Patents by Inventor Keiji Emoto

Keiji Emoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7218020
    Abstract: Outflow of heat generated by a linear motor to the outside is suppressed. A linear motor according to the present invention is a linear motor used in a vacuum atmosphere, including a stator, a movable element movable relative to the stator, and a metal film formed on the surface of at least one of the stator and the movable element. This decreases the emissivity and reduces the outflow of heat by radiation from the linear motor.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: May 15, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Keiji Emoto
  • Patent number: 7177007
    Abstract: An exposure apparatus including an illumination optical unit for irradiating exposure light, a stage for mounting a substrate and moving the substrate, a driving unit for driving the stage, a heater for applying heat to the stage, and a heat generation amount control unit for controlling heat generation amount to suppress a temperature change of the stage before or after driving of the driving unit or a temperature change of the stage before or after irradiating of the illumination optical unit.
    Type: Grant
    Filed: April 20, 2006
    Date of Patent: February 13, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Keiji Emoto
  • Patent number: 7158232
    Abstract: In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.
    Type: Grant
    Filed: February 15, 2006
    Date of Patent: January 2, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kotaru Akutsu, Keiji Emoto
  • Patent number: 7154588
    Abstract: An alignment apparatus includes a first support member having a reference surface which movably supports an object, a driving unit which moves the object in at least one direction on the reference surface and aligns the object at a predetermined position, and a second support member which is provided separately from the first support member and supports a heating unit of the driving unit through a bearing.
    Type: Grant
    Filed: April 19, 2006
    Date of Patent: December 26, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventor: Keiji Emoto
  • Publication number: 20060220478
    Abstract: Disclosed is a positioning system and an exposure apparatus having the same, wherein in accordance with an aspect of the present invention the positioning system includes a stage being movable and being configured to carry an object thereon, an interferometer configured to measure a position of the stage, a driving system configured to drive the stage, and a heater provided between a light path of the interferometer and a coil which is a component element of the driving system. In one preferred form of the present invention, the heater has a film-like shape or it is formed as a portion of a cooling jacket that is configured to cover the coil.
    Type: Application
    Filed: March 30, 2006
    Publication date: October 5, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Keiji Emoto
  • Publication number: 20060187438
    Abstract: An exposure apparatus including an illumination optical unit for irradiating exposure light, a stage for mounting a substrate and moving the substrate, a driving unit for driving the stage, a heater for applying heat to the stage, and a heat generation amount control unit for controlling heat generation amount to suppress a temperature change of the stage before or after driving of the driving unit or a temperature change of the stage before or after irradiating of the illumination optical unit.
    Type: Application
    Filed: April 20, 2006
    Publication date: August 24, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Keiji Emoto
  • Publication number: 20060187437
    Abstract: An alignment apparatus includes a first support member having a reference surface which movably supports an object, a driving unit which moves the object in at least one direction on the reference surface and aligns the object at a predetermined position, and a second support member which is provided separately from the first support member and supports a heating unit of the driving unit through a bearing.
    Type: Application
    Filed: April 19, 2006
    Publication date: August 24, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Keiji Emoto
  • Publication number: 20060158650
    Abstract: In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.
    Type: Application
    Filed: February 15, 2006
    Publication date: July 20, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kotaro Akutsu, Keiji Emoto
  • Patent number: 7064804
    Abstract: An exposure apparatus having an illumination optical unit for emitting exposure light, a stage for supporting a substrate, and a main controller for controlling exposure operation of transferring a pattern formed on a master to the substrate. The apparatus includes a controller for controlling a Peltier element on the basis of an operation control signal from the main controller, and controlling heat movement by the Peltier element, the Peltier element being set at or near an object to be temperature-controlled in real time.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: June 20, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventor: Keiji Emoto
  • Patent number: 7057703
    Abstract: An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation device which generates the pure water flowing in the channel as the coolant with a resistivity of not less than 1 M?·cm.
    Type: Grant
    Filed: May 13, 2005
    Date of Patent: June 6, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Keiji Emoto, Hirohide Matsuhisa, Kotaro Akutsu
  • Patent number: 7053982
    Abstract: An alignment apparatus includes a first support member having a reference surface which movably supports an object, and a driving unit which moves the object in at least one direction on the reference surface and aligns the object at a predetermined position. The driving unit includes (i) a first driving unit which moves the object in a first direction, and (ii) a second driving unit which moves the object in a second direction, substantially perpendicular to the first direction. The alignment apparatus further includes a second support member which is provided separately from the first support member and supports a heating unit of the driving unit, through a bearing. The first support member supports the object so as to allow the object to move in the first and second directions, and the second support member supports the first and second driving units.
    Type: Grant
    Filed: May 18, 2004
    Date of Patent: May 30, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventor: Keiji Emoto
  • Publication number: 20060107769
    Abstract: Disclosed is a temperature adjusting system for adjusting temperature of a sample, that includes a sample container for containing a sample therein, and a cooling unit for applying a liquid to a surface of the sample container, to cool the sample on the basis of heat of vaporization of the liquid on the surface of the sample container.
    Type: Application
    Filed: November 10, 2005
    Publication date: May 25, 2006
    Inventor: Keiji Emoto
  • Patent number: 7038759
    Abstract: An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the pure water flowing in the channel, and a coolant generation device which generates the pure water flowing in the channel as the coolant with a resistivity of not less than 1 M?·cm.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: May 2, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Keiji Emoto, Hirohide Matsuhisa, Kotaro Akutsu
  • Patent number: 7012690
    Abstract: In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.
    Type: Grant
    Filed: November 30, 2004
    Date of Patent: March 14, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kotaro Akutsu, Keiji Emoto
  • Publication number: 20060028629
    Abstract: An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the coolant flowing in the channel, and a UV sterilization unit which performs UV sterilization processing for the coolant flowing in the channel.
    Type: Application
    Filed: October 7, 2005
    Publication date: February 9, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Keiji Emoto, Hirohide Matsuhisa, Kotaro Akutsu
  • Patent number: 6982782
    Abstract: An apparatus for processing an object includes a vessel which forms a pressure-reduced inner space and accommodates the object, a member which is supported by an inner side of the vessel through a heat insulator, and a temperature adjusting portion which adjusts a temperature of the member.
    Type: Grant
    Filed: March 9, 2004
    Date of Patent: January 3, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventor: Keiji Emoto
  • Publication number: 20050285451
    Abstract: In a linear motor, each arrayed coil unit (160) of a stator yoke (151) is divided into an upper coil (161) and lower coil (162). A cooling pipe (153) is interposed between the upper coil (161) and the lower coil (162).
    Type: Application
    Filed: May 27, 2005
    Publication date: December 29, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiroyoshi Kubo, Keiji Emoto
  • Publication number: 20050280790
    Abstract: An apparatus for processing an object includes a vessel which forms a pressure-reduced inner space and accommodates the object, a member which is supported by an inner side of the vessel through a heat insulator, and a temperature adjusting portion which adjusts a temperature of the member.
    Type: Application
    Filed: August 1, 2005
    Publication date: December 22, 2005
    Inventor: Keiji Emoto
  • Patent number: 6972499
    Abstract: Outflow of heat generated by a linear motor to the outside is suppressed. A linear motor according to the present invention is a linear motor used in a vacuum atmosphere, including a stator, a movable element movable relative to the stator, and a metal film formed on the surface of at least one of the stator and the movable element. This decreases the emissivity and reduces the outflow of heat by radiation from the linear motor.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: December 6, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Keiji Emoto
  • Publication number: 20050253463
    Abstract: Provided herein is a stage apparatus comprising a movable element including a plurality of magnets, a stage fixed to the movable element, and a stator configured with layers of coils arranged opposite to the magnets with a gap, in which respective layers of coils 1 to 3 and 14 serve as a plurality of driving axes for driving the movable element in two-dimensional directions, and applying power to coils corresponding to respective layers enables generation of driving force in the movable stage. In this stage apparatus, a conductive area of a section having a normal in a coil winding direction is made so that heat generation amounts of coils corresponding to the respective layers are substantially equal.
    Type: Application
    Filed: May 11, 2005
    Publication date: November 17, 2005
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Keiji Emoto