Patents by Inventor Ki-Wook HWANG

Ki-Wook HWANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for etching silicon nitride film and etching method using same
    Patent number: 11608471
    Abstract: An etching composition for silicon nitride comprising: a phosphoric acid compound; water; and at least one of a silane compound represented by Formula 1, below, and a reaction product thereof, and an etching method using the same are disclosed,
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: March 21, 2023
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Ki Wook Hwang, Sang Ran Koh, Youn Jin Cho, Jung Min Choi, Kwen Woo Han, Jun Young Jang, Yong Woon Yoon
  • Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same
    Patent number: 11254871
    Abstract: An etching composition for silicon nitride layers and a method of etching a silicon nitride layer using the composition, the etching composition including an inorganic acid or a salt thereof; a solvent; an acid-modified silica or an acid-modified silicic acid; and a cyclic compound containing four or more nitrogen atoms.
    Type: Grant
    Filed: October 15, 2020
    Date of Patent: February 22, 2022
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Jung Min Choi, Jun Young Jang, Hyun Jung Kim, Hyung Rang Moon, Ji Hye Lee, Kwen Woo Han, Ki Wook Hwang
  • COMPOSITION FOR ETCHING SILICON NITRIDE FILM AND ETCHING METHOD USING SAME
    Publication number: 20210363423
    Abstract: An etching composition for silicon nitride comprising: a phosphoric acid compound; water; and at least one of a silane compound represented by Formula 1 and a reaction product thereof, and an etching method using the same are disclosed.
    Type: Application
    Filed: April 5, 2019
    Publication date: November 25, 2021
    Inventors: Ki Wook HWANG, Sang Ran KOH, Youn Jin CHO, Jung Min CHOI, Kwen Woo HAN, Jun Young Jang, Yong Woon YOON
  • ETCHING COMPOSITION FOR SILICON NITRIDE LAYER AND METHOD OF ETCHING SILICON NITRIDE LAYER USING THE SAME
    Publication number: 20210115335
    Abstract: An etching composition for silicon nitride layers and a method of etching a silicon nitride layer using the composition, the etching composition including an inorganic acid or a salt thereof; a solvent; an acid-modified silica or an acid-modified silicic acid; and a cyclic compound containing four or more nitrogen atoms.
    Type: Application
    Filed: October 15, 2020
    Publication date: April 22, 2021
    Inventors: Jung Min CHOI, Jun Young JANG, Hyun Jung KIM, Hyung Rang MOON, Ji Hye LEE, Kwen Woo HAN, Ki Wook HWANG
  • Compound, novel mixture, photosensitive resin composition, and color filter
    Patent number: 9242990
    Abstract: A compound is represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description:
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: January 26, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Myoung-Youp Shin, Won-Jung Kim, Kyung-Soo Moon, Chae-Won Pak, Eui-Soo Jeong, Ki-Wook Hwang
  • Novel Compound, Novel Mixture, Photosensitive Resin Composition, and Color Filter
    Publication number: 20150322077
    Abstract: A compound is represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description:
    Type: Application
    Filed: October 30, 2014
    Publication date: November 12, 2015
    Inventors: Myoung-Youp SHIN, Won-Jung KIM, Kyung-Soo MOON, Chae-Won PAK, Eui-Soo JEONG, Ki-Wook HWANG
  • Novel Compound, Novel Polymer, Colorant Including the Same, Positive Photosensitive Resin Composition Including the Same, and Color Filter
    Publication number: 20150210796
    Abstract: Disclosed are a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description, a polymer, a colorant including the same, and a photosensitive resin composition including the colorant, and a color filter.
    Type: Application
    Filed: October 22, 2014
    Publication date: July 30, 2015
    Inventors: Won-Jung KIM, Kyoung-Hee KANG, Chae-Won PAK, Myoung-Youp SHIN, Hwan-Sung CHEON, Eui-Soo JEONG, Ki-Wook HWANG