Patents by Inventor Kenichi Watabe

Kenichi Watabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11942665
    Abstract: A separator member for a fuel cell includes: a first resin layer including a resin; and a graphite layer that is layered on the first resin layer and substantially made of graphite. The layering amount of the graphite layer is 50 g/m2 or less, and the volume resistivity of the graphite is 3 m?·cm or less.
    Type: Grant
    Filed: May 20, 2021
    Date of Patent: March 26, 2024
    Assignee: ARISAWA MFG. CO., LTD.
    Inventors: Akira Yoshida, Kio Miyaji, Kenichi Watabe
  • Publication number: 20230178758
    Abstract: A separator member for a fuel cell includes: a first resin layer including a resin; and a graphite layer that is layered on the first resin layer and substantially made of graphite. The layering amount of the graphite layer is 50 g/m2 or less, and the volume resistivity of the graphite is 3 m?·cm or less.
    Type: Application
    Filed: May 20, 2021
    Publication date: June 8, 2023
    Applicant: Arisawa MFG. Co., Ltd.
    Inventors: Akira YOSHIDA, Kio MIYAJI, Kenichi WATABE
  • Patent number: 10508743
    Abstract: The flow rate controlling device according to the present invention comprises: a base that has an opening portion a ring member that is provided encompassing the opening portion and that can rotate around the opening portion a motor for rotating the ring member, and a plurality of blade members that are supported on the base to the outside of the opening portion in the radial direction, and that can rotate around rotary shafts that are parallel to the axis of the opening portion, wherein: groove portions are formed in the ring member; protruding portions that can slide within the groove portions are formed on the blade members; and the motor rotates the ring member to slide the protruding portions within the groove portions to rotate the plurality of blade members to open and close the opening portion.
    Type: Grant
    Filed: September 28, 2015
    Date of Patent: December 17, 2019
    Assignee: Nidec Copal Corporation
    Inventors: Tomihiro Wakayama, Tomonori Shinozaki, Kenichi Watabe
  • Patent number: 9760013
    Abstract: Provided is an exposure apparatus including a transporting section; a first polarized light output section that outputs first polarized light; a second polarized light output section that outputs second polarized light; a first mask section that has formed therein a first aperture section that passes the first polarized light for exposing an orientation film and blocks the first polarized light; and a second mask section that has formed therein a second aperture section that passes the second polarized light for exposing the orientation film and blocks the second polarized light. The first aperture section and the second aperture section are formed to expose a certain region of the orientation film in an overlapping manner.
    Type: Grant
    Filed: April 22, 2015
    Date of Patent: September 12, 2017
    Assignee: ARISAWA MFG. CO., LTD
    Inventors: Yasuaki Umezawa, Tatsuya Sato, Kazuhiro Ura, Kenichi Watabe, Yuichi Kakubari
  • Publication number: 20170211707
    Abstract: The flow rate controlling device according to the present invention comprises: a base that has an opening portion a ring member that is provided encompassing the opening portion and that can rotate around the opening portion a motor for rotating the ring member, and a plurality of blade members that are supported on the base to the outside of the opening portion in the radial direction, and that can rotate around rotary shafts that are parallel to the axis of the opening portion, wherein: groove portions are formed in the ring member; protruding portions that can slide within the groove portions are formed on the blade members; and the motor rotates the ring member to slide the protruding portions within the groove portions to rotate the plurality of blade members to open and close the opening portion.
    Type: Application
    Filed: September 28, 2015
    Publication date: July 27, 2017
    Applicant: Nidec Copal Corporation
    Inventors: Tomihiro WAKAYAMA, Tomonori SHINOZAKI, Kenichi WATABE
  • Patent number: 9594276
    Abstract: Provided is an optical diffraction element that restricts overall thickness of the element while maintaining strength. The optical diffraction element comprises a substrate; an orientation layer that is formed on one surface of the substrate and includes anisotropic polymers that are oriented perpendicular to or inclined relative to a surface of the substrate in at least a partial region of the orientation layer; and a liquid crystal layer formed on the orientation layer. The liquid crystal layer includes a plurality of orientation patterns that are formed periodically and include liquid crystal molecules having different orientation directions, and the orientation direction for at least some of the orientation patterns is perpendicular to or inclined relative to the surface of the substrate, as a result of aligning with the orientation of the orientation layer formed on a bottom surface of the orientation patterns.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: March 14, 2017
    Assignee: ARISAWA MFG. CO., LTD.
    Inventors: Yasuaki Umezawa, Kenichi Watabe
  • Publication number: 20160370597
    Abstract: Conventional optical elements cannot emit circularly polarized light beams obtained by beam separation in the same direction. An optical element includes a polarization splitter element configured to split incoming light into a first circularly polarized light beam and a second circularly polarized light beam that has different handedness than the first circularly polarized light beam, where the polarization splitter element is configured to reflect the first circularly polarized light beam and allow the second circularly polarized light beam to transmit, and a reflector element configured to reflect the first circularly polarized light beam that has been reflected by the polarization splitter element, to proceed in a direction in which the second circularly polarized light beam is allowed to transmit.
    Type: Application
    Filed: September 5, 2016
    Publication date: December 22, 2016
    Inventors: Yuichi KAKUBARI, Kenichi WATABE
  • Patent number: 9158123
    Abstract: A light diffraction element comprising a transparent substrate and a first orientation layer that is formed on one surface of the substrate and includes anisotropic polymers and a first pattern of an orientation direction arranged periodically in a first direction along the primary plane of the substrate. The first pattern includes three or more small regions that are arranged in the first direction and in which the orientation direction of the polymers included in the first orientation layer are different from each other, and generates diffracted light as a result of interference between light passed respectively through the three or more small regions.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: October 13, 2015
    Assignee: ARISAWA MFG. CO., LTD.
    Inventors: Yuichi Kakubari, Yasuaki Umezawa, Kenichi Watabe
  • Publication number: 20150227057
    Abstract: Provided is an exposure apparatus including a transporting section; a first polarized light output section that outputs first polarized light; a second polarized light output section that outputs second polarized light; a first mask section that has formed therein a first aperture section that passes the first polarized light for exposing an orientation film and blocks the first polarized light; and a second mask section that has formed therein a second aperture section that passes the second polarized light for exposing the orientation film and blocks the second polarized light. The first aperture section and the second aperture section are formed to expose a certain region of the orientation film in an overlapping manner.
    Type: Application
    Filed: April 22, 2015
    Publication date: August 13, 2015
    Inventors: Yasuaki UMEZAWA, Tatsuya SATO, Kazuhiro URA, Kenichi WATABE, Yuichi KAKUBARI
  • Publication number: 20150008601
    Abstract: A retardation plate manufacturing method for manufacturing a retardation plate that has an orientation pattern in which is formed a plurality of regions having optical axes oriented in different directions from each other, the retardation plate manufacturing method comprising arranging an unoriented light orientation layer that is to be oriented by light on a first surface of a substrate; preparing a retardation mask including an orientation pattern in which is formed a plurality of regions that have a quarter wavelength retardation plate retardation function and correspond to the plurality of regions in the orientation pattern of the retardation plate; and orienting the light orientation layer by irradiating the retardation mask with elliptically polarized light and irradiating the light orientation layer with polarized light emitted form the retardation mask.
    Type: Application
    Filed: September 22, 2014
    Publication date: January 8, 2015
    Inventors: Yuichi KAKUBARI, Kenichi WATABE
  • Publication number: 20140071394
    Abstract: Provided is an optical diffraction element that restricts overall thickness of the element while maintaining strength. The optical diffraction element comprises a substrate; an orientation layer that is formed on one surface of the substrate and includes anisotropic polymers that are oriented perpendicular to or inclined relative to a surface of the substrate in at least a partial region of the orientation layer; and a liquid crystal layer formed on the orientation layer. The liquid crystal layer includes a plurality of orientation patterns that are formed periodically and include liquid crystal molecules having different orientation directions, and the orientation direction for at least some of the orientation patterns is perpendicular to or inclined relative to the surface of the substrate, as a result of aligning with the orientation of the orientation layer formed on a bottom surface of the orientation patterns.
    Type: Application
    Filed: November 15, 2013
    Publication date: March 13, 2014
    Applicant: ARISAWA MFG. CO., LTD.
    Inventors: Yasuaki UMEZAWA, Kenichi WATABE
  • Publication number: 20140016081
    Abstract: A light diffraction element comprising a transparent substrate and a first orientation layer that is formed on one surface of the substrate and includes anisotropic polymers and a first pattern of an orientation direction arranged periodically in a first direction along the primary plane of the substrate. The first pattern includes three or more small regions that are arranged in the first direction and in which the orientation direction of the polymers included in the first orientation layer are different from each other, and generates diffracted light as a result of interference between light passed respectively through the three or more small regions.
    Type: Application
    Filed: September 20, 2013
    Publication date: January 16, 2014
    Applicant: ARISAWA MFG. CO., LTD.
    Inventors: Yuichi KAKUBARI, Yasuaki UMEZAWA, Kenichi WATABE
  • Patent number: 8551439
    Abstract: A method of refining carbon parts for the production of polycrystalline silicon, comprises the steps of, replacing an inside gas of a reactor, in which the carbon parts are placed, with an inert gas, drying the carbon parts by raising a temperature in the reactor to a drying temperature of the carbon parts while flowing an inert gas through the reactor, raising a temperature in the reactor to a purification temperature higher than the drying temperature while flowing chlorine gas through the reactor, reducing a pressure in the reactor, maintaining the inside of the reactor in a reduced pressure, pressurizing the inside of the reactor by introducing chlorine gas for bringing the inside of the reactor into a pressurized state, and cooling the inside of the reactor.
    Type: Grant
    Filed: September 15, 2009
    Date of Patent: October 8, 2013
    Assignee: Mitsubishi Materials Corporation
    Inventors: Mitsutoshi Narukawa, Kenichi Watabe
  • Patent number: 8218406
    Abstract: A lens driving apparatus that can be installed in an optical unit. The lens driving apparatus includes a lead screw rotated by rotation of a motor, a lens holder movable reciprocally along a rotation axis line of the lead screw by rotation of the lead screw, a guide shaft extending in parallel with the rotation axis line. The guide shaft passes through the lens holder to guide movement of a lens held at a free end of the lens holder in a cantilevered state.
    Type: Grant
    Filed: May 19, 2009
    Date of Patent: July 10, 2012
    Assignee: Nidec Copal Corporation
    Inventors: Haruki Oe, Toru Ishimasa, Yoji Fujimura, Kenichi Watabe
  • Publication number: 20100068125
    Abstract: A method of refining carbon parts for the production of polycrystalline silicon, comprises the steps of, replacing an inside gas of a reactor, in which the carbon parts are placed, with an inert gas, drying the carbon parts by raising a temperature in the reactor to a drying temperature of the carbon parts while flowing an inert gas through the reactor, raising a temperature in the reactor to a purification temperature higher than the drying temperature while flowing chlorine gas through the reactor, reducing a pressure in the reactor, maintaining the inside of the reactor in a reduced pressure, pressurizing the inside of the reactor by introducing chlorine gas for bringing the inside of the reactor into a pressurized state, and cooling the inside of the reactor.
    Type: Application
    Filed: September 15, 2009
    Publication date: March 18, 2010
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Mitsutoshi Narukawa, Kenichi Watabe
  • Publication number: 20050195489
    Abstract: A lens which has a plurality of protrusions and cavities includes a core layer having a cross sectional shape smaller than and similar to a cross sectional shape of the lens; and a skin layer, which covers the core layer, having a smaller storage modulus of elasticity than that of said core layer. The lens may further include a substrate for fixing the core layer on a surface thereof, the substrate having tabular shape being made of a light-transmitting material.
    Type: Application
    Filed: March 3, 2005
    Publication date: September 8, 2005
    Applicant: Arisawa Mfg. Co., Ltd.
    Inventors: Kenichi Watabe, Hiroyuki Shimotsuma, Shinichi Imai
  • Patent number: 6726379
    Abstract: A camera focal plane shutter according to the invention comprises a shutter blade for opening and closing an exposure aperture to carry out an exposure operation; an electromagnetic actuator for directly driving the shutter blade, and a positioning means for positioning the shutter blade at an operation starting position. This positioning means is comprised of a swing arm supported in a manner enabling it to swing so as to comes into contact with and separate from a drive pin of a rotor, a torsion spring for applying a pushing force so as to push one end of the swing arm against the drive pin, and an eccentric pin which stops the swing arm at a position with a predetermined angle against the pushing force of the torsion spring. Therefore, an impulse force caused by the movement of the shutter blade is eased, and the shutter blade is easily positioned with high accuracy at the operation starting position.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: April 27, 2004
    Assignee: Nidec Copal Corporation
    Inventors: Kenichi Watabe, Hiroshi Miyasaki
  • Publication number: 20020136555
    Abstract: A camera focal plane shutter according to the invention comprises a shutter blade for opening and closing an exposure aperture to carry out an exposure operation; an electromagnetic actuator for directly driving the shutter blade, and a positioning means for positioning the shutter blade at an operation starting position. This positioning means is comprised of a swing arm supported in a manner enabling it to swing so as to comes into contact with and separate from a drive pin of a rotor, a torsion spring for applying a pushing force so as to push one end of the swing arm against the drive pin, and an eccentric pin which stops the swing arm at a position with a predetermined angle against the pushing force of the torsion spring. Therefore, an impulse force caused by the movement of the shutter blade is eased, and the shutter blade is easily positioned with high accuracy at the operation starting position.
    Type: Application
    Filed: March 22, 2002
    Publication date: September 26, 2002
    Inventors: Kenichi Watabe, Hiroshi Miyazaki
  • Patent number: 5508773
    Abstract: A focal plane shutter for use in a photographic camera in which a shutter base plate is made of a synthetic resin material and a metallic supporting plate is mounted on a front surface of the shutter base plate. Shafts pivoting levers for driving a leading blade group and trailing blade group are fixed to a front surface of the metallic supporting plate, whereas shafts pivoting arms for driving the leading blade group and the trailing blade group are fixed to a rear surface of the supporting plate. The shafts pivoting the driving arms and supporting arms protrude from a rear surface of the shutter base plate.
    Type: Grant
    Filed: November 18, 1994
    Date of Patent: April 16, 1996
    Assignee: Copal Company Limited
    Inventors: Hiroshi Miyazaki, Kenichi Watabe, Toshihisa Saito
  • Patent number: 4994834
    Abstract: The forcal plane shutter for cameras is equipped with a first release lever capable of retaining a rear blade group at position to close an exposure aperture, and a second release lever capable of maintaining a front blade group and the rear blade group at the unfolded position thereof and the folded position thereof respectively until the front blade group and the rear blade group are attracted and retained at the unfolded position and the folded position respectively securely with an electromagnetic device. The focal plane shutter is of a double light interruption type which has excellent response to the release signal and capable of assuring stable operations. The focal plane shutter further comprises a control means capable of retaining the first release lever in the released state thereof and can be set in a successive photographing mode accordingly.
    Type: Grant
    Filed: March 9, 1990
    Date of Patent: February 19, 1991
    Assignee: Copal Company Limited
    Inventors: Kenichi Watabe, Shigemi Takahashi, Toshihisa Saito, Akira Suzuki