Abstract: A first semiconductor element according to one embodiment of the present disclosure includes an element substrate including an element region, a peripheral region, a readout circuit substrate, a first electrode, a second electrode, and an insulating layer. A wiring layer and a first semiconductor layer including a compound semiconductor material are provided as a stack in the element region. The peripheral region is outside the element region. The readout circuit substrate is opposed to the first semiconductor layer with the wiring layer interposed therebetween, and is electrically coupled to the first semiconductor layer with the wiring layer interposed therebetween. The first electrode is provided in the wiring layer and is electrically coupled to the first semiconductor layer. The second electrode is opposed to the first electrode with the first semiconductor layer interposed therebetween. The insulating layer is provided on the second electrode and has a non-reducing property.

Abstract: An enzyme sensor is configured to measure a measurement target substance included in a secretion of a living body. The enzyme sensor includes a layered structure including (a) an absorber layer configured to absorb the secretion, (b) an enzyme layer containing an enzyme, and (c) an electrode part arranged in an order of the (a), the (b), and the (c). The absorber layer includes a polymeric material having a chemically bound crosslinked structure.

Abstract: A resistive paste according to the present disclosure includes metal particles, insulating particles, glass particles, and a metal silicide. The metal particles include copper and nickel. The insulating particles include at least one of alumina, zirconia, zinc oxide, or boron nitride. A chip resistor according to the present disclosure includes a resistive element and a substrate. The resistive element includes the resistive paste as a material and is disposed on the substrate.

Abstract: A polishing method capable of appropriately controlling a temperature of a polishing surface of a polishing pad during polishing of a workpiece is disclosed. The polishing method includes detecting a surface condition of a sample while polishing the sample on a polishing surface of a polishing pad; creating time-series data representing temporal change in the surface condition of the sample; determining a point in time at which the surface condition of the sample has distinctively changed based on the time-series data; determining a temperature control time based on the determined point in time; and controlling a temperature of the polishing surface of the polishing pad based on the temperature control time, while polishing a workpiece on the polishing surface of the polishing pad.

Abstract: A semiconductor device includes a first pad to which a high voltage is to be input, a second pad to which a low voltage is to be input, a third pad to which a ground voltage is to be input, and a protection circuit provided between the first pad and the third pad. The protection circuit includes a first protection element group including a plurality of first transistors arranged in a first direction, a second protection element group including a plurality of second transistors arranged in the first direction and disposed apart from the first protection element group in a second direction orthogonal to the first direction, a guard ring provided around the first and second protection element groups, and an intermediate guard ring provided between the first protection element group and the second protection element group and connected to the third pad via a resistance element.

Abstract: Provided is an article position management apparatus that a receiver receives image data from a camera apparatus and that identifies a position of an article, based on an article marker attached to an article and a reference point marker whose coordinate information in an absolute coordinate system in a field is set in advance, the article marker and the reference point marker being included in the image data, when the camera apparatus is a mobile camera apparatus, and identifies the position of the article, based on the article marker included in the image, when the camera apparatus is a fixed camera apparatus.

Abstract: A medical treatment material that forms a hydrogel upon contact with water contains a polymer (A) including a structural unit derived from an ethylenic unsaturated monomer (ma) which has a carboxyl group and a molecular weight of 115 or less, and a polymer (B) including a structural unit derived from an ethylenic unsaturated monomer (mb) which has a functional group E that is capable of forming a hydrogen bond with a carboxyl group, the polymer (B) not being the polymer (A). At least one of the polymer (A) and the polymer (B) includes a structural unit derived from an ethylenic unsaturated monomer (mc) differing from the ethylenic unsaturated monomers (ma) and (mb), and the monomer (mc) is not an ethylenic unsaturated monomer having a cross-linkable functional group.

Abstract: The signal processing device includes: a beat sound frequency determination unit that determines an optimal beat sound frequency of a user on the basis of a brain wave signal of the user; and a binaural beat signal generation unit that acquires an ambient environment sound, converts a sample acoustic signal prepared in advance into a binaural beat, on the basis of an optimal beat sound frequency, and mixes the binaural-beat-converted sample acoustic signal with the ambient environment sound, to generate a binaural-beat-converted ambient environmental sound signal.

Abstract: A plug and a socket constitute a buckle. The plug includes a plug base and a pair of legs. At least one of the pair of legs includes a first extension extending from the plug base in an insertion direction of the plug, a second extension extending from the first extension in an inward width direction of the plug, an engagement portion provided on the first extension or the second extension to be engageable with a to-be-engaged portion of the socket in a detachment direction of the plug, and an operation portion provided on the second extension. When a force in the detachment direction is applied on the operation portion, the first extension is elastically deformed in the width direction of the plug in such a manner that a position of the engagement portion shifts from an engagement position to a disengagement position with respect to the to-be-engaged portion.

Abstract: The semiconductor device includes a control unit having redundant processors, a memory storing target data, a secure memory storing a key used for encryption or decryption processing, an cryptographic unit, a secure processor instructing cryptographic processing to the cryptographic unit in response to a request from the control unit, a first bus coupled to the control unit, the memory, the cryptographic unit, and the secure processor, and a second bus coupled to the secure memory, the cryptographic unit, and the secure processor. The control unit communicates with the memory via a predetermined error detection mechanism, the cryptographic unit includes a plurality of cryptographic processors that independently perform cryptographic processing on target data using a key based on an instruction, and each of the plurality of cryptographic processors includes a data transfer unit that performs data transfer with the memory via the error detection mechanism.

Abstract: The semiconductor device includes a control unit having redundant processors, a memory storing target data, a secure memory storing a key used for encryption or decryption processing, an cryptographic unit, a secure processor instructing cryptographic processing to the cryptographic unit in response to a request from the control unit, a first bus coupled to the control unit, the memory, the cryptographic unit, and the secure processor, and a second bus coupled to the secure memory, the cryptographic unit, and the secure processor. The control unit communicates with the memory via a predetermined error detection mechanism, the cryptographic unit includes a plurality of cryptographic processors that independently perform cryptographic processing on target data using a key based on an instruction, and each of the plurality of cryptographic processors includes a data transfer unit that performs data transfer with the memory via the error detection mechanism.

Abstract: A substrate processing method is provided. The substrate processing method includes: (S7) supplying a water repellent agent (SMT) to a substrate (W); (S11) supplying dilute isopropyl alcohol (dIPA) to the substrate (W) after the supplying a water repellent agent (SMT), the dilute isopropyl alcohol (dIPA) being obtained by diluting isopropyl alcohol; and (S12) drying the substrate (W) after the supplying dilute isopropyl alcohol (dIPA).

Abstract: A method with which the reception sensitivity of a communication device can be measured accurately and with satisfactory reproducibility and a method with which the effect of noise control performed upon a communication device can be accurately evaluated. A first communication device in a nonreflective environment in an anechoic chamber wirelessly receives a test signal transmitted from a pseudo base station through an attached antenna thereof at the same time when a second communication device near the first communication device receives the test signal through a signal line. The first communication device is simultaneously subjected to the interference of noise generated by the second communication device at the attached antenna. Thus, the noise is made to interfere with the attached antenna of the first communication device without disassembling the first communication device and moving the first communication device in the nonreflective environment.

Abstract: A lighting device to be installed in an instrument panel inside a vehicle to be used as an indirect lighting device to emit a light reflected on a surface of the instrument panel. The lighting device is installed at a space behind the instrument panel while being separated from a gap to serve as a light extraction slot of the instrument panel.

Abstract: A substrate treatment method includes a first gas treating step, a water-repellency treatment step, and a spraying step. In the first gas treating step, a first gas is supplied to the substrate inside the chamber in a state in which the inside of the chamber is decompressed. The first gas includes gas of an organic solvent. The water-repellency treatment step is executed after the first gas treating step. In the water-repellency treatment step, the inside of the chamber is in the decompressed state, and a water-repellent agent is supplied to the substrate inside the chamber. The spraying step is executed after the water-repellency treatment step. In the spraying step, the inside of the chamber is in the decompressed state, and a first liquid is sprayed over the substrate inside the chamber. The first liquid includes liquid of an organic solvent.

Abstract: The substrate treatment method includes a first decompressing step, a first pressurizing step, and a first atmospheric pressure step. In the first decompressing step, the inside of a chamber is in a decompressed state, and a first gas is supplied to a substrate inside the chamber. The first gas includes an organic solvent. The first pressurizing step is executed after the first decompressing step. In the first pressurizing step, mixed gas is supplied to the substrate inside the chamber, and the inside of the chamber is pressurized from the decompressed state to an atmospheric pressure state. The mixed gas includes an organic solvent and inert gas. The first atmospheric pressure step is executed after the first pressurizing step. In the first atmospheric pressure step, the inside of the chamber is maintained in the atmospheric pressure state, and at least any of liquid discharge treatment and substrate treatment is performed.

Abstract: Provided is a composition useful for preventing and/or treating neurodegenerative disorders such as Alzheimer's disease and Parkinson's disease. The composition is for preventing and/or treating a neurodegenerative disorder, and contains, as an active ingredient, a compound represented by the following formula (I): or an isomer thereof, or a salt thereof.

Abstract: A honeycomb structure includes a central area and a reinforced outer peripheral area. For a boundary cell having cell walls with different wall thicknesses on two sides parallel with an imaginary parallel line, a thin wall thickness t1<a thick wall thickness t3, an inner wall thickness t2<an outer wall thickness t4, t1=t2, and t3=t4. The honeycomb structure includes a cross-shaped unit having a thin wall, an inner wall, a cell wall, and a cell wall and a cross-shaped unit having a thick wall, an outer wall, a cell wall, and a cell wall. The honeycomb structure also includes cross-shaped units extending vertically and horizontally from alternate cell vertexes arranged from a cell vertex as a starting point. In the central area and the reinforced outer peripheral area, the cell walls of each cross-shaped unit have a substantially equal wall thickness.

Abstract: A honeycomb structure includes a central area and a reinforced outer peripheral area. A reference boundary cell with an inner wall orthogonal to an imaginary straight line, adjacent to the honeycomb center, and thinner than an outer wall adjacent to the honeycomb periphery has a reference wall different in wall thickness from the other three cell walls among the remaining four cell walls excluding the inner wall and the outer wall. The honeycomb structure includes a reference Y-shaped unit having the reference wall, the outer wall, and a cell wall. The honeycomb structure includes a plurality of Y-shaped units extending in the same directions as the reference Y-shaped unit. For every Y-shaped unit in the central area and the reinforced outer peripheral area of the honeycomb structure, the cell walls of each Y-shaped unit has an equal wall thickness.

Abstract: A substrate treatment method includes a rinsing step of performing treatment of a substrate with a rinse liquid, an immersing step of immersing the substrate in a diluted isopropyl alcohol (dIPA) stored in a treatment tank after the rinsing step, a first isopropyl alcohol treatment step of performing treatment of the substrate with an isopropyl alcohol after the immersing step, and a water-repellent treatment step of performing water-repellent treatment of the substrate after the first isopropyl alcohol treatment step.