Patents by Inventor Kikuo Furukawa

Kikuo Furukawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240084136
    Abstract: According to the present invention, there can be provided a photocurable composition comprising a sulfur (a) having a cyclic structure represented by the following formula (1), an episulfide compound (b), and a photopolymerization initiator (c), wherein the content of the sulfur (a) is 1 to 28 parts by mass, with respect to the total mass (100 parts by mass) of the sulfur (a) and the episulfide compound (b):
    Type: Application
    Filed: January 11, 2022
    Publication date: March 14, 2024
    Inventors: Kota KINJO, Kosuke NAMIKI, Kikuo FURUKAWA, Eiji KOSHIISHI
  • Patent number: 11214650
    Abstract: A composition for a high refractive index, low dispersion resin for a close-contact double layer-type composite diffractive optical element that is highly photocurable and provides a high productivity, and a close-contact double layer-type composite diffractive optical element using such composition are provided. A composition for a high refractive index, low dispersion resin for a close-contact double layer-type composite diffractive optical element includes a thiol compound represented by general formula (1) or an oligomer synthesized by use of a thiol compound represented by general formula (1) (A component); and an ene compound including two or more polymerizable unsaturated bonds (B component). (In the formula, p represents an integer of 2 to 5; Xp and Zp independently represent a hydrogen atom or a mercaptomethyl group; a ratio of sulfur atoms in a molecule is 40 to 80% by mass; and the number of thiol groups is 3 or larger.).
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: January 4, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke Namiki, Eiji Koshiishi, Kikuo Furukawa, Hiroshi Horikoshi
  • Patent number: 11186673
    Abstract: The purpose of the present invention is to appropriately control the rate of polymerization of a composition in which a thiol compound and an isocyanate compound are added to an episulfide compound and thereby provide an optical material which has high transparency. This composition for use as optical material comprises (a) an episulfide compound, (b) an isocyanate compound, (c) a thiol compound, and (d) a benzyl halide compound represented by formula (1): wherein: X is a halogen; L is selected from the group consisting of a hydrogen atom, a methyl group, a halogen, a mercaptomethyl group, and an isocyanate methyl group; and n is 1 or 2.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: November 30, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki Kariyazono, Takashi Aoki, Kouhei Takemura, Kikuo Furukawa
  • Publication number: 20200223975
    Abstract: The purpose of the present invention is to appropriately control the rate of polymerization of a composition in which a thiol compound and an isocyanate compound are added to an episulfide compound and thereby provide an optical material which has high transparency. This composition for use as optical material comprises (a) an episulfide compound, (b) an isocyanate compound, (c) a thiol compound, and (d) a benzyl halide compound represented by formula (1): wherein: X is a halogen; L is selected from the group consisting of a hydrogen atom, a methyl group, a halogen, a mercaptomethyl group, and an isocyanate methyl group; and n is 1 or 2.
    Type: Application
    Filed: February 26, 2018
    Publication date: July 16, 2020
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki KARIYAZONO, Takashi AOKI, Kouhei TAKEMURA, Kikuo FURUKAWA
  • Patent number: 10647819
    Abstract: According to the present invention, it is possible to provide a photocurable composition which comprises a cyclic compound (a) represented by formula (1), an episulfide compound (b), and a photopolymerization initiator (c). In a preferred embodiment, the proportion of the cyclic compound (a) in the photocurable composition is 5-80 mass %, the proportion of the episulfide compound (b) is 20-95 mass %, and the proportion of the photopolymerization initiator (c) is 0.1-10 parts by mass per 100 parts by mass of the sum of the cyclic compound (a) and the episulfide compound (b). In the formula, C represents a carbon atom, X represents S, Se, or Te, and a to f are integers of 0-3, provided that 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: May 12, 2020
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke Namiki, Yousuke Imagawa, Eiji Koshiishi, Kikuo Furukawa, Hiroshi Horikoshi
  • Patent number: 10526452
    Abstract: The present invention can provide a method for producing a cured product of an episulfide-based resin, the method having: (A) a step for obtaining a composition for a resin by mixing compound (a), compound (b) and a polymerization catalyst; (B) a step for pouring the composition for a resin into a mold; and (C) a step in which, by increasing the temperature of a heating medium, the composition for a resin is polymerized in the heating medium that contains a liquid having a thermal conductivity of 0.2 W/m·K or higher, or in a shower of the heating medium. The maximum temperature of the heating medium in step (C) is 55 to 110° C. (a) A compound which has two episulfide groups per molecule and which is represented by formula (1): wherein m represents an integer from 0 to 4 and n represents an integer from 0 to 2 (b) A compound having one or more thiol groups per molecule.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: January 7, 2020
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kousuke Namiki, Sawako Fuse, Eiji Koshiishi, Kikuo Furukawa, Hiroshi Horikoshi
  • Publication number: 20190127530
    Abstract: A composition for a high refractive index, and low dispersion resin for a close-contact double layer-type composite diffractive optical element that is highly photocurable and provides a high productivity, and a close-contact double layer-type composite diffractive optical element using such composition are provided. A composition for a high refractive index, and low dispersion resin for a close-contact double layer-type composite diffractive optical element includes a thiol compound represented by general formula (1) or an oligomer synthesized by use of a thiol compound represented by general formula (1) (A component); and an ene compound including two or more polymerizable unsaturated bonds (B component). (In the formula, p represents an integer of 2 to 5; Xp and Zp independently represent a hydrogen atom or a mercaptomethyl group; a ratio of sulfur atoms in a molecule is 40 to 80% by mass; and the number of thiol groups is 3 or larger.
    Type: Application
    Filed: April 6, 2017
    Publication date: May 2, 2019
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke NAMIKI, Eiji KOSHIISHI, Kikuo FURUKAWA, Hiroshi HORIKOSHI
  • Publication number: 20180265638
    Abstract: According to the present invention, it is possible to provide a photocurable composition which comprises a cyclic compound (a) represented by formula (1), an episulfide compound (b), and a photopolymerization initiator (c). In a preferred embodiment, the proportion of the cyclic compound (a) in the photocurable composition is 5-80 mass %, the proportion of the episulfide compound (b) is 20-95 mass %, and the proportion of the photopolymerization initiator (c) is 0.1-10 parts by mass per 100 parts by mass of the sum of the cyclic compound (a) and the episulfide compound (b). In the formula, C represents a carbon atom, X represents S, Se, or Te, and a to f are integers of 0-3, provided that 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).
    Type: Application
    Filed: October 7, 2016
    Publication date: September 20, 2018
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke NAMIKI, Yousuke IMAGAWA, Eiji KOSHIISHI, Kikuo FURUKAWA, Hiroshi HORIKOSHI
  • Patent number: 10005714
    Abstract: Provided are a novel alicyclic ester compound and a method for producing a compound of general formula (1) at a high yield from a compound of general formula (2) and a compound of general formula (3). An adamantane compound expressed by general formula (2) and a hydroxyalkyl (meth)acrylate ester compound expressed by general formula (3) are reacted with each other by use of a dehydration condensation agent as a catalyst to obtain an alicyclic ester compound expressed by general formula (1).
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: June 26, 2018
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiroyuki Tanagi, Hiroshi Horikoshi, Kikuo Furukawa, Shoichi Hayakawa, Hiroyasu Tanaka
  • Publication number: 20180171080
    Abstract: The present invention is able to provide a curable composition which contains a poly(meth)acrylate compound having a fluorene ring (component (A)), a polythiol compound having a thioalkyl structure (component (B)), an ene compound having a polycyclic aromatic hydrocarbon skeleton (component (C)), and a polymerization initiator (component (D)). A curable composition according to the present invention is especially useful as an adhesive for optical applications, and has high refractive index as an optical characteristic, while having low contractility, photocurability, colorlessness and transparency, viscosity suitable for work, and the like.
    Type: Application
    Filed: May 19, 2016
    Publication date: June 21, 2018
    Inventors: Kousuke NAMIKI, Sawako FUSE, Hitoshi OKAZAKI, Eiji KOSHIISHI, Kikuo FURUKAWA, Hiroshi HORIKOSHI
  • Patent number: 9994513
    Abstract: Provided are a resist and a compound for the resist improving the sensitivity, the resolution and the line edge roughness (LER) in a good balance without spoiling basic properties of a chemical amplification resist such as pattern shape, dry etching resistance, heat resistance and the like. Provided are a method for producing an alicyclic ester compound expressed by general formula (1), an alicyclic ester compound expressed by general formula (1), a (meth)acrylic copolymer obtained by polymerization of the alicyclic ester compound, and a photosensitive resin composition containing the (meth)acrylic copolymer. A method for producing an alicyclic ester compound expressed by general formula (1) includes reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: June 12, 2018
    Assignee: Mitsubishi Gas Chemical, Inc.
    Inventors: Shoichi Hayakawa, Hiroshi Horikoshi, Kikuo Furukawa, Hiroyasu Tanaka, Hiroyuki Tanagi
  • Patent number: 9951163
    Abstract: The present invention provides a resist or a compound for use as a resist, which is highly sensitive and well-balanced without losing the fundamental physical properties required as a chemically amplified resist (e.g., resolution, line edge roughness (LER)). The present invention is directed to a (meth)acrylate compound represented by general formula (1) and a process for preparation thereof, as well as a (meth)acrylic copolymer obtainable by polymerization of the (meth)acrylate compound of general formula (1) and a photosensitive resin composition thereof: (wherein R1 represents a hydrogen atom or a methyl group, R2 represents a linear or branched alkyl group containing 2 to 4 carbon atoms, and each R3 may be the same or different and represents a group represented by the following formula (2) or (3), etc.) (provided that formulae (2) and (3) are as defined in the specification of the present application).
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: April 24, 2018
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiroyasu Tanaka, Shoichi Hayakawa, Hiroyuki Tanagi, Kikuo Furukawa, Hiroshi Horikoshi
  • Patent number: 9920169
    Abstract: According to the present invention, a curable composition can be provided, said composition being characterized by comprising: (A) an episulfide compound; and (B) a photobase generator comprising an organoboron compound represented by general formula (1) below: (In general formula (1), R1, R2, R3, R4 and R5 may be the same as or different from one another and independently represent an alkyl group having 1 to 8 carbon atoms; and Ar1, Ar2 and Ar3 may be the same as or different from one another and independently represent a group selected from the group consisting of a phenyl group, a naphthyl group, an anthracenyl group and a phenanthryl group, each of which may have a substituent selected from the group consisting of an alkyl group, an aryl group, an alkenyl group, a cycloalkyl group and a heterocyclic group.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: March 20, 2018
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kousuke Namiki, Hitoshi Okazaki, Eiji Koshiishi, Sawako Fuse, Kikuo Furukawa
  • Publication number: 20170044323
    Abstract: The present invention can provide a method for producing a cured product of an episulfide-based resin, the method having: (A) a step for obtaining a composition for a resin by mixing compound (a), compound (b) and a polymerization catalyst; (B) a step for pouring the composition for a resin into a mold; and (C) a step in which, by increasing the temperature of a heating medium, the composition for a resin is polymerized in the heating medium that contains a liquid having a thermal conductivity of 0.2 W/m·K or higher, or in a shower of the heating medium. The maximum temperature of the heating medium in step (C) is 55 to 110° C. (a) A compound which has two episulfide groups per molecule and which is represented by formula (1): wherein m represents an integer from 0 to 4 and n represents an integer from 0 to 2 (b) A compound having one or more thiol groups per molecule.
    Type: Application
    Filed: April 20, 2015
    Publication date: February 16, 2017
    Inventors: Kousuke NAMIKI, Sawako FUSE, Eiji KOSHIISHI, Kikuo FURUKAWA, Hiroshi HORIKOSHI
  • Publication number: 20170008830
    Abstract: Provided are a novel alicyclic ester compound and a method for producing a compound of general formula (1) at a high yield from a compound of general formula (2) and a compound of general formula (3).
    Type: Application
    Filed: February 12, 2015
    Publication date: January 12, 2017
    Inventors: Hiroyuki TANAGI, Hiroshi HORIKOSHI, Kikuo FURUKAWA, Shoichi HAYAKAWA, Hiroyasu TANAKA
  • Publication number: 20160355461
    Abstract: Provided are a resist and a compound for the resist improving the sensitivity, the resolution and the line edge roughness (LER) in a good balance without spoiling basic properties of a chemical amplification resist such as pattern shape, dry etching resistance, heat resistance and the like. Provided are a method for producing an alicyclic ester compound expressed by general formula (1), an alicyclic ester compound expressed by general formula (1), a (meth)acrylic copolymer obtained by polymerization of the alicyclic ester compound, and a photosensitive resin composition containing the (meth)acrylic copolymer. A method for producing an alicyclic ester compound expressed by general formula (1) includes reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid.
    Type: Application
    Filed: February 12, 2015
    Publication date: December 8, 2016
    Inventors: Shoichi HAYAKAWA, Hiroshi HORIKOSHI, Kikuo FURUKAWA, Hiroyasu TANAKA, Hiroyuki TANAGI
  • Publication number: 20160347896
    Abstract: The present invention provides a resist or a compound for use as a resist, which is highly sensitive and well-balanced without losing the fundamental physical properties required as a chemically amplified resist (e.g., resolution, line edge roughness (LER)). The present invention is directed to a (meth)acrylate compound represented by general formula (1) and a process for preparation thereof, as well as a (meth)acrylic copolymer obtainable by polymerization of the (meth)acrylate compound of general formula (1) and a photosensitive resin composition thereof: (wherein R1 represents a hydrogen atom or a methyl group, R2 represents a linear or branched alkyl group containing 2 to 4 carbon atoms, and each R3 may be the same or different and represents a group represented by the following formula (2) or (3), etc.) (provided that formulae (2) and (3) are as defined in the specification of the present application).
    Type: Application
    Filed: January 30, 2015
    Publication date: December 1, 2016
    Inventors: Hiroyasu TANAKA, Shoichi HAYAKAWA, Hiroyuki TANAGI, Kikuo FURUKAWA, Hiroshi HORIKOSHI
  • Patent number: 9477151
    Abstract: The present invention provides, as a chemically amplified resist, a well-balanced resist or compound which results in improved sensitivity, resolution and line edge roughness (LER) without impairing the fundamental physical properties required as a resist (e.g., pattern shape, dry etching resistance, heat resistance). A mixture of cycloaliphatic ester compounds represented by general formulae (1) to (3), and a process for preparation thereof, as well as a (meth)acrylic copolymer comprising the cycloaliphatic ester compounds of general formulae (1) to (3) and a photosensitive resin composition thereof are provided.
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: October 25, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shoichi Hayakawa, Yoshio Nishimura, Kikuo Furukawa, Hiroyasu Tanaka
  • Publication number: 20160152774
    Abstract: According to the present invention, a curable composition can be provided, said composition being characterized by comprising: (A) an episulfide compound; and (B) a photobase generator comprising an organoboron compound represented by general formula (1) below: (In general formula (1), R1, R2, R3, R4 and R5 may be the same as or different from one another and independently represent an alkyl group having 1 to 8 carbon atoms; and Ar1, Ar2 and Ar3 may be the same as or different from one another and independently represent a group selected from the group consisting of a phenyl group, a naphthyl group, an anthracenyl group and a phenanthryl group, each of which may have a substituent selected from the group consisting of an alkyl group, an aryl group, an alkenyl group, a cycloalkyl group and a heterocyclic group.
    Type: Application
    Filed: June 26, 2014
    Publication date: June 2, 2016
    Inventors: Kousuke Namiki, Hitoshi Okazaki, Eiji Koshiishi, Sawako Fuse, Kikuo Furukawa
  • Publication number: 20160070168
    Abstract: The present invention provides, as a chemically amplified resist, a well-balanced resist or compound which results in improved sensitivity, resolution and line edge roughness (LER) without impairing the fundamental physical properties required as a resist (e.g., pattern shape, dry etching resistance, heat resistance). A mixture of cycloaliphatic ester compounds represented by general formulae (1) to (3), and a process for preparation thereof, as well as a (meth)acrylic copolymer comprising the cycloaliphatic ester compounds of general formulae (1) to (3) and a photosensitive resin composition thereof are provided.
    Type: Application
    Filed: April 22, 2014
    Publication date: March 10, 2016
    Inventors: Shoichi Hayakawa, Yoshio Nishimura, Kikuo Furukawa, Hiroyasu Tanaka