Patents by Inventor Keita Kato

Keita Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200380478
    Abstract: An API management device includes: a reception unit configured to receive a selection of a charging condition when using an API; a receiver configured to receive a request for the API from the application; a transmitter configured to transmit a response according to the request to the application; and a history storage configured to store a history of the request for the API and the response for each of the applications that use the API. A charging management device includes: a charging condition storage configured to store the charging condition received by the reception unit for each of the applications that use the API when using the API; an acquisition unit configured to acquire information on the history from the history storage; and a determination unit configured to determine a charge value for the application that uses the API based on the charging condition and the information on the history.
    Type: Application
    Filed: November 1, 2018
    Publication date: December 3, 2020
    Inventors: Keita Omori, Kohei Kato, Eijiro Hoshi
  • Patent number: 10811612
    Abstract: An organic electroluminescence device including a cathode, an anode, and an emitting layer disposed between the cathode and the anode, wherein the emitting layer contains a compound represented by the following formula (1) and one or more compounds selected from the group consisting of compounds represented by formulas (11), (21), (31), (41), (51), (61), (71) and (81). In the formula (1), at least one of R1 to R8 is a deuterium atom.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: October 20, 2020
    Assignee: IDEMITSU KOSAN CO., LTD.
    Inventors: Yuki Nakano, Taro Yamaki, Satomi Tasaki, Tomoki Kato, Keita Seda, Ryota Takahashi
  • Patent number: 10802399
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: October 13, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Nishio, Masafumi Kojima, Akiyoshi Goto, Tomotaka Tsuchimura, Michihiro Shirakawa, Keita Kato
  • Patent number: 10776927
    Abstract: A motion information calculation unit acquires motion information between a plurality of target images. An occlusion information calculation unit generates occlusion information between the target images. An image interpolation processing unit determines priority of the motion information based on the motion information and the occlusion information, and performs predetermined image processing for the target images by using motion information that is weighted based on the priority.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: September 15, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Keita Kato
  • Patent number: 10761424
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: September 1, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Nishio, Masafumi Kojima, Akiyoshi Goto, Tomotaka Tsuchimura, Michihiro Shirakawa, Keita Kato
  • Patent number: 10744767
    Abstract: A liquid ejection device is disclosed. One device includes a liquid supply member defining a liquid supply channel that is in communication with a common liquid chamber via an outlet of the liquid supply channel. The outlet and the common liquid chamber extend along a longitudinal direction respectively. The liquid supply member includes a plurality of ribs located within the liquid supply channel, the plurality of ribs are disposed side by side in the longitudinal direction. The plurality of ribs includes a first rib, a second rib and a third rib. A distance from the first rib to the third rib in the longitudinal direction is smaller than a distance from the first rib to the second rib in the longitudinal direction.
    Type: Grant
    Filed: August 27, 2018
    Date of Patent: August 18, 2020
    Assignee: BROTHER KOGYO KABUSHIKI KAISHA
    Inventors: Taisuke Mizuno, Yasuo Kato, Takashi Aiba, Keita Sugiura
  • Publication number: 20200225198
    Abstract: The invention relates to an immunochromatographic device which contains a nitrous acid compound and an organic acid or an organic acid derivative and which is for detecting a detection target in an analyte wherein a sample droplet-receiving member, a labeling substance-holding member, a chromatography medium member and an absorption member are arranged in a manner that a sample develops in this order and wherein a part containing the nitrous acid compound and a part containing the organic acid or the like are at upstream positions from the labeling substance-containing part, and the part containing the nitrous acid compound and the part containing the organic acid or the like are not substantially in contact with each other in the thickness direction.
    Type: Application
    Filed: March 3, 2017
    Publication date: July 16, 2020
    Inventors: Keita SUZUKI, Yuya KATO, Hisahiko IWAMOTO
  • Publication number: 20200112234
    Abstract: An excitation operation brake includes a braking shaft, an armature that rotates integrally with the braking shaft, and a field core including a disc portion facing the armature. The disc portion includes an outer magnetic shielding portion and an inner magnetic shielding portion, which make a magnetic flux flowing through the disc portion bypass to the armature a plurality of times. The outer magnetic shielding portion includes a bypass magnetic path having a magnetic resistance smaller than the magnetic resistance of a magnetic path that bypasses the armature.
    Type: Application
    Filed: October 2, 2019
    Publication date: April 9, 2020
    Inventors: Yasuo KIDENA, Keita NAKASHIMA, Takeshi MAEDA, Motoi KATO, Yoshihiro KUROSU, Hiroyasu ONAI, Kosuke MURAKAMI
  • Publication number: 20200111965
    Abstract: An organic electroluminescence device including a cathode, an anode, and an emitting layer disposed between the cathode and the anode, wherein the emitting layer contains a compound represented by the following formula (1) and one or more compounds selected from the group consisting of compounds represented by formulas (11), (21), (31), (41), (51), (61), (71) and (81). In the formula (1), at least one of R1 to R8 is a deuterium atom.
    Type: Application
    Filed: September 30, 2019
    Publication date: April 9, 2020
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Yuki NAKANO, Taro YAMAKI, Satomi TASAKI, Tomoki KATO, Keita SEDA, Ryota TAKAHASHI
  • Publication number: 20200111962
    Abstract: An organic electroluminescence device including a cathode, an anode, and an emitting layer disposed between the cathode and the anode, wherein the emitting layer includes a compound represented by the following formula (1) and one or more compounds selected from the group consisting of compounds represented by formulas (11), (21), (31), (41), (51), (61), (71) and (81), In the formula (1), at least one of R1 to R8 is a deuterium atom,
    Type: Application
    Filed: July 17, 2019
    Publication date: April 9, 2020
    Applicant: Idemitsu Kosan Co., Ltd.
    Inventors: Yuki NAKANO, Taro YAMAKI, Satomi TASAKI, Tomoki KATO, Keita SEDA, Ryota TAKAHASHI
  • Publication number: 20200012189
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (1). In General Formula (1), X represents a sulfur atom or an iodine atom. m represents 1 or 2, in a case where X is a sulfur atom, m is 2, and in a case where X is an iodine atom, m is 1. R1's each independently represent an alkyl group or alkenyl group which may include a heteroatom, an aromatic heterocyclic group, or an aromatic hydrocarbon ring group. Further, in a case where m is 2, two R1's may be bonded to each other to form a ring. R2 represents a divalent linking group. R3 represents a divalent linking group having no aromatic group. Y? represents an anionic moiety. The pKa of the compound represented by General Formula (1) as Y? is protonated is ?2.0 to 1.5.
    Type: Application
    Filed: July 10, 2019
    Publication date: January 9, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Akiyoshi GOTO, Masafumi KOJIMA, Akira TAKADA, Keita KATO, Kyohei SAKITA
  • Publication number: 20190377261
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.
    Type: Application
    Filed: August 21, 2019
    Publication date: December 12, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi Yamamoto, Akiyoshi Goto, Keita Kato
  • Publication number: 20190305644
    Abstract: A rotating electric machine includes a case, a stator, a first rotary member including a rotor core and a first shaft, a second rotary member including a second shaft, and a multiple disc clutch. A first oil passage and a second oil passage are provided inside the case. The first oil passage starts from an inside of the first shaft or an inside of the second shaft, passes through the multiple disc clutch from an inner side to an outer side in a radial direction with respect to a rotation center, and reaches an inner side of the rotor core in the radial direction. The second oil passage starts from the inside of the first shaft or the inside of the second shaft and reaches the inner side of the rotor core in the radial direction without passing through the multiple disc clutch.
    Type: Application
    Filed: March 22, 2019
    Publication date: October 3, 2019
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Shigeki IDEUE, Koji KATO, Keita INDA, Toshihiko KAMIYA, Tatsuya OKISHIMA
  • Publication number: 20190294043
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of ?1.40 or more upon irradiation with actinic rays or radiation, and (B) a resin having a repeating unit containing an acid-decomposable group, in which an Eth sensitivity of the repeating unit containing an acid-decomposable group is 5.64 or less, and which can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern; a photoacid generator; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: June 5, 2019
    Publication date: September 26, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke Asakawa, Akiyoshi Goto, Masafumi Kojima, Keita Kato, Keiyu Ou, Kyohei Sakita
  • Publication number: 20190294042
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which satisfies a relational expression represented by a specific formula in a case where an exposure latitude is represented by EL and an normalized image log slope is represented by NILS, in which the actinic ray-sensitive or radiation-sensitive resin composition can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern (for example, a contact hole pattern having a hole diameter of 45 nm or less, or a line-and-space pattern having a line width of 45 nm or less); and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: June 5, 2019
    Publication date: September 26, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Keita KATO, Kyohei SAKITA, Daisuke ASAKAWA, Akiyoshi GOTO, Masafumi KOJIMA
  • Publication number: 20190214579
    Abstract: A compound represented by the formula (1) below. At least one set of two or more adjacent groups among R1 to R11 forms a substituted or unsubstituted heterocyclic ring, or forms a ring represented by the formula (2) below, or at least one of R1 to R4 is a group represented by the formula (3) below.
    Type: Application
    Filed: December 27, 2018
    Publication date: July 11, 2019
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Keita SEDA, Ryota TAKAHASHI, Tomoki KATO, Hidetsugu IKEDA, Yuki NAKANO
  • Publication number: 20190196326
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid represented by Formula (I) by irradiation with an actinic ray or radiation, and a resin. The resist film is formed of the actinic ray-sensitive or radiation-sensitive resin composition. In the pattern forming method and the method of manufacturing an electronic device, the actinic ray-sensitive or radiation-sensitive resin composition is used.
    Type: Application
    Filed: February 27, 2019
    Publication date: June 27, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Masafumi KOJIMA, Daisuke ASAKAWA, Akiyoshi GOTO, Keita KATO, Keiyu OU
  • Patent number: 10321089
    Abstract: An image reproduction apparatus includes an obtaining unit that obtains positions of a subject included in a captured moving image for individual frames, a tracking unit that tracks a movement of the subject specified as a tracking target when the moving image is reproduced, and a control unit that controls a display region using the obtained positions of the subject in a case where a difference between a position of the subject specified as the tracking target and the position of the subject obtained by the obtaining unit at a time of image shooting is within a predetermined range, and controls a display region using the position of the subject specified as the tracking target that is tracked by the tracking unit in a reproduction target frame in a case where the difference is not within the predetermined range.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: June 11, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Keita Kato
  • Patent number: 10261417
    Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).
    Type: Grant
    Filed: October 12, 2016
    Date of Patent: April 16, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Michihiro Shirakawa, Keita Kato, Fumihiro Yoshino, Kei Yamamoto
  • Patent number: 10248019
    Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: April 2, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Kaoru Iwato, Kana Fujii, Sou Kamimura, Yuichiro Enomoto, Keita Kato, Shuhei Yamaguchi