Patents by Inventor Kazusige Sano

Kazusige Sano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Weighing apparatus, substrate liquid processing apparatus, weighing method, substrate liquid processing method and recording medium
    Patent number: 11152234
    Abstract: A processing liquid used in a substrate liquid processing apparatus can be supplied in a constant amount with high accuracy. A substrate liquid processing apparatus A1 includes a storage line 61 configured to store a processing liquid therein; an introduction line 62 configured to introduce the processing liquid into the storage line 61; a discharge line 63 configured to discharge the processing liquid from the storage line 61; and a gas supply unit 65 configured to perform a strickling of the processing liquid by jetting a gas to a surface of the processing liquid stored in the storage line 61.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: October 19, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Teruaki Konishi, Kazusige Sano, Koji Tanaka
  • Liquid processing apparatus, liquid processing method, and storage medium
    Patent number: 10840081
    Abstract: A substrate liquid processing method includes immersing the substrate in a processing liquid for processing the substrate, detecting a conversion point at which a processing condition of the processing the substrate is changed, and changing the processing condition when the conversion point is detected.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: November 17, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takumi Honda, Kazusige Sano, Hironobu Hyakutake
  • LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM
    Publication number: 20190371595
    Abstract: A substrate liquid processing method includes immersing the substrate in a processing liquid for processing the substrate, detecting a conversion point at which a processing condition of the processing the substrate is changed, and changing the processing condition when the conversion point is detected.
    Type: Application
    Filed: May 30, 2019
    Publication date: December 5, 2019
    Inventors: Takumi Honda, Kazusige Sano, Hironobu Hyakutake
  • WEIGHING APPARATUS, SUBSTRATE LIQUID PROCESSING APPARATUS, WEIGHING METHOD, SUBSTRATE LIQUID PROCESSING METHOD AND RECORDING MEDIUM
    Publication number: 20180286718
    Abstract: A processing liquid used in a substrate liquid processing apparatus can be supplied in a constant amount with high accuracy. A substrate liquid processing apparatus A1 includes a storage line 61 configured to store a processing liquid therein; an introduction line 62 configured to introduce the processing liquid into the storage line 61; a discharge line 63 configured to discharge the processing liquid from the storage line 61; and a gas supply unit 65 configured to perform a strickling of the processing liquid by jetting a gas to a surface of the processing liquid stored in the storage line 61.
    Type: Application
    Filed: March 29, 2018
    Publication date: October 4, 2018
    Inventors: Teruaki Konishi, Kazusige Sano, Koji Tanaka