Patents by Inventor KhanhTin NGUYEN

KhanhTin NGUYEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11874601
    Abstract: A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R01, R02, R03, and R04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R01 and R02, R02 and R03, or R03 and R04 are bonded to each other to form an aromatic ring; R05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation.
    Type: Grant
    Filed: June 21, 2021
    Date of Patent: January 16, 2024
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventor: KhanhTin Nguyen
  • Patent number: 11754922
    Abstract: A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1).
    Type: Grant
    Filed: June 23, 2021
    Date of Patent: September 12, 2023
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Masatoshi Arai, KhanhTin Nguyen
  • Patent number: 11703756
    Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: July 18, 2023
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Koshi Onishi, KhanhTin Nguyen, Masatoshi Arai, Yoshitaka Komuro
  • Patent number: 11693316
    Abstract: A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), W1 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, R11 represents an unsaturated hydrocarbon group which may have a substituent, R12 and R13 represent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an ?-position of Ct constitutes a carbon-carbon unsaturated bond.
    Type: Grant
    Filed: December 14, 2020
    Date of Patent: July 4, 2023
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: KhanhTin Nguyen, Masatoshi Arai, Nobuhiro Michibayashi
  • Publication number: 20220397825
    Abstract: A resist composition containing a base material component and a compound represented by General Formula (d0), in which in the formula, Rd0 represents a condensed cyclic group containing a condensed ring containing at least one aromatic rings, the condensed cyclic group having, as a substituent, an acid decomposable group which is decomposed under action of acid to form a polar group, Yd0 represents a divalent linking group or a single bond, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or more
    Type: Application
    Filed: April 25, 2022
    Publication date: December 15, 2022
    Inventor: KhanhTin NGUYEN
  • Publication number: 20220019142
    Abstract: A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1).
    Type: Application
    Filed: June 23, 2021
    Publication date: January 20, 2022
    Inventors: Masatoshi ARAI, KhanhTin NGUYEN
  • Publication number: 20220011665
    Abstract: A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R01, R02, R03, and R04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R01 and R02, R02 and R03, or R03 and R04 are bonded to each other to form an aromatic ring; R05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation
    Type: Application
    Filed: June 21, 2021
    Publication date: January 13, 2022
    Inventor: KhanhTin NGUYEN
  • Patent number: 11181822
    Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: November 23, 2021
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Koshi Onishi, KhanhTin Nguyen, Masatoshi Arai, Yoshitaka Komuro
  • Patent number: 11099479
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).
    Type: Grant
    Filed: October 4, 2017
    Date of Patent: August 24, 2021
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takashi Nagamine, Hideto Nito, Masafumi Fujisaki, Tatsuya Fujii, Yuki Fukumura, Takahiro Kojima, Issei Suzuki, Takuya Ikeda, KhanhTin Nguyen
  • Publication number: 20210200088
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, a total amount of a basic component including a compound represented by general formula (d0) and an acid-generator component is 25 to 60 parts by weight relative to 100 parts by weight of a base material component. In formula (d0), Rd0 represents a monovalent organic group; Xd0 represents —O—, —C(?O)—, —O—C(?O)—, —C(?O)—O—, —S— or —SO2—; Yd0 represents a single bond or a divalent hydrocarbon group which may have a substituent; Mm+ represents a m-valent organic cation; and m represents an integer of 1 or more Rd0-Xd0-Yd0-COO?(Mm?)1/m??(d0).
    Type: Application
    Filed: December 21, 2020
    Publication date: July 1, 2021
    Inventors: Toshiaki YATSUNAMI, Takaya MAEHASHI, Masahiro SHIOSAKI, Hiroshi GOHARA, Seiji TODOROKI, Koshi ONISHI, KhanhTin NGUYEN, Nobuhiro MICHIBAYASHI, Takuya IKEDA
  • Publication number: 20210191268
    Abstract: A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), W1 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, R11 represents an unsaturated hydrocarbon group which may have a substituent, R12 and R13 represent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an ?-position of Ct constitutes a carbon-carbon unsaturated bond.
    Type: Application
    Filed: December 14, 2020
    Publication date: June 24, 2021
    Inventors: KhanhTin NGUYEN, Masatoshi ARAI, Nobuhiro MICHIBAYASHI
  • Publication number: 20210141307
    Abstract: A resist composition including a base material component (A), an acid-generator component (B) and a photodegradable base (D1), the base material component (A) including a resin component (A1) having a structural unit (a10), at least one of the acid-generator component (B) and the photodegradable base (D1) including a compound (BD1), and a total amount of the acid-generator component (B) and the photodegradable base (D1) being 25 parts by weight or more, relative to 100 parts by weight of the base material component (A) (in formula (a10-1), Wax1 represents an aromatic hydrocarbon group which may have a substituent; in formula (bd1), R001 to R003 represents a monovalent organic group, and at least one has an acid dissociable group)
    Type: Application
    Filed: November 4, 2020
    Publication date: May 13, 2021
    Inventors: Mari Murata, Yoshitaka Komuro, Masatoshi Arai, Takashi Nagamine, KhanhTin Nguyen
  • Publication number: 20200183273
    Abstract: A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mm+ represents an m-valent organic cation, Rd0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p?(q×2)+5” is satisfied.
    Type: Application
    Filed: November 18, 2019
    Publication date: June 11, 2020
    Inventors: KhanhTin NGUYEN, Mari MURATA, Masatoshi ARAI, Nobuhiro MICHIBAYASHI
  • Publication number: 20190361343
    Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).
    Type: Application
    Filed: May 23, 2019
    Publication date: November 28, 2019
    Inventors: Koshi ONISHI, KhanhTin NGUYEN, Masatoshi ARAI, Yoshitaka KOMURO
  • Patent number: 10414918
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 5, 2017
    Date of Patent: September 17, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Masahiro Shiosaki, Takuya Ikeda, Takaya Maehashi
  • Publication number: 20190219920
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).
    Type: Application
    Filed: October 4, 2017
    Publication date: July 18, 2019
    Inventors: Takashi NAGAMINE, Hideto NITO, Masafumi FUJISAKI, Tatsuya FUJII, Yuki FUKUMURA, Takahiro KOJIMA, Issei SUZUKI, Takuya IKEDA, KhanhTin NGUYEN
  • Patent number: 10295905
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: May 21, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Takaya Maehashi
  • Publication number: 20180024433
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Application
    Filed: July 17, 2017
    Publication date: January 25, 2018
    Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Takaya MAEHASHI
  • Publication number: 20180022916
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Application
    Filed: July 5, 2017
    Publication date: January 25, 2018
    Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Masahiro SHIOSAKI, Takuya IKEDA, Takaya MAEHASHI