Patents by Inventor Keita Kato

Keita Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220179307
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin X including a repeating unit derived from a compound including two or more structural moieties consisting of an anionic moiety and a cationic moiety, and a polymerizable group, in which the compound generates an acid including an acidic moiety derived from the anionic moiety in the two or more structural moieties by irradiation with actinic rays or radiation.
    Type: Application
    Filed: February 23, 2022
    Publication date: June 9, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Akira TAKADA, Akiyoshi GOTO, Masafumi KOJIMA, Aina USHIYAMA, Michihiro SHIRAKAWA, Keita KATO, Hironori OKA, Mitsuhiro FUJITA, Yasuharu SHIRAISHI
  • Publication number: 20220082938
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.
    Type: Application
    Filed: November 28, 2021
    Publication date: March 17, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Aina USHIYAMA, Masafumi KOJIMA, Akiyoshi GOTO, Michihiro SHIRAKAWA, Keita KATO, Hironori OKA
  • Patent number: 11156917
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: October 26, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi Yamamoto, Akiyoshi Goto, Keita Kato
  • Patent number: 11073762
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of ?1.40 or more upon irradiation with actinic rays or radiation, and (B) a resin having a repeating unit containing an acid-decomposable group, in which an Eth sensitivity of the repeating unit containing an acid-decomposable group is 5.64 or less, and which can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern; a photoacid generator; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Grant
    Filed: June 5, 2019
    Date of Patent: July 27, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Daisuke Asakawa, Akiyoshi Goto, Masafumi Kojima, Keita Kato, Keiyu Ou, Kyohei Sakita
  • Patent number: 11067890
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (1). In General Formula (1), X represents a sulfur atom or an iodine atom. m represents 1 or 2, in a case where X is a sulfur atom, m is 2, and in a case where X is an iodine atom, m is 1. R1's each independently represent an alkyl group or alkenyl group which may include a heteroatom, an aromatic heterocyclic group, or an aromatic hydrocarbon ring group. Further, in a case where m is 2, two R1's may be bonded to each other to form a ring. R2 represents a divalent linking group. R3 represents a divalent linking group having no aromatic group. Y? represents an anionic moiety. The pKa of the compound represented by General Formula (1) as Y? is protonated is ?2.0 to 1.5.
    Type: Grant
    Filed: July 10, 2019
    Date of Patent: July 20, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Masafumi Kojima, Akira Takada, Keita Kato, Kyohei Sakita
  • Publication number: 20210072642
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.
    Type: Application
    Filed: November 19, 2020
    Publication date: March 11, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke ASAKAWA, Akiyoshi GOTO, Masafumi KOJIMA, Takashi KAWASHIMA, Yasufumi OISHI, Keita KATO
  • Patent number: 10902057
    Abstract: The present invention can, in relation to a single image file including a plurality of original images, record an image file including editing information that represents original image editing content while maintaining the original images. For doing so, an image processing apparatus that performs editing processing in relation to an image file that includes a plurality of images, comprises an editing unit configured to edit an original image in an image file that includes a plurality of original images and generate editing information for reproducing a post-editing image from the original image, and a recording unit configured to, by adding the editing information generated by the editing unit to the image file, record the editing information in the image file.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: January 26, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Keita Kato
  • Publication number: 20200393756
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having an excellent pattern collapse suppressing property and excellent LWR performance can be obtained. In addition, the present invention also provides a resist film, a pattern forming method, and a method for manufacturing an electronic device, each regarding the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin whose solubility in a developer is changed by the action of an acid, a photoacid generator represented by General Formula (b1), and a solvent, in which the photoacid generator represented by General Formula (b1) is a compound that generates an acid having a pka of 1.
    Type: Application
    Filed: August 26, 2020
    Publication date: December 17, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Keita KATO, Michihiro SHIRAKAWA, Akiyoshi GOTO, Takashi KAWASHIMA, Masafumi KOJIMA
  • Patent number: 10859914
    Abstract: A method for producing an electronic device includes the pattern forming method, and an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development. Specifically, provided is a pattern forming method, including a film forming step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition, an exposure step of irradiating the film, and a development step of developing the film using a developer containing an organic solvent, in which the composition contains a resin containing a repeating unit having an Si atom and a repeating unit having an acid-decomposable group and a compound capable of generating an acid upon irradiation with actinic rays or radiation, the content of Si atoms in the resin is 1.0 to 30 mass %, and the content of the resin in the total solid content of the composition is 20 mass % or more.
    Type: Grant
    Filed: July 24, 2017
    Date of Patent: December 8, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Naoya Hatakeyama, Akiyoshi Goto, Michihiro Shirakawa, Keita Kato, Keiyu Ou
  • Patent number: 10802399
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: October 13, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Nishio, Masafumi Kojima, Akiyoshi Goto, Tomotaka Tsuchimura, Michihiro Shirakawa, Keita Kato
  • Patent number: 10776927
    Abstract: A motion information calculation unit acquires motion information between a plurality of target images. An occlusion information calculation unit generates occlusion information between the target images. An image interpolation processing unit determines priority of the motion information based on the motion information and the occlusion information, and performs predetermined image processing for the target images by using motion information that is weighted based on the priority.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: September 15, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Keita Kato
  • Patent number: 10761424
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: September 1, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Nishio, Masafumi Kojima, Akiyoshi Goto, Tomotaka Tsuchimura, Michihiro Shirakawa, Keita Kato
  • Publication number: 20200012189
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (1). In General Formula (1), X represents a sulfur atom or an iodine atom. m represents 1 or 2, in a case where X is a sulfur atom, m is 2, and in a case where X is an iodine atom, m is 1. R1's each independently represent an alkyl group or alkenyl group which may include a heteroatom, an aromatic heterocyclic group, or an aromatic hydrocarbon ring group. Further, in a case where m is 2, two R1's may be bonded to each other to form a ring. R2 represents a divalent linking group. R3 represents a divalent linking group having no aromatic group. Y? represents an anionic moiety. The pKa of the compound represented by General Formula (1) as Y? is protonated is ?2.0 to 1.5.
    Type: Application
    Filed: July 10, 2019
    Publication date: January 9, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Akiyoshi GOTO, Masafumi KOJIMA, Akira TAKADA, Keita KATO, Kyohei SAKITA
  • Publication number: 20190377261
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.
    Type: Application
    Filed: August 21, 2019
    Publication date: December 12, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi Yamamoto, Akiyoshi Goto, Keita Kato
  • Publication number: 20190294043
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of ?1.40 or more upon irradiation with actinic rays or radiation, and (B) a resin having a repeating unit containing an acid-decomposable group, in which an Eth sensitivity of the repeating unit containing an acid-decomposable group is 5.64 or less, and which can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern; a photoacid generator; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: June 5, 2019
    Publication date: September 26, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke Asakawa, Akiyoshi Goto, Masafumi Kojima, Keita Kato, Keiyu Ou, Kyohei Sakita
  • Publication number: 20190294042
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which satisfies a relational expression represented by a specific formula in a case where an exposure latitude is represented by EL and an normalized image log slope is represented by NILS, in which the actinic ray-sensitive or radiation-sensitive resin composition can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern (for example, a contact hole pattern having a hole diameter of 45 nm or less, or a line-and-space pattern having a line width of 45 nm or less); and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: June 5, 2019
    Publication date: September 26, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Keita KATO, Kyohei SAKITA, Daisuke ASAKAWA, Akiyoshi GOTO, Masafumi KOJIMA
  • Publication number: 20190196326
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid represented by Formula (I) by irradiation with an actinic ray or radiation, and a resin. The resist film is formed of the actinic ray-sensitive or radiation-sensitive resin composition. In the pattern forming method and the method of manufacturing an electronic device, the actinic ray-sensitive or radiation-sensitive resin composition is used.
    Type: Application
    Filed: February 27, 2019
    Publication date: June 27, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Masafumi KOJIMA, Daisuke ASAKAWA, Akiyoshi GOTO, Keita KATO, Keiyu OU
  • Patent number: 10321089
    Abstract: An image reproduction apparatus includes an obtaining unit that obtains positions of a subject included in a captured moving image for individual frames, a tracking unit that tracks a movement of the subject specified as a tracking target when the moving image is reproduced, and a control unit that controls a display region using the obtained positions of the subject in a case where a difference between a position of the subject specified as the tracking target and the position of the subject obtained by the obtaining unit at a time of image shooting is within a predetermined range, and controls a display region using the position of the subject specified as the tracking target that is tracked by the tracking unit in a reproduction target frame in a case where the difference is not within the predetermined range.
    Type: Grant
    Filed: November 15, 2016
    Date of Patent: June 11, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Keita Kato
  • Patent number: 10261417
    Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).
    Type: Grant
    Filed: October 12, 2016
    Date of Patent: April 16, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Michihiro Shirakawa, Keita Kato, Fumihiro Yoshino, Kei Yamamoto
  • Patent number: 10248019
    Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: April 2, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Kaoru Iwato, Kana Fujii, Sou Kamimura, Yuichiro Enomoto, Keita Kato, Shuhei Yamaguchi