Abstract: Disclosed is a computation device for optimizing photovoltaic power generation by computing a wire connection pattern of a plurality of photovoltaic modules, the computation device including a parameter acquisition unit configured to acquire a parameter including at least a current value from each of the photovoltaic modules; a class classification unit configured to perform class classification of the photovoltaic modules based on the parameter acquired by the parameter acquisition unit; and a wire connection pattern selection unit configured to select the wire connection pattern based on the class classification performed by the class classification unit.

Abstract: The present invention relates to a lithographic printing plate material for CTP, which comprises a substrate, a photosensitive layer formed on the substrate, and a dye-containing layer formed on the photosensitive layer, wherein the photosensitive layer is formed by a photosensitive composition comprising a halomethyl group-containing compound and an organoboron anion-containing compound, and wherein the dye-containing layer is formed by a composition for dye-containing layer, which comprises a near-infrared-absorbing dye. Accordingly, the present invention can provide a lithographic printing plate material for CTP comprising a substrate, a photosensitive layer and a dye-containing layer formed on the photosensitive layer, a producing method therefor, as well as a method for producing a printing plate from the printing plate material and a printing prate produced thereby.

Abstract: A photosolder resist composition of the invention is characterized by containing (A) a resin containing radical polymerization groups and carboxyl groups obtained by adding a cyclic ether group of a cyclic ether group-containing vinyl monomer to a carboxylic group of a radical copolymer containing at least isobornyl (meth) acrylate and a carboxyl group-containing vinyl monomer as monomer units; (B) an inorganic filler; and (C) a photocurable mixture of a polyfunctional acrylic monomer (c1), a cyclic ether group-containing compound (c2), and a photopolymerization initiator (c3).

Abstract: The method of the present invention is a method for forming a solder-resist film on a circuit board having patterned circuit conductor parts at least on one face and involves steps of forming a resin layer between neighboring circuit conductor parts by applying a liquid-phase curable resin so as to fill grooves between the neighboring circuit conductor parts and forming a solder-resist film by applying a solder resist to the circuit board having the resin layer.

Abstract: A photosolder resist composition is characterized by containing (A) a resin containing radical polymerization groups and carboxyl groups obtained by adding a cyclic ether group of a cyclic ether group-containing vinyl monomer to a carboxylic group of a radical copolymer containing at least a vinyl aromatic compound and a carboxyl group-containing vinyl monomer as monomer units; (B) an inorganic filler; (C) a photocurable mixture composed of a polyfunctional acrylic monomer (c1), a cyclic ether group-containing compound (c2) and a photopolymerization initiator (c3).

Abstract: A photosolder resist composition of the invention is characterized by containing (A) a resin containing radical polymerization groups and carboxyl groups obtained by adding a cyclic ether group of a cyclic ether group-containing vinyl monomer to a carboxylic group of a radical copolymer containing at least isobornyl (meth) acrylate and a carboxyl group-containing vinyl monomer as monomer units; (B) an inorganic filler; and (C) a photocurable mixture of a polyfunctional acrylic monomer (c1), a cyclic ether group-containing compound (c2), and a photopolymerization initiator (c3).

Abstract: Disclosed are aqueous photosolder resist compositions containing (A) an aqueous solution prepared by neutralizing a resin containing a free-radically polymerizable group and a carboxyl group with a base; (B) an inorganic filler; (C) a photocurable mixture of (c-1) a multifunctional acrylic monomer, (c-2) a compound having a cyclic ether group other than a glycidyl group and (c-3) a photoinitiator; and optionally (D) an aqueous solution prepared by neutralizing a frege-radically polymerized substance having an acid value of 130-230 mgKOH/mg. The cyclic ether group other than a glycidyl group is an alicyclic epoxy or oxetane group, for example.

Abstract: An apparatus and a method for processing water wash photopolymer solution includes a washout unit for washing a flexographic printing plate with water, a holding tank for holding an effluent from the washout unit, and a mixing cone for mixing an amount of the effluent supplied from the holding tank with a coagulant so as to coagulate a solid content of the effluent with the coagulant.

Abstract: The present invention provides a catalyst composition for producing a polyether polyamine, comprising:(a) ruthenium and(b) at least one of metals selected from the group consisting of palladium, platinum, rhodium, osmium, iridium, rhenium, technetium, molybdenum and tungsten on a carrier.