Patents by Inventor Kiyoshi Murata
Kiyoshi Murata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240243010Abstract: An inhibitor for selectively depositing a thin film may include a compound represented by Formula 1 below: where, R1 is an aldehyde group, an amino group, a carbonyl group, a ketone group, a nitrile group, an acyl halide group, a substituted or unsubstituted C2 to C20 alkenyl group, or a substituted or unsubstituted C2 to C20 alkynyl group, R2 is a halogen atom, a substituted or unsubstituted C1 to C10 alkylhalide group, a substituted or unsubstituted C4 to C10 tertiary alkyl group, or a substituted or unsubstituted C1 to C10 alkylthio group, and n is an integer from 1 to 5. The inhibitor is adsorbed to a surface of a first layer but not adsorbed to a surface of a second layer. The first layer may include a metal-based material, and the second layer is different from the first layer and may include an insulating material.Type: ApplicationFiled: January 3, 2024Publication date: July 18, 2024Applicant: ADEKA CORPORATIONInventors: JIHYUN LEE, EUN HYEA KO, SOYOUNG LEE, THANH CUONG NGUYEN, HOON HAN, BYUNGKEUN HWANG, HIROYUKI UCHIUZOU, KIYOSHI MURATA, TOMOHARU YOSHINO, YOUNJOUNG CHO
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Publication number: 20240067663Abstract: An yttrium compound, a method of manufacturing an integrated circuit device, and a raw material for forming an yttrium-containing film, the yttrium compound being represented by the following General formula (1):Type: ApplicationFiled: August 8, 2023Publication date: February 29, 2024Applicant: ADEKA CORPORATIONInventors: Hyunwoo KIM, Kazuki HARANO, Kiyoshi MURATA, Haruyoshi SATO, Seungmin RYU, Gyuhee PARK, Younjoung CHO, Atsushi YAMASHITA
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Publication number: 20230369039Abstract: A method of manufacturing a semiconductor device is provided. The method includes providing a first layer having a first surface and a second layer having a second surface orthogonal to the first surface in a vertical direction, forming an inhibitor layer conformally on the first surface and the second surface, exposing the second surface by selectively removing the inhibitor layer on the second surface among the first surface and the second surface, the exposing of the second surface may include selectively removing an edge portion of the inhibitor layer on the first surface, the edge portion contacting the second surface, and forming an interest layer on the exposed second surface.Type: ApplicationFiled: May 10, 2023Publication date: November 16, 2023Applicants: Samsung Electronics Co., Ltd., ADEKA CORPORATIONInventors: Eunhyea KO, Daihyun Kim, Thanh Cuong Nguyen, Soyoung Lee, Jihyun Lee, Hoon Han, Byungkeun Hwang, Hiroyuki Uchiuzou, Kiyoshi Murata, Tomoharu Yoshino, Youjoung Cho
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Publication number: 20230215723Abstract: To manufacture an integrated circuit (IC) device, a structure in which a first material film including silicon atoms and nitrogen atoms and a second material film devoid of nitrogen atoms is formed on a substrate. A carbonyl compound having a functional group without an ?-hydrogen is applied to the structure, and thus, an inhibitor is selectively formed only on an exposed surface of the first material film from among the first material film and the second material film.Type: ApplicationFiled: December 29, 2022Publication date: July 6, 2023Applicant: ADEKA CORPORATIONInventors: EUNHYEA KO, Hoon Han, Soyoung Lee, Thanh Cuong Nguyen, Hiroyuki Uchiuzou, Kiyoshi Murata, Tomoharu Yoshino, Daekeon Kim, Younjoung Cho, Jiyu Choi, Byungkeun Hwang
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Patent number: 11667730Abstract: An oxime ester compound represented by general formula (I): wherein R1, R2, and R3 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R4 and R5 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.Type: GrantFiled: June 22, 2017Date of Patent: June 6, 2023Assignee: ADEKA CORPORATIONInventors: Daisuke Sawamoto, Koichi Kimijima, Kiyoshi Murata, Yasunori Kozaki, Takeo Oishi
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Publication number: 20230040334Abstract: An yttrium compound and a method of manufacturing an integrated circuit device, the compound being represented by General Formula (I):Type: ApplicationFiled: July 7, 2022Publication date: February 9, 2023Applicant: ADEKA CORPORATIONInventors: Hyunwoo KIM, Kazuki HARANO, Kiyoshi MURATA, Haruyoshi SATO, Younsoo KIM, Seungmin RYU, Atsushi YAMASHITA, Gyuhee PARK, Younjoung CHO
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Publication number: 20170283520Abstract: An oxime ester compound represented by general formula (I): wherein R1, R2, and R3 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R4 and R5 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.Type: ApplicationFiled: June 22, 2017Publication date: October 5, 2017Inventors: Daisuke SAWAMOTO, Koichi KIMIJIMA, Kiyoshi MURATA, Yasunori KOZAKI, Takeo OISHI
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Patent number: 9594302Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R5, R6, R7, R8, R9, R10, and R11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.Type: GrantFiled: March 5, 2013Date of Patent: March 14, 2017Assignee: ADEKA CORPORATIONInventors: Takeo Oishi, Koichi Kimijima, Nobuhide Tominaga, Hirokatsu Shinano, Daisuke Sawamoto, Kiyoshi Murata
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Patent number: 9403925Abstract: Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C): (wherein, ring A represents a benzene ring or a cyclohexyl ring; R1 represents an alkylene group having 1 to 6 carbon atoms; R2 represents an alkyl group having 1 to 4 carbon atoms; a represents a number of 0 or 1; b represents an integer of 0 to 3; and c represents a number of 1 or 2).Type: GrantFiled: August 24, 2012Date of Patent: August 2, 2016Assignee: ADEKA CORPORATIONInventors: Kenichiro Hiwatari, Atsuo Tomita, Tomoaki Saiki, Kiyoshi Murata
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Publication number: 20140187715Abstract: Provided are: a curable composition from which a cured article having excellent molding processability and high heat resistance as well as such a high Tg that it can be used as a molding resin for a SiC power semiconductor can be obtained; and a cured article thereof. The curable composition comprises: 100 parts by mass of a compound having at least two partial structures represented by the following Formula (1) in the molecule as a component (A); 0.5 to 3 parts by mass of a thermal radical generator as a component (B); and 0 to 50 parts by mass of other radical-reactive compound as a component (C): (wherein, ring A represents a benzene ring or a cyclohexyl ring; R1 represents an alkylene group having 1 to 6 carbon atoms; R2 represents an alkyl group having 1 to 4 carbon atoms; a represents a number of 0 or 1; b represents an integer of 0 to 3; and c represents a number of 1 or 2).Type: ApplicationFiled: August 24, 2012Publication date: July 3, 2014Applicant: ADEKA CORPORATIONInventors: Kenichiro Hiwatari, Atsuo Tomita, Tomoaki Saiki, Kiyoshi Murata
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Publication number: 20140144482Abstract: When a tab wire 20 is connected to a busbar electrode 12 on a surface side of a photovoltaic cell 6, the bonding strength at the connection part can be improved and electric resistance can be reduced without reducing the amount of received light. The busbar electrode 12 and the tab wire 20 are bonded via conductive resin 22 having light-transmission property. This conductive resin 22 covers at least a part of a side face of the busbar electrode 12, and preferably reaches the surface of the photovoltaic cell 6. The tab wire 20 may have a width smaller than a width of the busbar electrode 12.Type: ApplicationFiled: February 3, 2014Publication date: May 29, 2014Applicant: JX NIPPON OIL & ENERGY CORPORATIONInventors: Noriyo Ishimaru, Shigeki Kondo, Kiyoshi Murata, Yasushi Fukuda
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Patent number: 8252512Abstract: An novel epoxy compound is represented by the general formula (I) and has a benzo- or naphtho-cycloalkane skeleton: X, Y, and Z each independently represent an alkyl group having 1-10 carbon atoms and optionally substituted with a halogen atom, an aryl group having 6-20 carbon atoms and optionally substituted with a halogen atom, an arylalkyl group having 7-20 carbon atoms and optionally substituted with a halogen atom, a heterocyclic group having 2-20 carbon atoms and optionally substituted with a halogen atom, or a halogen atom; k represents a number of 0-4; p represents a number of 0-8; r represents a number of 0-4; n represents 0-10; x represents a number of 0-4; y represents a number of 0-4; a sum of x and y is 2-4; and an optical isomer that exists when n is not 0 may be of any type.Type: GrantFiled: April 28, 2008Date of Patent: August 28, 2012Assignee: Adeka CorporationInventors: Taiki Mihara, Kiyoshi Murata, Koichi Kimijima
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Patent number: 8197710Abstract: A polymerizable compound represented by general formula (1): wherein Z1 and Z2 each represent a (meth)acryloyloxy group; X1 and X2 each independently represent a single bond, an optionally branched alkylene group having 1 to 8 carbon atoms, an ether linkage, —COO—, —OCO—, —OCOO—, a 6-membered ring optionally having a substituent, or a combination thereof; R1 represents —R?, —OR?, —CO—R?, or —OCO—R?; R? represents a halogen atom, an optionally branched alkyl group having 1 to 8 carbon atoms, or a 6-membered ring optionally having a substituent, L1 and L2 each independently represent a member selected from a single bond, —CH2CH2—, —CH?CH—, —C?C—, —CH2O—, —OCH2—, —COO—, and —OCO—; m represents an integer of 1 to 4; and the R1's may be the same or different.Type: GrantFiled: October 9, 2007Date of Patent: June 12, 2012Assignee: Adeka CorporationInventors: Rieko Hamada, Masatomi Irisawa, Kiyoshi Murata
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Patent number: 8148045Abstract: A novel compound is a highly-sensitive photopolymerization initiator with excellent stability, low sublimability, excellent developability, and high transmittance in the visible region. It efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using such compound. An oxime ester compound is represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: R1 and R2 each represent R11, COR11, CONR12R13, CN, etc.; R11, R12, and R13 each represent a C1-20 alkyl group, etc.; R3 and R4 each represent R11, OR11, COR11, CONR12R13, OCOR11, CN, a halogen atom, etc.; a and b each represent an integer 0-4; X represents an oxygen atom, a sulfur atom, etc.Type: GrantFiled: November 19, 2010Date of Patent: April 3, 2012Assignee: Adeka CorporationInventors: Kiyoshi Murata, Takeo Oishi, Koichi Kimijima
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Patent number: 8117004Abstract: To increase the overall efficiency of a test apparatus, provided is a test module that includes an instruction information storage section that stores instruction information indicating an order in which basic patterns are expanded; a basic pattern data storage section that stores basic pattern data; a plurality of pattern generating sections that each include a temporary instruction information storage section, which temporarily stores a portion of the instruction information, and that each generate a test pattern supplied to a device under test by expanding the basic pattern data in the order indicated by the instruction information stored in the corresponding temporary instruction information storage section; and a plurality of position information storage sections that independently store position information indicating reading positions of the instruction information stored in the instruction information storage section that is common to the plurality of pattern generating sections, in association with eType: GrantFiled: March 30, 2008Date of Patent: February 14, 2012Assignee: Advantest CorporationInventors: Sami Akhtar, Kiyoshi Murata, Tomoyuki Sugaya
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Patent number: 8010851Abstract: A testing module including a designation information storing section that stores designation information designating an order of decoding fundamental patterns, a fundamental pattern storing section that stores the fundamental patterns, a plurality of pattern generating sections that each generate a test pattern to be supplied to a device under test, a plurality of position information storing sections that each store, in association with a corresponding pattern generating section, position information designating a read position from which the designation information is read from the designation information storing section, and an information transmission path shared by the pattern generating sections that transmits a part of the designation information from the designation information storing section to the designation information temporary storing section in each pattern generating section.Type: GrantFiled: March 31, 2008Date of Patent: August 30, 2011Assignee: Advantest CorporationInventors: Sami Akhtar, Kiyoshi Murata, Tomoyuki Sugaya
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Publication number: 20110129778Abstract: The invention provides a novel compound useful as a highly-sensitive photopolymerization initiator that has excellent stability, low sublimability, excellent developability, and high transmittance in the visible region and that efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using the above-described compound. Specifically, the invention provides an oxime ester compound represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: wherein, R1 and R2 each represent R11, COR11, CONR12R13, CN, etc.; R11, R12, and R13 each represent a C1-20 alkyl group, etc.; R3 and R4 each represent R11, OR11, COR11, CONR12R13, OCOR11, CN, a halogen atom, etc.Type: ApplicationFiled: November 19, 2010Publication date: June 2, 2011Applicant: ADEKA CORPORATIONInventors: Kiyoshi MURATA, Takeo OISHI, Koichi KIMIJIMA
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Publication number: 20100294990Abstract: A polymerizable compound represented by general formula (1): wherein Z1 and Z2 each represent a (meth)acryloyloxy group; X1 and X2 each independently represent a single bond, an optionally branched alkylene group having 1 to 8 carbon atoms, an ether linkage, —COO—, —OCO—, —OCOO—, a 6-membered ring optionally having a substituent, or a combination thereof; R1 represents —R?, —OR?, —CO—R?, or —OCO-R?; R? represents a halogen atom, an optionally branched alkyl group having 1 to 8 carbon atoms, or a 6-membered ring optionally having a substituent, L1 and L2 each independently represent a member selected from a single bond, —CH2CH2—, —CH?CH—, —C?C—, —CH2O—, —OCH2—, —COO—, and —OCO—; m represents an integer of 1 to 4; and the R1's may be the same or different.Type: ApplicationFiled: October 9, 2007Publication date: November 25, 2010Applicant: ADEKA CORPORATIONInventors: Rieko Hamada, Masatomi Irisawa, Kiyoshi Murata
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Patent number: 7779313Abstract: Provided is test apparatus with higher testing efficiency, including: plurality of pattern generating sections generating test pattern to supply to devices under test; group control section controlling group of pattern generating sections out of the pattern generating sections, and generating control signal upon receiving signal output from any pattern generating section controlled; range information storage section storing range information indicating range of pattern generating sections, out of the pattern generating sections, that serve to test one independent device under test; and comprehensive control section receiving the control signal from the group control section, identifying any pattern generating section that supplies the test pattern to the same device under test as that to which the pattern generating section having output the signal supplies the test pattern based on the range information, and in response to the control signal, controlling any other group control section that controls the idenType: GrantFiled: March 30, 2008Date of Patent: August 17, 2010Assignee: Advantest CorporationInventors: Kiyoshi Murata, Tomoyuki Sugaya, Sami Akhtar
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Publication number: 20100015551Abstract: An novel epoxy compound is represented by the general formula (I) and has a benzo- or naphtho-cycloalkane skeleton: X, Y, and Z each independently represent an alkyl group having 1-10 carbon atoms and optionally substituted with a halogen atom, an aryl group having 6-20 carbon atoms and optionally substituted with a halogen atom, an arylalkyl group having 7-20 carbon atoms and optionally substituted with a halogen atom, a heterocyclic group having 2-20 carbon atoms and optionally substituted with a halogen atom, or a halogen atom; k represents a number of 0-4; p represents a number of 0-8; r represents a number of 0-4; n represents 0-10; x represents a number of 0-4; y represents a number of 0-4; a sum of x and y is 2-4; and an optical isomer that exists when n is not 0 may be of any type.Type: ApplicationFiled: April 28, 2008Publication date: January 21, 2010Applicant: ADEKA CORPORATIONInventors: Taiki Mihara, Kiyoshi Murata, Koichi Kimijima