Patents by Inventor Kazuo Mizuguchi

Kazuo Mizuguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240399319
    Abstract: The present invention provides an anion exchange membrane that has low electrical resistance when used in electrodialysis, is produced without an increase in cost, and is excellent in selective permeability to monovalent anions, and a method for producing the same. The anion exchange membrane has a tertiary amino group and a quaternary ammonium group as functional groups, such that an intensity ratio of the tertiary amino group to the quaternary ammonium group is 1.0 or more as measured by X-ray photoelectron spectroscopy on a surface of the anion exchange membrane having the tertiary amino group and the quaternary ammonium group as the functional groups.
    Type: Application
    Filed: August 24, 2022
    Publication date: December 5, 2024
    Applicants: ASTOM Corporation, TOKUYAMA CORPORATION
    Inventors: Kazuo MIZUGUCHI, Nobuhiko OHMURA, Masayuki KISHINO, Michihito NAKATANI
  • Patent number: 10583430
    Abstract: An ion exchange membrane having a structure that an ion exchange resin is filled in spaces of a porous base film, the porous base film has a structure that at least two porous olefin resin layers are laminated with a bonding strength of 100 gf/cm or more to less than 700 gf/cm and a Gurley air permeance of 500 sec/100 ml or less in terms of a 100 ?m thick film. In this ion exchange membrane, base film has high air permeability though it has a multi-layer structure that a plurality of porous resin films are bonded together, and therefore a rise in electric resistance caused by the lamination of the base sheets is effectively suppressed.
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: March 10, 2020
    Assignee: ASTOM CORPORATION
    Inventors: Tomoaki Takahashi, Hiroshi Miyazawa, Nobuyuki Tanaka, Nobuhiko Ohmura, Kazuo Mizuguchi, Kenji Fukuta
  • Publication number: 20170216832
    Abstract: An ion exchange membrane having a structure that an ion exchange resin is filled in spaces of a porous base film, the porous base film has a structure that at least two porous olefin resin layers are laminated with a bonding strength of 100 gf/cm or more to less than 700 gf/cm and a Gurley air permeance of 500 sec/100 ml or less in terms of a 100 ?m thick film. In this ion exchange membrane, base film has high air permeability though it has a multi-layer structure that a plurality of porous resin films are bonded together, and therefore a rise in electric resistance caused by the lamination of the base sheets is effectively suppressed.
    Type: Application
    Filed: July 16, 2015
    Publication date: August 3, 2017
    Applicant: ASTOM CORPORATION
    Inventors: Tomoaki TAKAHASHI, Hiroshi MIYAZAWA, Nobuyuki TANAKA, Nobuhiko OHMURA, Kazuo MIZUGUCHI, Kenji FUKUTA
  • Patent number: 9162185
    Abstract: An ion-exchange membrane including a porous unstretched polyethylene sheet in which fine pores are piercing, the pores being filled with an ion-exchange resin. The ion-exchange membrane exhibits excellent concentration property.
    Type: Grant
    Filed: March 28, 2012
    Date of Patent: October 20, 2015
    Assignee: ASTOM Corporation
    Inventors: Nobuhiko Ohmura, Kazuo Mizuguchi, Kazunori Nishio, Toshio Aritomi
  • Patent number: 8980070
    Abstract: To provide a bipolar membrane featuring improved adhesion between an anion-exchange membrane and a cation-exchange membrane without accompanied by an increase in the membrane voltage. [Means for Solution] A bipolar membrane comprising a cation-exchange membrane and an anion-exchange membrane joined together facing each other, wherein at least one of the ion exchange membranes contains a chlorinated polyolefin.
    Type: Grant
    Filed: December 7, 2009
    Date of Patent: March 17, 2015
    Assignee: Astom Corporation
    Inventors: Kazunori Nishio, Kazuo Mizuguchi, Minoru Kawashima, Toshio Aritomi
  • Publication number: 20140014519
    Abstract: An ion-exchange membrane including a porous unstretched polyethylene sheet in which fine pores are piercing, the pores being filled with an ion-exchange resin. The ion-exchange membrane exhibits excellent concentration property.
    Type: Application
    Filed: March 28, 2012
    Publication date: January 16, 2014
    Applicant: ASTOM CORPORATION
    Inventors: Nobuhiko Ohmura, Kazuo Mizuguchi, Kazunori Nishio, Toshio Aritomi
  • Publication number: 20110240463
    Abstract: To provide a bipolar membrane featuring improved adhesion between an anion-exchange membrane and a cation-exchange membrane without accompanied by an increase in the membrane voltage. [Means for Solution] A bipolar membrane comprising a cation-exchange membrane and an anion-exchange membrane joined together facing each other, wherein at least one of the ion exchange membranes contains a chlorinated polyolefin.
    Type: Application
    Filed: December 7, 2009
    Publication date: October 6, 2011
    Inventors: Kazunori Nishio, Kazuo Mizuguchi, Minoru Kawashima, Toshio Aritomi
  • Patent number: 5602414
    Abstract: In a method for fabricating an infrared detector, initially, a CdHgTe layer of a first conductivity type is produced on a front surface of a semiconductor substrate, a plurality of spaced apart CdHgTe regions of a second conductivity type, opposite the first conductivity type, are produced at the surface of the first conductivity type CdHgTe layer, and part of the surface of the first conductivity type CdHgTe layer between the second conductivity type CdHgTe regions is selectively irradiated with a charged particle beam to evaporate Hg atoms from that part, whereby a CdHgTe separation region of the first conductivity type and having a Cd composition larger than that of the first conductivity type CdHgTe layer is produced penetrating through the first conductivity type CdHgTe layer and surrounding each of the second conductivity type CdHgTe regions. Therefore, a highly-integrated high-resolution infrared detector with no crosstalk between pixels is achieved.
    Type: Grant
    Filed: June 16, 1994
    Date of Patent: February 11, 1997
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kotaro Mitsui, Zenpei Kawazu, Kazuo Mizuguchi, Seiji Ochi, Yuji Ohkura, Norio Hayafuji, Hirotaka Kizuki, Mari Tsugami, Akihiro Takami, Manabu Katoh
  • Patent number: 5161167
    Abstract: A semiconductor laser producing visible light includes a first conductivity type GaAs substrate, a first conductivity type (Al.sub.w Ga.sub.1-w).sub.0.5 In.sub.0.5 P cladding layer disposed on the substrate, a (Al.sub.z Ga.sub.1-z).sub.0.5 In.sub.0.5 P active layer disposed on the first conductivity type cladding layer wherein 0.ltoreq.z<w, a second conductivity type (Al.sub.w Ga.sub.1-w).sub.0.5 In.sub.0.5 P cladding layer having a lattice constant and disposed on the active layer, a first conductivity type In.sub.1-x Ga.sub.x As.sub.1-y P.sub.y current blocking layer disposed on part of the second conductivity type cladding layer wherein y is approximately equal to -2x+2, 0.5.ltoreq.x<1, and 0<y.ltoreq.
    Type: Grant
    Filed: June 18, 1991
    Date of Patent: November 3, 1992
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Takashi Murakami, Shigeki Kageyama, Kazuo Mizuguchi
  • Patent number: 4377734
    Abstract: Ions of a metal which becomes passive under the presence of oxygen with regard to plasma etching are implanted into selected portions of the surface of a workpiece, after which the workpiece is subjected to plasma etching with a reaction gas mixed with oxygen, whereby that layer which has been rendered passive acts as a mask, and an etched pattern is formed.
    Type: Grant
    Filed: October 9, 1980
    Date of Patent: March 22, 1983
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yoji Mashiko, Hirozo Takano, Haruhiko Abe, Sotoju Asai, Kazuo Mizuguchi, Sumio Nomoto
  • Patent number: 4341616
    Abstract: A dry etching device is provided in which on at least one portion of the path of etchant movement from the plasma production region to the etching workpiece a resin coating containing atoms or molecules of the same type as the chemically active atoms or molecules which constitute the etchant, is formed.
    Type: Grant
    Filed: December 11, 1980
    Date of Patent: July 27, 1982
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Nagatomo, Haruhiko Abe, Kazuo Mizuguchi
  • Patent number: 4314874
    Abstract: A thin aluminum film 3 is formed on the top surface of a substrate 2, 1. Selected areas of the aluminum film are irradiated by an oxygen ion beam 6 to form implanted regions 7. The surface is then plasma etched, with the oxygen ion implanted regions serving as a mask to thereby prevent the removal of the underlying areas of the aluminum film.
    Type: Grant
    Filed: September 24, 1980
    Date of Patent: February 9, 1982
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Haruhiko Abe, Yoji Mashiko, Hiroshi Harada, Sotoju Asai, Kazuo Mizuguchi, Sumio Nomoto