Patents by Inventor Klaus Becker

Klaus Becker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9818570
    Abstract: An indirectly heated cathode (IHC) ion source having improved life is disclosed. The IHC ion source comprises a chamber having a cathode and a repeller on opposite ends of the ion source. Biased electrodes are disposed on one or more sides of the ion source. The bias voltage applied to at least one of the cathode, the repeller and the electrodes, relative to the chamber, is varied over time. In certain embodiments, the voltage applied to the electrodes may begin at an initial positive voltage. Over time, this voltage may be reduced, while still maintaining the target ion beam current. Advantageously, the life of the cathode is improved using this technique.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: November 14, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Daniel Alvarado, Klaus Becker, David Ackerman
  • Patent number: 9809726
    Abstract: The present invention relates to a process for producing high-gloss surfaces on at least one portion of a substrate area, where the steps comprise (a) applying a layer made of a melt to at least one portion of the substrate area; (b) polishing of the applied layer of melt; (c) applying at least one lacquer layer to the polished layer of melt by means of a curtain-coating process; and (d) hardening the layer structure applied. The invention further relates to articles obtainable by this type of process.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: November 7, 2017
    Assignee: KLEBCHEMIE M. G. BECKER GMBH & CO. KG
    Inventors: Klaus Becker-Weimann, Jens Fandrey
  • Patent number: 9807864
    Abstract: An electrode for manipulating an ion beam. The electrode may include an insert having an ion beam aperture to conduct the ion beam therethrough, the insert comprising a first electrically conductive material; a frame disposed around the insert and comprising a second electrically conductive material; and an outer portion, the outer portion disposed around the frame and comprising a third electrically conductive material, wherein the insert is reversibly detachable from the frame, and wherein the frame is reversibly attachable from the outer portion.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: October 31, 2017
    Assignee: Varian Semiconductor Equipment Associates Inc.
    Inventors: Christopher Lupoli, Sheri A. Durgin, Daniel McGillicuddy, Victor J. Theriault, Klaus Becker
  • Publication number: 20170217814
    Abstract: A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO2—SiO2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO2—SiO2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO2—SiO2-soot particles.
    Type: Application
    Filed: November 6, 2014
    Publication date: August 3, 2017
    Applicant: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Stefan OCHS, Klaus BECKER
  • Patent number: 9691584
    Abstract: An ion source having improved life is disclosed. In certain embodiments, the ion source is an IHC ion source comprising a chamber, having a plurality of electrically conductive walls, having a cathode which is electrically connected to the walls of the ion source. Electrodes are disposed on one or more walls of the ion source. A bias voltage is applied to at least one of the electrodes, relative to the walls of the chamber. In certain embodiments, fewer positive ions are attracted to the cathode, reducing the amount of sputtering experienced by the cathode. Advantageously, the life of the cathode is improved using this technique. In another embodiment, the ion source comprises a Bernas ion source comprising a chamber having a filament with one lead of the filament connected to the walls of the ion source.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: June 27, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Daniel R. Tieger, Klaus Becker, Daniel Alvarado
  • Publication number: 20170117113
    Abstract: An indirectly heated cathode (IHC) ion source having improved life is disclosed. The IHC ion source comprises a chamber having a cathode and a repeller on opposite ends of the ion source. Biased electrodes are disposed on one or more sides of the ion source. The bias voltage applied to at least one of the cathode, the repeller and the electrodes, relative to the chamber, is varied over time. In certain embodiments, the voltage applied to the electrodes may begin at an initial positive voltage. Over time, this voltage may be reduced, while still maintaining the target ion beam current. Advantageously, the life of the cathode is improved using this technique.
    Type: Application
    Filed: December 17, 2015
    Publication date: April 27, 2017
    Inventors: Daniel Alvarado, Klaus Becker, David Ackerman
  • Patent number: 9594241
    Abstract: A transmitted-light microscope for imaging well-shaped, liquid-containing sample vessels, wherein the transmitted-light microscope has an illumination beam path for illuminating the sample vessel with an illumination beam bundle, from above, along an optical axis, wherein the illumination beam path has an illuminating element aligned to the optical axis, which element irradiates the illumination beam bundle onto the sample vessel, an imaging beam path for imaging the sample vessel from below along the optical axis and a pipette access channel for introducing a reagent into the sample vessel, wherein the illuminating element is annular and has an opening on the optical axis through which opening runs the pipette access channel.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: March 14, 2017
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Peter Schoen, Ralf Steinmeyer, Maik Sommer, Klaus Becker
  • Patent number: 9586850
    Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+?5×10?4.
    Type: Grant
    Filed: July 22, 2014
    Date of Patent: March 7, 2017
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Stefan Ochs, Klaus Becker, Stephan Thomas
  • Publication number: 20170051178
    Abstract: The present invention relates to a process for producing high-gloss surfaces on at least one portion of a substrate area, where the steps comprise (a) applying a layer made of a melt to at least one portion of the substrate area; (b) polishing of the applied layer of melt; (c) applying at least one lacquer layer to the polished layer of melt by means of a curtain-coating process; and (d) hardening the layer structure applied. The invention further relates to articles obtainable by this type of process.
    Type: Application
    Filed: November 8, 2016
    Publication date: February 23, 2017
    Applicant: Klebchemie M. G. Becker GmbH & Co. KG
    Inventors: Klaus BECKER-WEIMANN, Jens FANDREY
  • Patent number: 9568818
    Abstract: A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.
    Type: Grant
    Filed: September 23, 2015
    Date of Patent: February 14, 2017
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Stefan Ochs, Klaus Becker
  • Patent number: 9540271
    Abstract: A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography is provided. The blank includes a surface portion to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank. A maximum inhomogeneity (dCTEmax) of less than 5 ppb/K is defined as a difference between a CTE maximum value and a CTE minimum value. The dCTEmax is at least 0.5 ppb/K. The CA forms a non-circular area having a centroid. The dCTE distribution profile is not rotation-symmetrical and is defined over the CA, such that straight profile sections normalized to a unit length and extending through the centroid of the area yield a dCTE family of curves forming a curve band with a bandwidth of less than 0.5×dCTEmax.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: January 10, 2017
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Klaus Becker, Stefan Ochs, Stephan Thomas
  • Patent number: 9522840
    Abstract: A blank of TiO2—SiO2 glass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc. The TiO2—SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920° C. and 970° C. a dependence expressed as the differential quotient dTzc/dTf of its zero crossing temperature Tzc on the fictive temperature Tf of less than 0.3.
    Type: Grant
    Filed: February 4, 2014
    Date of Patent: December 20, 2016
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Stephan Thomas, Klaus Becker, Stefan Ochs
  • Patent number: 9518187
    Abstract: The present invention relates to a process for producing high-gloss surfaces on at least one portion of a substrate area, where the steps comprise (a) applying a layer made of a melt to at least one portion of the substrate area; (b) polishing of the applied layer of melt; (c) applying at least one lacquer layer to the polished layer of melt by means of a curtain-coating process; and (d) hardening the layer structure applied. The invention further relates to articles obtainable by this type of process.
    Type: Grant
    Filed: December 19, 2011
    Date of Patent: December 13, 2016
    Assignee: KLEBCHEMIE M. G. BECKER GMBH & CO. KG
    Inventors: Klaus Becker-Weimann, Jens Fandrey
  • Publication number: 20160320715
    Abstract: A substrate for an EUV mirror which contains a zero crossing temperature profile that departs from the statistical distribution is provided. A method for producing a substrate for an EUV mirror is also provided, in which the zero crossing temperature profile in the substrate is adapted to the operating temperature of the mirror. A lithography method using the substrate is also described.
    Type: Application
    Filed: September 10, 2014
    Publication date: November 3, 2016
    Applicant: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Klaus BECKER, Stephan THOMAS
  • Publication number: 20160304741
    Abstract: The present invention relates to an article whose surface has been at least partly sealed and to methods of its sealing, the sealing layer comprising a reactive melt layer and a coating layer. The invention provides a method of sealing at least part of the surface of an article, comprising the steps of: (a) applying a reactive melt layer based on polyurethane to at least one part of the surface of the article; (b) smoothing the reactive melt layer; and (c) applying a coating material to form a coating layer on the reactive melt layer, the coating layer being applied before the full curing of the reactive melt layer.
    Type: Application
    Filed: June 24, 2016
    Publication date: October 20, 2016
    Applicant: Klebchemie M.G. Becker GmbH & Co. KG
    Inventors: Jens FANDREY, Elke EHRMANN, Klaus BECKER-WEIMANN
  • Publication number: 20160264447
    Abstract: A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO2—SiO2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO2—SiO2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO2—SiO2-soot particles.
    Type: Application
    Filed: November 6, 2014
    Publication date: September 15, 2016
    Inventors: Stefan OCHS, Klaus BECKER
  • Patent number: 9399721
    Abstract: The present invention relates to an article whose surface has been at least partly sealed and to methods of its sealing, the sealing layer comprising a reactive melt layer and a coating layer. The invention provides a method of sealing at least part of the surface of an article, comprising the steps of: (a) applying a reactive melt layer based on polyurethane to at least one part of the surface of the article; (b) smoothing the reactive melt layer; and (c) applying a coating material to form a coating layer on the reactive melt layer, the coating layer being applied before the full curing of the reactive melt layer.
    Type: Grant
    Filed: December 22, 2005
    Date of Patent: July 26, 2016
    Assignee: KLEBCHEMIE M.G. BECKER GMBH & CO. KG
    Inventors: Jens Fandrey, Elke Ehrmann, Klaus Becker-Weimann
  • Publication number: 20160201685
    Abstract: A submersible pump includes a bearing arrangement and a rotor shaft. The bearing arrangement includes a bearing cover, a bearing flange, and one or more bearing elements, each bearing element having an inner bearing ring, an outer bearing ring and a roller element. The rotor shaft is rotatably supported in the one or more bearing element about an axis of rotation extending in a longitudinal axial direction so that the inner bearing ring is configured to rotate along with the rotor shaft in an operating state. The bearing element is arranged at the bearing flange such that the bearing cover tensions each outer bearing ring in a longitudinal axial direction and such that a peripheral gap having a predefined axial width is formed in a radial direction between the outer bearing ring and the bearing cover and between the outer bearing ring and the bearing flange.
    Type: Application
    Filed: December 29, 2015
    Publication date: July 14, 2016
    Inventor: Klaus BECKER
  • Publication number: 20160185645
    Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+?5×10?4.
    Type: Application
    Filed: July 22, 2014
    Publication date: June 30, 2016
    Applicant: HERAEUS QUARZGLAS GMBH & CO. KG
    Inventors: Stefan OCHS, Klaus BECKER, Stephan THOMAS
  • Publication number: 20160151880
    Abstract: A method for producing a mirror substrate blank made from titanium-doped silica glass for EUV lithography, having a thickness of at least 40 millimeters, includes steps of face grinding the surface of the blank and identifying data on defects in a surface layer of the blank. Light penetrates the blank at a predetermined angle of incidence ? of less than 90° at a location on the flat surface of the blank. The light scatters on a defect in the blank, and the scattered light is detected at a distance x from the penetration location on the surface of the blank by a light detection element arranged perpendicularly thereabove. The method further includes steps of determining the position of the defect in the surface layer based on the obtained data, and partial or complete removal of the surface layer in consideration of the position determination and forming the mirror substrate blank.
    Type: Application
    Filed: July 2, 2014
    Publication date: June 2, 2016
    Inventor: Klaus BECKER