W, a sidewall unit 62 downwardly extended from the ceiling unit 61,and a heating unit 63 provided at the ceiling unit 61 and configured to heat the processing liquid L1 on the substrate W. The sidewall unit 62 of the cover body 6 is placed at an outer periphery side of the substrate W when the processing liquid L1 on the substrate W is heated.
    Type: Application
    Filed: June 27, 2017
    Publication date: January 4, 2018
    Inventors: Kazuki Motomatsu, Satoshi Kaneko, Kazunori Sakamoto
  • Patent number: 9822453
    Abstract: A substrate entire region treatment process of discharging a processing fluid of a temperature different from a surface temperature of a substrate 3 from a first nozzle 24 toward the substrate is performed while moving the first nozzle toward an outer side from an entire region treatment start position P2 located at a central portion to an entire region treatment end position P5 located at a peripheral portion. Then, after moving the first nozzle toward an inner side to a peripheral region treatment start position P6 located at an outer position than the entire region treatment start position P2, a substrate peripheral region treatment process of discharging the processing fluid from the first nozzle toward the substrate is performed while moving the first nozzle toward the outer side from the peripheral region treatment start position P6 to a peripheral region treatment stop position P7 located at a peripheral portion.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: November 21, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Satoshi Kaneko, Kazuki Motomatsu, Kazunori Sakamoto
  • Publication number: 20150159276
    Abstract: A substrate entire region treatment process of discharging a processing fluid of a temperature different from a surface temperature of a substrate 3 from a first nozzle 24 toward the substrate is performed while moving the first nozzle toward an outer side from an entire region treatment start position P2 located at a central portion to an entire region treatment end position P5 located at a peripheral portion. Then, after moving the first nozzle toward an inner side to a peripheral region treatment start position P6 located at an outer position than the entire region treatment start position P2, a substrate peripheral region treatment process of discharging the processing fluid from the first nozzle toward the substrate is performed while moving the first nozzle toward the outer side from the peripheral region treatment start position P6 to a peripheral region treatment stop position P7 located at a peripheral portion.
    Type: Application
    Filed: December 4, 2014
    Publication date: June 11, 2015
    Inventors: Satoshi Kaneko, Kazuki Motomatsu, Kazunori Sakamoto
  • Patent number: 8178731
    Abstract: An object of the present invention is to provide a process for producing high-purity hydroxytriphenylenes in which not only inexpensive raw materials can be used but also no complicated steps of deprotection such as dealkylation, and reduction and the like are necessary, and which is thereby advantageous in industrial production. Also there is provided a novel crystal of 2,3,6,7,10,11-hexahydroxytriphenylene monohydrate, which has satisfactory thermal stability. The process for producing a compound represented by the general formula (2) is characterized by reacting a compound represented by the general formula (1) in the presence of a metal oxide comprising a metal selected from trivalent iron, pentavalent vanadium and hexavalent molybdenum and of a nonvolatile strong acid: wherein, Rs are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms.
    Type: Grant
    Filed: March 10, 2011
    Date of Patent: May 15, 2012
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Daisuke Takano, Tomokazu Kato, Toshihiro Fujinaka, Kazunori Sakamoto
  • Publication number: 20110201845
    Abstract: An object of the present invention is to provide a process for producing high-purity hydroxytriphenylenes in which not only inexpensive raw materials can be used but also no complicated steps of deprotection such as dealkylation, and reduction and the like are necessary, and which is thereby advantageous in industrial production. Also there is provided a novel crystal of 2,3,6,7,10,11-hexahydroxytriphenylene monohydrate, which has satisfactory thermal stability. The process for producing a compound represented by the general formula (2) is characterized by reacting a compound represented by the general formula (1) in the presence of a metal oxide comprising a metal selected from trivalent iron, pentavalent vanadium and hexavalent molybdenum and of a nonvolatile strong acid: wherein, Rs are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms.
    Type: Application
    Filed: March 10, 2011
    Publication date: August 18, 2011
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Daisuke Takano, Tomokazu Kato, Toshihiro Fujinaka, Kazunori Sakamoto
  • Patent number: 7964757
    Abstract: An object of the present invention is to provide a process for producing high-purity hydroxytriphenylenes in which not only inexpensive raw materials can be used but also no complicated steps of deprotection such as dealkylation, and reduction and the like are necessary, and which is thereby advantageous in industrial production. Also there is provided a novel crystal of 2,3,6,7,10,11-hexahydroxytriphenylene monohydrate, which has satisfactory thermal stability. The process for producing a compound represented by the general formula (2) is characterized by reacting a compound represented by the general formula (1) in the presence of a metal oxide comprising a metal selected from trivalent iron, pentavalent vanadium and hexavalent molybdenum and of a nonvolatile strong acid: wherein, Rs are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms.
    Type: Grant
    Filed: August 6, 2008
    Date of Patent: June 21, 2011
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Daisuke Takano, Tomokazu Kato, Toshihiro Fujinaka, Kazunori Sakamoto
  • Patent number: 7777993
    Abstract: A wiper control circuit is provided for invalidating the state of a wiper operation switch to suppress unnecessary operations of a wiper in an automotive vehicle upon starting an engine using a remote control engine starter. The wiper control circuit is configured to suppress generation of a sneak current and thereby reduce the likelihood that an erroneous operation instruction is received.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: August 17, 2010
    Assignee: Sumitomo Wiring Systems, Ltd.
    Inventor: Kazunori Sakamoto
  • Publication number: 20100191020
    Abstract: An object of the present invention is to provide a process for producing high-purity hydroxytriphenylenes in which not only inexpensive raw materials can be used but also no complicated steps of deprotection such as dealkylation, and reduction and the like are necessary, and which is thereby advantageous in industrial production. Also there is provided a novel crystal of 2,3,6,7,10,11-hexahydroxytriphenylene monohydrate, which has satisfactory thermal stability. The process for producing a compound represented by the general formula (2) is characterized by reacting a compound represented by the general formula (1) in the presence of a metal oxide comprising a metal selected from trivalent iron, pentavalent vanadium and hexavalent molybdenum and of a nonvolatile strong acid: wherein, Rs are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms.
    Type: Application
    Filed: August 6, 2008
    Publication date: July 29, 2010
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Daisuke Takano, Tomokazu Kato, Toshihiro Fujinaka, Kazunori Sakamoto
  • Publication number: 20090314448
    Abstract: A method for producing a metal material involves applying, to the surface of the ZAS alloy, an agent comprising a solvent and, dispersed therein, a material containing Cu such as Cu powder and a Cu—Mn alloy powder and preferably, dispersed or dissolved therein, a reducing agent capable of reducing an oxide film present on the surface of the ZAS alloy, and heating the ZAS alloy having the agent applied thereon, to thereby diffuse Cu into the alloy. The metal material comprises a Zn—Al—Sn based alloy (ZAS alloy) and Cu diffused in the alloy, wherein Cu is diffused into the inside of the alloy to a depth from the surface of 0.5 mm or more, the concentration of Cu decreases from the surface of the ZAS alloy towards the inside thereof, and there is present no specific interface between Cu and the ZAS alloy.
    Type: Application
    Filed: August 26, 2009
    Publication date: December 24, 2009
    Inventors: Mitsuo Kuwabara, Tadashi Okada, Naoji Yamamoto, Masahito Hasuike, Michiharu Hasegawa, Tetsuaki Aoki, Masanori Kogawa, Kazunori Sakamoto, Keizou Tanoue
  • Patent number: 7601389
    Abstract: A metal material comprises a Zn—Al—Sn based alloy (ZAS alloy) and Cu diffused in the alloy, wherein Cu is diffused into the inside of the alloy to a depth from the surface of 0.5 mm or more, the concentration of Cu decreases from the surface of the ZAS alloy towards the inside thereof, and there is present no specific interface between Cu and the ZAS alloy; and a method for producing the metal material involves applying, to the surface of the ZAS alloy, an agent comprising a solvent and, dispersed therein, a material containing Cu such as a Cu powder and a Cu—Mn alloy powder and preferably, dispersed or dissolved therein, a reducing agent capable of reducing an oxide film present on the surface of the ZAS alloy, and heating the ZAS alloy having the agent applied thereon, to thereby diffuse Cu into the alloy.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: October 13, 2009
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Kuwabara, Tadashi Okada, Naoji Yamamoto, Masahito Hasuike, Hideo Yoshikawa, Michiharu Hasegawa, Tetsuaki Aoki, Masanori Kogawa, Kazunori Sakamoto, Keizou Tanoue
  • Publication number: 20090206659
    Abstract: A wiper control circuit is provided for invalidating the state of a wiper operation switch to suppress unnecessary operations of a wiper in an automotive vehicle upon staring an engine using a remote control engine starter. The wiper control circuit is configured to suppress generation of a sneak current and thereby reduce the likelihood that an erroneous operation instruction is received.
    Type: Application
    Filed: October 5, 2007
    Publication date: August 20, 2009
    Inventor: Kazunori Sakamoto
  • Patent number: 7490523
    Abstract: An occupant load detecting device of a seat for a vehicle includes a strain member arranged between a floor-side fixing member and a seat-side fixing member and having a strain gauge, a connecting member fixed to the strain member and securely connected to one of the floor-side fixing member and the seat-side fixing member, a first supporting member relatively immovably fitted into a fixing hole and fixed to an attachment surface formed at the other one of the floor-side fixing member and the seat-side fixing member to support the strain member, a second supporting member fitted into an attachment hole and fixed to the attachment surface, and a bracket including first and second fixing portions and an amplifier case fixing portion continuous with the first and second fixing portions and extending at a side of the strain member in a lateral direction of the seat.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: February 17, 2009
    Assignee: Aisin Seiki Kabushiki Kaisha
    Inventors: Kazunori Sakamoto, Hideki Kawabata, Muneto Inayoshi, Satohiko Nakano, Mutsuro Aoyama
  • Patent number: 7487687
    Abstract: An occupant load sensor of a seat for a vehicle includes a metal-made bracket fixed to a strain member and having an attachment portion extending in a lateral direction from the strain member, an amplifier substrate for amplifying a signal transmitted by the strain gauge. One surface of the amplifier substrate is covered by the attachment portion of the metal-made bracket and the other surface thereof is covered by a metal-foil ground pattern. The occupant load sensor further includes a resin-made amplifier case fixed to the attachment portion of the metal-made bracket and arranged in parallel to the strain member. The resin-made amplifier case houses therein the amplifier substrate.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: February 10, 2009
    Assignee: Aisin Seiki Kabushiki Kaisha
    Inventors: Chiaki Sumi, Satohiko Nakano, Mutsuro Aoyama, Kazunori Sakamoto, Hideki Kawabata, Muneto Inayoshi, Hajime Shiohara