Patents by Inventor Kimihiro Matsukawa

Kimihiro Matsukawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11084915
    Abstract: Provided is a means capable of realizing a surface-roughening method for modifying the surface of a resin molded article to form a surficial layer, such as a coating or plating, or to impart a function derived from the surface configuration. The method comprises adding a resin composition and performing a post-treatment and is thus simpler and easier than conventional methods. The resin composition is a composition for resin surface roughening that contains an aliphatic polycarbonate and an alkali metal salt.
    Type: Grant
    Filed: December 26, 2016
    Date of Patent: August 10, 2021
    Assignees: Sumitomo Seika Chemicals Co., Ltd., Osaka Research Institute of Industrial Science and Technology
    Inventors: Kiyoshi Nishioka, Hiroki Maeda, Kei Ishikura, Kimihiro Matsukawa, Yukiyasu Kashiwagi, Masashi Saitoh
  • Publication number: 20210147634
    Abstract: A (poly)glycerol-based alkoxysilane having a (poly)glycerol skeleton with an average polymerization degree of 1 to 100, and a plurality of alkoxysilyl groups at a terminal is provided as a novel material capable of imparting sustainable anti-fogging properties to a base material such as glass.
    Type: Application
    Filed: November 19, 2020
    Publication date: May 20, 2021
    Applicant: SAKAMOTO YAKUHIN KOGYO CO., LTD.
    Inventors: Shiori HARADA, Hikaru OGAWA, Yukiko TANIHATA, Kimihiro MATSUKAWA
  • Publication number: 20200239759
    Abstract: The present invention is a thermally conductive particle-filled fiber containing a resin and thermally conductive particles, wherein at least some of the thermally conductive particles are present inside the fiber, an average particle diameter of the thermally conductive particles is 10 to 1000 nm, and an average fiber diameter of the fiber is 50 to 10000 nm.
    Type: Application
    Filed: May 10, 2018
    Publication date: July 30, 2020
    Inventors: Kazuhide YOSHIYAMA, Kensuke NAKA, Kimihiro MATSUKAWA
  • Publication number: 20180371197
    Abstract: Provided is a means capable of realizing a surface-roughening method for modifying the surface of a resin molded article to form a surficial layer, such as a coating or plating, or to impart a function derived from the surface configuration. The method comprises adding a resin composition and performing a post-treatment and is thus simpler and easier than conventional methods. The resin composition is a composition for resin surface roughening that contains an aliphatic polycarbonate and an alkali metal salt.
    Type: Application
    Filed: December 26, 2016
    Publication date: December 27, 2018
    Applicants: SUMITOMO SEIKA CHEMICALS CO., LTD., OSAKA RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Kiyoshi NISHIOKA, Hiroki MAEDA, Kei ISHIKURA, Kimihiro MATSUKAWA, Yukiyasu KASHIWAGI, Masashi SAITOH
  • Patent number: 9890264
    Abstract: An objective of the present invention is to provide an organic-inorganic hybrid acrylic polymer having an increased refractive index, which has a higher transparency and a less impaired scratch resistance; a metal oxide dispersion and a polymerizable composition as materials for the polymer; and the organic-inorganic hybrid polymer capable of being produced in a crack-free manner. Another objective of the present invention is to provide a high-performance antireflection film using the organic-inorganic hybrid polymer. The metal oxide dispersion of the present invention comprises a phosphorus compound represented by Formula (1): (wherein, R1 is a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; R2 is an organic residue; and n is 1 or 2) and a metal oxide.
    Type: Grant
    Filed: April 24, 2013
    Date of Patent: February 13, 2018
    Assignees: OSAKA RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE AND TECHNOLOGY, DAIHACHI CHEMICAL INDUSTRY CO., LTD.
    Inventors: Kimihiro Matsukawa, Seiji Watase, Manabu Hirata
  • Patent number: 9845394
    Abstract: Provided are a method for easily and quickly producing a patterned thin film having a high refractive index and a high transparency, and a highly refractive thin film produced by the method. The method comprises a first step: a step of forming, on a substrate, a coating using a sol containing a metal oxide modified with a phosphorus compound represented by the following formula (1): (wherein R1 is a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; R2 is a divalent organic residue; and n is 1 or 2); a second step: a step of curing the coating on the substrate obtained in the first step by light irradiation; and a third step: a step of further adding energy to the cured film obtained in the second step by heating and/or light irradiation.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: December 19, 2017
    Assignees: OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE, DAIHACHI CHEMICAL INDUSTRY CO., LTD.
    Inventors: Kimihiro Matsukawa, Seiji Watase, Koji Mitamura, Manabu Hirata
  • Publication number: 20160200913
    Abstract: Provided are a method for easily and quickly producing a patterned thin film having a high refractive index and a high transparency, and a highly refractive thin film produced by the method. The method comprises a first step: a step of forming, on a substrate, a coating using a sol containing a metal oxide modified with a phosphorus compound represented by the following formula (1): (wherein R1 is a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; R2 is a divalent organic residue; and n is 1 or 2); a second step: a step of curing the coating on the substrate obtained in the first step by light irradiation; and a third step: a step of further adding energy to the cured film obtained in the second step by heating and/or light irradiation.
    Type: Application
    Filed: August 20, 2014
    Publication date: July 14, 2016
    Applicants: OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE, DAIHACHI CHEMICAL INDUSTRY CO., LTD.
    Inventors: Kimihiro MATSUKAWA, Seiji WATASE, Koji MITAMURA, Manabu HIRATA
  • Publication number: 20150051344
    Abstract: An objective of the present invention is to provide an organic-inorganic hybrid acrylic polymer having an increased refractive index, which has a higher transparency and a less impaired scratch resistance; a metal oxide dispersion and a polymerizable composition as materials for the polymer; and the organic-inorganic hybrid polymer capable of being produced in a crack-free manner. Another objective of the present invention is to provide a high-performance antireflection film using the organic-inorganic hybrid polymer. The metal oxide dispersion of the present invention comprises a phosphorus compound represented by Formula (1): (wherein, R1 is a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; R2 is an organic residue; and n is 1 or 2) and a metal oxide.
    Type: Application
    Filed: April 24, 2013
    Publication date: February 19, 2015
    Inventors: Kimihiro Matsukawa, Seiji Watase, Manabu Hirata
  • Patent number: 8318885
    Abstract: A curable resin composition which is easily cured by heating or ultraviolet irradiation and capable of forming a thick cured film due to low shrinkage. This curable resin composition enables to obtain a cured product satisfying various characteristics such as heat resistance, chemical resistance, high surface hardness and high refractive index. Also disclosed is a cured product obtained from such a composition.
    Type: Grant
    Filed: May 3, 2010
    Date of Patent: November 27, 2012
    Assignee: Arakawa Chemical Industries Ltd.
    Inventors: Kimihiro Matsukawa, Takeshi Fukuda, Hideki Goda
  • Publication number: 20100215937
    Abstract: A curable resin composition which is easily cured by heating or ultraviolet irradiation and capable of forming a thick cured film due to low shrinkage. This curable resin composition enables to obtain a cured product satisfying various characteristics such as heat resistance, chemical resistance, high surface hardness and high refractive index. Also disclosed is a cured product obtained from such a composition.
    Type: Application
    Filed: May 3, 2010
    Publication date: August 26, 2010
    Applicant: Arakawa Chemical Industries, Ltd.
    Inventors: Kimihiro Matsukawa, Takeshi Fukuda, Hideki Goda
  • Publication number: 20090286015
    Abstract: A curable resin composition which is easily cured by heating or ultraviolet irradiation and capable of forming a thick cured film due to low shrinkage. This curable resin composition enables to obtain a cured product satisfying various characteristics such as heat resistance, chemical resistance, high surface hardness and high refractive index. Also disclosed is a cured product obtained from such a composition.
    Type: Application
    Filed: July 19, 2006
    Publication date: November 19, 2009
    Applicant: AKAKAWA CHEMICAL INDUSTRIES, LTD
    Inventors: Kimihiro Matsukawa, Takeshi Fukuda, Hideki Goda
  • Publication number: 20090206328
    Abstract: Disclosed is a photosensitive composition having photosensitivity which is alkaline developable without containing a crosslinking agent. Specifically disclosed is a silicon-containing photosensitive composition characterized by containing a silicon-containing polymer including at least one polymer (A1) represented by the general formula (1) below, wherein at least one of R11-R1n is an H and the rest of them are organic groups, or at least one polymer (A1) and one polymer (A2) represented by the general formula (2) below, and a compound (B) which generates an acid or a base when irradiated with an active ray or radiation ray. (In the formula, at least one of R11-R1n represents an H, and n represents an integer of 1 or more.) (In the formula, R21-R2n represent atoms other than H or functional groups, and n represents an integer of 1 or more.
    Type: Application
    Filed: December 28, 2005
    Publication date: August 20, 2009
    Applicants: SEKISUI CHEMICAL CO., LTD.
    Inventors: Kimihiro Matsukawa, Yukihito Matsuura, Kenichi Azuma, Shigeru Nakamura, Yasunari Kusaka