Kiyoharu Tadanaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: A process for producing an optical element which has excellent heat resistance and adhesion to a substrate. This process comprises applying a liquid composition for forming an optical element to the molding surface of a substrate having a regular pattern surface consisting of areas having high wettability and areas having low wettability as the molding surface and curing the composition to form projections in the areas having high wettability. A solution containing at least one compound selected from the group consisting of a hydrolyzable compound which can be hydrolyzed and polycondensed and a hydrolyzed/polycondensed product thereof is used as the liquid composition for forming an optical element.
Abstract: The invention is about a process for depositing via the sol-gel route a continuous or discontinuous layer based on metal oxide(s) on a substrate (1), especially a transparent substrate, which includes at least the following steps:
(a)—preparation of a sol from at least one metal precursor, at least one chelating/stabilizing agent, optionally at least one solvent and/or at least one dopant precursor,
(b)—deposition of the sol as a layer on at least part of one of the faces of the substrate (1),
(c)—irradiation by ultraviolet rays of at least part of the sol deposited as a layer on the substrate (1),
(d)—heat treatment of at least that part of the sol which was irradiated by the ultraviolet rays.
Abstract: There can be provided a method for producing a pattern film-coated article which has excellent film formability, can remove unexposed portions of a film completely in the development step after exposing the film to light. and has excellent pattern accuracy; and a photosensitive composition.
Abstract: An article with a predetermined surface pattern that is coated with a film which makes possible the complete transfer of the pattern of a patterning die and thick-film patterning having a depth to the order of several tens of micrometers, prevents the occurrence of cracks, has high film hardness, and has a surface pattern which is the inverse of the surface pattern of the patterning die. This article is produced by joining a patterning die closely to a substrate with a sol-gel material containing the silane compound represented by the formula: R1SiX3 (wherein R1 is an alkyl group or hydrogen and X is an alkoxyl group or a halogen atom) and the silane compound represented by the formula: R2SiY3 (wherein R2 is an aryl group or a substituted aryl group and Y is an alkoxyl group or a halogen atom) disposed therebetween in the form of a film and heating them to coat the surface of the substrate with a gel film having a surface pattern which is the inverse of the surface pattern of the patterning die.