Patents by Inventor Kenji Ishikawa

Kenji Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020118958
    Abstract: Video data recording using a plurality of video camera devices can be performed more conveniently than in the conventional technique. A video camera device working as a parent device has a signal sending/receiving function and a control function for the whole system, and a video camera device working as a child device has a signal sending/receiving function. The parent device sends synchronization data for time synchronization, and each child device performs a shooting operation in time synchronization with the parent device in accordance with the received synchronization data.
    Type: Application
    Filed: February 22, 2002
    Publication date: August 29, 2002
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Ishikawa, Takuya Sayama, Akihiko Ohtani, Toshimasa Mitsumori
  • Publication number: 20020098763
    Abstract: A polishing and cleaning sheet for hard surfaces which comprises a sheet substrate impregnated with a polishing cleaner, wherein the substrate is a laminate comprising (A) a fiber aggregate comprising 50 to 100% by weight of ultrafine fibers having a fineness of 0.01 to 1.2 dtex and (B) a flexible material comprising 50 to 100% by weight of hydrophobic fibers and has a maximum absorption capacity of 4 to 15 times its own weight, the substrate is impregnated with 1 to 5 parts by weight, per part by weight of the substrate, of the polishing cleaner, provided that the amount of the polishing cleaner infiltrated in the substrate is not exceed 80% of the maximum absorption capacity, and the polishing cleaner comprises 0.01 to 10% by weight of a water-repellent compound and 50 to 99% by weight of water.
    Type: Application
    Filed: November 16, 2001
    Publication date: July 25, 2002
    Inventors: Masashi Yoshikawa, Masashi Shioji, Kenji Ishikawa, Yutaka Saito, Michio Yokosuka
  • Publication number: 20020092994
    Abstract: To provide the ultrasonic-welding apparatus, which can attain the above-mentioned requirement, and which can automatically achieve both measurement of the face-deflection the work piece after welding and the welding of work pieces, such as a reel for a magnetic tape.
    Type: Application
    Filed: January 16, 2002
    Publication date: July 18, 2002
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kouta Kitamura, Tadashi Takahara, Kenji Ishikawa, Novuo Takahashi
  • Patent number: 6376046
    Abstract: A cleaning article comprising a detergent-retaining layer containing a hydrophobic material and detergent gradual-releasing layers having a higher density than the detergent-retaining layer, and the detergent-retaining layer is sandwiched between the detergent gradual-releasing layers.
    Type: Grant
    Filed: July 7, 1999
    Date of Patent: April 23, 2002
    Assignee: Kao Corporation
    Inventors: Eiichi Hoshino, Koji Hanaoka, Fumiko Inaba, Kazuo Mori, Kenji Ishikawa, Hironobu Sionome
  • Publication number: 20010014787
    Abstract: The present invention provides an intravascular catheter comprising a catheter part; an internal needle disposed through the catheter part; and a flexible resin member disposed on the outer surface of the catheter part. It is preferable that the intravascular catheter comprises a blood leakage prevention member for preventing leakage of blood by closing the catheter part via the flexible resin member. It is also preferable that the blood leakage prevention member comprises a pressure part capable of pressuring the catheter part via the flexible resin member. It is further preferable that the blood leakage prevention member comprises a fixing mechanism capable of fixing the pressure part in the pressuring state, and a releasing mechanism capable of releasing the pressuring state.
    Type: Application
    Filed: February 6, 2001
    Publication date: August 16, 2001
    Inventors: Yoshihide Toyokawa, Kenji Ishikawa, Toshiya Asai
  • Patent number: 6224934
    Abstract: An ozone-processing apparatus for a semiconductor process system includes an airtight process chamber and a lamp chamber, which are partitioned by a window for transmitting ultraviolet rays. A plurality of ultraviolet-ray lamps is arrayed along the window in the lamp chamber. A measurement space is defined between the window and the lamps in the lamp chamber. The lamp chamber is provided with a mount portion to set up a measuring unit therein. The measuring unit includes a sensor to be inserted into the measuring space, for measuring the light quantity of the lamps. The sensor is movable in a direction in which the lamps are arrayed.
    Type: Grant
    Filed: June 6, 2000
    Date of Patent: May 1, 2001
    Assignee: Tokyo Electron Limited
    Inventors: Masaaki Hasei, Kenji Ishikawa, Qian Shao Shou, Tetsuya Nakano
  • Patent number: 6018608
    Abstract: A component of color difference signal is detected from a video component signal, and its color saturation information is compared with a predetermined threshold level, then in response to the comparison result, information is generated in order to control phase modulation such as, when the information is smaller than the threshold level, phases of color burst signals are modulated during a specified period, and when the information is larger than the threshold level, the phase stays as standard. The generated information is added to the color video signal. These steps can avoid unpleasant striped color noises appeared on a conventional color TV receiver, the unpleasant striped color noises has been caused by a modified color burst signal without the above steps.
    Type: Grant
    Filed: December 6, 1996
    Date of Patent: January 25, 2000
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Hirohiko Sakashita, Hisao Morita, Masaaki Fujita, Kenji Ishikawa
  • Patent number: 5993436
    Abstract: An indwelling catheter is made of a polyurethane resin having a Shore hardness of 60D or more. The soft segment of the polyurethane resin is constituted by polycaprolactone. The indwelling catheter has a kinking resistance of 10 mm or more when measured at 37.degree. C. in wet state. The Young's modulus is at first 20 kgf/mm.sup.2 or more when measure at 25.degree. C. in dry state, and reduces to 15 kgf/mm.sup.2 or less by soaking it in water of 37.degree. C. for 5 minutes or less.
    Type: Grant
    Filed: November 3, 1998
    Date of Patent: November 30, 1999
    Assignee: Terumo Kabushiki Kaisha
    Inventors: Hideaki Kitou, Yoshihide Toyokawa, Takayasu Shimazaki, Kenji Ishikawa
  • Patent number: 5969767
    Abstract: A video signal apparatus allows multiple pictures to be displayed. A plurality of input video signals are processed to produce a plurality of signals corresponding to a respective plurality of pictures. The plurality of pictures corresponding to the plurality of signals are displayed. At least one of the plurality of pictures which have been displayed is selected. First and second modifications are made to the selected picture. The first modification to the selected picture indicates that the selected picture is being provided with the second modification.
    Type: Grant
    Filed: September 4, 1996
    Date of Patent: October 19, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Ishikawa, Eiichi Ashida, Kinya Kanno
  • Patent number: 5958140
    Abstract: A one-by-one type heat-processing apparatus is disclosed. The one-by-one type heat-processing apparatus includes a processing vessel for processing a semiconductor wafer. A susceptor having a support surface for placing the semiconductor wafer is arranged in the processing vessel. A shower head section is arranged at an interval with respect to the support surface of the susceptor. Processing gas supply pipes for supplying a processing gas are independently connected to the shower head section. A plurality of gas injection holes are formed in the shower head section. First to third heating means for heating the susceptor are attached to the susceptor. The first heating means having a disk-like shape is arranged at almost the center on the lower surface side of the susceptor. The second heating means is concentrically arranged to surround the first heating means. The third heating means is arranged at the peripheral edge portion of the susceptor.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: September 28, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Junichi Arami, Kenji Ishikawa, Masayuki Kitamura
  • Patent number: 5908656
    Abstract: This invention provides a medical device in which its lubricity is continually maintained and its safety is guaranteed.Particularly, it provides a medical device in which lubricity is generated on at least a portion of its surface when the device is contacted with body fluids or exposed to physiological aqueous conditions, wherein the lubricity-generating portion is formed by thermoforming.
    Type: Grant
    Filed: July 10, 1997
    Date of Patent: June 1, 1999
    Assignee: Terumo Kabushiki Kaisha
    Inventors: Kenji Ishikawa, Hideaki Kitou, Kenichi Shimura, Yasunobu Zushi, Naoki Ishii, Taku Aoike
  • Patent number: 5904872
    Abstract: A heating device is formed by a heating plate formed of silica and having a heating surface for heating an object to be heated, a heating element having a predetermined pattern and fixed to a surface opposing the heating surface of the heating plate, and a reflecting plate formed of silica and brought into tight contact with the surface of the heating plate on which the heating element is formed. This heating device is arranged in a processing vessel in a CVD apparatus, and a semiconductor wafer is placed on the heating device. A process gas is supplied into the processing vessel while the semiconductor wafer is heated, thereby forming a predetermined film on the semiconductor wafer.
    Type: Grant
    Filed: September 27, 1995
    Date of Patent: May 18, 1999
    Assignees: Tokyo Electron Limited, Shin-Etsu Chemical Co., Ltd.
    Inventors: Junichi Arami, Kenji Ishikawa, Harunori Ushikawa, Isao Yanagisawa, Nobuo Kawada, Hiroshi Mogi
  • Patent number: 5665260
    Abstract: A ceramic electrostatic chuck with a built-in heater having electrodes of an electroconductive ceramic bonded to a surface of a supporting substrate of an electrically conducting ceramic. A heat generating layer of an electroconductive ceramic is bonded to the other surface of the supporting substrate and a covering layer of an electrically insulating ceramic is provided thereon. Each of the supporting substrate, electrode for the electrostatic chuck and heat generating layer has a surface roughness Rmax of 5 .mu.m or larger.
    Type: Grant
    Filed: December 27, 1994
    Date of Patent: September 9, 1997
    Assignees: Shin-Etsu Chemical Co., Ltd., Tokyo Electoron Limited
    Inventors: Nobuo Kawada, Shoji Kano, Koji Hagiwara, Nobuo Arai, Junichi Arami, Kenji Ishikawa
  • Patent number: 5665167
    Abstract: A static chuck and a workpiece push-up pin are disposed on a susceptor which is one of opposed electrodes generating plasma. The push-up pin and the susceptor are electrically connected. A grounding circuit which discharges electric charges remaining on the susceptor is disposed in parallel with an RF power supply circuit which supplies RF power to the susceptor. Thus, electric charges remaining in the power supply circuit can be discharged and an abnormal discharging between the push-up pin and the susceptor can be prevented.
    Type: Grant
    Filed: February 14, 1994
    Date of Patent: September 9, 1997
    Assignee: Tokyo Electron Kabushiki Kaisha
    Inventors: Yoichi Deguchi, Satoru Kawakami, Shiro Koyama, Kenji Ishikawa
  • Patent number: 5625526
    Abstract: An electrostatic chuck of this invention includes a conductive film, an insulating coat formed on a susceptor to cover the conductive film, and a feeder circuit for applying a voltage to the conductive film to cause the insulating coat to generate an electrostatic attractive force. The feeder circuit includes a connecting conductor replacing a portion of the insulating coat to be electrically connected to the conductive film, a first feeder pin extending through the susceptor from its front surface side to its rear surface side and having one end portion electrically connected to the connecting conductor, an insulating member for insulating the first feeder pin from the susceptor, a second feeder pin having one end portion pressed against the other end portion of the first feeder pin to be electrically connected to the first feeder pin, and a power supply electrically connected to the second feeder pin.
    Type: Grant
    Filed: June 1, 1994
    Date of Patent: April 29, 1997
    Assignees: Tokyo Electron Limited, Tokyo Electron Yamanashi Limited
    Inventors: Masahide Watanabe, Masami Kubota, Shiro Koyama, Kenji Ishikawa, Kouichi Kazama, Mitsuaki Komino, Takanori Sakurai
  • Patent number: 5618350
    Abstract: A receptacle terminal is provided at a mount table and comprised of a downwardly opened electroconductive cap member. The receptacle terminal is connected to a heating element of a heater. A plug terminal is forced into the receptacle terminal and has an electroconductive section, support section and insulating pipe. The insulating pipe is provided around the circumference of the support section. A first clearance is defined between the support section and the inner wall of the insulating pipe. A second clearance is defined between the end face of the electroconductor section and that of the insulating pipe. The lower end portions of the support section and insulating pipe extend out of a processing chamber via a hole in the bottom plate of the processing chamber. A gas supply attachment is provided around the circumference of the insulating pipe and has a cavity including the circumferential portion of the insulating pipe and communicating with a gas supply pipe.
    Type: Grant
    Filed: March 21, 1996
    Date of Patent: April 8, 1997
    Assignee: Tokyo Electron Limited
    Inventors: Kenji Ishikawa, Junichi Arami
  • Patent number: 5595916
    Abstract: In a silicon oxide film evaluation method for evaluating the silicon oxide film formed on a silicon substrate, radiation of a plurality of incident angles is irradiated to the silicon oxide film, reflected radiation of the radiation of the plural incident angles on the silicon oxide film is measured, reflectances for the radiation of the plural incident angles is computed, based on the radiation of the plural incident angles and reflected radiation thereof, a dielectric function is computed, based on the reflectances for the plural incident angles, and film quality of the silicon oxide film is evaluated, based on the dielectric function. The silicon oxide film evaluation method and apparatus can evaluate film quality of the silicon oxide film formed on the silicon substrate in non-contact and non-destructively.
    Type: Grant
    Filed: March 29, 1994
    Date of Patent: January 21, 1997
    Assignee: Fujitsu Limited
    Inventors: Shuzo Fujimura, Hiroki Ogawa, Kenji Ishikawa, Carlos R. Inomata
  • Patent number: 5591269
    Abstract: A vacuum processing apparatus includes: a processing chamber for performing a film formation process to a semiconductor wafer in a vacuum; a mounting member provided in the processing chamber and having a mounting surface for mounting a target object; an electrostatic chuck, provided to the mounting surface of the mounting member, for chucking the semiconductor wafer; a heating mechanism for heating the semiconductor wafer; and a processing gas supply mechanism for supplying a processing gas for performing the film formation process to the semiconductor wafer into the processing chamber.
    Type: Grant
    Filed: June 23, 1994
    Date of Patent: January 7, 1997
    Assignees: Tokyo Electron Limited, Tokyo Electron Tohoku Limited
    Inventors: Junichi Arami, Kenji Ishikawa, Youichi Deguchi, Hironori Yagi, Nobuo Kawada, Isao Yanagisawa
  • Patent number: 5567267
    Abstract: A susceptor of a plasma etching apparatus is arranged on a heater fixing frame incorporating a heater. The fixing frame is arranged on a cooling block containing liquid nitrogen. A boundary clearance is formed between the fixed frame and the cooling block and on a heat transfer path. A method of controlling the temperature of the susceptor includes an initialization mode, an idle mode following the initialization mode, process and maintenance modes selectively following the idle mode. The initialization mode includes the steps of filling the boundary clearance with a heat transfer gas and observing a change in temperature of the susceptor caused by cold transferred from the cooling block. The idle mode is executed after the temperature of the susceptor reaches a predetermined temperature. The idle mode includes the step of exhausting the boundary clearance to set it in a vacuum state to sever the heat transfer path.
    Type: Grant
    Filed: November 19, 1993
    Date of Patent: October 22, 1996
    Assignee: Tokyo Electron Limited
    Inventors: Kouichi Kazama, Mitsuaki Komino, Kenji Ishikawa, Yoichi Ueda
  • Patent number: 5566043
    Abstract: The ceramic electrostatic chuck with built-in heater of the present invention is disclosed having electrodes for electrostatic chuck made from an electroconductive ceramic bonded to a surface of a supporting substrate made from an electrically insulating ceramic, a heat generating layer made from an electroconductive ceramic is bonded to the other surface and the side surface and a covering layer made from an electrically insulating ceramic is provided thereon.
    Type: Grant
    Filed: December 27, 1994
    Date of Patent: October 15, 1996
    Assignees: Shin-Etsu Chemical Co., Ltd., Tokyo Electoron Limited
    Inventors: Nobuo Kawada, Toshihiko Shindoh, Takaaki Nagao, Kazuhiko Urano, Junichi Arami, Kenji Ishikawa