Patents by Inventor KhanhTin NGUYEN
KhanhTin NGUYEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent
Patent number: 11874601Abstract: A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R01, R02, R03, and R04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R01 and R02, R02 and R03, or R03 and R04 are bonded to each other to form an aromatic ring; R05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation.Type: GrantFiled: June 21, 2021Date of Patent: January 16, 2024Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventor: KhanhTin Nguyen -
Patent number: 11754922Abstract: A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1).Type: GrantFiled: June 23, 2021Date of Patent: September 12, 2023Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masatoshi Arai, KhanhTin Nguyen
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Patent number: 11703756Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).Type: GrantFiled: May 23, 2019Date of Patent: July 18, 2023Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Koshi Onishi, KhanhTin Nguyen, Masatoshi Arai, Yoshitaka Komuro
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Patent number: 11693316Abstract: A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), W1 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, R11 represents an unsaturated hydrocarbon group which may have a substituent, R12 and R13 represent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an ?-position of Ct constitutes a carbon-carbon unsaturated bond.Type: GrantFiled: December 14, 2020Date of Patent: July 4, 2023Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: KhanhTin Nguyen, Masatoshi Arai, Nobuhiro Michibayashi
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RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROLLING AGENT
Publication number: 20220397825Abstract: A resist composition containing a base material component and a compound represented by General Formula (d0), in which in the formula, Rd0 represents a condensed cyclic group containing a condensed ring containing at least one aromatic rings, the condensed cyclic group having, as a substituent, an acid decomposable group which is decomposed under action of acid to form a polar group, Yd0 represents a divalent linking group or a single bond, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or moreType: ApplicationFiled: April 25, 2022Publication date: December 15, 2022Inventor: KhanhTin NGUYEN -
Publication number: 20220019142Abstract: A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1).Type: ApplicationFiled: June 23, 2021Publication date: January 20, 2022Inventors: Masatoshi ARAI, KhanhTin NGUYEN
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RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT
Publication number: 20220011665Abstract: A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R01, R02, R03, and R04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R01 and R02, R02 and R03, or R03 and R04 are bonded to each other to form an aromatic ring; R05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and Mm+ represents an m-valent organic cationType: ApplicationFiled: June 21, 2021Publication date: January 13, 2022Inventor: KhanhTin NGUYEN -
Patent number: 11181822Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).Type: GrantFiled: May 23, 2019Date of Patent: November 23, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Koshi Onishi, KhanhTin Nguyen, Masatoshi Arai, Yoshitaka Komuro
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Patent number: 11099479Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).Type: GrantFiled: October 4, 2017Date of Patent: August 24, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takashi Nagamine, Hideto Nito, Masafumi Fujisaki, Tatsuya Fujii, Yuki Fukumura, Takahiro Kojima, Issei Suzuki, Takuya Ikeda, KhanhTin Nguyen
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Publication number: 20210200088Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, a total amount of a basic component including a compound represented by general formula (d0) and an acid-generator component is 25 to 60 parts by weight relative to 100 parts by weight of a base material component. In formula (d0), Rd0 represents a monovalent organic group; Xd0 represents —O—, —C(?O)—, —O—C(?O)—, —C(?O)—O—, —S— or —SO2—; Yd0 represents a single bond or a divalent hydrocarbon group which may have a substituent; Mm+ represents a m-valent organic cation; and m represents an integer of 1 or more Rd0-Xd0-Yd0-COO?(Mm?)1/m??(d0).Type: ApplicationFiled: December 21, 2020Publication date: July 1, 2021Inventors: Toshiaki YATSUNAMI, Takaya MAEHASHI, Masahiro SHIOSAKI, Hiroshi GOHARA, Seiji TODOROKI, Koshi ONISHI, KhanhTin NGUYEN, Nobuhiro MICHIBAYASHI, Takuya IKEDA
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Publication number: 20210191268Abstract: A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), W1 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, R11 represents an unsaturated hydrocarbon group which may have a substituent, R12 and R13 represent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an ?-position of Ct constitutes a carbon-carbon unsaturated bond.Type: ApplicationFiled: December 14, 2020Publication date: June 24, 2021Inventors: KhanhTin NGUYEN, Masatoshi ARAI, Nobuhiro MICHIBAYASHI
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Publication number: 20210141307Abstract: A resist composition including a base material component (A), an acid-generator component (B) and a photodegradable base (D1), the base material component (A) including a resin component (A1) having a structural unit (a10), at least one of the acid-generator component (B) and the photodegradable base (D1) including a compound (BD1), and a total amount of the acid-generator component (B) and the photodegradable base (D1) being 25 parts by weight or more, relative to 100 parts by weight of the base material component (A) (in formula (a10-1), Wax1 represents an aromatic hydrocarbon group which may have a substituent; in formula (bd1), R001 to R003 represents a monovalent organic group, and at least one has an acid dissociable group)Type: ApplicationFiled: November 4, 2020Publication date: May 13, 2021Inventors: Mari Murata, Yoshitaka Komuro, Masatoshi Arai, Takashi Nagamine, KhanhTin Nguyen
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Publication number: 20200183273Abstract: A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mm+ represents an m-valent organic cation, Rd0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p?(q×2)+5” is satisfied.Type: ApplicationFiled: November 18, 2019Publication date: June 11, 2020Inventors: KhanhTin NGUYEN, Mari MURATA, Masatoshi ARAI, Nobuhiro MICHIBAYASHI
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Publication number: 20190361343Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).Type: ApplicationFiled: May 23, 2019Publication date: November 28, 2019Inventors: Koshi ONISHI, KhanhTin NGUYEN, Masatoshi ARAI, Yoshitaka KOMURO
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Patent number: 10414918Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.Type: GrantFiled: July 5, 2017Date of Patent: September 17, 2019Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Masahiro Shiosaki, Takuya Ikeda, Takaya Maehashi
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Publication number: 20190219920Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).Type: ApplicationFiled: October 4, 2017Publication date: July 18, 2019Inventors: Takashi NAGAMINE, Hideto NITO, Masafumi FUJISAKI, Tatsuya FUJII, Yuki FUKUMURA, Takahiro KOJIMA, Issei SUZUKI, Takuya IKEDA, KhanhTin NGUYEN
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Patent number: 10295905Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.Type: GrantFiled: July 17, 2017Date of Patent: May 21, 2019Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Takaya Maehashi
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Publication number: 20180024433Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.Type: ApplicationFiled: July 17, 2017Publication date: January 25, 2018Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Takaya MAEHASHI
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Publication number: 20180022916Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.Type: ApplicationFiled: July 5, 2017Publication date: January 25, 2018Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Masahiro SHIOSAKI, Takuya IKEDA, Takaya MAEHASHI