Patents by Inventor Kazuya Ebara
Kazuya Ebara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11130855Abstract: Provided is a composition for forming release layers which comprises (A) a polyurea including a repeating unit represented by formula (1), (B) an acid compound or a salt thereof, (C) a crosslinking agent selected from among compounds having a nitrogen atom substituted by a hydroxyalkyl group and/or an alkoxymethyl group, (D) a polymeric additive including a repeating unit represented by formula (a1), a repeating unit represented by formula (b), and a repeating unit represented by formula (c), and (E) a solvent, wherein the polymeric additive (D) is contained in an amount of 5-100 parts by mass per 100 parts by mass of the polyurea (A). (In the formulae, the RA moieties each are independently a hydrogen atom or a methyl group; RB1 is a branched C3-4 alkyl group in which at least one hydrogen atom has been replaced with a fluorine atom; RC is a C1-10 hydroxyalkyl group; and RD is a C6-20 polycycloalkyl group or C6-12 aryl group.Type: GrantFiled: July 26, 2018Date of Patent: September 28, 2021Assignee: NISSAN CHEMICAL CORPORATIONInventors: Kazuya Shindo, Tokio Nishita, Kazuya Ebara, BangChing Ho
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Publication number: 20210189126Abstract: Provided is a detachable layer-forming composition which, for example, contains an organic solvent and a polyamic acid, both ends of which are derived from a diamine and sealed with an aromatic dicarboxylic acid, such as the polyamic acid represented by this formula. In the formula, X represents a tetravalent aromatic group, Y represents a divalent aromatic group, R1-R4 each independently represent a hydrogen atom, a C1-10 alkyl group, or a C6-20 aryl group, and m is a natural number.Type: ApplicationFiled: March 8, 2021Publication date: June 24, 2021Applicant: NISSAN CHEMICAL CORPORATIONInventors: Kazuya EBARA, Kazuya SHINDO
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Publication number: 20200317915Abstract: Provided is a detachable layer-forming composition which, for example, contains an organic solvent and a polyamic acid, both ends of which are derived from a diamine and sealed with an aromatic dicarboxylic acid, such as the polyamic acid represented by this formula. (In the formula, X represents a tetravalent aromatic group, Y represents a divalent aromatic group, R1-R4 each independently represent a hydrogen atom, a C1-10 alkyl group, or a C6-20 aryl group, and m is a natural number.Type: ApplicationFiled: May 23, 2017Publication date: October 8, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Kazuya EBARA, Kazuya SHINDO
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Publication number: 20200317963Abstract: Provided is a detachable layer-forming composition which, for example, contains an organic solvent and a polyamic acid, both ends of which are derived from tetracarboxylic acid and sealed with an aromatic monoamine, such as the polyamic acid represented by this formula. (In the formula, X represents a tetravalent aromatic group, Y represents a divalent aromatic group, R1-R5 each independently represent a hydrogen atom, a C1-10 alkyl group, or a C6-20 aryl group, and m is a natural number.Type: ApplicationFiled: May 23, 2017Publication date: October 8, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Kazuya EBARA, Kazuya SHINDO
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Publication number: 20200239679Abstract: Provided is a composition for forming release layers which comprises (A) a polyurea including a repeating unit represented by formula (1), (B) an acid compound or a salt thereof, (C) a crosslinking agent selected from among compounds having a nitrogen atom substituted by a hydroxyalkyl group and/or an alkoxymethyl group, (D) a polymeric additive including a repeating unit represented by formula (a1), a repeating unit represented by formula (b), and a repeating unit represented by formula (c), and (E) a solvent, wherein the polymeric additive (D) is contained in an amount of 5-100 parts by mass per 100 parts by mass of the polyurea (A). (In the formulae, the RA moieties each are independently a hydrogen atom or a methyl group; RB1 is a branched C3-4 alkyl group in which at least one hydrogen atom has been replaced with a fluorine atom; RC is a C1-10 hydroxyalkyl group; and RD is a C6-20 polycycloalkyl group or C6-12 aryl group.Type: ApplicationFiled: July 26, 2018Publication date: July 30, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Kazuya SHINDO, Tokio NISHITA, Kazuya EBARA, BangChing HO
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Patent number: 9975996Abstract: A method for manufacturing a polyhydroxyamide resin (A) containing no chloride includes reacting a coumarin dimer component of Formula (19), where R56, R57, R58, R59, R60 and R61 independently represent an alkyl group having 1 to 10 carbon atom(s), a halogen atom, a nitro group, an amino group, a cyano group, a carboxy group, an alkoxycarbonyl group having 1 to 10 carbon atom(s), a halogenated alkyl group having 1 to 10 carbon atom(s) or a hydroxy group, and a dimamine in a polar solvent.Type: GrantFiled: March 8, 2016Date of Patent: May 22, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kazuya Ebara, Hideo Suzuki, Takayuki Tamura
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Patent number: 9761741Abstract: There is provided a novel material used for solar cells that can contribute to the improvement in maximum output of solar cells. A film-forming material for forming a light-collecting film on a transparent electrode of a solar cell, including an aromatic group-containing organic polymer compound (A), wherein the film-forming material exhibits an index of refraction of 1.5 to 2.0 at a wavelength of 633 nm and a transmittance of 95% or more with respect to light having a wavelength of 400 nm, and a solar cell obtained by coating a cured film made from the film-forming material on a surface of a transparent electrode.Type: GrantFiled: December 1, 2011Date of Patent: September 12, 2017Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kazuya Ebara, Hikaru Imamura, Rikimaru Sakamoto
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Publication number: 20160185905Abstract: A method for manufacturing a polyhydroxyamide resin (A) containing no chloride includes reacting a coumarin dimer component of Formula (19), where R56, R57, R58, R59, R60 and R61 independently represent an alkyl group having 1 to 10 carbon atom(s), a halogen atom, a nitro group, an amino group, a cyano group, a carboxy group, an alkoxycarbonyl group having 1 to 10 carbon atom(s), a halogenated alkyl group having 1 to 10 carbon atom(s) or a hydroxy group, and a dimamine in a polar solvent.Type: ApplicationFiled: March 8, 2016Publication date: June 30, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kazuya EBARA, Hideo SUZUKI, Takayuki TAMURA
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Patent number: 9240500Abstract: There is provided a novel material used for solar cells that can contribute to the improvement in maximum output of solar cells without using the conventional MPPT system. A film-forming material for forming a light-collecting film on a transparent electrode of a solar cell, including an aromatic group-containing organic polymer compound (A) and a cross-linker (B), wherein the film-forming material exhibits an index of refraction of 1.5 to 2.0 at a wavelength of 633 nm and a transmittance of 95% or more with respect to light having a wavelength of 400 nm, and a solar cell obtained by coating a cured film made from the film-forming material on a surface of a transparent electrode.Type: GrantFiled: December 1, 2011Date of Patent: January 19, 2016Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventor: Kazuya Ebara
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Patent number: 8871894Abstract: There is provided a simple production method of a polyhydroxyimide. A production method of a polyhydroxyimide, characterized by comprising adding to a polyhydroxyimide precursor containing a repeating structure of Formula (1): in which X is a tetravalent aliphatic group or aromatic group, Y is an organic group containing an aromatic group substituted with at least one OH group, and n is an integer of 1 or more, at least a compound of Formula (2) or Formula (3): in which R1 to R4 or R5 to R8 are independently a hydrogen atom or a monovalent organic group, and m is a natural number, and heating the resultant reaction mixture at a temperature of 50° C. or more to obtain a polyimide having a weight average molecular weight measured by gel permeation chromatography (GPC) in terms of polystyrene of 5,000 to 100,000.Type: GrantFiled: April 22, 2010Date of Patent: October 28, 2014Assignee: Nissan Chemical Industries, Ltd.Inventor: Kazuya Ebara
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Patent number: 8796393Abstract: There is provided a simple production method of polyhydroxyimide and a positive photosensitive resin composition containing the polyhydroxyimide. A production method of a polyhydroxyimide comprising: adding an acid component that is at least one type of carboxylic acid having a pKa of 0 to 5 to a polyhydroxyimide precursor of Formula (1): (where X is a tetravalent aliphatic or aromatic group, Y is an organic group containing an aromatic group substituted with at least one OH group, and n is an integer of 1 or more); and heating the resultant mixture to a temperature of 50 to 100° C. to prepare a poly imide of Formula (2): (where X, Y and n are the same as those defined above) having a weight average molecular weight of 3,000 to 100,000.Type: GrantFiled: January 16, 2013Date of Patent: August 5, 2014Assignee: Nissan Chemical Industries, Ltd.Inventor: Kazuya Ebara
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Publication number: 20140116505Abstract: There is provided a resin composition capable of forming a cured film having excellent light resistance, high transparency, and a high refractive index. A resin composition including: a component (A); a component (B); and a component (C) below, in which the composition is formed into a film and is then heated at 150° C. or higher to achieve a refractive index of 1.65 or higher: the component (A): a triazine compound having at least two nitrogen atoms substituted with a hydroxymethyl group and/or an alkoxymethyl group; the component (B): an ethylene glycol compound having at least one acrylic moiety and having an aromatic group substituted with an organic group or a condensed aromatic group; and the component (C): an acid compound having a pKa of 2 or lower.Type: ApplicationFiled: May 25, 2012Publication date: May 1, 2014Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventor: Kazuya Ebara
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Publication number: 20130284261Abstract: There is provided a novel material used for solar cells that can contribute to the improvement in maximum output of solar cells without using the conventional MPPT system. A film-forming material for forming a light-collecting film on a transparent electrode of a solar cell, including an aromatic group-containing organic polymer compound (A) and a cross-linker (B), wherein the film-forming material exhibits an index of refraction of 1.5 to 2.0 at a wavelength of 633 nm and a transmittance of 95% or more with respect to light having a wavelength of 400 nm, and a solar cell obtained by coating a cured film made from the film-forming material on a surface of a transparent electrode.Type: ApplicationFiled: December 1, 2011Publication date: October 31, 2013Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventor: Kazuya Ebara
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Publication number: 20130284262Abstract: There is provided a novel material used for solar cells that can contribute to the improvement in maximum output of solar cells. A film-forming material for forming a light-collecting film on a transparent electrode of a solar cell, including an aromatic group-containing organic polymer compound (A), wherein the film-forming material exhibits an index of refraction of 1.5 to 2.0 at a wavelength of 633 nm and a transmittance of 95% or more with respect to light having a wavelength of 400 nm, and a solar cell obtained by coating a cured film made from the film-forming material on a surface of a transparent electrode.Type: ApplicationFiled: December 1, 2011Publication date: October 31, 2013Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kazuya Ebara, Hikaru Imamura, Rikimaru Sakamoto
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Publication number: 20120094232Abstract: There is provided a simple production method of a polyhydroxyimide. A production method of a polyhydroxyimide, characterized by comprising adding to a polyhydroxyimide precursor containing a repeating structure of Formula (1): in which X is a tetravalent aliphatic group or aromatic group, Y is an organic group containing an aromatic group substituted with at least one OH group, and n is an integer of 1 or more, at least a compound of Formula (2) or Formula (3): in which R1 to R4 or R5 to R8 are independently a hydrogen atom or a monovalent organic group, and m is a natural number, and heating the resultant reaction mixture at a temperature of 50° C. or more to obtain a polyimide having a weight average molecular weight measured by gel permeation chromatography (GPC) in terms of polystyrene of 5,000 to 100,000.Type: ApplicationFiled: April 22, 2010Publication date: April 19, 2012Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventor: Kazuya Ebara
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Publication number: 20100304291Abstract: There is provided a simple production method of polyhydroxyimide and a positive photosensitive resin composition containing the polyhydroxyimide. A production method of a polyhydroxyimide comprising: adding an acid component that is at least one type of carboxylic acid having a pKa of 0 to 5 to a polyhydroxyimide precursor of Formula (1): (where X is a tetravalent aliphatic or aromatic group, Y is an organic group containing an aromatic group substituted with at least one OH group, and n is an integer of 1 or more); and heating the resultant mixture to a temperature of 50 to 100° C. to prepare a polyimide of Formula (2): (where X, Y and n are the same as those defined above) having a weight average molecular weight of 3,000 to 100,000.Type: ApplicationFiled: December 12, 2008Publication date: December 2, 2010Inventor: Kazuya Ebara
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Publication number: 20100119969Abstract: There is provided a positive photosensitive resin composition that is excellent in electric insulating properties, heat resistance, mechanical strength and electrical characteristics, and capable of forming a high-resolution circuit pattern. The positive photosensitive resin composition comprises at least one type of a polyhydroxyamide resin containing a repeating unit represented by Formula (1) and having a weight average molecular weight of 3,000 to 100,000, and a compound generating an acid by light irradiation. (where X represents a tetravalent aliphatic group or an aromatic group; R1 and R2 independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atom(s); Ar1 and Ar2 independently represent an aromatic group; Y represents an organic group containing an aromatic group substituted with at least one OH group; n represents an integer of 1 or more; and l and m independently represent an integer of 0 or 1 or more and satisfy l+m?2).Type: ApplicationFiled: May 27, 2008Publication date: May 13, 2010Applicant: NISSAN CHEMICAL INDUSTRIES LTD.Inventors: Kazuya Ebara, Hideo Suzuki, Takayuki Tamura
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Patent number: 6780561Abstract: Provided is a polybenzoxazole precursor having a high purity which does not contain ionic by-products. The above polybenzoxazole precursor comprises a repetitive unit represented by Formula (1): wherein A1 represents a tetravalent aromatic group; N and OH which are bonded to A1 are paired, and the respective pairs of N and OH are bonded to carbons which are adjacent to each other on the same aromatic ring; A2 represents a divalent organic group; and n represents a number of 2 to 300.Type: GrantFiled: November 26, 2002Date of Patent: August 24, 2004Assignee: Kansai Paint Co., Ltd.Inventors: Mitsuru Ueda, Kazuya Ebara, Kenji Miyagawa, Kazuo Yamanaka, Yoichi Yonehara
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Publication number: 20030143480Abstract: Provided is a polybenzoxazole precursor having a high purity which does not contain ionic by-products.Type: ApplicationFiled: November 26, 2002Publication date: July 31, 2003Inventors: Mitsuru Ueda, Kazuya Ebara, Kenji Miyagawa, Kazuo Yamanaka, Yoichi Yonehara