Patents by Inventor Kirthi K. Kattige

Kirthi K. Kattige has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma activated conformal dielectric film deposition
    Patent number: 8999859
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: April 7, 2015
    Assignee: Novellus Systems, Inc.
    Inventors: Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi K. Kattige, Bart K. van Schravendijk, Andrew J. McKerrow
  • PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
    Publication number: 20140216337
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Application
    Filed: December 18, 2013
    Publication date: August 7, 2014
    Applicant: Novellus Systems, Inc.
    Inventors: Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi K. Kattige, Bart K. van Schravendijk, Andrew J. McKerrow
  • Plasma activated conformal dielectric film deposition
    Patent number: 8637411
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: January 28, 2014
    Assignee: Novellus Systems, Inc.
    Inventors: Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi K. Kattige, Bart J. van Schravendijk, Andrew J. McKerrow
  • PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
    Publication number: 20120028454
    Abstract: Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
    Type: Application
    Filed: September 23, 2011
    Publication date: February 2, 2012
    Inventors: Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram, Vishwanathan Rangarajan, Kirthi K. Kattige, Bart J. van Schravendijk, Andrew J. McKerrow