Patents by Inventor Ki Young Kwak
Ki Young Kwak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11928994Abstract: A display device includes a substrate including a display area and a non-display area disposed near the display area, a plurality of pixels disposed in the display area, a plurality of signal lines disposed on the substrate and connected to the pixels, and a pad portion disposed in the non-display area and including a plurality of pads. The signal lines include a first crack detecting line connected to a first test voltage pad and a first pad at a first node, connected to a second pad at a second node, and extending around the non-display area between the first node and the second node, as well as a first data line including a first end connected to a first transistor connected to the first crack detecting line at the second node, and a second end connected to corresponding pixels from among the plurality of pixels.Type: GrantFiled: June 4, 2019Date of Patent: March 12, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Kwang Sae Lee, Ji-Hyun Ka, Won Kyu Kwak, Hwa Young Song, Ki Myeong Eom
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Patent number: 11897006Abstract: The present disclosure provides a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a substrate support unit configured to support a substrate, a liquid supply unit configured to supply a liquid containing any one of a chemical liquid and a cleaning liquid to the substrate supported by the substrate support unit, a processing container configured to accommodate the substrate support unit and recover the liquid supplied to the substrate from the liquid supply unit, and a capture module provided in the processing container to capture the liquid so as to suppress the liquid scattered from the substrate from being bounced back from the processing container and re-scattering.Type: GrantFiled: May 10, 2022Date of Patent: February 13, 2024Assignee: SEMES CO., LTD.Inventors: Ki Young Kwak, Sang Young Kwon, Cha Sub Shim
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Patent number: 11850635Abstract: A substrate processing apparatus includes a support unit; a first nozzle for discharging a first rinse solution to a first area of the substrate; and a second nozzle for discharging a second rinse solution to a second area of the substrate, wherein the first nozzle discharges the first rinse solution to a first area during a first period so that the first area and the second area of the substrate are wetted by the first rinse solution, and some area of the substrate is not wetted by the first rinse solution, wherein the first nozzle discharges the first rinse solution to the first area and the second nozzle discharges the second rinse solution to the second area in a second period directly connected to the first period so that an entire upper surface of the substrate is wetted by the first rinse solution and the second rinse solution.Type: GrantFiled: August 16, 2021Date of Patent: December 26, 2023Assignee: Semes Co., Ltd.Inventors: Dong Hee Son, Ki Young Kwak
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Patent number: 11571724Abstract: A substrate processing apparatus includes a process module including a substrate support unit, an inverting unit and a processing unit, and a transfer module, wherein the inverting unit inverts a substrate so that a second surface faces upward, and provides the inverted substrate to the substrate support unit, wherein the processing unit performs a first processing on the second surface of the substrate seated on the substrate support unit, wherein the inverting unit inverts the first processed substrate so that the first surface faces upward, wherein the transfer module takes the substrate with a first surface facing upward out of the process module, and introduces again the substrate with a first surface facing upward into the process module to seat it on the substrate support unit, wherein the processing unit performs a second processing on the first surface of the substrate seated on the substrate support unit.Type: GrantFiled: August 17, 2021Date of Patent: February 7, 2023Assignee: Semes Co., Ltd.Inventors: Ki Young Kwak, Hyun Ho Lee
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Publication number: 20220379351Abstract: The present disclosure provides a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a substrate support unit configured to support a substrate, a liquid supply unit configured to supply a liquid containing any one of a chemical liquid and a cleaning liquid to the substrate supported by the substrate support unit, a processing container configured to accommodate the substrate support unit and recover the liquid supplied to the substrate from the liquid supply unit, and a capture module provided in the processing container to capture the liquid so as to suppress the liquid scattered from the substrate from being bounced back from the processing container and re-scattering.Type: ApplicationFiled: May 10, 2022Publication date: December 1, 2022Inventors: Ki Young KWAK, Sang Young Kwon, Cha Sub Shim
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Publication number: 20220355345Abstract: Provided are a substrate treatment apparatus and method for treating a substrate while preventing the surface of the substrate from drying out. The substrate treatment method includes: moving a first nozzle to above a first point on a substrate; ejecting a first substrate treatment liquid onto the substrate from the first nozzle; moving a second nozzle to above the first point; and ejecting a second substrate treatment liquid onto the substrate from the second nozzle, wherein the second nozzle is positioned above a second point on the substrate before moving to above the first point.Type: ApplicationFiled: April 30, 2022Publication date: November 10, 2022Inventors: Sang Young KWON, Ki Young KWAK
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Publication number: 20220355344Abstract: An apparatus and method for treating a substrate that implement a recipe capable of increasing an absorption amount of metal ions to the substrate are provided. The method for treating the substrate includes: ejecting a substrate treating liquid onto the substrate; rotating the substrate at a first low-speed; and when the ejecting of the substrate treating liquid has been finished, drying the substrate.Type: ApplicationFiled: April 29, 2022Publication date: November 10, 2022Inventors: Hyun Seok Choi, Ki Young Kwak, Dong Hee Son, Jong Hwan Park, Jong Jin Jung
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Publication number: 20220203415Abstract: A substrate processing apparatus includes a process module including a substrate support unit, an inverting unit and a processing unit, and a transfer module, wherein the inverting unit inverts a substrate so that a second surface faces upward, and provides the inverted substrate to the substrate support unit, wherein the processing unit performs a first processing on the second surface of the substrate seated on the substrate support unit, wherein the inverting unit inverts the first processed substrate so that the first surface faces upward, wherein the transfer module takes the substrate with a first surface facing upward out of the process module, and introduces again the substrate with a first surface facing upward into the process module to seat it on the substrate support unit, wherein the processing unit performs a second processing on the first surface of the substrate seated on the substrate support unit.Type: ApplicationFiled: August 17, 2021Publication date: June 30, 2022Inventors: Ki Young Kwak, Hyun Ho Lee
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Publication number: 20220126330Abstract: A substrate processing apparatus includes a support unit; a first nozzle for discharging a first rinse solution to a first area of the substrate; and a second nozzle for discharging a second rinse solution to a second area of the substrate, wherein the first nozzle discharges the first rinse solution to a first area during a first period so that the first area and the second area of the substrate are wetted by the first rinse solution, and some area of the substrate is not wetted by the first rinse solution, wherein the first nozzle discharges the first rinse solution to the first area and the second nozzle discharges the second rinse solution to the second area in a second period directly connected to the first period so that an entire upper surface of the substrate is wetted by the first rinse solution and the second rinse solution.Type: ApplicationFiled: August 16, 2021Publication date: April 28, 2022Inventors: Dong Hee Son, Ki Young Kwak
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Publication number: 20200020014Abstract: Disclosed is a trained model generating method and apparatus that assesses an acquisition price of a subscription product by executing an artificial intelligence (AI) algorithm or a machine learning algorithm in a 5G environment connected for the Internet of Things, and that reinforces a trained model by reflecting, as a reward, a result of suggesting to a user to acquire the product. A product price assessing method according to one embodiment of the present disclosure may include: applying at least one of user information, product information, or environment information, or preprocessed data thereof to a machine learning-based first trained model; and assessing a product price of a product related to the product information based on the first trained model. Reinforcement learning may be conducted to the first trained model by reflecting, as a reward, whether the user determines to acquire the product at the assessed product price.Type: ApplicationFiled: September 23, 2019Publication date: January 16, 2020Applicant: LG ELECTRONICS INC.Inventors: Moon Sub Jin, Ki Young Kwak, Mi Sook Kim, Hwa Jun Oh
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Patent number: 8229045Abstract: Provided are an apparatus and method for measuring a carrier-to-interference and noise ratio (CINR) using a pilot symbol in a digital communication system, and more particularly, to an apparatus and method for measuring a CINR by estimating a data signal, noise, and an interference signal from a pilot symbol in a digital communication system using orthogonal frequency division multiplexing (OFDM)/orthogonal frequency division multiplexing access (OFDMA). The apparatus includes: a pilot symbol acquisition unit for acquiring the pilot symbol from a baseband frequency signal; a signal estimation unit for estimating a pilot signal and a data signal from the pilot symbol; a power calculation unit for calculating a power value of the estimated data signal and calculating a power value of a noise signal from a difference between the pilot symbol and an estimated pilot signal; and a CINR calculation unit for calculating a CINR on the basis of the power values of the data and noise signals.Type: GrantFiled: December 28, 2006Date of Patent: July 24, 2012Assignee: SeAH Networks Co., Ltd.Inventors: Ki Young Kwak, Kang Min Lee, Ji Myung Oh, Yong Suk Hwang
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Publication number: 20090135892Abstract: Provided are an apparatus and method for measuring a carrier-to-interference-and-noise ratio (CINR) using down-link preambles. More particularly, provided are an apparatus and method that measure CINRs according to a plurality of logical bands in a downlink band-adaptive modulation and coding (AMC) channel mode zone using preambles and determine whether or not to switch to another channel mode or logical band on the basis of the CINRS. According to the apparatus and method, it is possible to easily measure a plurality of CINRs and switch to a better channel mode or another logical band using the measured CINRs. Consequently, the optimum channel environment can be maintained.Type: ApplicationFiled: December 27, 2006Publication date: May 28, 2009Inventor: Ki Young KWAK
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Publication number: 20090016420Abstract: Provided are an apparatus and method for measuring a carrier-to-interference and noise ratio (CINR) using a pilot symbol in a digital communication system, and more particularly, to an apparatus and method for measuring a CINR by estimating a data signal, noise, and an interference signal from a pilot symbol in a digital communication system using orthogonal frequency division multiplexing (OFDM)/orthogonal frequency division multiplexing access (OFDMA). The apparatus includes: a pilot symbol acquisition unit for acquiring the pilot symbol from a baseband frequency signal; a signal estimation unit for estimating a pilot signal and a data signal from the pilot symbol; a power calculation unit for calculating a power value of the estimated data signal and calculating a power value of a noise signal from a difference between the pilot symbol and an estimated pilot signal; and a CINR calculation unit for calculating a CINR on the basis of the power values of the data and noise signals.Type: ApplicationFiled: December 28, 2006Publication date: January 15, 2009Inventors: Ki Young Kwak, Kang Min Lee, Ji Myung Oh, Yong Suk Hwang
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Publication number: 20080303508Abstract: Provided are an apparatus and method for estimating carrier frequency offset in a communication terminal operating in a communication system supporting Orthogonal Frequency Division Multiplexing (OFDM) or Orthogonal Frequency Division Multiplexing Access (OFDMA). More particularly, provided are a method of estimating carrier frequency offset in a communication terminal supporting DownLink (DL) Full Usage of SubChannel (FUSC) and DL Band-Adaptive Modulation and Coding (AMC) channel modes in a wireless communication system based on one of Institute of Electrical and Electronic Engineers (IEEE) 802.16d/e, Wireless Broadband (WiBro), and Worldwide interoperability for Microwave Access (WiMAX) standards, and a communication terminal performing the method.Type: ApplicationFiled: December 28, 2006Publication date: December 11, 2008Inventors: Ki Young Kwak, Kang Min Lee
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Publication number: 20080299983Abstract: Provided are an apparatus and method for measuring a carrier-to-interference-and-noise ratio (CINR) using a downlink preamble in a digital communication system. More particularly, provided are an apparatus and method that measure CINRs using preambles of received signals respectively corresponding to a plurality of cells or sectors and perform handover and reverse power control using the CINRs in a digital communication system employing an orthogonal frequency division multiplexing (OFDM) technique or orthogonal frequency division multiple access (OFDMA) technique. According to the apparatus and method, it is possible to easily measure CINRs and perform handover and reverse power control using the measured CINRs. Therefore, deterioration in performance can be reduced even in a poor channel environment by maintaining a CINR received by a base station at an appropriate level.Type: ApplicationFiled: December 27, 2006Publication date: December 4, 2008Inventors: Ki Young Kwak, Kang Min Lee, Ji Myung Oh