Patents by Inventor Keigo Matsuura

Keigo Matsuura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240138263
    Abstract: A light emitting element of one or more embodiments includes a first electrode, a second electrode oppositely to the first electrode, and an emission layer between the first electrode and the second electrode. The light emitting element of one or more embodiments includes a polycyclic compound represented by a specific chemical structure in the emission layer, thereby showing improved emission efficiency and life characteristics.
    Type: Application
    Filed: September 18, 2023
    Publication date: April 25, 2024
    Inventors: Makoto YAMAMOTO, Keigo HOSHI, Yuji SUZAKI, Hirokazu KUWABARA, Nobutaka AKASHI, Ryuhei FURUE, Toshiyuki MATSUURA, Yoshiro SUGITA, Yuma AOKI, Yuuki MIYAZAKI
  • Publication number: 20230406869
    Abstract: A compound represented by the following formula (A1) or (A2): G1-(CH2)m1—CHX1—(CH2)n1-M ??Formula (A1) M-(CH2)n2—CHX1—(CH2)m2-G2(CH2)m3—CHX1—(CH2)n3-M ??Formula (A2). Where in the formula (A1) and (A2), G1, G2, X1, M, n1, n2, n3, m1, m2, and m3 are as defined in the disclosure. A method for producing a compound represented by the following formula (B1) or (B2), where M in the compound of formula (A1) or (A2) is converted into a hydrogen or hydrocarbon group represented by R3: G1-(CH2)m1—CHX1—(CH2)n1—R3 ??Formula (B1) R3—(CH2)n2—CHX1—(CH2)m2-G2-(CH2)m3—CHX1—(CH2)n3—R3 ??Formula (B2). Where in the formulas B1 and B2, G1, G2, X1, R3, n1, n2, n3, m1, m2, and m3 are as defined in the disclosure.
    Type: Application
    Filed: September 1, 2023
    Publication date: December 21, 2023
    Applicant: AGC Inc.
    Inventors: Makoto UNO, Eiichiro ANRAKU, Takafumi KAWAKAMI, Keigo MATSUURA
  • Publication number: 20230392038
    Abstract: The object is to provide a composition capable of forming a surface layer excellent in abrasion resistance, a base material with the surface layer, and a method for producing the base material with the surface layer. The composition of the present invention comprises a fluorinated ether compound having a poly(oxyfluoroalkylene) chain and a reactive silyl group, and a crosslinking agent having a plurality of reactive silyl groups and no poly(oxyfluoroalkylene) chain.
    Type: Application
    Filed: August 17, 2023
    Publication date: December 7, 2023
    Applicant: AGC Inc.
    Inventors: Kazumi KOUDA, Takafumi KAWAKAMI, Eiichiro ANRAKU, Keigo MATSUURA, Makoto UNO
  • Publication number: 20230392039
    Abstract: There are provided a novel compound, a method for producing the same, and a method for producing a surface treatment agent using the novel compound as a raw material. A compound represented by the following formula (A1) or (A2). G1-(CH2)n-M??Formula (A1) M-(CH2)n-G2-(CH2)n-M??Formula (A2) where, each reference sign in the formula is as described in the specification.
    Type: Application
    Filed: August 23, 2023
    Publication date: December 7, 2023
    Applicant: AGC Inc.
    Inventors: Makoto UNO, Eiichiro ANRAKU, Takafumi KAWAKAMI, Keigo MATSUURA
  • Patent number: 11773216
    Abstract: A fluorinated ether compound and a composition capable of forming a light resistant surface layer and an article are provided. The fluorinated ether compound of the present invention has a poly(oxyfluoroalkylene) chain, a reactive silyl group and a group (A) represented by —NR—C(O)— (wherein R is a hydrogen atom or an alkyl group), wherein the carbonyl carbon in the group (A) is bonded to a carbon atom, and the poly(oxyfluoroalkyiene) chain is located at the nitrogen end of the group (A).
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: October 3, 2023
    Assignee: AGC Inc.
    Inventors: Keigo Matsuura, Eiichiro Anraku, Ryuta Takashita, Koki Watanabe, Makoto Uno, Koichi Murata, Takafumi Kawakami
  • Publication number: 20230296818
    Abstract: An optical filter includes: an absorption layer including a first near-infrared absorbing dye (D1), a second near-infrared absorbing dye (D2), and a transparent resin; and a reflection layer including a dielectric multilayer film. The dye (D1) and the dye (D2) are squarylium compounds satisfying following (1) to (3). (1) The dye (D1) has a maximum absorption wavelength ?max(D1) within a range of 680 to 730 nm, and the difference between a wavelength at which a transmittance is 80% on the shorter wavelength side than ?max(D1) when the concentration is adjusted such that a transmittance at ?max(D1) is 10%, and ?max(D1) is 100 nm or less. (2) The dye (D2) has a maximum absorption wavelength ?max(D2) within a range of 720 to 770 nm. (3) A value obtained by subtracting ?max(D1) from ?max(D2) is 30 nm or more and 85 nm or less.
    Type: Application
    Filed: May 24, 2023
    Publication date: September 21, 2023
    Applicant: AGC Inc.
    Inventors: Kazuhiko SHIONO, Nanako NISHIMOTO, Sayuri YAMADA, Hiroki HOTAKA, Satoshi OKADA, Keigo MATSUURA
  • Patent number: 11709298
    Abstract: An optical filter includes: an absorption layer including a first near-infrared absorbing dye (D1), a second near-infrared absorbing dye (D2), and a transparent resin; and a reflection layer including a dielectric multilayer film. The dye (D1) and the dye (D2) are squarylium compounds satisfying following (1) to (3). (1) The dye (D1) has a maximum absorption wavelength ?max(D1) within a range of 680 to 730 nm, and the difference between a wavelength at which a transmittance is 80% on the shorter wavelength side than ?max(D1) when the concentration is adjusted such that a transmittance at ?max(D1) is 10%, and ?max(D1) is 100 nm or less. (2) The dye (D2) has a maximum absorption wavelength ?max(D2) within a range of 720 to 770 nm. (3) A value obtained by subtracting ?max(D1) from ?max(D2) is 30 nm or more and 85 nm or less.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: July 25, 2023
    Assignee: AGC Inc.
    Inventors: Kazuhiko Shiono, Nanako Nishimoto, Sayuri Yamada, Hiroki Hotaka, Satoshi Okada, Keigo Matsuura
  • Patent number: 11693163
    Abstract: An optical filter includes an absorption layer which increases a visible light transmittance while having a good near-infrared blocking characteristic, and which is excellent in not only adhesiveness with respect to a layer to be abutted, but also light resistance. The optical filter includes: an absorption layer containing a near-infrared absorbing dye containing a squarylium-based dye and a transparent resin; and an inorganic or organic material in contact with the absorption layer. The squarylium-based dye has a squarylium skeleton and condensed ring structures bonded thereto respectively on both sides thereof, the condensed ring structures each including a benzene ring and a nitrogen atom as an annular atom, each benzene ring having an urethane structure in the second position.
    Type: Grant
    Filed: September 10, 2020
    Date of Patent: July 4, 2023
    Assignee: AGC Inc.
    Inventors: Kazuhiko Shiono, Keigo Matsuura, Sayuri Higashitamori, Hiroki Hotaka
  • Publication number: 20230133905
    Abstract: Provided are a curable composition and an application thereof. The curable composition contains: a compound A having a polymerizable group (a) and an oxyfluoroalkylene group; a polymerization initiator; and a compound B having a polymerizable group different from the polymerizable group (a). The polymerizable group (a) in the compound A is at least one selected from the group consisting of a vinylphenyl group, a vinylphenyloxy group, a vinylbenzyloxy group, a vinyloxy group, a vinyloxycarbonyl group, a vinylamino group, a vinylaminocarbonyl group, a vinylthio group, an allyloxy group, an allyloxycarbonyl group, an allylamino group, an allylaminocarbonyl group, an allylthio group, an epoxy group, and an epoxycycloalkyl group.
    Type: Application
    Filed: December 27, 2022
    Publication date: May 4, 2023
    Applicant: AGC Inc.
    Inventors: Takefumi ABE, Saki TAKEI, Kaori TSURUOKA, Keigo MATSUURA, Yoshitaka NOMURA, Nobuyuki OTOZAWA, Tomoaki SAKURADA
  • Patent number: 11542407
    Abstract: To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer, and a method for producing it. A fluorinated ether compound represented by A-O—(Rf1O)m—Rf2-Z1-Q1 (R1)b, wherein A is a C1-20 perfluoroalkyl group, Rf1 is a linear fluoroalkylene group, m is an integer of from 2 to 500, Rf2 is a linear fluoroalkylene group, Z1 is a single bond, —(CR2R3)c— (wherein R2 and R3 are a hydrogen atom, a C1-6 monovalent organic group or the like, and c is an integer of from 1 to 10), a specific bond or a bivalent organic group having a specific bond, Q1 is a group having a (b+1) valent ring, R1 is a monovalent organic group having at least one hydrolyzable silyl group, and b is an integer of at least 2.
    Type: Grant
    Filed: January 28, 2020
    Date of Patent: January 3, 2023
    Assignee: AGC Inc.
    Inventors: Taiki Hoshino, Keigo Matsuura, Eiichiro Anraku, Masahiro Ito, Hiromasa Yamamoto, Motoshi Aoyama, Yusuke Tomiyori, Yutaka Furukawa
  • Patent number: 11525031
    Abstract: A fluorinated ether compound represented by A-O—(Rf1O)m—Rf2—[C(O)N(R1)]p-Q1-C(R2)[-Q2-SiR3nL3-n]2, wherein A is a C1-20 perfluoroalkyl group, Rf1 is a linear fluoroalkylene group, m is an integer of from 2 to 500, Rf2 is a linear fluoroalkylene group, R1 is a hydrogen atom or an alkyl group, p is 0 or 1, Q1 is a single bond or an alkylene group, R2 is a hydrogen atom, a monovalent hydrocarbon group or the like, Q2 is an alkylene group, R3 is a hydrogen atom or a monovalent hydrocarbon group, L is a hydrolyzable group, and n is an integer of from 0 to 2 is provided. A fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer, and a method for producing it are also provided.
    Type: Grant
    Filed: January 28, 2020
    Date of Patent: December 13, 2022
    Assignee: AGC Inc.
    Inventors: Taiki Hoshino, Keigo Matsuura, Makoto Uno, Masahiro Ito, Kenji Ishizeki, Lilin Zhou, Daisuke Kobayashi
  • Patent number: 11365285
    Abstract: A fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer and a method for producing it are provided. The fluorinated ether compound is represented by A-O—(Rf1O)m-Q1(R1)b, wherein A is a C1-20, perfluoroalkyl group, Rf1 is a perfluoroalkylene group, m is an integer of from 2 to 500, (Rf1O)m a n d may consist of two or more types of Rf1O differing in the number of carbon atoms, Q1 is a (b+1) valent perfluorohydrocarbon group which may have a hydroxy group, R1 is a monovalent organic group having at least one hydrolyzable silyl group, b is an integer of at least 2, and the b R1 may be the same or different.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: June 21, 2022
    Assignee: AGC Inc.
    Inventors: Makoto Uno, Hiromasa Yamamoto, Taiki Hoshino, Keigo Matsuura, Eiichiro Anraku
  • Patent number: 11208529
    Abstract: To provide a fluorinated ether compound capable of forming a surface layer excellent in fingerprint stain removability and abrasion resistance as before and more excellent in light resistance than ever. A fluorinated ether compound represented by A1—O—(Rf1O)m—A2, wherein A1 is a perfluoroalkyl group or the like, A2 is —Q1[—C(R11)b(R12)3?b]a or the like, Rf1 is a fluoroalkylene group, m is from 2 to 500, Q1 is a a+1 valent organic group, R11 is —Q2—Si(R21)c(R22)d(R23)e, R12 is a hydrogen atom, a halogen atom or the like, a is an integer of from 1 to 3, b is 2 or 3, Q2 is a single bond or a bivalent organic group, R21 is —Q3—Si(R31)3?g(R32)g, R22 is an alkyl group, R23 is a hydrolyzable group or a hydroxy group, c, d and e are from 0 to 3, c+d+e is 3, c in at last one R11 among a plurality of R11 is 2 or 3, Q3 is a bivalent organic group, R31 is an alkyl group, R32 is a hydrolyzable group or a hydroxy group, and g is from 1 to 3.
    Type: Grant
    Filed: April 2, 2020
    Date of Patent: December 28, 2021
    Assignee: AGC Inc.
    Inventors: Yutaka Furukawa, Taiki Hoshino, Keigo Matsuura, Makoto Uno, Eiichiro Anraku
  • Publication number: 20210348024
    Abstract: To provide a composition with which a surface layer excellent in abrasion resistance and sliding resistance can be formed, and an article. The composition of the present invention comprises a compound represented by the formula (1) and a compound represented by the formula (2), wherein the ratio of the number of moles of the group represented by —CF3 in Rf1 in the formula (1) to the total of the number of moles of the group represented by —CF2— closest to Y1 in Rf2 in the formula (1), the number of moles of the group represented by —CF2— closest to Y2 in Rf3 in the formula (2) and the number of moles of the group represented by —CF2— closest to Y3 in Rf3 in the formula (2), is from 0.001 to 0.
    Type: Application
    Filed: July 20, 2021
    Publication date: November 11, 2021
    Applicant: AGC Inc.
    Inventors: Keigo MATSUURA, Taiki HOSHINO, Kiyotaka TAKAO, Makoto UNO, Eiichiro ANRAKU, Motoshi AOYAMA, Naoki KATSUKI, Yusuke TOMIYORI, Toyokazu ENTA, Hiromasa YAMAMOTO
  • Publication number: 20210269591
    Abstract: A fluorinated ether compound and a composition capable of forming a light resistant surface layer and an article are provided. The fluorinated ether compound of the present invention has a poly(oxyfluoroalkylene) chain, a reactive silyl group and a group (A) represented by —NR—C(O)— (wherein R is a hydrogen atom or an alkyl group), wherein the carbonyl carbon in the group (A) is bonded to a carbon atom, and the poly(oxyfluoroalkylene) chain is located at the nitrogen end of the group (A).
    Type: Application
    Filed: May 17, 2021
    Publication date: September 2, 2021
    Applicant: AGC Inc.
    Inventors: Keigo MATSUURA, Eiichiro ANRAKU, Ryuta TAKASHITA, Koki WATANABE, Makoto UNO, Koichi MURATA, Takafumi KAWAKAMI
  • Publication number: 20210269592
    Abstract: A fluorinated compound and a fluorinated compound-containing composition which enable formation of a surface layer having high friction resistance and fingerprint marks removability even if the fluorinated compound has a fluorinated organic group having a shorter chain are provided. A coating liquid, an article including the surface layer on its surface, and a method of producing the same are also provided. A fluorinated compound represented by [(Rf-A-)2N-]a1Q1[-T]b1 (wherein Rf: a fluoroalkyl group or a group having —O— between carbon atoms of a fluoroalkyl group having two or more carbon atoms, A: a divalent organic group having no fluorine atom, Q1: a a1+b1 valent organic group, T: —Si(R)3-c(L)c, R: an alkyl group, L: a hydrolyzable group or a hydroxyl group, a1: an integer of 1 or more, b1: an integer of 2 or more, and c: 2 or 3).
    Type: Application
    Filed: May 10, 2021
    Publication date: September 2, 2021
    Applicant: AGC Inc.
    Inventors: Eiichiro ANRAKU, Keigo MATSUURA, Taiki HOSHINO
  • Patent number: 11059977
    Abstract: Provided is a near-infrared-absorbing dye increasing a visible light transmittance and having a near-infrared blocking characteristic. The near-infrared-absorbing dye has an absorption characteristic measured by dissolving the dye in dichloromethane satisfying the following requirements. ?In an absorption spectrum at a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in a wavelength region of 670 nm or more. ?The following relational expression is established between a maximum absorption constant ?A with respect to light with a wavelength of 430 to 550 nm and a maximum absorption constant ?B with respect to light with a wavelength of 670 nm or more, where ?B/?A?65. ?In a spectral transmittance curve, an average transmittance of light with a wavelength of 430 to 460 nm is 94.0% or more when a transmittance at the maximum absorption wavelength ?max is set to 1%.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: July 13, 2021
    Assignee: AGC Inc.
    Inventors: Noriaki Miyake, Satoshi Okada, Jun Irisawa, Teppei Konishi, Keigo Matsuura
  • Publication number: 20200408974
    Abstract: An optical filter includes an absorption layer which increases a visible light transmittance while having a good near-infrared blocking characteristic, and which is excellent in not only adhesiveness with respect to a layer to be abutted, but also light resistance. The optical filter includes: an absorption layer containing a near-infrared absorbing dye containing a squarylium-based dye and a transparent resin; and an inorganic or organic material in contact with the absorption layer. The squarylium-based dye has a squarylium skeleton and condensed ring structures bonded thereto respectively on both sides thereof, the condensed ring structures each including a benzene ring and a nitrogen atom as an annular atom, each benzene ring having an urethane structure in the second position.
    Type: Application
    Filed: September 10, 2020
    Publication date: December 31, 2020
    Applicant: AGC, Inc.
    Inventors: Kazuhiko SHIONO, Keigo MATSUURA, Sayuri HAGASHITAMORI, Hiroki HOTAKA
  • Patent number: 10809428
    Abstract: An optical filter includes an absorption layer which increases a visible light transmittance while having a good near-infrared blocking characteristic, and which is excellent in not only adhesiveness with respect to a layer to be abutted, but also light resistance. The optical filter includes: an absorption layer containing a near-infrared absorbing dye containing a squarylium-based dye and a transparent resin; and an inorganic or organic material in contact with the absorption layer. The squarylium-based dye has a squarylium skeleton and condensed ring structures bonded thereto respectively on both sides thereof, the condensed ring structures each including a benzene ring and a nitrogen atom as an annular atom, each benzene ring having an urethane structure in the second position.
    Type: Grant
    Filed: November 8, 2017
    Date of Patent: October 20, 2020
    Assignee: AGC Inc.
    Inventors: Kazuhiko Shiono, Keigo Matsuura, Sayuri Higashitamori, Hiroki Hotaka
  • Patent number: 10745572
    Abstract: An optical filter includes an absorption layer containing a near-infrared absorbing dye with an absorption characteristic in dichloromethane satisfying (i-1) to (i-3). (i-1) In an absorption spectrum of a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in 670 to 730 nm. (i-2) Between a maximum absorption coefficient ?A of light with a wavelength of 430 to 550 nm and a maximum absorption coefficient ?B of light with a wavelength of 670 to 730 nm, the following relational expression: ?B/?A?65 is established. (i-3) In a spectral transmittance curve, the difference between a wavelength ?80 with which the transmittance becomes 80% on a shorter wavelength side than the maximum absorption wavelength with the transmittance at the maximum absorption wavelength ?max set to 10% and the maximum absorption wavelength ?max is 65 nm or less.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: August 18, 2020
    Assignee: AGC Inc.
    Inventors: Kazuhiko Shiono, Keigo Matsuura, Hiroki Hotaka