Patents by Inventor Kirkwood Rough

Kirkwood Rough has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210065956
    Abstract: A coil having a coil body and a plurality of concentric cross-section windings of wire disposed around the coil body, the wire having a spacing between adjacent turns of about 0.25 to 1.0 of the radius of the wire. Also, a coil for a plasma processing device, the coil having a coil body and a plurality of concentric cylindrical cross-section windings of wire disposed around the coil body, the wire having a spacing between adjacent turns of about 0.25 to 1.0 of the radius of the wire and a diameter to length ratio of between about 2:1 and about 3:1.
    Type: Application
    Filed: August 28, 2020
    Publication date: March 4, 2021
    Inventors: Kirkwood Rough, Aaron Cuttino
  • Publication number: 20090026912
    Abstract: Method and apparatus for achieving an intensity modulated electron blanker are disclosed. An apparatus includes a cathode exposed to an activation source to generate an electron beam. Cathode control circuitry adjusts a cathode control amplifier to regulate cathode voltage and the potential of the electron beam. In some approaches the electron beam potential is used to control the blanking frequency, switching speeds, and duty cycle. In another approach electron generating beams directed on to the cathode are modulated to control the electron beam.
    Type: Application
    Filed: July 26, 2007
    Publication date: January 29, 2009
    Inventors: Vincenzo Lordi, Kirkwood Rough, Xuefeng Liu, Shem-Tov Levi
  • Patent number: 5814195
    Abstract: A sputtering system using an AC power supply in the range of 10 kHz to 100 kHz uses two rotatable cylindrical magnetrons. The rotatable cylindrical magnetrons, when used for depositing a dielectric layer onto a substrate, clean off dielectric material that is deposited onto the target. This prevents a dielectric layer on the target from acting like a capacitor and may help avoid arcing. Additionally, an impedance-limiting capacitor can be placed in series in the electrical path between the targets through the transformer so as to reduce arcing. This impedance-limiting capacitor has a value much larger than the capacitors used to couple the power supply to a target in radio frequency sputtering systems.
    Type: Grant
    Filed: October 25, 1996
    Date of Patent: September 29, 1998
    Assignee: The Boc Group, Inc.
    Inventors: John Lehan, Henry Byorum, Russell J. Hill, J. Kirkwood Rough
  • Patent number: 5502306
    Abstract: There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means.
    Type: Grant
    Filed: March 17, 1994
    Date of Patent: March 26, 1996
    Assignee: KLA Instruments Corporation
    Inventors: Dan Meisburger, Alan D. Brodie, Curt Chadwick, Anil Desai, Hans Dohse, Dennis Emge, John Greene, Ralph Johnson, Ming-Yie Ling, John McMurtry, Barry Becker, Ray Paul, Mike Robinson, Richard Simmons, David E. A. Smith, John Taylor, Lee Veneklasen, Dean Walters, Paul Wieczorek, Sam Wong, April Dutta, Surendra Lele, Kirkwood Rough, Henry Pearce-Percy, Jack Y. Jau, Chun C. Lin, Hoi T. Nguyen, Yen-Jen Oyang, Timothy L. Hutcheson, David J. Clark, Chung-Shih Pan, Chetana Bhaskar, Chris Kirk, Eric Munro